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1. 发明申请

WO2012041461A2 PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROLITHOGRAPHIC EXPOSURE 审中-公开
标题翻译：微刻法投影曝光工具及微刻曝光法
公开(公告)号：WO2012041461A2
公开(公告)日：2012-04-05
申请号：PCT/EP2011/004750
申请日：2011-09-22
申请人： CARL ZEISS SMT GMBH , HETZLER, Jochen , BLEIDISTEL, Sascha , GRUNER, Toralf , HARTJES, Joachim , SCHWAB, Markus , WOLF, Alexander
发明人： HETZLER, Jochen , BLEIDISTEL, Sascha , GRUNER, Toralf , HARTJES, Joachim , SCHWAB, Markus , WOLF, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70608 , G03F7/70733 , G03F9/7003 , G03F9/7034 , G03F9/7049
摘要： A projection exposure tool (10) for microlithography for exposing a substrate (20) comprises a projection objective (18) and an optical measuring apparatus (40) for determining a surface topography of the substrate (20) before the latter is exposed. The measuring apparatus (40) has a measuring beam path which extends outside of the projection objective (18), and is configured as a wavefront measuring apparatus, which is configured to determine topography measurement values simultaneously at a number of points on the substrate surface (21).
摘要翻译：用于微曝光曝光衬底（20）的投影曝光工具（10）包括投影物镜（18）和用于确定衬底（20）的表面形貌的光学测量装置（40）在后者暴露之前。测量设备（40）具有延伸到投影物镜（18）外部的测量光束路径，并且被配置为波前测量设备，该波前测量设备被配置为同时在基板表面上的多个点处确定地形测量值 21）。

2. 发明申请

WO2012034571A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2012034571A1
公开(公告)日：2012-03-22
申请号：PCT/EP2010/005628
申请日：2010-09-14
申请人： CARL ZEISS SMT GMBH , SCHWAB, Markus , PATRA, Michael
发明人： SCHWAB, Markus , PATRA, Michael
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system of a microlithographic projection exposure apparatus comprises a dividing array (36; 136; 236) of optical elements (70a, 70b; 170a, 170b; 270). Each optical element has a positive optical power and produces a converging light beam (LBa, LBb). A spatial light modulator (38) is arranged between the dividing array (36; 136; 236) and a surface (76) and is configured to vary an irradiance distribution in the surface (78). The modulator comprises an array (40) of mirrors each being configured to deflect a converging light beam (LBa, LBb) produced by the associated optical element by a deflection angle that is variable in response to a control signal. Each mirror directs the deflected light beam towards the surface (76) where the deflected light beam produces a light spot (78a, 78b, 78c). At least two optical elements (70a, 70b; 170a, 170b; 270) of the dividing array (36; 136; 236) have different optical properties so that the spot sizes of the light spots are different.
摘要翻译：微光刻投影曝光装置的照明系统包括光学元件（70a，70b; 170a，170b; 270）的分割阵列（36; 136; 236）。每个光学元件具有正光焦度并产生会聚光束（LBa，LBb）。空间光调制器（38）布置在分隔阵列（36; 136; 236）和表面（76）之间，并被配置为改变表面（78）中的辐照度分布。调制器包括一组反射镜阵列（40），每个镜子被配置为使由相关联的光学元件产生的会聚光束（LBa，LBb）偏转响应于控制信号而变化的偏转角。每个反射镜将偏转的光束引向偏转的光束产生光斑（78a，78b，78c）的表面（76）。分隔阵列（36; 136; 236）的至少两个光学元件（70a，70b; 170a，170b; 270）具有不同的光学特性，使得光点的光斑尺寸不同。

