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1. 发明申请

WO2016050284A1 CATHODE SPUTTERING MODE 审中-公开
标题翻译：阴极溅射模式
公开(公告)号：WO2016050284A1
公开(公告)日：2016-04-07
申请号：PCT/EP2014/070941
申请日：2014-09-30
申请人： APPLIED MATERIALS, INC. , KLÖPPEL, Andreas , PIERALISI, Fabio , LIU, Jian , HANIKA, Markus , LOPP, Andreas
发明人： KLÖPPEL, Andreas , PIERALISI, Fabio , LIU, Jian , HANIKA, Markus , LOPP, Andreas
IPC分类号： C23C14/35 , H01J37/34
CPC分类号： C23C14/352 , H01J37/3405 , H01J37/3417 , H01J37/3444 , H01J37/345 , H01J37/3464
摘要： A method for depositing material is provided. The method includes sputtering material from a cathode array, wherein only one of two adjacent cathodes of the cathode array are operated to have one or more time intervals, wherein only one cathode of the adjacent cathodes sputter on the same substrate.
摘要翻译：提供一种沉积材料的方法。该方法包括来自阴极阵列的溅射材料，其中阴极阵列的两个相邻阴极中只有一个被操作以具有一个或多个时间间隔，其中相邻阴极中只有一个阴极溅射在相同的衬底上。

2. 发明申请

WO2013020589A1 ADJUSTABLE MASK 审中-公开
标题翻译：可调面膜
公开(公告)号：WO2013020589A1
公开(公告)日：2013-02-14
申请号：PCT/EP2011/063714
申请日：2011-08-09
申请人： APPLIED MATERIALS, INC. , SCHEER, Evelyn , HANIKA, Markus , LINDENBERG, Ralph , BENDER, Marcus , LOPP, Andreas , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian
发明人： SCHEER, Evelyn , HANIKA, Markus , LINDENBERG, Ralph , BENDER, Marcus , LOPP, Andreas , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian
IPC分类号： C23C14/04 , C23C16/04
CPC分类号： C23C14/042 , C23C16/042
摘要： An deposition apparatus for forming a deposition material layer on a substrate is described. The deposition apparatus includes a substrate support adapted for holding a substrate; and an edge (660) exclusion mask (640) for covering a periphery of the substrate (610) during layer deposition. The mask has at least one frame portion defining an aperture. The at least one frame portion of the mask is adapted for being moved (670,680) with respect to the substrate depending on the amount of deposition material deposited on the at least one frame portion of the mask. Further, a method for depositing a deposition material layer on a substrate using an edge exclusion mask is described.
摘要翻译：描述了用于在基板上形成沉积材料层的沉积装置。沉积设备包括适于保持衬底的衬底支撑件; 以及用于在层沉积期间覆盖衬底（610）的周边的边缘（660）排除掩模（640）。掩模具有限定孔的至少一个框架部分。掩模的至少一个框架部分适于相对于基板移动（670,680），这取决于沉积在掩模的至少一个框架部分上的沉积材料的量。此外，描述了使用边缘排除掩模在基板上沉积沉积材料层的方法。

3. 发明申请

WO2013178252A1 METHOD FOR COATING A SUBSTRATE AND COATER 审中-公开
标题翻译：涂层和涂层的方法
公开(公告)号：WO2013178252A1
公开(公告)日：2013-12-05
申请号：PCT/EP2012/060055
申请日：2012-05-29
申请人： APPLIED MATERIALS, INC. , SCHEER, Evelyn , HANIKA, Markus , SCHWANITZ, Konrad , PIERALISI, Fabio , KLOEPPEL, Andreas , LIU, Jian , LOPP, Andreas
发明人： SCHEER, Evelyn , HANIKA, Markus , SCHWANITZ, Konrad , PIERALISI, Fabio , KLOEPPEL, Andreas , LIU, Jian , LOPP, Andreas
IPC分类号： C23C14/35 , H01J37/34
CPC分类号： H01J37/3473 , C23C14/35 , C23C14/352 , H01J37/32568 , H01J37/3405 , H01J37/3417 , H01J2237/3323
摘要： A method for coating a substrate by means of a cathode arrangement including at least two rotatable cathodes is disclosed. The method includes rotating at least one of the at least two rotatable cathodes in a first direction, and, at the same time, rotating at least one of the at least two rotatable cathodes in a second direction. The first direction is opposite to the second direction. Furthermore, a controller for controlling a coating process is disclosed. Furthermore, a coater for coating a substrate is disclosed. The coater includes a cathode arrangement with at least two rotatable cathodes and a controller as disclosed herein.
摘要翻译：公开了一种通过包括至少两个可旋转阴极的阴极装置涂覆基板的方法。该方法包括在第一方向上旋转至少两个可旋转阴极中的至少一个，并且同时在第二方向旋转至少两个可旋转阴极中的至少一个。第一方向与第二方向相反。此外，公开了一种用于控制涂布工艺的控制器。此外，公开了一种用于涂覆基材的涂布机。涂布机包括具有至少两个可旋转阴极的阴极装置和如本文所公开的控制器。

