基本信息:
- 专利标题： ADJUSTABLE MASK
- 专利标题（中）：可调面膜
- 申请号：PCT/EP2011/063714 申请日：2011-08-09
- 公开(公告)号：WO2013020589A1 公开(公告)日：2013-02-14
- 发明人： SCHEER, Evelyn , HANIKA, Markus , LINDENBERG, Ralph , BENDER, Marcus , LOPP, Andreas , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian
- 申请人： APPLIED MATERIALS, INC. , SCHEER, Evelyn , HANIKA, Markus , LINDENBERG, Ralph , BENDER, Marcus , LOPP, Andreas , SCHWANITZ, Konrad , PIERALISI, Fabio , LIU, Jian
- 申请人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 专利权人： APPLIED MATERIALS, INC.,SCHEER, Evelyn,HANIKA, Markus,LINDENBERG, Ralph,BENDER, Marcus,LOPP, Andreas,SCHWANITZ, Konrad,PIERALISI, Fabio,LIU, Jian
- 当前专利权人： APPLIED MATERIALS, INC.,SCHEER, Evelyn,HANIKA, Markus,LINDENBERG, Ralph,BENDER, Marcus,LOPP, Andreas,SCHWANITZ, Konrad,PIERALISI, Fabio,LIU, Jian
- 当前专利权人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 代理机构： ZIMMERMANN, Gerd et al.
- 主分类号： C23C14/04
- IPC分类号： C23C14/04 ; C23C16/04
摘要：
An deposition apparatus for forming a deposition material layer on a substrate is described. The deposition apparatus includes a substrate support adapted for holding a substrate; and an edge (660) exclusion mask (640) for covering a periphery of the substrate (610) during layer deposition. The mask has at least one frame portion defining an aperture. The at least one frame portion of the mask is adapted for being moved (670,680) with respect to the substrate depending on the amount of deposition material deposited on the at least one frame portion of the mask. Further, a method for depositing a deposition material layer on a substrate using an edge exclusion mask is described.
摘要（中）：
描述了用于在基板上形成沉积材料层的沉积装置。 沉积设备包括适于保持衬底的衬底支撑件; 以及用于在层沉积期间覆盖衬底（610）的周边的边缘（660）排除掩模（640）。 掩模具有限定孔的至少一个框架部分。 掩模的至少一个框架部分适于相对于基板移动（670,680），这取决于沉积在掩模的至少一个框架部分上的沉积材料的量。 此外，描述了使用边缘排除掩模在基板上沉积沉积材料层的方法。