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1. 发明申请

WO2014028685A1 APPARATUSES AND METHODS FOR OBTAINING AT-BIT MEASUREMENTS FOR AN EARTH BORING DRILLING TOOL 审中-公开
标题翻译：用于获得地镗钻工具的在位测量的设备和方法
公开(公告)号：WO2014028685A1
公开(公告)日：2014-02-20
申请号：PCT/US2013/055053
申请日：2013-08-15
申请人： BAKER HUGHES INCORPORATED , ELEMENT SIX LIMITED
发明人： SCOTT, Danny, E. , MOLLART, Timothy, Peter , BRANDON, John, Robert
IPC分类号： E21B47/013 , E21B10/46 , E21B10/42
CPC分类号： E21B49/003 , B22F7/06 , B22F2005/001 , B22F2005/005 , C22C26/00 , E21B10/54 , E21B10/55 , E21B10/56 , E21B10/567 , E21B12/00 , E21B12/02 , E21B44/00 , E21B47/00 , E21B47/01
摘要： An earth-boring drilling tool comprises a cutting element. The cutting element comprises a substrate, a diamond table, and at least one sensing element formed from a doped diamond material disposed at least partially within the diamond table. A method for determining an at-bit measurement for an earth-boring drill bit comprises receiving an electrical signal generated within a doped diamond material disposed within a diamond table of a cutting element of the earth-boring drill bit, and correlating the electrical signal with at least one parameter during a drilling operation.
摘要翻译：钻地钻孔工具包括切割元件。切割元件包括基底，金刚石台以及至少一个由掺杂金刚石材料形成的感测元件，所述金刚石材料至少部分地设置在金刚石台内。一种用于确定钻地钻头的钻头测量的方法包括：接收设置在钻地钻头的切削元件的金刚石台内的掺杂金刚石材料内产生的电信号;以及将电信号与钻井作业中至少有一个参数。

2. 发明申请

WO2014028686A1 METHOD FOR FORMING INSTRUMENTED CUTTING ELEMENTS OF AN EARTH-BORING DRILLING TOOL 审中-公开
标题翻译：形成钻孔钻具的仪表切割元件的方法
公开(公告)号：WO2014028686A1
公开(公告)日：2014-02-20
申请号：PCT/US2013/055055
申请日：2013-08-15
申请人： BAKER HUGHES INCORPORATED , ELEMENT SIX LIMITED
发明人： SCOTT, Danny, E. , MOLLART, Timothy, Peter , BRANDON, John, Robert
IPC分类号： E21B47/013 , E21B10/44 , E21B10/42
CPC分类号： E21B10/567 , B23P15/32 , B24D18/0009 , B24D99/005 , E21B47/00 , E21B47/01
摘要： A method of forming an instrumented cutting element comprises forming a free standing sintered diamond table having at least one chamber in the free standing sintered diamond table, providing a doped diamond material within the at least one chamber, and attaching a substrate to the free standing sintered diamond table to form an instrumented cutting element. The instrumented cutting element includes the doped diamond material disposed within the sintered diamond table on the substrate. A method of forming an earth-boring tool comprises attaching at least one instrumented cutting element to a body of an earth-boring tool. The at least one instrumented cutting element has a diamond table bonded to a substrate. The diamond table has at least one sensing element disposed at least partially within the diamond table. The at least one sensing element comprises a doped diamond material.
摘要翻译：一种形成仪表切割元件的方法包括：在独立烧结金刚石台中形成具有至少一个室的独立烧结金刚石台，在至少一个室内提供掺杂的金刚石材料，以及将基底连接到独立烧结金刚石钻石台，形成仪表切割元件。仪器切割元件包括设置在基板上的烧结金刚石台内的掺杂金刚石材料。一种形成钻孔工具的方法包括将至少一个装置的切割元件附接到钻孔工具的主体。所述至少一个仪表切割元件具有结合到基底的金刚石台。钻石台具有至少部分地设置在钻石台内的至少一个感测元件。所述至少一个感测元件包括掺杂的金刚石材料。

