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1. 发明申请

WO2008073954A3 WET PHOTORESIST STRIPPING PROCESS AND APPARATUS 审中-公开
标题翻译：湿光电极剥离工艺和设备
公开(公告)号：WO2008073954A3
公开(公告)日：2008-08-21
申请号：PCT/US2007087161
申请日：2007-12-12
申请人： APPLIED MATERIALS INC , CHO SEON-MEE , FOAD MAJEED A
发明人： CHO SEON-MEE , FOAD MAJEED A
IPC分类号： H01L21/02 , H01L21/311
CPC分类号： H01L21/67075 , G03F7/42 , G03F7/423 , G03F7/426 , H01L21/31133
摘要： A process for stripping photoresist from a substrate is provided. A processing system for implanting a dopant into a layer of a film stack, annealing the stripped film stack, and stripping the implanted film stack is also provided. When high dopant concentrations are implanted into a photoresist layer, a crust layer may form on the surface of the photoresist layer that may not be easily removed. The methods described herein are effective for removing a photoresist layer having such a crust on its surface.
摘要翻译：提供了从基板剥离光致抗蚀剂的方法。还提供了一种用于将掺杂剂注入薄膜堆叠层，退火剥离的薄膜堆叠以及剥离植入薄膜叠层的处理系统。当高掺杂剂浓度注入到光致抗蚀剂层中时，可能在光致抗蚀剂层的表面上形成可能不容易去除的外壳层。本文描述的方法对于在其表面上去除具有这样的外壳的光致抗蚀剂层是有效的。

2. 发明申请

WO2008073954B1 WET PHOTORESIST STRIPPING PROCESS AND APPARATUS 审中-公开
标题翻译：湿式光刻胶剥离工艺及设备
公开(公告)号：WO2008073954B1
公开(公告)日：2008-11-27
申请号：PCT/US2007087161
申请日：2007-12-12
申请人： APPLIED MATERIALS INC , CHO SEON-MEE , FOAD MAJEED A
发明人： CHO SEON-MEE , FOAD MAJEED A
IPC分类号： H01L21/02 , H01L21/311
CPC分类号： H01L21/67075 , G03F7/42 , G03F7/423 , G03F7/426 , H01L21/31133
摘要： A process for stripping photoresist from a substrate is provided. A processing system for implanting a dopant into a layer of a film stack, annealing the stripped film stack, and stripping the implanted film stack is also provided. When high dopant concentrations are implanted into a photoresist layer, a crust layer may form on the surface of the photoresist layer that may not be easily removed. The methods described herein are effective for removing a photoresist layer having such a crust on its surface.
摘要翻译：提供了从衬底剥离光刻胶的工艺。还提供了一种处理系统，用于将掺杂剂注入到薄膜叠层的层中，对剥离的薄膜叠层进行退火以及剥离注入的薄膜叠层。当将高掺杂浓度注入到光致抗蚀剂层中时，可能在光致抗蚀剂层的表面上形成可能不容易去除的硬皮层。本文描述的方法对于去除其表面上具有这样的外壳的光致抗蚀剂层是有效的。

3. 发明申请

WO2008073906A3 DRY PHOTORESIST STRIPPING PROCESS AND APPARATUS 审中-公开
标题翻译：干燥剂剥离工艺和设备
公开(公告)号：WO2008073906A3
公开(公告)日：2008-09-12
申请号：PCT/US2007087008
申请日：2007-12-10
申请人： APPLIED MATERIALS INC , CHO SEON-MEE , FOAD MAJEED A
发明人： CHO SEON-MEE , FOAD MAJEED A
IPC分类号： H01L21/31 , B05D3/00
CPC分类号： G03F7/427 , H01L21/31138
摘要： A process for stripping photoresist from a substrate is provided. A processing system for implanting a dopant into a layer of a film stack, annealing the stripped film stack, and stripping the implanted film stack is also provided. When high dopant concentrations are implanted into a photoresist layer, a crust layer may form on the surface of the photoresist layer that may not be easily removed. The methods described herein are effective for removing a photoresist layer having such a crust on its surface.
摘要翻译：提供了从基板剥离光致抗蚀剂的方法。还提供了一种用于将掺杂剂注入薄膜堆叠层，退火剥离的薄膜堆叠以及剥离植入薄膜叠层的处理系统。当将高掺杂剂浓度注入到光致抗蚀剂层中时，可能在光致抗蚀剂层的表面上形成可能不容易除去的外壳层。本文描述的方法对于在其表面上去除具有这样的外壳的光致抗蚀剂层是有效的。

