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1. 发明申请

WO2014139591A1 CARRIER FOR SUBSTRATES 审中-公开
标题翻译：基板载体
公开(公告)号：WO2014139591A1
公开(公告)日：2014-09-18
申请号：PCT/EP2013/055440
申请日：2013-03-15
申请人： APPLIED MATERIALS, INC. , HEIMEL, Oliver , LINDENBERG, Ralph , WURSTER, Harald , ZENGEL, Claus
发明人： HEIMEL, Oliver , LINDENBERG, Ralph , WURSTER, Harald , ZENGEL, Claus
IPC分类号： C23C14/50 , C03C17/00
CPC分类号： C23C16/4587 , C23C14/50
摘要： A carrier for supporting a substrate (101) in a substrate processing chamber for vacuum processing is described. The carrier includes a substrate fixation assembly, wherein the substrate fixation assembly includes one or more fixation units (120), wherein each fixation unit includes an edge contacting surface (121) configured for contacting the edge of the substrate and defining a contact position; a first fixation element (122) having a first surface (124)configured for contacting a first substrate surface (102) of the substrate, wherein the first fixation element extends from the contact position by a first length LI substantially parallel to the first substrate surface; a second fixation element (123) having a second surface (125) configured for contacting a second substrate surface (103) of the substrate, wherein the second substrate surface opposes the first substrate surface of the substrate, and wherein the second fixation element extends from the contact position by a second length L2 substantially parallel to the second substrate surface; a force element (130) for providing a fixation force (140) for the substrate with at least one of the first and the second fixation element; wherein the shorter length of the first length and the second length provides in combination with the fixation force a moment (140); wherein the one or more fixation units provide the moment to be 10 Nmm per substrate edge length unit or above.
摘要翻译：描述了用于在用于真空处理的基板处理室中支撑基板（101）的载体。所述载体包括基底固定组件，其中所述基底固定组件包括一个或多个固定单元（120），其中每个固定单元包括边缘接触表面（121），所述边缘接触表面被构造用于接触所述基底的边缘并限定接触位置; 第一固定元件（122），其具有被配置用于接触所述基板的第一基板表面（102）的第一表面（124），其中所述第一固定元件从所述接触位置延伸大致平行于所述第一基板表面的第一长度 ; 具有第二表面（125）的第二固定元件（123），所述第二表面被配置为接触所述基底的第二基底表面（103），其中所述第二基底表面与所述基底的所述第一基底表面相对，并且其中所述第二固定元件从所述接触位置与所述第二衬底表面基本平行的第二长度L2; 力元件（130），用于利用所述第一和第二固定元件中的至少一个为所述基底提供固定力（140）; 其中所述第一长度和所述第二长度的较短长度与所述固定力结合时刻（140）; 其中所述一个或多个固定单元提供每个衬底边缘长度单位或更高的10N的力矩。

2. 发明申请

WO2018133952A1 HOLDER FOR SUBSTRATES 审中-公开
公开(公告)号：WO2018133952A1
公开(公告)日：2018-07-26
申请号：PCT/EP2017/051328
申请日：2017-01-23
申请人： APPLIED MATERIALS, INC. , LAU, Simon , LINDENBERG, Ralph , ULLMANN, Oliver , ZENGEL, Claus , WURSTER, Harald
发明人： LAU, Simon , LINDENBERG, Ralph , ULLMANN, Oliver , ZENGEL, Claus , WURSTER, Harald
IPC分类号： C23C14/50 , C23C16/458 , B65G49/06 , C03C17/00
摘要： A holder configured to be attached to a carrier body for holding a substrate is described. The holder includes a front portion arranged to face a material source or a mask; a rear portion arranged to face away from a material source, wherein the rear portion includes a beveled portion with an inclined surface; and a groove for receiving a substrate provided between the front portion and the rear portion.

3. 发明申请

WO2013026492A1 PROTECTION OF EDGE EXCLUSION MASK SHIELDING 审中-公开
标题翻译：保护边缘除鳞屏蔽
公开(公告)号：WO2013026492A1
公开(公告)日：2013-02-28
申请号：PCT/EP2011/064669
申请日：2011-08-25
申请人： APPLIED MATERIALS, INC. , ZENGEL, Claus , LINDENBERG, Ralph , WURSTER, Harald , HANSEN, Hauke
发明人： ZENGEL, Claus , LINDENBERG, Ralph , WURSTER, Harald , HANSEN, Hauke
IPC分类号： C23C14/04 , C23C16/04
CPC分类号： C23C14/042 , C23C16/042
摘要： A masking arrangement (300) for masking a substrate during layer deposition is described. The masking arrangement includes a mask structure (340) forming an aperture for exposing the substrate during a layer deposition, and a protection shield (150), which is provided adjacent to the masking structure, wherein the protection shield protects one or more portions of the masking arrangement from being coated during layer deposition, and wherein an interface (360) is formed between the protection shield and the masking structure, and wherein the mask structure comprises a roof portion (342) extending over the interface, and wherein the roof portion forms a gap (344) with a portion of the protection shield.
摘要翻译：描述了用于在层沉积期间掩蔽衬底的掩模布置（300）。掩模装置包括在层沉积期间形成用于暴露衬底的孔的掩模结构（340）和邻近掩模结构设置的保护屏蔽（150），其中保护屏蔽保护了一个或多个部分掩模布置在层沉积期间被涂覆，并且其中在保护屏蔽和掩蔽结构之间形成界面（360），并且其中掩模结构包括在界面上延伸的顶部部分（342），并且其中屋顶部分形成与所述保护罩的一部分的间隙（344）。

