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1. 发明申请

WO2020188529A1 A COATED STEEL SUBSTRATE, A METHOD FOR THE MANUFACTURE OF A COATED STEEL SUBSTRATE, A METHOD FOR MANUFACTURE OF A STEEL PRODUCT AND A STEEL PRODUCT 审中-公开
公开(公告)号：WO2020188529A1
公开(公告)日：2020-09-24
申请号：PCT/IB2020/052577
申请日：2020-03-20
申请人： ARCELORMITTAL , LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： URIOS, Thomas , CHOQUET, Patrick , ERSHOV, Sergey
IPC分类号： C23C2/00 , C23C10/32 , C23C10/40 , C23C14/00 , C23C16/00 , C23C22/00 , C23C24/04
摘要： The present invention relates to a coated steel substrate coated with a first coating comprising above 40wt.% of chromium and optionally one or several elements chosen from yttrium, silicon, calcium, titanium, zirconium, vanadium, niobium and nickel in an amount below 10wt.% for each element, the balance being chromium and a second coating comprising from 2 to 30wt.% of Aluminum, from 10 to 40wt.% of chromium and optionally one or several elements chosen from yttrium, silicon, calcium, titanium, zirconium, vanadium, niobium and nickel in an amount below 10wt.% for each element, the balance being iron, said steel substrate comprising Cr ≤ 2.0% by weight.; a method for the manufacture of this coated steel substrate; a method for the manufacture of a coated hot steel product; a coated hot steel product and the use of a hot steel product.

2. 发明申请

WO2020188321A1 A COATED STEEL SUBSTRATE, A METHOD FOR THE MANUFACTURE OF A COATED STEEL SUBSTRATE, A METHOD FOR MANUFACTURE OF A STEEL PRODUCT AND A STEEL PRODUCT 审中-公开
公开(公告)号：WO2020188321A1
公开(公告)日：2020-09-24
申请号：PCT/IB2019/052260
申请日：2019-03-20
申请人： ARCELORMITTAL , LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： URIOS, Thomas , CHOQUET, Patrick , ERSHOV, Sergey
IPC分类号： C23C2/00 , C23C10/32 , C23C10/40 , C23C14/00 , C23C16/00 , C23C22/00 , C23C24/04
摘要： The present invention relates to a coated steel substrate coated with a first coating comprising chromium and a second coating comprising from 2 to 30wt.% of Aluminum, from 10 to 40wt% of chromium, the balance being iron, said steel substrate comprising Cr ≤2.0% by weight; a method for the manufacture of this coated steel substrate; a method for the manufacture of a coated hot steel product; a coated hot steel product and the use of a hot steel product.

3. 发明申请

WO2018050562A1 POST-DISCHARGE PLASMA COATING DEVICE FOR WIRED SUBSTRATES 审中-公开
标题翻译：用于有线基板的放电后等离子体涂覆装置
公开(公告)号：WO2018050562A1
公开(公告)日：2018-03-22
申请号：PCT/EP2017/072635
申请日：2017-09-08
申请人： LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： BULOU, Simon , CHOQUET, Patrick , GAULAIN, Thomas , GERARD, Mathieu
IPC分类号： H01J37/32 , C23C16/503 , H05H1/24
摘要： The invention is directed to a post-discharge plasma coating device (2) for a wired substrate (4) comprising an inner tubular electrode (6) on an inner tubular wall (3) for receiving the substrate (4) and a precursor (8) moving axially in a working direction (30); an outer tubular electrode (10) coaxial with, and surrounding, the inner tubular electrode (6). The inner and outer electrodes (6,10) are configured to be supplied with an electrical power source (18) for producing a plasma when a plasma gas (12) is supplied between said electrodes and is thereby excited, the plasma excited gas (19) flowing axially in the working direction (30) and reacting with the precursor (8) in a coating area (16) at the end of the inner tubular wall (3) in said direction. The inner tubular wall (3) extends axially towards the coating area (16) at least until, preferably beyond, the end of the outer electrode (10), in the working direction (30) and at least one dielectric tubular wall extends axially between the inner tubular electrode (6) and the outer tubular electrode (10).
摘要翻译：本发明涉及一种用于接线基板（4）的放电后等离子体涂覆设备（2），其包括位于内管状壁（3）上的内管状电极（6），用于接收基板（4）和沿工作方向（30）轴向移动的前驱体（8）; 与内部管状电极（6）同轴并围绕内部管状电极（6）的外部管状电极（10）。当等离子体气体（12）被供应到所述电极之间并由此被激发时，内部和外部电极（6,10）被配置为供应用于产生等离子体的电源（18），等离子体激发的气体）沿工作方向（30）轴向流动并且在所述方向上在内部管状壁（3）的端部处的涂覆区域（16）中与前体（8）反应。内管状壁（3）沿工作方向（30）至少直到，优选超过外电极（10）的端部，朝着涂覆区域（16）轴向延伸，并且至少一个介电管状壁在轴向内部管状电极（6）和外部管状电极（10）。

