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1. 发明申请

WO2005031467A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE 审中-公开
标题翻译：微观投影曝光
公开(公告)号：WO2005031467A3
公开(公告)日：2005-05-19
申请号：PCT/EP0311977
申请日：2003-10-29
申请人： ZEISS CARL SMT AG , GRUNER TORALF , KRAEHMER DANIEL , TOTZECK MICHAEL , WANGLER JOHANNES , BROTSACK MARKUS , DIECKMANN NILS , GOEHNERMEIER AKSEL , SCHWAB MARKUS
发明人： GRUNER TORALF , KRAEHMER DANIEL , TOTZECK MICHAEL , WANGLER JOHANNES , BROTSACK MARKUS , DIECKMANN NILS , GOEHNERMEIER AKSEL , SCHWAB MARKUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane (7) of a projection objective (6), as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device (40, 50, 60, 70, 80) the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在布置在投影物镜（6）的图像平面（7）的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，输出朝向基板的辐射，并具有产生输出偏振状态。通过借助于至少一个偏振操纵装置（40,50,60,70,80）的输出偏振状态的可变调节，可以形成输出偏振状态以接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

2. 发明申请

WO2006029796A3 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置
公开(公告)号：WO2006029796A3
公开(公告)日：2006-08-03
申请号：PCT/EP2005009804
申请日：2005-09-13
申请人： ZEISS CARL SMT AG , BROTSACK MARKUS , DEGUENTHER MARKUS , ULRICH WILHELM , WIETZORREK JOACHIM , WANGLER JOHANNES , FELDMANN HEIKO , ZEILER ANDREAS
发明人： BROTSACK MARKUS , DEGUENTHER MARKUS , ULRICH WILHELM , WIETZORREK JOACHIM , WANGLER JOHANNES , FELDMANN HEIKO , ZEILER ANDREAS
IPC分类号： G03F7/20
CPC分类号： G03F7/70191
摘要： An illumination system (12) for a microlithographic projection exposure apparatus (10) comprises a masking device (36) and a masking objective (38; 138; 238) which projects the masking device (36) onto an image plane (18). The illumination system further includes an optical correction element (46; 34'; 146a, 146b; 242; 242a, 242b, 242c) having a surface (48; 44; 44'; 148a, 148b) that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane (40; 140) which precedes the image plane (18) of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system (12; 112; 212) in the image plane matches a principal ray distribution required by a projection objective (16).
摘要翻译：用于微光刻投影曝光装置（10）的照明系统（12）包括将掩模装置（36）投影到图像平面（18）上的掩蔽装置（36）和掩蔽物镜（38; 138; 238）。所述照明系统还包括具有表面（48; 44; 44'; 148a，148b）的光学校正元件（46; 34'; 146a，146b; 242; 242a，242b，242c），所述表面是非球面形或支撑衍射具有至少基本上非球面表面效果的结构。该表面至少大致布置在掩模对象的图像平面（18）之前的场平面（40; 140）中。非球面作用表面被设计成使得由照明系统（12; 112; 在图像平面中匹配投影物镜（16）所需的主光线分布。

3. 发明申请

WO2005026843A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE INSTALLATION 审中-公开
标题翻译：用于微观投影曝光安装的照明系统
公开(公告)号：WO2005026843A3
公开(公告)日：2005-05-26
申请号：PCT/EP2004010188
申请日：2004-09-13
申请人： ZEISS CARL SMT AG , KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
发明人： KOEHLER JESS , WANGLER JOHANNES , BROTSACK MARKUS , SINGER WOLFGANG , FIOLKA DAMIAN , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/702
摘要： An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.
摘要翻译：用于微光刻投影曝光装置的照明系统用于利用来自主光源（11）的光照亮照明场。照明系统具有从主光源接收光的光分配装置（25），并且从该光产生二维强度分布，其可以可变地设置在照明系统的瞳孔成形表面（31）中。配光装置具有至少一个光学调制装置（20），其具有能独立控制的各个元件（21）的二维阵列，以便改变入射在光调制装置上的光的角分布。该装置允许在不更换光学部件的情况下可变地设置不同的照明模式。