3. 发明申请

WO2012084658A1 MICROWAVE POWER DELIVERY SYSTEM FOR PLASMA REACTORS 审中-公开
标题翻译：用于等离子体反应器的微波功率输送系统
公开(公告)号：WO2012084658A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072822
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , WORT, Christopher, John, Howard , BRANDON, John, Robert
发明人： WORT, Christopher, John, Howard , BRANDON, John, Robert
IPC分类号： C23C16/27 , C23C16/511 , H01J37/32 , H01P5/04 , H01P5/20
CPC分类号： H01J37/32229 , C23C16/274 , C23C16/511 , C23C16/54 , H01J37/32192 , H01J37/32256 , H01J37/32266 , H01J2237/3321 , H01P5/20 , H01P5/222
摘要： A microwave power delivery system for supplying microwave power to a plurality of microwave plasma reactors (8), the microwave power delivery system comprising: a tuner (14) configured to be coupled to a microwave source (4) and configured to match impedance of the plurality of microwave plasma reactors to that of the microwave source; and a waveguide junction (18) coupled to the tuner and configured to guide microwaves to and from the plurality of microwave plasma reactors, wherein the waveguide junction comprises four waveguide ports including a first port coupled to the tuner, second and third ports configured to be coupled to respective microwave plasma reactors, and a fourth port coupled to a microwave sink (20), wherein the waveguide junction is configured to evenly split microwave power input from the tuner through the first port between the second and third ports for providing microwave power to respective microwave plasma reactors, wherein the waveguide junction is configured to decouple the second and third ports thereby preventing any reflected microwaves from one of the microwave plasma reactors from feeding across the waveguide junction directly into another microwave plasma reactor causing an imbalance, wherein the waveguide junction is further configured to feed reflected microwaves received back through the second and third ports which are balanced in terms of magnitude and phase to the tuner such that they can be reflected by the tuner and re-used, and wherein the waveguide junction is further configured to feed excess reflected power which is not balanced through the fourth port into the microwave sink.
摘要翻译：一种用于向多个微波等离子体反应器（8）提供微波功率的微波功率输送系统，所述微波功率输送系统包括：调谐器（14），其被配置为耦合到微波源（4）并且被配置为使所述微波功率输出系统多个微波等离子体反应器; 以及波导结（18），其耦合到所述调谐器并且被配置为向所述多个微波等离子体反应器引导微波，其中所述波导结包括四个波导端口，所述波导端口包括耦合到所述调谐器的第一端口，所述第二端口和所述第三端口被配置为耦合到相应的微波等离子体反应器，以及耦合到微波吸收器（20）的第四端口，其中所述波导结被配置为将从所述调谐器输入的微波功率均匀地分开通过所述第二和第三端口之间的第一端口，以提供微波功率各个微波等离子体反应器，其中波导结被配置为使第二和第三端口去耦，从而防止来自微波等离子体反应器之一的任何反射的微波直接穿过波导结直接进入另一个引起不平衡的微波等离子体反应器，其中波导结进一步构造成供给反向收回的反射的微波 gh第二和第三端口，其在幅度和相位方面与调谐器平衡，使得它们可以被调谐器反射并重新使用，并且其中波导结还被配置为馈送不平衡的多余的反射功率第四口进入微波槽。

