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1. 发明申请

WO2012041461A2 PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY AND METHOD FOR MICROLITHOGRAPHIC EXPOSURE 审中-公开
标题翻译：微刻法投影曝光工具及微刻曝光法
公开(公告)号：WO2012041461A2
公开(公告)日：2012-04-05
申请号：PCT/EP2011/004750
申请日：2011-09-22
申请人： CARL ZEISS SMT GMBH , HETZLER, Jochen , BLEIDISTEL, Sascha , GRUNER, Toralf , HARTJES, Joachim , SCHWAB, Markus , WOLF, Alexander
发明人： HETZLER, Jochen , BLEIDISTEL, Sascha , GRUNER, Toralf , HARTJES, Joachim , SCHWAB, Markus , WOLF, Alexander
IPC分类号： G03F7/20
CPC分类号： G03F7/70133 , G03F7/70608 , G03F7/70733 , G03F9/7003 , G03F9/7034 , G03F9/7049
摘要： A projection exposure tool (10) for microlithography for exposing a substrate (20) comprises a projection objective (18) and an optical measuring apparatus (40) for determining a surface topography of the substrate (20) before the latter is exposed. The measuring apparatus (40) has a measuring beam path which extends outside of the projection objective (18), and is configured as a wavefront measuring apparatus, which is configured to determine topography measurement values simultaneously at a number of points on the substrate surface (21).
摘要翻译：用于微曝光曝光衬底（20）的投影曝光工具（10）包括投影物镜（18）和用于确定衬底（20）的表面形貌的光学测量装置（40）在后者暴露之前。测量设备（40）具有延伸到投影物镜（18）外部的测量光束路径，并且被配置为波前测量设备，该波前测量设备被配置为同时在基板表面上的多个点处确定地形测量值 21）。

2. 发明申请

WO2015185357A1 OPTISCHES SYSTEM, INSBESONDERE FÜR EINE MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
标题翻译：光学系统中，尤其是对于微光刻投射曝光设备
公开(公告)号：WO2015185357A1
公开(公告)日：2015-12-10
申请号：PCT/EP2015/061081
申请日：2015-05-20
申请人： CARL ZEISS SMT GMBH , SCHICKETANZ, Thomas , GRUNER, Toralf , SCHWAB, Markus
发明人： SCHICKETANZ, Thomas , GRUNER, Toralf , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70233
摘要： Die Erfindung betrifft ein optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, mit wenigstens einem Spiegel, wobei der Spiegel (M2, 40) in dem optischen System derart angeordnet ist, dass die im Betrieb des optischen Systems bei Reflexion elektromagnetischer Strahlung an dem Spiegel auftretenden, auf die jeweilige Oberflächennormale bezogenen Reflexionswinkel wenigstens 50° betragen, und wobei der Spiegel aus wenigstens zwei Segmenten (41, 42) zusammengesetzt ist, zwischen denen auf dem optischen Element wenigstens eine Segmentgrenze (45) vorhanden ist.
摘要翻译：本发明涉及一种光学系统，尤其是用于微光刻投射曝光设备，其具有至少一个反射镜，其中所述反射镜（M2，40）被布置在光学系统中，使得对于在反射镜的电磁辐射的反射的光学系统的操作过程中发生的，与相应表面法线反射角为至少50°，并且其中，所述反射镜包括至少两个段（41,42）组成，被设置在光学元件的至少一个边界节段（45），其上之间。

3. 发明申请

WO2012089224A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2012089224A1
公开(公告)日：2012-07-05
申请号：PCT/EP2010/007953
申请日：2010-12-28
申请人： CARL ZEISS SMT GMBH , PATRA, Michael , BIELING, Stig , DEGÜNTHER, Markus , SCHLESENER, Frank , SCHWAB, Markus
发明人： PATRA, Michael , BIELING, Stig , DEGÜNTHER, Markus , SCHLESENER, Frank , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70158 , G03F7/70058
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises a light source (30), which is configured to produce a projection light beam (34), and a first and a second diffractive optical element (42, 44; 242, 244) arranged between the light source (30) and a pupil plane (84). The diffractive effect produced by each diffractive optical element depends on the position of a light field (110) that is irradiated by the projection light beam (34) on the diffractive optical elements (42, 44; 242, 244). A displacement mechanism (54, 64) changes the mutual spatial arrangement of the diffractive optical elements. In at least one of the mutual spatial arrangements, which can be obtained with the help of the displacement mechanism (54, 64), the light field (110) extends both over the first and the second diffractive optical element (42, 44; 242, 244). This makes it possible to produce in a simple manner continuously variable illumination settings.
摘要翻译：微光刻投影曝光装置（10）的照明系统包括被配置为产生投影光束（34）的光源（30）和第一和第二衍射光学元件（42,44; 242,244））布置在光源（30）和光瞳平面（84）之间。由每个衍射光学元件产生的衍射效应取决于由投影光束（34）照射在衍射光学元件（42,44; 242,244）上的光场（110）的位置。位移机构（54,64）改变衍射光学元件的相互空间布置。在借助位移机构（54,64）可获得的相互空间布置中的至少一个中，光场（110）在第一和第二衍射光学元件（42,44; 242）之上延伸，244）。这使得可以以简单的方式生产连续可变的照明设置。