4. 发明申请

WO2004099873A3 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION ILLUMINATION INSTALLATION 审中-公开
标题翻译：照明系统，微光刻投射曝光系统
公开(公告)号：WO2004099873A3
公开(公告)日：2005-06-09
申请号：PCT/EP2004004875
申请日：2004-05-07
申请人： ZEISS CARL SMT AG , DEGUENTHER MARKUS , WANGLER JOHANNES , BROTSACK MARKUS , MIZKEWITSCH ELLA
发明人： DEGUENTHER MARKUS , WANGLER JOHANNES , BROTSACK MARKUS , MIZKEWITSCH ELLA
IPC分类号： G02B27/09 , G03F20060101 , G03F7/20
CPC分类号： G03F7/70075 , G03F7/70091
摘要： The invention relates to an illumination system (1) for a microlithographic projection illumination installation. Said illumination system is configured to illuminate an illumination field with an illumination radiation having a defined degree of coherency sigma , said degree of coherency being adjustable within a coherency degree range that reaches the range of very low coherency degrees substantially below sigma =0.2. The illumination system comprises a first optical system (30) for producing a defined light distribution in an entry plane of a light mixing device and a light mixing device (12) for homogenizing the incident radiation. The first optical system and the light mixing device can be adjusted between a plurality of configurations that correspond to different coherency degree ranges. The coherency degree ranges overlap and are calculated in such a manner that the resulting total coherency degree range is larger than the individual coherency degree ranges.
摘要翻译：一种用于微光刻投影曝光设备的照明系统（1）被设计为与具有相干西格玛的预定程度的照明光束，其特征在于，相干度可以一定程度的相干性区域的，其延伸到非常小的程度的一致性的范围显著低于标准差= 0.2范围内调节照明的照明场，照明系统具有用于产生在光混合装置的入射平面上的规定的配光均匀化的入射辐射的第一光学系统（30），和一光混合装置（12）。第一光学系统和所述光混合装置是多个对应于不同程度的相干性区域的配置之间的每个切换。重叠区域连贯性的程度，并且其尺寸使得相干区域的得到的总程度比相干区域的各个程度越大。

5. 发明申请

WO2004034146A3 LIGHTING SYSTEM COMPRISING A DEVICE FOR ADJUSTING THE LIGHT INTENSITY 审中-公开
标题翻译：带有用于调整光强度的装置的照明系统
公开(公告)号：WO2004034146A3
公开(公告)日：2004-08-05
申请号：PCT/EP0309370
申请日：2003-08-23
申请人： ZEISS CARL SMT AG , SINGER WOLFGANG , ANTONI MARTIN , MELZER FRANK , WANGLER JOHANNES , HAINZ JOACHIM , WIETZORREK JOACHIM , MAUL MANFRED , WEISS MARKUS
发明人： SINGER WOLFGANG , ANTONI MARTIN , MELZER FRANK , WANGLER JOHANNES , HAINZ JOACHIM , WIETZORREK JOACHIM , MAUL MANFRED , WEISS MARKUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/7085
摘要： The invention relates to a lighting system for microlithography with wavelengths
摘要翻译：本发明涉及的照明系统用于与波长微光刻<= 157纳米，尤其用于EUV光刻用于照明物平面，其包括辐射源，其提供的光线的光束是可用的，其中光束的束，在所涉及的光路中的照明系统从辐射源到物体平面的方向具有光强度; 第一光学部件，其至少包括具有多个光栅元件的第一光学元件，其中所述第一光学元件布置在所述辐射源与所述物平面之间的所述光束路径中; 其特征在于，提供用于调节<= 157nm波长的光强度的装置，其被设置在从辐射源到辐射源与第一光学元件之间的物平面的光路中。

6. 发明申请

WO2006074812A3 ILLUMINATION SYTSEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2006074812A3
公开(公告)日：2007-05-24
申请号：PCT/EP2005014122
申请日：2005-12-30
申请人： ZEISS CARL SMT AG , SINGER WOLFGANG , BADER DIETER , WANGLER JOHANNES , DEGUENTHER MARKUS
发明人： SINGER WOLFGANG , BADER DIETER , WANGLER JOHANNES , DEGUENTHER MARKUS
IPC分类号： G03F7/20
CPC分类号： G03F7/70066 , G03F7/70075 , G03F7/70083
摘要： An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are-positioned in or in close proximity to à field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light' emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).
摘要翻译：微光刻曝光系统的照明系统（12）包括多个发光元件（24），所述多个发光元件（24）具有光出射面，所述光出射面位于或平行于à场平面（OP）或瞳平面并被配置为单独激活。集光元件，例如蝇眼透镜的微透镜或圆柱透镜阵列可以用于收集由光发射元件（24）发射的光束。可以提供均匀化装置，例如棒状积分器或光学光栅元件（40），以改善光罩平面（RP）中的强度均匀性。