4. 发明申请

WO2006056871A2 COMPONENTS 审中-公开
标题翻译：组件
公开(公告)号：WO2006056871A2
公开(公告)日：2006-06-01
申请号：PCT/IB2005/003546
申请日：2005-11-25
申请人： ELEMENT SIX LIMITED , SMALLMAN, Clint, Guy , SCARSBROOK, Geoffrey, Alan , DAVIES, Geoffrey, John , BRANDON, John, Robert
发明人： SMALLMAN, Clint, Guy , SCARSBROOK, Geoffrey, Alan , DAVIES, Geoffrey, John , BRANDON, John, Robert
IPC分类号： H04R7/02 , H04R31/00
CPC分类号： C22C26/00 , H04R31/003 , H04R2307/023 , H04R2307/027 , Y10T428/12 , Y10T428/12431
摘要： A component that is rigid and three-dimensional and has a relatively low mass. The component has a foil body formed of a metal or metal alloy matrix that is embedded with ultra-hard particles or grit, such as diamond and/or cBN. It can be used in applications where a combination of high rigidity and low mass is required, such as in audio applications, for example.
摘要翻译：刚性和立体且质量相对较低的组件。该组件具有由金属或金属合金基体形成的箔体，该金属或金属合金基质嵌入超硬颗粒或砂粒，例如金刚石和/或cBN。它可以用于需要高刚性和低质量的组合的应用中，例如在音频应用中。

5. 发明申请

WO2013178535A2 FREE-STANDING NON-PLANAR POLYCRYSTALLINE SYNTHETIC DIAMOND COMPONENTS 审中-公开
标题翻译：自由标准非平面多晶合成金刚石组件
公开(公告)号：WO2013178535A2
公开(公告)日：2013-12-05
申请号：PCT/EP2013/060666
申请日：2013-05-23
申请人： ELEMENT SIX LIMITED
发明人： LIGGINS, Stephanie , BRANDON, John, Robert , PERKINS, Neil , WORT, Christopher, John, Howard , INGLIS, Paul, Nicolas , MCCLYMONT, Mark, Robin
IPC分类号： H04R7/12 , H04R31/00
CPC分类号： A44C17/007 , C23C16/01 , C23C16/27 , C23C16/274 , C23C16/458 , H04R7/127 , H04R31/003 , H04R2307/023 , Y10T428/21 , Y10T428/24355
摘要： A free-standing non-planar polycrystalline CVD synthetic diamond component which comprises a nucleation face and a growth face, the nucleation face comprising smaller grains than the growth face, the nucleation face having a surface roughness R a no more than 50 nm, wherein the free-standing non-planar polycrystalline CVD synthetic diamond component has a longest linear dimension when projected onto a plane of no less than 5 mm and is substantially crack free over at least a central region thereof, wherein the central region is at least 70% of a total area of the free-standing non-planar polycrystalline CVD synthetic diamond component, wherein the central region has no cracks which intersect both external major faces of the free-standing non-planar polycrystalline CVD synthetic diamond component and extend greater than 2 mm in length.
摘要翻译：一种独立的非平面多晶CVD合成金刚石组分，其包含成核面和生长面，所述成核面包含比生长面更小的晶粒，成核面的表面粗糙度Ra不大于50nm，其中，当非投影到不小于5mm的平面上并且在至少其中心区域上基本上无裂纹时，其非常平坦的多晶CVD合成金刚石组件具有最长的线性尺寸，其中中心区域至少为70％独立非平面多晶CVD合成金刚石组分的总面积，其中中心区域没有与独立的非平面多晶CVD合成金刚石组分的两个主要表面相交并且长度大于2mm的裂纹。

6. 发明申请

WO2013087702A3 LARGE AREA OPTICAL QUALITY SYNTHETIC POLYCRYSTALLINE DIAMOND WINDOW 审中-公开
公开(公告)号：WO2013087702A3
公开(公告)日：2013-06-20
申请号：PCT/EP2012/075246
申请日：2012-12-12
申请人： ELEMENT SIX LIMITED
发明人： INGLIS, Paul, Nicholas , BRANDON, John, Robert , DODSON, Joseph, Michael , MOLLART, Timothy, Peter
IPC分类号： C23C16/01 , C23C16/27 , H01J37/32 , C23C16/44 , C23C16/56 , C23C16/455 , C23C16/458 , C23C16/46
摘要： A polycrystalline chemical vapour deposited (CVD) diamond wafer comprising: a largest linear dimension equal to or greater than 125 mm; a thickness equal to or greater than 200 μm; and one or both of the following characteristics measured at room temperature (nominally 298 K) over at least a central area of the polycrystalline CVD diamond wafer, said central area being circular, centred on a central point of the polycrystalline CVD diamond wafer, and having a diameter of at least 70% of the largest linear dimension of the polycrystalline CVD diamond wafer: an absorption coefficient 0.2 cm -1 at 10.6 μm; and a dielectric loss coefficient at 145 GHz, of tan δ 2 x 10 -4 .