4. 发明申请

WO2018050758A1 DEVICE FOR PERFORMING ATMOSPHERIC PRESSURE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION AT LOW TEMPERATURE 审中-公开
标题翻译：用于在低温下进行大气压等离子体增强化学气相沉积的装置
公开(公告)号：WO2018050758A1
公开(公告)日：2018-03-22
申请号：PCT/EP2017/073165
申请日：2017-09-14
申请人： LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： BABA, Kamal , BOSCHER, Nicolas , BULOU, Simon , CHOQUET, Patrick , GERARD, Mathieu , QUESADA GONZALEZ, Miguel
IPC分类号： H01J37/32 , C23C16/06 , H05H1/46
摘要： The invention is directed to a plasma post-discharge deposition device (100) for depositing crystalline metal oxide derivative on a substrate (112), said device comprising a gas source (116) with a substrate inlet (102), a post-discharge deposition chamber (110) with a substrate outlet (104), said substrate inlet and said substrate outlet defining a longitudinal central axis, and a dielectric tube (108) placed between said gas source and said deposition chamber on said longitudinal central axis; configured to confine a plasma discharge and comprising a discharge zone lying on the internal surface of said dielectric tube and a central zone centred on said longitudinal central axis. Said deposition device is remarkable in that said central zone is located at a distance comprised between 1 mm and 2.5 mm from the internal surface of said dielectric tube. The invention is also directed to a plasma-enhanced chemical vapour deposition method.
摘要翻译：本发明涉及用于在衬底（112）上沉积结晶金属氧化物衍生物的等离子体放电后沉积装置（100），所述装置包括具有衬底入口（116）的气体源（116）具有衬底出口（104）的放电后沉积室（110），所述衬底入口和所述衬底出口限定纵向中心轴线，以及放置在所述气体源和所述沉积室之间的介电管（108）所述纵向中心轴线; 被配置为限制等离子体放电并且包括位于所述介电管的内表面上的放电区和以所述纵向中心轴为中心的中心区。所述沉积装置的显着之处在于所述中心区域位于离所述电介质管的内表面1mm至2.5mm之间的距离处。本发明还涉及等离子体增强化学气相沉积方法。

5. 发明申请

WO2015169864A1 METHOD FOR FORMING REGUAL POLYMER THIN FILMS USING ATMOSPHERIC PLASMA DEPOSITION 审中-公开
标题翻译：使用大气等离子体沉积形成再分散聚合物薄膜的方法
公开(公告)号：WO2015169864A1
公开(公告)日：2015-11-12
申请号：PCT/EP2015/059979
申请日：2015-05-06
申请人： LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： BOSCHER, Nicolas , CHOQUET, Patrick , DUDAY, David , HILT, Florian
IPC分类号： B05D1/00
CPC分类号： B05D1/62 , B05D3/0486 , H01J37/32192 , H01J37/32348 , H01J2237/3321
摘要： The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
摘要翻译：本发明提供了一种使用大气等离子体放电在衬底上形成规则聚合物薄膜的方法。特别地，该方法允许需要高规则性和线性聚合物结构的功能聚合物薄膜的沉积。