3. 发明申请

WO2012028158A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2012028158A1
公开(公告)日：2012-03-08
申请号：PCT/EP2010/005317
申请日：2010-08-30
申请人： CARL ZEISS SMT GMBH , PATRA, Michael , SCHWAB, Markus
发明人： PATRA, Michael , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70091 , G03F7/70116
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (52; 152) that includes an array (54c; 154b) of optical raster elements (56; 156). A condenser (72) superimposes the light beams associated with the optical raster elements in a common field plane (71). A modulator (62; 162; 262) modifies a field dependency of an angular irradiance distribution in an illuminated field. Units (60; 160; 260) of the modulator are associated with one of the light beams and are arranged at a position in front of the condenser (72) such that only the associated light beam impinges on a single modulator unit (60). The units are furthermore configured to variably redistribute, without blocking any light, a spatial and/or an angular irradiance distribution of the associated light beams. A control device (66) controls the modulator units (60; 160; 260) if it receives an input command that the field dependency of the angular irradiance distribution in the mask plane (78) shall be modified.
摘要翻译：微光刻投影曝光装置（10）的照明系统包括光学积分器（52; 152），其包括光栅元件（56; 156）的阵列（54c; 154b）。冷凝器（72）将与光栅元件相关联的光束叠加在公共场平面（71）中。调制器（62; 162; 262）修改照明场中的角度辐照度分布的场依赖性。调制器的单元（60; 160; 260）与一个光束相关联并且被布置在聚光器（72）的前面的位置处，使得仅相关联的光束撞击在单个调制器单元（60）上。这些单元还被配置为可变地重新分布相关联的光束的空间和/或角度辐照度分布，而不阻挡任何光。如果调制器单元（60; 160; 260）接收到必须修改掩模平面（78）中角度辐照度分布的场依赖性的输入命令，则控制装置（66）控制调制器单元（60; 160; 260）。

4. 发明申请

WO2009135586A1 ILLUMINATION SYSTEM COMPRISING A FOURIER OPTICAL SYSTEM 审中-公开
标题翻译：包含四光系统的照明系统
公开(公告)号：WO2009135586A1
公开(公告)日：2009-11-12
申请号：PCT/EP2009/002824
申请日：2009-04-17
申请人： CARL ZEISS SMT AG , SCHWAB, Markus , LAYH, Michael , DEGUENTHER, Markus , HOEGELE, Artur
发明人： SCHWAB, Markus , LAYH, Michael , DEGUENTHER, Markus , HOEGELE, Artur
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system (190) for a microlithography projection exposure apparatus (100) for illuminating an illumination field (165) with the light from a primary light source (102) has a variably adjustable pupil shaping unit (150) for receiving light from the primary light source (102) and for generating a variably adjustable two-dimensional intensity distribution in a pupil shaping surface (110) of the illumination system. The pupil shaping unit (150) has a Fourier optical system (500) for converting an entrance beam bundle (105) entering through an entrance plane of the Fourier optical system into an exit beam bundle exiting from an exit plane of the Fourier optical system. The Fourier optical system has a focal length f FOS and a structural length L measured between an entrance-side first system surface and an exit-side last system surface along an optical axis and the condition (L/f FOS )
摘要翻译：用于利用来自主光源（102）的光照射照明场（165）的微光刻投影曝光设备（100）的照明系统（190）具有可变调节的瞳孔成形单元（150），用于接收来自主光源光源（102）并且用于在照明系统的光瞳成形表面（110）中产生可变地调节的二维强度分布。瞳孔成形单元（150）具有傅立叶光学系统（500），用于将通过傅立叶光学系统的入射面进入的入射光束束（105）转换成从傅立叶光学系统的出射平面离开的出射光束束。傅立叶光学系统具有焦距fFOS和沿着光轴在入射侧第一系统表面和出射侧最后系统表面之间测量的结构长度L，并且条件（L / fFOS）<1/6成立。

5. 发明申请

WO2008107025A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2008107025A1
公开(公告)日：2008-09-12
申请号：PCT/EP2007/060360
申请日：2007-10-01
申请人： CARL ZEISS SMT AG , FIOLKA, Damian , MAUL, Manfred , SCHWAB, Markus , SEITZ, Wolfgang , DITTMANN, Olaf
发明人： FIOLKA, Damian , MAUL, Manfred , SCHWAB, Markus , SEITZ, Wolfgang , DITTMANN, Olaf
IPC分类号： G02B27/28 , G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G02B5/1876 , G02B27/283 , G02B27/285 , G02B27/286 , G03F7/70566
摘要： The invention relates to an illumination system of a microlithographic projection exposure apparatus comprising a depolariser (10, 500-900) which in conjunction with a light mixing system disposed downstream in the light propagation direction at least partially causes effective depolarisation of polarised light impinging on the depolariser (10, 500-900) and a microlens array (20) which is arranged upstream of the light mixing system in the light propagation direction and in which a plurality of microlenses (20a, 20b,... ) are arranged with a periodicity, wherein the depolariser (10, 500-900) is such that a contribution afforded by interaction of the depolariser (10, 500-900) on the one hand with the periodicity of the microlens array (20) on the other hand, to a residual polarisation distribution occurring in a pupil plane (PP) arranged downstream of the microlens array (20) in the light propagation direction has a maximum degree of polarisation of not more than 5%.
摘要翻译：本发明涉及一种微光刻投影曝光装置的照明系统，其包括去极化器（10,500-900），其与在光传播方向上配置的下游的光混合系统相结合，至少部分地引起偏振光的入射极化去极化器（10,500-900）和微透镜阵列（20），其布置在光传播方向上的光混合系统的上游，并且其中多个微透镜（20a，20b，...）以周期性其中去极化剂（10,500-900）使得一方面由去极化剂（10,500-900）与微透镜阵列（20）的周期性相互作用提供的贡献另一方面在光传播方向上布置在微透镜阵列（20）下游的光瞳面（PP）中发生的残留极化分布具有不大于5％的最大极化度。