4. 发明申请

WO2013060355A1 MULTIDIRECTIONAL RACETRACK ROTARY CATHODE FOR PVD ARRAY APPLICATIONS 审中-公开
标题翻译： PVD阵列应用的多媒体旋转阴极
公开(公告)号：WO2013060355A1
公开(公告)日：2013-05-02
申请号：PCT/EP2011/068552
申请日：2011-10-24
申请人： APPLIED MATERIALS, INC. , SCHEER, Evelyn , HANIKA, Markus , LINDENBERG, Ralph , BENDER, Marcus , LOPP, Andreas , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian
发明人： SCHEER, Evelyn , HANIKA, Markus , LINDENBERG, Ralph , BENDER, Marcus , LOPP, Andreas , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34
CPC分类号： H01J37/32532 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/345 , H01J37/3452 , H01J37/3455
摘要： A cathode assembly (130; 200; 300; 400) for a sputter deposition apparatus and a method for coating a substrate is provided. The cathode assembly has a coating side for coating on a substrate. Further, the cathode assembly includes a rotary target assembly adapted for rotating a target material (210; 310; 410) around a rotary axis (220; 320; 420); at least a first magnet assembly (230; 330; 340; 430; 431; 432; 433) having an inner magnet pole and at least one outer magnet poles and being adapted for generating one or more plasma regions (240; 250; 340; 350; 440; 441; 442; 443). The cathode assembly (130; 200; 300; 400) has a first angular coordinate for a magnet pole, the magnet pole being provided for the coating side, and a second angular coordinate for a further magnet pole, the magnet pole being provided for the coating side; wherein the first angular coordinate (260; 360; 460) and the second angular coordinate (270; 370; 461) define an angle a larger than about 20 degrees and smaller than about 160 degrees.
摘要翻译：提供了一种用于溅射沉积设备的阴极组件（130; 200; 300; 400）和一种用于涂覆衬底的方法。阴极组件具有用于在基板上涂覆的涂层侧。此外，阴极组件包括适于围绕旋转轴线（220; 320; 420）旋转靶材料（210; 310; 410）的旋转靶组件; 至少一个具有内磁极和至少一个外磁极的第一磁体组件（230; 330; 340; 430; 431; 432; 433），并适于产生一个或多个等离子体区域（240; 250; 340; 350; 440; 441; 442; 443）。阴极组件（130; 200; 300; 400）具有用于磁极的第一角度坐标，为涂层侧提供磁极，并且为另一个磁极设置第二角坐标，磁极设置用于涂层面其中所述第一角坐标（260; 360; 460）和所述第二角坐标（270; 370; 461）限定大于约20度且小于约160度的角度。

5. 发明申请

WO2012041557A1 SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL 审中-公开
标题翻译：用于形成溅射材料层的系统和方法
公开(公告)号：WO2012041557A1
公开(公告)日：2012-04-05
申请号：PCT/EP2011/062674
申请日：2011-07-22
申请人： APPLIED MATERIALS, INC. , BENDER, Marcus , HANIKA, Markus , SCHEER, Evelyn , PIERALISI, Fabio , MAHNKE, Guido , LINDENBERG, Ralph , LOPP, Andreas , SCHWANITZ, Konrad , LIU, Jian
发明人： BENDER, Marcus , HANIKA, Markus , SCHEER, Evelyn , PIERALISI, Fabio , MAHNKE, Guido , LINDENBERG, Ralph , LOPP, Andreas , SCHWANITZ, Konrad , LIU, Jian
IPC分类号： H01J37/34
CPC分类号： C23C14/352 , C23C14/35 , H01J37/34 , H01J37/3473
摘要： The present disclosure describes a method of coating a substrate (110), the method including forming a layer (806) of sputtered material on the substrate (110). Forming the layer of sputtered material may include: sputtering material from at least one rotatable target (120') over the substrate (110); varying the relative position between the at least one target (120') and the substrate (110). In addition, the present disclosure describes varying the distance between a target (120; 120'; 120'') and a substrate during the sputter process. The present disclosure further describes a system for coating a substrate.
摘要翻译：本公开描述了涂覆基底（110）的方法，该方法包括在基底（110）上形成溅射材料层（806）。形成溅射材料层可以包括：从衬底（110）上的至少一个可旋转靶（120'）溅射材料; 改变所述至少一个靶（120'）和所述衬底（110）之间的相对位置。另外，本公开内容描述了在溅射过程期间改变目标（120; 120'; 120“）和衬底之间的距离。本公开进一步描述了用于涂覆基底的系统。