4. 发明申请

WO2015169393A1 SHIELDING DEVICE FOR ROTATABLE CATHODE ASSEMBLY AND METHOD FOR SHIELDING A DARK SPACE IN A DEPOSITION APPARATUS 审中-公开
标题翻译：用于可旋转阴极组件的屏蔽装置和用于在沉积装置中遮蔽暗空间的方法
公开(公告)号：WO2015169393A1
公开(公告)日：2015-11-12
申请号：PCT/EP2014/059557
申请日：2014-05-09
申请人： APPLIED MATERIALS, INC. , WURSTER, Harald
发明人： WURSTER, Harald
IPC分类号： H01J37/34
CPC分类号： H01J37/3441 , H01J37/3405 , H01J37/3435
摘要： According to the present disclosure, a shielding device (20) for a rotatable cathode having a rotatable target (10) for sputtering material onto a substrate and a method for shielding a dark space region in a deposition apparatus are provided. The shielding device (20) includes a shield (21) configured for covering a portion of the rotatable target (10) and a fixture (80) for connecting the shield (21) to the rotatable target (10). The fixture (80) is configured for engaging with the shield (21) to allow the shield to expand essentially away from the centre of the rotatable target (10) in an axial direction of the rotatable target.
摘要翻译：根据本公开，提供了一种用于可旋转阴极的屏蔽装置（20），其具有用于将材料溅射到基板上的可旋转靶（10）和用于屏蔽沉积装置中的暗区的方法。屏蔽装置（20）包括被配置为覆盖可旋转靶（10）的一部分的屏蔽件（21）和用于将屏蔽件（21）连接到可旋转靶材（10）的固定装置（80）。固定装置（80）构造成与屏蔽件（21）接合，以允许屏蔽件在可旋转靶材的轴向方向上基本远离可旋转靶材（10）的中心扩展。

5. 发明申请

WO2017194098A1 METHODS OF OPERATING A DEPOSITION APPARATUS, AND DEPOSITION APPARATUS 审中-公开
标题翻译：操作沉积设备的方法和沉积设备
公开(公告)号：WO2017194098A1
公开(公告)日：2017-11-16
申请号：PCT/EP2016/060440
申请日：2016-05-10
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LOPP, Andreas , WURSTER, Harald , HAAS, Dieter
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , LOPP, Andreas , WURSTER, Harald , HAAS, Dieter
IPC分类号： C23C14/12 , C23C14/24 , C23C14/04 , C23C16/44 , C23C16/455 , C23C14/56 , H01L51/56
摘要： A method of operating a deposition apparatus is provided. The method comprises: Deposition of an evaporated source material on a substrate (10) by guiding the evaporated source material from one or more outlets (22) of an evaporation source (20) toward the substrate (10), wherein part of the evaporated source material is blocked by and attaches to a shielding device (30) arranged between the one or more outlets (22) and the substrate (10), followed by a cleaning of the shielding device (30) by at least locally heating the shielding device (30) for releasing at least part of the attached source material from the shielding device (30). According to a further aspect, a deposition apparatus is provided that can be operated according to the described methods.
摘要翻译：提供了一种操作沉积装置的方法。该方法包括：通过将蒸发源材料从蒸发源（20）的一个或多个出口（22）引向衬底（10）而将蒸发源材料沉积在衬底（10）上，其中部分蒸发源材料被设置在一个或多个出口（22）和衬底（10）之间的防护装置（30）阻挡并附接到防护装置（30），接着通过至少局部加热防护装置（30）来清洁防护装置（30）用于从所述防护装置（30）释放至少部分所附着的源材料。根据另一方面，提供了一种可根据所述方法操作的沉积设备。

6. 发明申请

WO2022243734A1 NOZZLE FOR A DISTRIBUTOR OF A MATERIAL DEPOSITION SOURCE, MATERIAL DEPOSITION SOURCE, VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL 审中-公开
公开(公告)号：WO2022243734A1
公开(公告)日：2022-11-24
申请号：PCT/IB2021/054422
申请日：2021-05-21
申请人： APPLIED MATERIALS, INC. , AULBACH, Julian , MÜLLER, Andreas , WURSTER, Harald , LOPP, Andreas , FREIHERR VON LINDENFELS, David Friedrich , ANJIKI, Takashi
发明人： AULBACH, Julian , MÜLLER, Andreas , WURSTER, Harald , LOPP, Andreas , FREIHERR VON LINDENFELS, David Friedrich , ANJIKI, Takashi
IPC分类号： C23C14/24 , H01L51/00
摘要： A nozzle for an evaporated material distributor is described. The nozzle includes a nozzle inlet for receiving evaporated material; a nozzle outlet; and a nozzle passage extending between the nozzle inlet and the nozzle outlet having a first passage portion, a second passage portion and a third passage portion, the second passage portion having an aperture angle which continuously increases in a direction from the nozzle inlet to the nozzle outlet and the third passage portion having an essentially constant aperture angle.