6. 发明申请

WO2012041461A3 PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROLITHOGRAPHIC EXPOSURE 审中-公开
标题翻译：用于微结构曝光的投影曝光工具和微观曝光方法
公开(公告)号：WO2012041461A3
公开(公告)日：2012-06-21
申请号：PCT/EP2011004750
申请日：2011-09-22
申请人： ZEISS CARL SMT GMBH , HETZLER JOCHEN , BLEIDISTEL SASCHA , GRUNER TORALF , HARTJES JOACHIM , SCHWAB MARKUS , WOLF ALEXANDER
发明人： HETZLER JOCHEN , BLEIDISTEL SASCHA , GRUNER TORALF , HARTJES JOACHIM , SCHWAB MARKUS , WOLF ALEXANDER
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70133 , G03F7/70608 , G03F7/70733 , G03F9/7003 , G03F9/7034 , G03F9/7049
摘要： A projection exposure tool (10) for microlithography for exposing a substrate (20) comprises a projection objective (18) and an optical measuring apparatus (40) for determining a surface topography of the substrate (20) before the latter is exposed. The measuring apparatus (40) has a measuring beam path which extends outside of the projection objective (18), and is configured as a wavefront measuring apparatus, which is configured to determine topography measurement values simultaneously at a number of points on the substrate surface (21).
摘要翻译：用于曝光衬底（20）的用于微光刻的投影曝光工具（10）包括用于在曝光衬底（20）暴露之前确定衬底（20）的表面形貌的投影物镜（18）和光学测量装置（40）。测量装置（40）具有延伸到投影物镜（18）外部的测量光束路径，并且被配置为波前测量装置，其被配置为在基板表面上的多个点处同时确定地形测量值（ 21）。

7. 发明申请

WO2005048672A1 POWER SUPPLY WITH IMPROVED COOLING 审中-公开
标题翻译：电源具有改进的冷却功能
公开(公告)号：WO2005048672A1
公开(公告)日：2005-05-26
申请号：PCT/CH2003/000751
申请日：2003-11-14
申请人： DELTA ENERGY SYSTEMS (SWITZERLAND) AG , SCHWAB, Markus
发明人： SCHWAB, Markus
IPC分类号： H05K7/20
CPC分类号： H05K7/20918
摘要： The casing of a power supply (8) includes a bottom (2) and a cover (3). Both of them have a U-like shape. Since the cover (3) is slightly wider than the bottom (2) two air ducts (4) are provided between the side plates (2.2) of the bottom (2) and the corresponding side plates (3.2) of the cover (3) respectively. A printed circuit board (1) is mounted within the casing, particularly on the bottom (2). Different mechanical, electric and/or electronic components (6) are mounted on the printed circuit board (1). Furthermore, heat generating components (5) are mounted on the printed circuit board (1) such that they are in tight contact with the side plates (2.2) of the bottom (2). The waste heat generated by the components (5) is transferred to the side plates (2.2) of the bottom (2) and further on to the cover (3) and its side plates (3.2). From there the heat is dissipated into the air and particularly into the air ducts (4) from where it is dissipated by the air flow from two fans (7) that are arranged at the inlet of the air ducts (4).
摘要翻译：电源（8）的壳体包括底部（2）和盖子（3）。他们都有一个U形的形状。由于盖（3）比底部（2）略宽，两个空气管道（4）设置在底部（2）的侧板（2.2）和盖（3）的相应的侧板（3.2）之间，分别。印刷电路板（1）安装在壳体内，特别是在底部（2）上。不同的机械，电和/或电子部件（6）安装在印刷电路板（1）上。此外，发热部件（5）安装在印刷电路板（1）上，使得它们与底部（2）的侧板（2.2）紧密接触。由部件（5）产生的废热被转移到底部（2）的侧板（2.2），并进一步转移到盖（3）及其侧板（3.2）上。从那里，热被散发到空气中，特别是散发到空气管道（4）中，空气管道（4）从布置在空气管道（4）的入口处的两个风扇（7）被空气流散发。

