专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012071130A2 DUAL-BULB LAMPHEAD CONTROL METHODOLOGY 审中-公开
标题翻译：双通道灯泡控制方法
公开(公告)号：WO2012071130A2
公开(公告)日：2012-05-31
申请号：PCT/US2011/058137
申请日：2011-10-27
申请人： APPLIED MATERIALS, INC. , YANG, Yao-Hung , KANGUDE, Abhijit , BALUJA, Sanjeev , MARTINELLI, Michael , KRIVULINA, Liliya , NOWAK, Thomas , ROCHA-ALVAREZ, Juan Carlos , HENDRICKSON, Scott
发明人： YANG, Yao-Hung , KANGUDE, Abhijit , BALUJA, Sanjeev , MARTINELLI, Michael , KRIVULINA, Liliya , NOWAK, Thomas , ROCHA-ALVAREZ, Juan Carlos , HENDRICKSON, Scott
IPC分类号： H01L21/26 , H01L21/205
CPC分类号： H05B41/3921 , H01L21/67115 , H05B41/3922
摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.
摘要翻译：本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。闭环控制确保从基板到基板的工艺均匀性。辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

2. 发明申请

WO2010048227A2 ULTRAVIOLET-TRANSMITTING MICROWAVE REFLECTOR COMPRISING A MICROMESH SCREEN 审中-公开
标题翻译：包含MICROMESH屏幕的超紫外线发射微波反射器
公开(公告)号：WO2010048227A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/061380
申请日：2009-10-20
申请人： APPLIED MATERIALS, INC. , NGUYEN, Tuan Anh , YANG, Yao-Hung , BALUJA, Sanjeev , NOWAK, Thomas , ROCHA-ALVAREZ, Juan Carlos
发明人： NGUYEN, Tuan Anh , YANG, Yao-Hung , BALUJA, Sanjeev , NOWAK, Thomas , ROCHA-ALVAREZ, Juan Carlos
IPC分类号： H01L21/324 , H01L21/205 , H01L21/203
CPC分类号： C25D5/022 , C25D1/08
摘要： An ultraviolet-transmitting microwave reflector for a substrate processing chamber, comprises a micromesh screen extending across the metallic frame. In one version, the micromesh screen comprises at least one electroformed layer. A method of fabricating the microwave reflector comprises electroforming a metallic frame surrounding a micromesh screen such that the micromesh screen comprises an open area of greater than 80% of the total area.
摘要翻译：用于基板处理室的紫外线透射微波反射器包括跨过金属框架延伸的微镜屏幕。在一个版本中，微镜屏幕包括至少一个电铸层。制造微波反射器的方法包括电铸微型屏幕周围的金属框架，使得微型屏幕包括大于总面积的80％的开放面积。

3. 发明申请

WO2010048237A2 ULTRAVIOLET REFLECTOR WITH COOLANT GAS HOLES AND METHOD 审中-公开
标题翻译：具有冷却剂气体孔的紫外线反射器和方法
公开(公告)号：WO2010048237A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/061391
申请日：2009-10-20
申请人： APPLIED MATERIALS, INC. , YANG, Yao-Hung , NGUYEN, Tuan Anh , BALUJA, Sanjeev , KASZUBA, Andrzej , ROCHA, Juan Carlos , NOWAK, Thomas , HO, Dustin W.
发明人： YANG, Yao-Hung , NGUYEN, Tuan Anh , BALUJA, Sanjeev , KASZUBA, Andrzej , ROCHA, Juan Carlos , NOWAK, Thomas , HO, Dustin W.
IPC分类号： H01L21/324 , H01L21/205
CPC分类号： G21K1/062 , B82Y10/00 , G21K2201/064 , G21K2201/065 , G21K2201/067
摘要： A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.
摘要翻译：用于紫外线灯的反射器可用于基板处理设备中。反射器包括延伸紫外线灯长度的纵向条。纵向条具有弯曲的反射表面并且包括多个通孔以将冷却剂气体导向紫外线灯。还描述了使用具有反射器的紫外线灯模块的室和紫外线处理方法。