7. 发明申请

WO2004031854A2 ILLUMINATION SYSTEM FOR A WAVELENGTH = 193 NM, COMPRISING SENSORS FOR DETERMINING THE ILLUMINATION 审中-公开
标题翻译：照明系统用于波长<= 193 nm的传感器，用于确定所述照明
公开(公告)号：WO2004031854A2
公开(公告)日：2004-04-15
申请号：PCT/EP0310605
申请日：2003-09-24
申请人： ZEISS CARL SMT AG , ASML NETHERLANDS BV , SINGER WOLFGANG , ANTONI MARTIN , WANGLER JOHANNES , WEISS MARKUS , BANINE VADIM YEVGENYEVICH , DIERICHS MARCEL , MOORS ROEL , SCHUSTER KARL-HEINZ
发明人： SINGER WOLFGANG , ANTONI MARTIN , WANGLER JOHANNES , WEISS MARKUS , BANINE VADIM YEVGENYEVICH , DIERICHS MARCEL , MOORS ROEL , SCHUSTER KARL-HEINZ
IPC分类号： G03F7/20 , G03F
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70558
摘要： The invention relates to an illumination system for wavelengths
摘要翻译：本发明涉及一种用于波长的照明系统<= 193纳米，其中所述照明系统包括一个光源，其提供可用的预定照明在一个平面和a）用第一光栅元件，其特征在于，所述第一光栅元件被布置在支撑元件上和第一光学部件所述第一光学部件被布置在或在其上提供照明的平面附近。本发明的特征在于：i）中设置在第一光学元件的至少一个传感器，用于在承载元件上的检测入射光的支撑元件上。 ⅱ）的照明系统的反射镜由传感器信号，使得Beleuctung的位置和强度被保持恒定的评价提供。

8. 发明申请

WO2004010224A2 PROJECTION OBJECTIVE FOR A PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：投影曝光装置投影目标
公开(公告)号：WO2004010224A2
公开(公告)日：2004-01-29
申请号：PCT/EP0300485
申请日：2003-01-20
申请人： ZEISS CARL SMT AG , SINGER WOLFGANG , MANN HANS-JUERGEN , WANGLER JOHANNES , ULRICH WILHELM
发明人： SINGER WOLFGANG , MANN HANS-JUERGEN , WANGLER JOHANNES , ULRICH WILHELM
IPC分类号： G02B17/06 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/04
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： The invention concerns a projection objective for a projection exposure apparatus, said projection exposure apparatus having a primary light source for emitting electromagnetic radiation with a wavelength
摘要翻译：本发明涉及投影曝光装置的投影物镜，所述投影曝光装置具有用于发射波长<= 193nm的电磁辐射的初级光源。投影物镜包括物平面，第一镜面; 第二个镜子第三个镜子第四个镜子和一个图像平面。物平面，第一镜，第二镜，第三镜，第四镜和像平面以居中布置的方式排列成共同的光轴。第一，第二，第三和第四反射镜位于物平面和图像平面之间。入射到位于物平面中的物体上的所述电磁辐射的主射线在从主光源朝向图像平面中的图像的方向上远离光轴倾斜。