4. 发明申请

WO2010118266A3 USE SPECIAL ION SOURCE APPARATUS AND IMPLANT WITH MOLECULAR IONS TO PROCESS HDD (HIGH DENSITY MAGNETIC DISKS) WITH PATTERNED MAGNETIC DOMAINS 审中-公开
标题翻译：使用特殊离子源装置和分子离子注入具有图形磁场的HDD（高密度磁性磁盘）
公开(公告)号：WO2010118266A3
公开(公告)日：2011-01-13
申请号：PCT/US2010030442
申请日：2010-04-08
申请人： APPLIED MATERIALS INC , MOFFATT STEPHEN , FOAD MAJEED A
发明人： MOFFATT STEPHEN , FOAD MAJEED A
IPC分类号： G11B5/84 , G11B5/73
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/746 , H01F10/16 , H01F10/265 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically susceptible material, and a patterned resist layer is formed over the magnetically susceptible material. Atom groups are directed toward the substrate, penetrating the resist and implanting into the magnetically susceptible layer. Thick portions of the resist prevent implantation in some areas to form a pattern of magnetic properties on the substrate. Energy and composition of the atom groups, thickness and hardness of the resist, and lattice energy of the magnetically susceptible material may all be adjusted to yield desired fragmentation and implantation of the atom groups, including in some embodiments mere impact on the surface without implanting. A protective layer and a lubricating layer are formed over the patterned magnetically susceptible layer.
摘要翻译：提供了一种用于制造磁存储介质的方法和装置。用磁敏材料涂覆结构基材，并且在磁敏感材料上形成图案化的抗蚀剂层。原子团指向衬底，穿透抗蚀剂并注入到磁敏感层中。抗蚀剂的厚部分防止在一些区域中的注入以在基底上形成磁性的图案。原子组的能量和组成，抗蚀剂的厚度和硬度以及磁敏材料的晶格能都可以被调整以产生所需的原子团的分裂和注入，包括在一些实施方案中仅仅对表面的冲击而不会进行注入。在图案化的易磁化层上形成保护层和润滑层。

5. 发明申请

WO2011119611A3 DIELECTRIC DEPOSITION USING A REMOTE PLASMA SOURCE 审中-公开
标题翻译：用远离等离子体源的介质沉积
公开(公告)号：WO2011119611A3
公开(公告)日：2011-12-22
申请号：PCT/US2011029433
申请日：2011-03-22
申请人： APPLIED MATERIALS INC , HOFMANN RALF , FOAD MAJEED A
发明人： HOFMANN RALF , FOAD MAJEED A
IPC分类号： C23C14/34 , C23C14/35 , C23C14/50
CPC分类号： C23C14/3407 , C23C14/0036 , C23C14/06 , C23C14/354 , H01J37/32357 , H01J37/34 , H05H1/46 , H05H2001/4667
摘要： A sputter deposition system comprises a vacuum chamber including a vacuum pump for maintaining a vacuum in the vacuum chamber, a gas inlet for supplying process gases to the vacuum chamber, a sputter target and a substrate holder within the vacuum chamber, and a plasma source attached to the vacuum chamber and positioned remotely from the sputter target, the plasma source being configured to form a high density plasma beam extending into the vacuum chamber. The plasma source may include a rectangular cross-section source chamber, an electromagnet, and a radio frequency coil, wherein the rectangular cross-section source chamber and the radio frequency coil are configured to give the high density plasma beam an elongated ovate cross-section. Furthermore, the surface of the sputter target may be configured in a non-planar form to provide uniform plasma energy deposition into the target and/or uniform sputter deposition at the surface of a substrate on the substrate holder. The sputter deposition system may include a plasma spreading system for reshaping the high density plasma beam for complete and uniform coverage of the sputter target.
摘要翻译：溅射沉积系统包括真空室和等离子体源，真空室包括用于保持真空室中的真空的真空泵，用于向真空室供应处理气体的气体入口，溅射靶和在真空室内的基板保持器，到真空室并且远离溅射靶定位，等离子体源被配置为形成延伸到真空室中的高密度等离子体束。等离子体源可以包括矩形横截面源室，电磁体和射频线圈，其中矩形横截面源室和射频线圈被配置为给高密度等离子体束提供细长的卵形横截面。此外，溅射靶材的表面可以以非平面形式构造，以在基板支架上的基板表面处提供均匀的等离子体能量沉积到靶材和/或均匀的溅射沉积。溅射沉积系统可以包括等离子体扩散系统，用于整形高密度等离子体束以完全且均匀地覆盖溅射靶。