7. 发明申请

WO2018166619A1 MATERIAL DEPOSITION ARRANGEMENT, VACUUM DEPOSITION SYSTEM AND METHODS THEREFOR 审中-公开
公开(公告)号：WO2018166619A1
公开(公告)日：2018-09-20
申请号：PCT/EP2017/056377
申请日：2017-03-17
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , WURSTER, Harald , SCHÜSSLER, Uwe
发明人： DIEGUEZ-CAMPO, Jose Manuel , WURSTER, Harald , SCHÜSSLER, Uwe
IPC分类号： C23C14/24
摘要： A material deposition arrangement (100) for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition arrangement (1 00) includes at least one material deposition source (105) having a crucible (110) configured to evaporate the material, a distribution assembly (120) configured for providing the evaporated material to the substrate, and a force application device (130) configured for applying a contact force at a connection (112) between the crucible (110) and the distribution assembly (120).

8. 发明申请

WO2017194097A1 EVAPORATION SOURCE FOR DEPOSITING AN EVAPORATED MATERIAL, AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL 审中-公开
标题翻译：用于沉积蒸发材料的蒸发源以及沉积蒸发材料的方法
公开(公告)号：WO2017194097A1
公开(公告)日：2017-11-16
申请号：PCT/EP2016/060439
申请日：2016-05-10
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , WURSTER, Harald , LOPP, Andreas , HAAS, Dieter
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , WURSTER, Harald , LOPP, Andreas , HAAS, Dieter
IPC分类号： C23C14/04 , C23C14/12 , C23C14/24 , H01L51/00
CPC分类号： C23C14/24 , C23C14/04 , C23C14/042 , C23C14/12 , C23C14/243 , H01L51/001 , H01L51/50
摘要： Embodiments described herein relate to an evaporation source (20) for depositing an evaporated source material on a substrate. The evaporation source (20) comprises one or more distribution pipes (106) with a plurality of nozzles (22), wherein each nozzle of the plurality of nozzles (22) is configured for directing a plume of evaporated source material toward the substrate (10); and a shielding device (30) comprising a plurality of apertures (32), wherein at least one aperture of the plurality of apertures (32) is configured to shape the plume (318) of evaporated source material emitted from a single associated nozzle. According to a further aspect, a shielding device for an evaporation source as well as methods of depositing an evaporated source material on a substrate are described.
摘要翻译：这里描述的实施例涉及用于将蒸发的源材料沉积在基底上的蒸发源（20）。所述蒸发源（20）包括具有多个喷嘴（22）的一个或多个分配管（106），其中所述多个喷嘴（22）中的每个喷嘴被配置用于将蒸发源材料的羽流朝向所述衬底（10 ）; 以及包括多个孔（32）的防护装置（30），其中所述多个孔（32）中的至少一个孔配置成对从单个相关联的喷嘴发射的蒸发源材料的羽流（318）进行成形。根据另一方面，描述了用于蒸发源的屏蔽装置以及在基底上沉积蒸发的源材料的方法。

9. 发明申请

WO2005097641A1 INSTALLATION FOR PROCESSING PLATE-SHAPED SUBSTRATES 审中-公开
标题翻译：用于处理板形基板的安装
公开(公告)号：WO2005097641A1
公开(公告)日：2005-10-20
申请号：PCT/EP2004/003842
申请日：2004-04-10
申请人： APPLIED FILMS GMBH & CO. KG , OLESCH, Arnold , WEIMANN, Manfred , REMMLINGER, Dirk , RICK, Alfred , RATSCHAT, Holger , MERTENS, Frank , SAUER, Andreas , WURSTER, Harald
发明人： OLESCH, Arnold , WEIMANN, Manfred , REMMLINGER, Dirk , RICK, Alfred , RATSCHAT, Holger , MERTENS, Frank , SAUER, Andreas , WURSTER, Harald
IPC分类号： B65H7/14
CPC分类号： B65G49/06 , B65G2249/02 , C03C17/002 , G01B11/06 , G01B11/2433 , G01V8/10
摘要： In order that an installation for coating panes of glass (4) can be operated more reliably, the invention proposes a modification of the light barriers (5) used in the installation. On the receiver side of these light barriers (5) there is a row of individual cells (16) which are more or less shaded according to the thickness of the glass pane (4) passing through the ray path of the light barrier (5). Some cells (16) always deliver a significantly reduced signal which can be evaluated as a reliable indication of the presence of an object in the ray path.
摘要翻译：为了更可靠地操作玻璃（4）的玻璃板的安装，本发明提出了在安装中使用的光栅（5）的修改。在这些光屏障（5）的接收器侧，存在一排单独的单元（16），其根据穿过光栅（5）的光线路径的玻璃板（4）的厚度或多或少地阴影，。一些单元（16）总是递送显着减小的信号，其可被评估为在光线路径中存在物体的可靠指示。

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