9. 发明申请

WO2008061681A2 ILLUMINATION LENS SYSTEM FOR PROJECTION MICROLITHOGRAPHY, AND MEASURING AND MONITORING METHOD FOR SUCH AN ILLUMINATION LENS SYSTEM 审中-公开
标题翻译：投影显微照明的照明光学和这种照明光学的测量和监测方法
公开(公告)号：WO2008061681A2
公开(公告)日：2008-05-29
申请号：PCT/EP2007009971
申请日：2007-11-19
申请人： ZEISS CARL SMT AG , PATRA MICHAEL , DEGUENTHER MARKUS , LAYH MICHAEL , WANGLER JOHANNES , MAUL MANFRED
发明人： PATRA MICHAEL , DEGUENTHER MARKUS , LAYH MICHAEL , WANGLER JOHANNES , MAUL MANFRED
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70116
摘要： Disclosed is a microlithographic projection exposure system (1) comprising an illumination system (4) with an illumination lens system (5) for illuminating an illumination field on a reticle level (6). The illumination lens system is equipped with a light distribution device (12a) encompassing a light deflection array (12) made up of individual elements, and an optical subassembly (21, 23 to 26) which converts the light intensity distribution predefined on a first level (19) of the illumination lens system (5) into an illumination angle distribution on the reticle level (6). Extracted illumination light (31) is applied to a spatially and time-resolved detection device (30) downstream of an extraction device (17) located between the light deflection array (12) and the reticle plane (6) within the light path in such a way that the detection device (30) detects a light intensity distribution corresponding to the light intensity distribution on the first level (19). The detection device (30) allows the influence of individual elements or groups of individual elements on the light intensity distribution on the first level (19) to be determined, especially by varying said individual elements or groups thereof over time. The light deflection array of the disclosed illumination lens system functions during normal operation.
摘要翻译：微光刻投射曝光设备（1）具有照明系统（4），照明系统（4）具有用于照射标线板平面（6）中的照明场的照明光学器件（5）。一种光分配装置（12A），其包括单个元件的光的偏转阵列（12），和光分布的装置（12a）的在照明光学部件的第一平面（19）的光学组件（21，23〜26）（5）在标线片平面（6）中的照明角度分布中给定的光强度分布也属于照明光学器件（5）。甲空间和时间分辨检测装置（30）被加载位于光偏转阵列（12）之间的光路之后并且在掩模母版平面（6）去耦合元件（17）被连接到耦合输出的照明光（31），该检测装置（30）是一个第一个平面（19）的光强分布对应的光强分布检测到。利用检测装置（30），尤其是具有单个元件或单个元件组的时间变化，可以确定它们对第一平面（19）中的光强度分布的影响。其结果是照明光学系统，其中在正常操作期间发生光偏转阵列的功能。

10. 发明申请

WO2004040378A3 ILLUMINATION DEVICE FOR A MICROLITHOGRAPHIC PROJECTION-EXPOSURE SYSTEM 审中-公开
标题翻译：照明装置，一种用于微光刻投影曝光系统
公开(公告)号：WO2004040378A3
公开(公告)日：2004-12-23
申请号：PCT/EP0311000
申请日：2003-10-04
申请人： ZEISS CARL SMT AG , DEGUENTHER MARKUS , BIELING STIG , WANGLER JOHANNES
发明人： DEGUENTHER MARKUS , BIELING STIG , WANGLER JOHANNES
IPC分类号： G03F7/20
CPC分类号： G03F7/70075
摘要： The invention relates to an illumination device for a microlithographic projection-exposure system, which preferably operates with a mercury high-pressure lamp as the primary light source. One embodiment of said device comprises an integrator unit for mixing the light of the primary light source, said unit having at least one cuboid integrator rod with a rectangular entrance surface (43) and lateral faces (45, 47) that are aligned at right angles to one another. A cuboid premixing unit (50) with a rectangular cross-section is situated in the optical path, upstream of the entry surface (43), said unit having several reflection surfaces (156, 157, 158, 159) running obliquely in relation to the lateral faces of the integrator rod. The oblique reflection surfaces cause azimuthal mixing of the light and can be used to provide a pupil of illumination light that is largely devoid of ellipticity.
摘要翻译：一种用于微光刻投射曝光系统，其优选地与作为主光源在一个实施例中对准，用于所述初级光源的积分器单元与具有矩形入射面（43）的至少一个平行六面体形积分棒的光的混合的高压水银灯进行操作并彼此垂直的侧表面的照明装置（45，47）。在输入表面（43）之前的光路中配置有具有多个倾斜于延伸的反射表面（156，157，158，159）的积分棒的侧面的矩形横截面的长方体预混合单元（50）。倾斜反射面引起光undkönnen的方位混合使用，以提供预混合背后的照明光的大部分elliptizitätsfreie瞳孔。

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