6. 发明申请

WO2010098993A3 HDD PATTERN IMPLANT SYSTEM 审中-公开
标题翻译： HDD图案植入系统
公开(公告)号：WO2010098993A3
公开(公告)日：2010-11-11
申请号：PCT/US2010024163
申请日：2010-02-12
申请人： APPLIED MATERIALS INC , FOAD MAJEED A , NEWMAN JACOB , MARIN JOSE ANTONIO , HOFFMAN DANIEL J , MOFFATT STEPHEN , VERHAVERBEKE STEVEN
发明人： FOAD MAJEED A , NEWMAN JACOB , MARIN JOSE ANTONIO , HOFFMAN DANIEL J , MOFFATT STEPHEN , VERHAVERBEKE STEVEN
IPC分类号： G11B5/73 , G11B5/82 , G11B5/84
CPC分类号： G11B5/82 , C23C14/48 , C23C14/50 , C23C16/00 , C23F1/00 , G11B5/84 , G11B5/855 , H01L21/673 , H01L21/677 , H01L21/687
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.
摘要翻译：提供了用于形成具有磁性图案化表面的基板的方法和设备。包含一种或多种具有磁性的材料的磁性层形成在基板上。对磁性层进行构图工艺，其中改变磁性层表面的选定部分，使得改变部分具有与未改变部分不同的磁性，而不改变衬底的形貌。在图案化的磁性层上沉积保护层和润滑剂层。图案化是通过许多将基材暴露于不同形式能量的过程来完成的。本文公开的装置和方法能够同时处理基板的两个主表面，或者通过翻转来顺序处理。在一些实施例中，衬底表面的磁性可以通过等离子体暴露均匀地改变，然后通过暴露于图案化的能量而选择性地恢复。

7. 发明申请

WO2010120725A4 HDD PATTERN APPARATUS USING LASER, E-BEAM, OR FOCUSED ION BEAM 审中-公开
标题翻译：使用激光，电子束或聚焦离子束的硬盘图案设备
公开(公告)号：WO2010120725A4
公开(公告)日：2011-03-03
申请号：PCT/US2010030823
申请日：2010-04-13
申请人： APPLIED MATERIALS INC , FOAD MAJEED A , MOFFATT STEPHEN
发明人： FOAD MAJEED A , MOFFATT STEPHEN
IPC分类号： G11B5/84 , G11B5/73 , G11B5/82
CPC分类号： G03B27/42 , G11B5/8404 , H01F10/187 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically active material, and a magnetic pattern is formed in the magnetically active material by treating portions of the material with energy from a laser, e-beam, or focused ion beam. The beam may be divided into a packet of beamlets by passing the beam through a divider, which may be a diffraction grating for laser energy, a thin film single crystal for electrons, or a perforated plate for ions, or the beam may be generated by an array of emitters. The beamlets are then focused to a desired dimension and distribution by optics or electric fields. The resulting beam packet may be shaped further by passing through an aperture of any desired shape. The resulting beam may be applied sequentially to exposure zones to treat an entire substrate or plurality of substrates.
摘要翻译：提供了一种用于制造磁存储介质的方法和装置。用磁性活性材料涂覆结构基材，通过用激光，电子束或聚焦离子束的能量处理材料的部分，在磁性活性材料中形成磁性图案。通过将光束通过分隔器（可以是用于激光能量的衍射光栅），用于电子的薄膜单晶或用于离子的多孔板，可以将光束分成束分束，或者可以通过一组发射器。然后通过光学或电场将子束聚焦到期望的尺寸和分布。所得到的束束可以进一步通过穿过任何所需形状的孔。所得到的光束可以顺序施加到曝光区域以处理整个基板或多个基板。