6. 发明申请

WO2019016221A1 PLASMA DEVICE FOR DEPOSITING FUNCTIONAL COMPOSITE FILM COMPRISING CRYSTALLIZED PARTICLES EMBEDDED IN A MATRIX AND METHOD OF DEPOSITION THEREOF 审中-公开
公开(公告)号：WO2019016221A1
公开(公告)日：2019-01-24
申请号：PCT/EP2018/069421
申请日：2018-07-17
申请人： LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： CHEMIN, Jean-Baptiste , BULOU, Simon , BOSCHER, Nicolas , CHOQUET, Patrick
IPC分类号： C23C16/452 , C23C16/453 , C23C16/455 , C23C16/448 , H05H1/42 , H05H1/48 , H01J37/32 , B01J35/00 , B82Y30/00 , G02B27/00
摘要： Plasma device (2) for depositing a functional composite film on a substrate (4) at atmospheric pressure, said device comprising a conduit (6) extending along a longitudinal axis with a gas inlet (8); a discharge area (12) configured to electrically excite the gas in the conduit at the inlet in order to produce a plasma at atmospheric pressure; a post-discharge area (14) downstream of the discharge area, comprising at least one first inlet (20) through a wall of the conduit, for injecting a first precursor or precursors mixture in the plasma; a plasma outlet (10). The post-discharge area further comprises at least one second inlet (22) through the wall of the conduit, for injecting a second precursor or precursors mixture in the plasma downstream of the at least first inlet.

7. 发明申请

WO2022254130A1 SUBSTRAT REVÊTU D'UN REVÊTEMENT LUBRIFIANT 审中-公开
公开(公告)号：WO2022254130A1
公开(公告)日：2022-12-08
申请号：PCT/FR2022/050999
申请日：2022-05-25
申请人： CENTRE NATIONAL D'ÉTUDES SPATIALES , CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE , INSTITUT NATIONAL DES SCIENCES APPLIQUEES DE LYON , LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： CHEMIN, Jean-Baptiste , CHOQUET, Patrick , COLAS, Guillaume , SAULOT, Aurélien , YANN, Michel
IPC分类号： C23C14/00 , C23C14/06 , C23C14/08 , C23C14/34 , C23C14/35
摘要： La présente invention porte sur un substrat revêtu d'un revêtement constitué de d'atomes de molybdène (Mo), de souffre (S), de tantale (Ta) et d'oxygène (O) présents sous la forme d'un ou plusieurs composés choisis parmi les composés de formule (I): [Chem 16] MowSxTayOz (I) dans laquelle w est égal à 0 ou 1; x varie de 0 à 2; y varie de 0 à 1 et z varie de 0 à 3; ledit revêtement comprenant au moins 5% at. d'oxygène et ledit revêtement possédant une microstructure compacte dense.

8. 发明申请

WO2019068770A1 ROOM-TEMPERATURE PLASMA-ASSISTED INKJET-PRINTING OF A LIQUID MOD INK ON A POROUS SUBSTRATE 审中-公开
公开(公告)号：WO2019068770A1
公开(公告)日：2019-04-11
申请号：PCT/EP2018/076920
申请日：2018-10-03
申请人： LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST) , UCL BUSINESS PLC (UCLB)
发明人： BOSCHER, Nicolas , CHEMIN, Jean-Baptiste , CHOQUET, Patrick , KNAPP, Caroline
IPC分类号： H05K3/12 , H05K1/09 , H05K3/10 , H05K1/03
CPC分类号： H05K3/125 , H05K1/0386 , H05K1/0393 , H05K1/092 , H05K3/1283 , H05K2201/0116 , H05K2203/095
摘要： The invention is directed to a method for depositing a conductive metal layer on a porous substrate, said method comprising the steps of (a) providing at least one porous substrate, (b) inkjet-printing a liquid metal-organic decomposition ink on said at least one porous substrate, and (c) providing a plasma exposure, wherein step (c) is performed less than 10 seconds after the end of step (b).