4. 发明申请

WO2013058970A1 SUBSTRATE SUPPORT BUSHING 审中-公开
标题翻译：基座支撑
公开(公告)号：WO2013058970A1
公开(公告)日：2013-04-25
申请号：PCT/US2012/058232
申请日：2012-10-01
申请人： APPLIED MATERIALS, INC. , HOU, Tao , OH, Jeonghoon , CHO, Tom, K. , MATLOSZ, Andrzej , HOOSHDARAN, Frank, F. , YANG, Yao-Hung
发明人： HOU, Tao , OH, Jeonghoon , CHO, Tom, K. , MATLOSZ, Andrzej , HOOSHDARAN, Frank, F. , YANG, Yao-Hung
IPC分类号： H01L21/683
CPC分类号： C23C16/4586 , C23C16/505 , F16C29/02 , H01L21/68742
摘要： A bushing assembly for supporting a substrate within a processing chamber is generally provided. In one aspect, the bushing assembly comprises a tubular body having an outer perimeter and an aperture extending therethrough, a first ring having a first inner edge, the first ring disposed in the aperture in an upper portion of the tubular body, and a second ring having a second inner edge, the second ring disposed in the aperture in a lower portion of the tubular body. In another aspect, the first inner edge has a first radius of curvature, and the second inner edge has a second radius of curvature. In another aspect, a first inner edge diameter, a second inner edge diameter, the first radius of curvature, and the second radius of curvature are selected such that a support pin extending through the aperture contacts the bushing assembly on at most two points.
摘要翻译：通常提供用于在处理室内支撑衬底的衬套组件。在一个方面，套管组件包括具有外周边和延伸穿过其的孔的管状体，第一环具有第一内边缘，第一环设置在管状体的上部中的孔中，第二环具有第二内边缘，所述第二环设置在所述管状体的下部中的所述孔中。在另一方面，第一内边缘具有第一曲率半径，并且第二内边缘具有第二曲率半径。在另一方面，选择第一内边缘直径，第二内边缘直径，第一曲率半径和第二曲率半径，使得延伸穿过孔的支撑销在最多两点处接触衬套组件。

5. 发明申请

WO2013162774A1 METHOD AND APPARATUS FOR INDEPENDENT WAFER HANDLING 审中-公开
标题翻译：用于独立水处理的方法和装置
公开(公告)号：WO2013162774A1
公开(公告)日：2013-10-31
申请号：PCT/US2013/032542
申请日：2013-03-15
申请人： APPLIED MATERIALS, INC. , YANG, Yao-Hung , OH, Jeonghoon , HOOSHDARAN, Frank F. , CHO, Tom K. , HOU, Tao , GUO, Yuanhung
发明人： YANG, Yao-Hung , OH, Jeonghoon , HOOSHDARAN, Frank F. , CHO, Tom K. , HOU, Tao , GUO, Yuanhung
IPC分类号： H01L21/683 , H01L21/677
CPC分类号： H01L21/67739 , H01L21/67742 , H01L21/67748 , H01L21/683 , H01L21/68742
摘要： A substrate processing system with independent substrate placement capability to two or more substrate support assemblies is provided. Two different sets of fixed-length lift pins are disposed on two or more substrate support lift pin assemblies of two or more process chambers, where the length of each lift pin in one process chamber is different from the length of each lift pin in another process chamber. The substrate processing system includes simplified mechanical substrate support lift pin mechanisms and minimum accessory parts cooperating with a substrate transfer mechanism (e.g., a transfer robot) for efficient and independent loading, unloading, and transfer of one or more substrates between two or more processing regions in a twin chamber or between two or more process chambers. A method for positioning one or more substrates to be loaded, unloaded, or processed independently or simultaneously in two or more processing regions or process chambers is provided.
摘要翻译：提供了一种对两个或更多个基板支撑组件具有独立的基板放置能力的基板处理系统。两个不同组的固定长度提升销设置在两个或更多个处理室的两个或更多个基板支撑提升销组件上，其中一个处理室中的每个提升销的长度在另一个过程中与每个提升销的长度不同室。基板处理系统包括简化的机械基板支撑提升销机构和与基板传送机构（例如，传送机器人）协作的最小附件部件，用于在两个或多个处理区域之间有效且独立地加载，卸载和传送一个或多个基板在双室中或两个或更多个处理室之间。提供了一种用于定位要在两个或更多个处理区域或处理室中单独或同时加载，卸载或处理的一个或多个基板的方法。

6. 发明申请

WO2013162697A1 METHOD AND APPARATUS FOR SUBSTRATE SUPPORT WITH MULTI-ZONE HEATING 审中-公开
标题翻译：用于多层加热的基板支撑的方法和装置
公开(公告)号：WO2013162697A1
公开(公告)日：2013-10-31
申请号：PCT/US2013/027824
申请日：2013-02-26
申请人： APPLIED MATERIALS, INC. , YANG, Yao-Hung , OH, Jeonghoon , HOOSHDARAN, Frank F. , CHO, Tom K. , HOU, Tao
发明人： YANG, Yao-Hung , OH, Jeonghoon , HOOSHDARAN, Frank F. , CHO, Tom K. , HOU, Tao
IPC分类号： H01L21/683 , H01L21/205 , H05B3/20 , C23C16/46
CPC分类号： H05B3/12 , H01L21/67103 , H01L21/67248 , H05B1/0233
摘要： Methods and substrate processing systems are provided for controlling substrate heating efficiency and generating a desired temperature profile on the surface of a substrate when the substrate is disposed on a substrate support surface of a substrate support assembly. The substrate support assembly is provided with minimum software control and hardware requirement and includes a heating element comprised of multiple heating elements sections. The heating element is connected to a power source for adjusting the temperature outputs of the multiple heating element sections and providing adjustable multi-heating zones and desired temperature distribution over the substrate support surface of the substrate support assembly within a process chamber.
摘要翻译：提供了方法和衬底处理系统，用于当衬底设置在衬底支撑组件的衬底支撑表面上时，用于控制衬底加热效率并在衬底的表面上产生期望的温度分布。基板支撑组件具有最小的软件控制和硬件要求，并且包括由多个加热元件部分组成的加热元件。加热元件连接到用于调节多个加热元件部分的温度输出的电源并且在处理室内的基板支撑组件的基板支撑表面上提供可调节的多加热区域和期望的温度分布。