6. 发明申请

WO2014005617A1 APPARATUS FOR COATING A LAYER OF SPUTTERED MATERIAL ON A SUBSTRATE AND DEPOSITION SYSTEM 审中-公开
标题翻译：在基材和沉积系统上涂覆溅射材料层的装置
公开(公告)号：WO2014005617A1
公开(公告)日：2014-01-09
申请号：PCT/EP2012/062836
申请日：2012-07-02
申请人： KLOEPPEL, Andreas , HANIKA, Markus , SCHEER, Evelyn , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian , APPLIED MATERIALS, INC.
发明人： KLOEPPEL, Andreas , HANIKA, Markus , SCHEER, Evelyn , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian
IPC分类号： H01J37/34 , C23C14/35
CPC分类号： C23C14/352 , H01J37/3405 , H01J37/3417 , H01J37/345
摘要： An apparatus (10; 166; 224) for coating a layer of sputtered material on a substrate (12) is described. Said apparatus (10; 166; 224) comprises at least two magnet assemblies (60, 74, 82, 90, 98, 106), wherein each magnet assembly (60, 74, 82, 90, 98, 106) has an outer and an inner magnet polarity. The outer magnet polarity of one of the at least two magnet assemblies (60, 74, 82, 90, 98, 106) is different from an adjacent outer magnet polarity of the other one of the at least two magnet assemblies (60, 74, 82, 90, 98, 106). Further, a deposition system (14) is described which comprises such an apparatus (10; 166; 224).
摘要翻译：描述了用于在衬底（12）上涂覆溅射材料层的设备（10; 166; 224）。所述装置（10; 166; 224）包括至少两个磁体组件（60,74,82,90,98,106），其中每个磁体组件（60,74,82,90,98,106）具有外部和内磁极性。所述至少两个磁体组件（60,74,82,90,98,106）中的一个的外部磁体极性与所述至少两个磁体组件（60,74,96,106）中的另一个的相邻外部磁体极性不同， 82，90，98，106）。此外，描述了包括这种装置（10; 166; 224）的沉积系统（14）。

7. 发明申请

WO2011039316A1 METHOD FOR COATING A SUBSTRATE AND COATER 审中-公开
标题翻译：涂层和涂层的方法
公开(公告)号：WO2011039316A1
公开(公告)日：2011-04-07
申请号：PCT/EP2010/064574
申请日：2010-09-30
申请人： APPLIED MATERIALS, INC. , BENDER, Marcus , HANIKA, Markus , SCHEER, Evelyn , PIERALISI, Fabio , MAHNKE, Guido
发明人： BENDER, Marcus , HANIKA, Markus , SCHEER, Evelyn , PIERALISI, Fabio , MAHNKE, Guido
IPC分类号： H01J37/34
CPC分类号： H01J37/3405 , H01J37/3452 , H01J37/3455
摘要： A method is provided for coating a substrate (100) with a cathode assembly (10) having a rotatable target (20). The rotatable target has at least one magnet assembly (25) positioned there within. The method includes positioning the magnet assembly at a first position so that it is asymmetrically aligned with respect to a plane (22) perpendicularly extending from the substrate (100) to the axis (21) of the rotatable target for a predetermined first time interval; positioning the magnet assembly at a second position that is asymmetrically aligned with respect to said plane (22) for a predetermined second time interval; and providing a voltage to the rotatable target that is varied over time during coating. Further, a coater is provided that includes a cathode assembly with a rotatable curved target; and two magnet assemblies positioned within the rotatable curved target wherein the distance between the two magnet assemblies can be varied.
摘要翻译：提供了一种用具有可旋转靶（20）的阴极组件（10）涂覆基底（100）的方法。可旋转靶具有定位在其内的至少一个磁体组件（25）。该方法包括将磁体组件定位在第一位置，使得其相对于从基板（100）垂直延伸到可旋转靶的轴线（21）的平面（22）以预定的第一时间间隔对准地对准; 将磁体组件定位在相对于所述平面（22）不对称对准预定的第二时间间隔的第二位置处; 以及向涂覆期间随时间变化的可旋转靶提供电压。此外，提供一种包括具有可旋转弯曲目标的阴极组件的涂布机; 以及位于可旋转弯曲目标内的两个磁体组件，其中两个磁体组件之间的距离可以改变。