9. 发明申请

WO2015150665A1 PROCÉDÉ ET DISPOSITIF POUR GÉNÉRER UN PLASMA EXCITE PAR UNE ÉNERGIE MICRO-ONDE DANS LE DOMAINE DE LA RÉSONNANCE CYCLONIQUE ÉLECTRONIQUE (RCE), POUR RÉALISER UN TRAITEMENT DE SURFACE OU REVÊTEMENT AUTOUR D'UN ÉLÉMENT FILIFORME. 审中-公开
标题翻译：用于在电子循环共振（ECR）域中产生由微波能量激发的等离子体的方法和装置，用于进行表面处理或生产在膜片元件周围的涂层
公开(公告)号：WO2015150665A1
公开(公告)日：2015-10-08
申请号：PCT/FR2015/050765
申请日：2015-03-26
申请人： H.E.F. , LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY (LIST)
发明人： BLANDENET, Olivier , LAGARDE, Thierry Léon , CHOQUET, Patrick , DUDAY, David
IPC分类号： H01J37/32
CPC分类号： H01J37/32192 , C23C16/511 , H01J37/32403 , H01J37/3244 , H01J37/32513 , H01J37/32678 , H01J37/32733 , H01J2237/3321
摘要： Selon le procédé: -on déplace linéairement en continu l'élément filiforme au travers de dipôles magnétiques disposés en regard et autour d'un tube constituant une chambre de traitement, -on introduit l'énergie micro-onde entre au moins deux dipôles magnétiques.
摘要翻译：根据该方法：丝状元件通过相互放置的磁偶极子和围绕形成处理室的管线连续移动; 并且微波能量被引入到至少两个磁偶极子之间。

10. 发明申请

WO2008142222A1 PROCÉDÉ DE REVÊTEMENT D'UN SUBSTRAT ET INSTALLATION DE DÉPÔT SOUS VIDE D'ALLIAGE MÉTALLIQUE 审中-公开
标题翻译：涂覆基材和金属合金真空沉积设备的方法
公开(公告)号：WO2008142222A1
公开(公告)日：2008-11-27
申请号：PCT/FR2008/000347
申请日：2008-03-19
申请人： ARCELORMITTAL FRANCE , CHOQUET, Patrick , SILBERBERG, Eric , SCHMITZ, Bruno , CHALEIX, Daniel
发明人： CHOQUET, Patrick , SILBERBERG, Eric , SCHMITZ, Bruno , CHALEIX, Daniel
IPC分类号： C23C14/16 , C23C14/24 , C23C14/56
CPC分类号： C23C16/06 , C23C14/16 , C23C14/24 , C23C14/562 , C23C16/45563
摘要： L'invention concerne un procédé de revêtement d'un substrat (S) selon lequel on dépose en continu sur le substrat (S) une couche d'alliage métallique comprenant au moins deux éléments métalliques, au moyen d'une installation de dépôt sous vide (1) comprenant un dispositif de revêtement par jet de vapeur (7), permettant de projeter sur le substrat (S) une vapeur contenant les éléments métalliques en une proportion relative prédéterminée et constante, la vapeur étant préalablement portée à une vitesse sonique. Le procédé est plus particulièrement destiné au dépôt de revêtements de Zn- Mg. Elle concerne également une installation de dépôt sous vide (1) en continu de revêtements formés d'alliages métalliques pour la mise en œuvre du procédé.
摘要翻译：本发明涉及一种通过使用包括蒸气喷射涂布装置（1）的真空沉积设备（1）在所述基板（S）上连续沉积包括至少两个金属元素的金属合金层的方法来涂覆基板（S） 7），用于以包含金属元素的蒸气以预定和恒定的相对比例喷涂基底（S），其中蒸汽预先被加速到声速。该方法特别用于沉积Zn-Mg涂层。本发明还涉及一种用于实现所述方法的连续金属合金真空沉积设备（1）。

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