7. 发明申请

WO2023027915A1 CLAMPED DUAL-CHANNEL SHOWERHEAD 审中-公开
公开(公告)号：WO2023027915A1
公开(公告)日：2023-03-02
申请号：PCT/US2022/040480
申请日：2022-08-16
申请人： APPLIED MATERIALS, INC.
发明人： HONNAVAR, Kiran Shyam , RAJU, Srikantha , SHEELAVANT, Gangadhar , PAL, Aniruddha , YANG, Yao-Hung , KENGUNTI, Basavaraja Shankarappa
IPC分类号： H01J37/32
摘要： Exemplary dual-channel showerheads may include an upper plate that defines a first plurality of apertures. The showerheads may include a base having a lower plate. The lower plate may define a second plurality of apertures and a third plurality of apertures. Each of the first plurality of apertures may be fluidly coupled with a respective one of the second plurality of apertures to define a fluid path extending from a top surface of the showerhead through a bottom surface of the showerhead. The base may define a gas inlet that is fluidly coupled with the third plurality of apertures. The base may be detachably coupled with the upper plate using one or more fastening mechanisms. The showerheads may include a compressible gasket positioned between the upper plate and the lower plate.

8. 发明申请

WO2022010839A1 FACEPLATE TENSIONING METHOD AND APPARATUS TO PREVENT DROOP 审中-公开
公开(公告)号：WO2022010839A1
公开(公告)日：2022-01-13
申请号：PCT/US2021/040436
申请日：2021-07-06
申请人： APPLIED MATERIALS, INC.
发明人： YANG, Yao-Hung , GADGIL, Shantanu Rajiv , GURJAR, Tanmay Pramod , GONDHALEKAR, Sudhir R.
IPC分类号： C23C16/455 , H01J37/32 , B05B1/18 , B05B15/18 , C23C16/45565
摘要： Embodiments of showerheads for use in a process chamber and methods of reducing drooping of a showerhead faceplate are provided herein. In some embodiments, a showerhead for use in a process chamber includes: a faceplate having a plurality of gas distribution holes disposed therethrough; and one or more cables that engage with the faceplate and configured to prestress the faceplate.

9. 发明申请

WO2021154816A1 METHODS AND APPARATUS FOR PLASMA SPRAYING SILICON CARBIDE COATINGS FOR SEMICONDUCTOR CHAMBER APPLICATIONS 审中-公开
公开(公告)号：WO2021154816A1
公开(公告)日：2021-08-05
申请号：PCT/US2021/015225
申请日：2021-01-27
申请人： APPLIED MATERIALS, INC.
发明人： CHEN, Yikai , PAL, Aniruddha , CHAUDHARI, Saurabh M. , YANG, Yao-Hung , SALIMIAN, Siamak , CHO, Tom K.
IPC分类号： C04B41/50 , C04B41/45 , C04B41/51 , H01L21/67 , H01J37/32
摘要： Methods and apparatus for producing bulk silicon carbide and producing silicon carbide coatings are provided herein. The method includes feeding a mixture of silicon carbide and ceramic into a plasma sprayer. The plasma generates a stream towards a substrate forming a bulk material or optionally a coating on the substrate such as an article upon contact therewith. In embodiments, the substrate can be removed, leaving a component part fabricated from bulk silicon carbide.

10. 发明申请

WO2020050912A1 METHOD OF RECLAIMING A SEAL 审中-公开
公开(公告)号：WO2020050912A1
公开(公告)日：2020-03-12
申请号：PCT/US2019/041813
申请日：2019-07-15
申请人： APPLIED MATERIALS, INC.
发明人： MAHESHWARI, Shagun P. , YANG, Yao-Hung , CHO, Tom K. , YEH, Yu-Chi , YU, Andrew , PAL, Aniruddha , SALIMIAN, Siamak
IPC分类号： H01L21/50 , H01L21/66 , H01L21/67 , H01L21/687
摘要： A method of reclaiming a used seal includes boiling the used seal in a liquid, and after boiling the used seal in the liquid, baking the used seal. The boiling the used seal may include boiling for a predetermined boiling time in the liquid, and the baking the used seal may include baking the used seal for a predetermined bake time at a predetermined temperature.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式