8. 发明申请

WO2010120725A3 HDD PATTERN APPARATUS USING LASER, E-BEAM, OR FOCUSED ION BEAM 审中-公开
标题翻译： HDD模式设备使用激光，电子束或聚焦离子束
公开(公告)号：WO2010120725A3
公开(公告)日：2011-01-13
申请号：PCT/US2010030823
申请日：2010-04-13
申请人： APPLIED MATERIALS INC , FOAD MAJEED A , MOFFATT STEPHEN
发明人： FOAD MAJEED A , MOFFATT STEPHEN
IPC分类号： G11B5/84 , G11B5/73 , G11B5/82
CPC分类号： G03B27/42 , G11B5/8404 , H01F10/187 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically active material, and a magnetic pattern is formed in the magnetically active material by treating portions of the material with energy from a laser, e-beam, or focused ion beam. The beam may be divided into a packet of beamlets by passing the beam through a divider, which may be a diffraction grating for laser energy, a thin film single crystal for electrons, or a perforated plate for ions, or the beam may be generated by an array of emitters. The beamlets are then focused to a desired dimension and distribution by optics or electric fields. The resulting beam packet may be shaped further by passing through an aperture of any desired shape. The resulting beam may be applied sequentially to exposure zones to treat an entire substrate or plurality of substrates.
摘要翻译：提供了一种用于制造磁存储介质的方法和设备。用磁性活性材料涂覆结构衬底，通过用来自激光器，电子束或聚焦离子束的能量处理材料的一部分，在磁性活性材料中形成磁性图案。可以通过使光束通过分隔器（其可以是用于激光能量的衍射光栅，用于电子的薄膜单晶或用于离子的多孔板）来将光束分成一束小光束，或者光束可以通过一系列发射器。然后通过光学或电场将子束聚焦到期望的尺寸和分布。所得到的束束可以通过穿过任何期望形状的孔而进一步成形。所产生的光束可以被顺序施加到曝光区以处理整个基板或多个基板。