8. 发明申请

WO2005031467A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE 审中-公开
标题翻译：微观投影曝光
公开(公告)号：WO2005031467A3
公开(公告)日：2005-05-19
申请号：PCT/EP0311977
申请日：2003-10-29
申请人： ZEISS CARL SMT AG , GRUNER TORALF , KRAEHMER DANIEL , TOTZECK MICHAEL , WANGLER JOHANNES , BROTSACK MARKUS , DIECKMANN NILS , GOEHNERMEIER AKSEL , SCHWAB MARKUS
发明人： GRUNER TORALF , KRAEHMER DANIEL , TOTZECK MICHAEL , WANGLER JOHANNES , BROTSACK MARKUS , DIECKMANN NILS , GOEHNERMEIER AKSEL , SCHWAB MARKUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane (7) of a projection objective (6), as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device (40, 50, 60, 70, 80) the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在布置在投影物镜（6）的图像平面（7）的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，输出朝向基板的辐射，并具有产生输出偏振状态。通过借助于至少一个偏振操纵装置（40,50,60,70,80）的输出偏振状态的可变调节，可以形成输出偏振状态以接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

9. 发明申请

WO2005031467A2 MICROLITHOGRAPHIC ILLUMINATION METHOD AS WELL AS A PROJECTION ILLUMINATION SYSTEM FOR CARRYING OUT THE METHOD 审中-公开
标题翻译：作为执行方法的投影照明系统的微观照明方法
公开(公告)号：WO2005031467A2
公开(公告)日：2005-04-07
申请号：PCT/EP2003/011977
申请日：2003-10-29
申请人： CARL ZEISS SMT AG , GRUNER, Toralf , KRAEHMER, Daniel , TOTZECK, Michael , WANGLER, Johannes , BROTSACK, Markus , DIECKMANN, Nils , GOEHNERMEIER, Aksel , SCHWAB, Markus
发明人： GRUNER, Toralf , KRAEHMER, Daniel , TOTZECK, Michael , WANGLER, Johannes , BROTSACK, Markus , DIECKMANN, Nils , GOEHNERMEIER, Aksel , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an illumination method for illuminating a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection illumination system for performing that method output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于照射布置在投影物镜的像面的区域中的基板以及在用于执行该方法的投影照明系统中的基板的照明方法中，产生了朝向基板并具有输出偏振状态的输出辐射。借助于至少一个偏振操纵装置借助于输出偏振状态的可变调节，可以形成输出偏振状态以接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

10. 发明申请

WO2015185357A1 OPTISCHES SYSTEM, INSBESONDERE FÜR EINE MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译：光学系统中，尤其是对于微光刻投射曝光设备
公开(公告)号：WO2015185357A1
公开(公告)日：2015-12-10
申请号：PCT/EP2015/061081
申请日：2015-05-20
申请人： CARL ZEISS SMT GMBH , SCHICKETANZ, Thomas , GRUNER, Toralf , SCHWAB, Markus
发明人： SCHICKETANZ, Thomas , GRUNER, Toralf , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70233
摘要： Die Erfindung betrifft ein optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, mit wenigstens einem Spiegel, wobei der Spiegel (M2, 40) in dem optischen System derart angeordnet ist, dass die im Betrieb des optischen Systems bei Reflexion elektromagnetischer Strahlung an dem Spiegel auftretenden, auf die jeweilige Oberflächennormale bezogenen Reflexionswinkel wenigstens 50° betragen, und wobei der Spiegel aus wenigstens zwei Segmenten (41, 42) zusammengesetzt ist, zwischen denen auf dem optischen Element wenigstens eine Segmentgrenze (45) vorhanden ist.
摘要翻译：本发明涉及一种光学系统，尤其是用于微光刻投射曝光设备，其具有至少一个反射镜，其中所述反射镜（M2，40）被布置在光学系统中，使得对于在反射镜的电磁辐射的反射的光学系统的操作过程中发生的，与相应表面法线反射角为至少50°，并且其中，所述反射镜包括至少两个段（41,42）组成，被设置在光学元件的至少一个边界节段（45），其上之间。

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