7. 发明申请

WO2012084660A1 A MICROWAVE PLASMA REACTOR FOR MANUFACTURING SYNTHETIC DIAMOND MATERIAL 审中-公开
标题翻译：用于制造合成金刚石材料的微波等离子体反应器
公开(公告)号：WO2012084660A1
公开(公告)日：2012-06-28
申请号：PCT/EP2011/072824
申请日：2011-12-14
申请人： ELEMENT SIX LIMITED , BRANDON, John, Robert , CULLEN, Alexander, Lamb , WILLIAMS, Stephen, David , DODSON, Joseph, Michael , WILMAN, Jonathan, James , WORT, Christopher, John, Howard
发明人： BRANDON, John, Robert , CULLEN, Alexander, Lamb , WILLIAMS, Stephen, David , DODSON, Joseph, Michael , WILMAN, Jonathan, James , WORT, Christopher, John, Howard
IPC分类号： H01J37/32 , C23C16/511
CPC分类号： H01J37/32458 , C23C16/274 , C23C16/511 , H01J37/32192 , H01J37/32284
摘要： A microwave plasma reactor for manufacturing synthetic diamond material via chemical vapour deposition, the microwave plasma reactor comprising: a microwave generator configured to generate microwaves at a frequency f; a plasma chamber comprising a base, a top plate, and a side wall extending from said base to said top plate defining a resonance cavity for supporting a microwave resonance mode, wherein the resonance cavity has a central rotational axis of symmetry extending from the base to the top plate, and wherein the top plate is mounted across said central rotational axis of symmetry; a microwave coupling configuration for feeding microwaves from the microwave generator into the plasma chamber; a gas flow system for feeding process gases into the plasma chamber and removing them therefrom; and a substrate holder disposed in the plasma chamber and comprising a supporting surface for supporting a substrate on which the synthetic diamond material is to be deposited in use; wherein the resonance cavity is configured to have a height, as measured from the base to the top plate of the plasma chamber, which supports a TM 011 resonant mode between the base and the top plate at said frequency f, and wherein the resonance cavity is further configured to have a diameter, as measured at a height less than 50% of the height of the resonance cavity as measured from the base, which satisfies the condition that a ratio of the resonance cavity height / the resonance cavity diameter is in the range 0.3 to 1.0.
摘要翻译：一种用于通过化学气相沉积制造合成金刚石材料的微波等离子体反应器，所述微波等离子体反应器包括：微波发生器，被配置为以频率f产生微波; 等离子体室，包括基底，顶板和从所述底座延伸到所述顶板的侧壁，所述侧壁限定用于支撑微波共振模式的谐振腔，其中所述谐振腔具有从所述底座延伸到对称的中心旋转对称轴线顶板，并且其中顶板穿过所述中心旋转对称轴线安装; 用于将微波从微波发生器馈送到等离子体室中的微波耦合配置; 用于将工艺气体进料到等离子体室中并从中除去它们的气体流动系统; 以及衬底保持器，其设置在所述等离子体室中，并且包括支撑表面，所述支撑表面用于支撑在使用中沉积所述合成金刚石材料的基底; 其中所述谐振腔被配置为具有从所述等离子体室的所述基板到所述顶板测量的高度，所述高度在所述频率f处支撑所述基座和所述顶板之间的TM011谐振模式，并且其中所述谐振腔进一步被配置为具有在从底部测量的高度小于谐振腔的高度的50％的高度处测量的直径，其满足谐振腔高度/谐振腔直径的比率在0.3范围内的条件到1.0。

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