9. 发明申请

WO2010144551A2 CARBON NANOTUBE-BASED SOLAR CELLS 审中-公开
标题翻译：基于碳纳米管的太阳能电池
公开(公告)号：WO2010144551A2
公开(公告)日：2010-12-16
申请号：PCT/US2010037937
申请日：2010-06-09
申请人： APPLIED MATERIALS INC , NALAMASU OMKARAM , GAY CHARLES , PUSHPARAJ VICTOR L , SINGH KAUSHAL K , VISSER ROBERT J , FOAD MAJEED A , HOFMANN RALF
发明人： NALAMASU OMKARAM , GAY CHARLES , PUSHPARAJ VICTOR L , SINGH KAUSHAL K , VISSER ROBERT J , FOAD MAJEED A , HOFMANN RALF
IPC分类号： H01L31/042
CPC分类号： H01L31/022425 , B82Y10/00 , H01L31/0322 , H01L31/03529 , H01L31/0384 , H01L31/0749 , H01L51/0048 , H01L51/4213 , Y02E10/541 , Y02P70/521
摘要： Solar cells are provided with carbon nanotubes (CNTs) which are used: to define a micron/sub-micron geometry of the solar cells; and/or as charge transporters for efficiently removing charge carriers from the absorber layer to reduce the rate of electron-hole recombination in the absorber layer. A solar cell may comprise: a substrate; a multiplicity of areas of metal catalyst on the surface of the substrate; a multiplicity of carbon nanotube bundles formed on the multiplicity of areas of metal catalyst, each bundle including carbon nanotubes aligned roughly perpendicular to the surface of the substrate; and a photoactive solar cell layer formed over the carbon nanotube bundles and exposed surfaces of the substrate, wherein the photoactive solar cell layer is continuous over the carbon nanotube bundles and the exposed surfaces of the substrate. The photoactive solar cell layer may be comprised of amorphous silicon p/i/n thin films; although, concepts of the present invention are also applicable to solar cells with absorber layers of microcrystalline silicon, SiGe, carbon doped microcrystalline silicon, CIS, CIGS, CISSe and various p-type II-VI binary compounds and ternary and quaternary compounds.
摘要翻译：太阳能电池提供有碳纳米管（CNT），其用于限定太阳能电池的微米/亚微米几何形状; 和/或作为电荷转运体，用于从吸收层有效去除电荷载体以降低吸收层中电子 - 空穴复合的速率。太阳能电池可以包括：基底; 在基材表面上的金属催化剂的多个区域; 形成在金属催化剂的多个区域上的多个碳纳米管束，每个束包括大致垂直于基板的表面排列的碳纳米管; 以及形成在所述碳纳米管束和所述基板的露出表面上的光活性太阳能电池层，其中所述光活性太阳能电池层在所述碳纳米管束和所述基板的暴露表面上连续。光电太阳能电池层可以由非晶硅p / i / n薄膜组成; 尽管本发明的概念也适用于具有微晶硅，SiGe，碳掺杂微晶硅，CIS，CIGS，CISSe和各种p型II-VI二元化合物和三元和四元化合物的吸收层的太阳能电池。

10. 发明申请

WO2010019283A3 METHOD FOR MEASURING DOPANT CONCENTRATION DURING PLASMA ION IMPLANTATION 审中-公开
标题翻译：在等离子体植入过程中测量痰浓度的方法
公开(公告)号：WO2010019283A3
公开(公告)日：2010-05-14
申请号：PCT/US2009034995
申请日：2009-02-24
申请人： APPLIED MATERIALS INC , FOAD MAJEED A , LI SHIJIAN
发明人： FOAD MAJEED A , LI SHIJIAN
IPC分类号： H01L21/66 , H01L21/265
CPC分类号： G01N21/68 , G01N21/59 , H01L21/26513 , H01L22/12 , H01L22/26
摘要： Embodiments of the invention generally provide methods for end point detection at predetermined dopant concentrations during plasma doping processes. In one embodiment, a method includes positioning a substrate within a process chamber, generating a plasma above the substrate and transmitting a light generated by the plasma through the substrate, wherein the light enters the topside and exits the backside of the substrate, and receiving the light by a sensor positioned below the substrate. The method further provides generating a signal proportional to the light received by the sensor, implanting the substrate with a dopant during a doping process, generating multiple light signals proportional to a decreasing amount of the light received by the sensor during the doping process, generating an end point signal proportional to the light received by the sensor once the substrate has a final dopant concentration, and ceasing the doping process.
摘要翻译：本发明的实施方案通常提供了在等离子体掺杂过程期间以预定掺杂剂浓度进行终点检测的方法。在一个实施例中，一种方法包括将衬底定位在处理室内，在衬底上方产生等离子体，并将由等离子体产生的光透射穿过衬底，其中光进入顶侧并离开衬底的背面，并接收通过位于基板下方的传感器进行光照射。该方法进一步提供产生与传感器接收的光成比例的信号，在掺杂过程期间用掺杂剂注入衬底，在掺杂过程期间产生与传感器接收的减少量的光成比例的多个光信号，产生一旦衬底具有最终的掺杂剂浓度，终点信号与传感器接收的光成比例，并停止掺杂过程。

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