8. 发明申请

WO2020078556A1 RADIATION DEVICE, DEPOSITION APPARATUS FOR DEPOSITING A MATERIAL ON A SUBSTRATE AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE 审中-公开
公开(公告)号：WO2020078556A1
公开(公告)日：2020-04-23
申请号：PCT/EP2018/078596
申请日：2018-10-18
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , PIERALISI, Fabio , BRAUNGER, Steffen , MORRISON, Neil , STOLLEY, Tobias , ALT, Horst , STEINIGER, Gerhard
发明人： DIEGUEZ-CAMPO, Jose Manuel , PIERALISI, Fabio , BRAUNGER, Steffen , MORRISON, Neil , STOLLEY, Tobias , ALT, Horst , STEINIGER, Gerhard
IPC分类号： H01L21/67
摘要： A radiation device (200) including a hollow body and a cooling device (246) arranged within the hollow body (250) is provided.

9. 发明申请

WO2017121490A1 OPTICAL INSPECTION SYSTEM, PROCESSING SYSTEM FOR PROCESSING OF A MATERIAL ON A FLEXIBLE SUBSTRATE, AND METHODS OF INSPECTING A FLEXIBLE SUBSTRATE 审中-公开
标题翻译：光学检测系统，柔性基板材料加工处理系统以及检测柔性基板的方法
公开(公告)号：WO2017121490A1
公开(公告)日：2017-07-20
申请号：PCT/EP2016/050823
申请日：2016-01-15
申请人： APPLIED MATERIALS, INC , PIERALISI, Fabio , RIES, Florian
发明人： PIERALISI, Fabio , RIES, Florian
IPC分类号： G01N21/89 , C23C14/54 , G01N21/86
CPC分类号： G01N21/8901 , C23C14/547 , G01N21/8422 , G01N21/86 , G01N21/8914 , G01N21/896
摘要： According to one aspect of the present disclosure, an optical inspection system (100) for inspecting a flexible substrate (10) is provided. The system includes a substrate support (20) with an at least partially convex substrate support surface (22) configured to guide the substrate along a substrate transportation path (T), the substrate support being arranged on a first side (1) of the substrate transportation path; a light source (30) arranged on a second side (2) of the substrate transportation path and configured to direct a light beam through a portion of the substrate which is supported on and in contact with the convex substrate support surface; and a light detector (40) for conducting a transmission measurement of the substrate. According to a further aspect of the present disclosure, methods of inspecting a flexible substrate are provided.
摘要翻译：根据本公开的一个方面，提供了一种用于检查柔性基板（10）的光学检查系统（100）。该系统包括具有至少部分凸起的衬底支撑表面（22）的衬底支撑件（20），该衬底支撑表面被配置为沿着衬底传送路径（T）引导衬底，该衬底支撑件被布置在衬底的第一侧面（1）运输路径; 光源（30），布置在所述基板传送路径的第二侧（2）上，并被配置为引导光束通过支撑在所述凸起基板支撑表面上并与所述凸起基板支撑表面接触的所述基板的一部分; 和用于进行衬底的透射测量的光检测器（40）。根据本公开的另一方面，提供了检查柔性基板的方法。

10. 发明申请

WO2020078557A1 DEPOSITION APPARATUS, SYSTEM AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE 审中-公开
公开(公告)号：WO2020078557A1
公开(公告)日：2020-04-23
申请号：PCT/EP2018/078598
申请日：2018-10-18
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , MORRISON, Neil , PIERALISI, Fabio , BRAUNGER, Steffen
发明人： DIEGUEZ-CAMPO, Jose Manuel , MORRISON, Neil , PIERALISI, Fabio , BRAUNGER, Steffen
IPC分类号： C23C14/54 , C23C14/56 , C23C16/46 , C23C16/511 , C23C16/54 , H01J37/32 , H01L31/20
摘要： A deposition apparatus (105) for depositing a material on a substrate (106) is provided. The deposition apparatus includes a transport device (140) for transporting the substrate (106), one or more deposition units (110) for depositing the material on the substrate (106), a deposition compartment (120), the deposition compartment comprising two or more edge regions (124), and a heating unit (300) configured for heating the substrate (106). The heating unit (300) is configured for heating the substrate (106) exclusively at a first substrat e segment (107) and a second substrate segment (108) with the first substrate segment and the second substrate segment facing the two or more edge regions (124) of the deposition compartment (120).

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