4. 发明申请

WO2011006710A3 WABENKONDENSOR, INSBESONDERE FÜR EINE MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE 审中-公开
公开(公告)号：WO2011006710A3
公开(公告)日：2011-01-20
申请号：PCT/EP2010/057934
申请日：2010-06-07
申请人： CARL ZEISS SMT GMBH , PATRA, Michael , SCHWAB, Markus
发明人： PATRA, Michael , SCHWAB, Markus
IPC分类号： G03F7/20
摘要： Die Erfindung betrifft einen Wabenkondensor (5, 12, 15, 100, 200, 300, 400, 500, 550), insbesondere für eine mikrolithographische Projektionsbelichtungsanlage, mit wenigstens drei in Lichtausbreitungsrichtung aufeinander folgenden Anordnungen (110-130, 310-340, 410-440) aus strahlablenkenden optischen Elementen (111, 112,...; 121, 122,...; 131, 132,...; 311, 312,...; 411, 412,...) zur Erzeugung einer Vielzahl optischer Kanäle, wobei in wenigstens einer dieser Anordnungen wenigstens zwei dieser optischen Kanäle einen unterschiedlichen Querschnitt aufweisen.

5. 发明申请

WO2012034571A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2012034571A1
公开(公告)日：2012-03-22
申请号：PCT/EP2010/005628
申请日：2010-09-14
申请人： CARL ZEISS SMT GMBH , SCHWAB, Markus , PATRA, Michael
发明人： SCHWAB, Markus , PATRA, Michael
IPC分类号： G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system of a microlithographic projection exposure apparatus comprises a dividing array (36; 136; 236) of optical elements (70a, 70b; 170a, 170b; 270). Each optical element has a positive optical power and produces a converging light beam (LBa, LBb). A spatial light modulator (38) is arranged between the dividing array (36; 136; 236) and a surface (76) and is configured to vary an irradiance distribution in the surface (78). The modulator comprises an array (40) of mirrors each being configured to deflect a converging light beam (LBa, LBb) produced by the associated optical element by a deflection angle that is variable in response to a control signal. Each mirror directs the deflected light beam towards the surface (76) where the deflected light beam produces a light spot (78a, 78b, 78c). At least two optical elements (70a, 70b; 170a, 170b; 270) of the dividing array (36; 136; 236) have different optical properties so that the spot sizes of the light spots are different.
摘要翻译：微光刻投影曝光装置的照明系统包括光学元件（70a，70b; 170a，170b; 270）的分割阵列（36; 136; 236）。每个光学元件具有正光焦度并产生会聚光束（LBa，LBb）。空间光调制器（38）布置在分隔阵列（36; 136; 236）和表面（76）之间，并被配置为改变表面（78）中的辐照度分布。调制器包括一组反射镜阵列（40），每个镜子被配置为使由相关联的光学元件产生的会聚光束（LBa，LBb）偏转响应于控制信号而变化的偏转角。每个反射镜将偏转的光束引向偏转的光束产生光斑（78a，78b，78c）的表面（76）。分隔阵列（36; 136; 236）的至少两个光学元件（70a，70b; 170a，170b; 270）具有不同的光学特性，使得光点的光斑尺寸不同。

6. 发明申请

WO2012028158A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 审中-公开
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：WO2012028158A1
公开(公告)日：2012-03-08
申请号：PCT/EP2010/005317
申请日：2010-08-30
申请人： CARL ZEISS SMT GMBH , PATRA, Michael , SCHWAB, Markus
发明人： PATRA, Michael , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70091 , G03F7/70116
摘要： An illumination system of a microlithographic projection exposure apparatus (10) comprises an optical integrator (52; 152) that includes an array (54c; 154b) of optical raster elements (56; 156). A condenser (72) superimposes the light beams associated with the optical raster elements in a common field plane (71). A modulator (62; 162; 262) modifies a field dependency of an angular irradiance distribution in an illuminated field. Units (60; 160; 260) of the modulator are associated with one of the light beams and are arranged at a position in front of the condenser (72) such that only the associated light beam impinges on a single modulator unit (60). The units are furthermore configured to variably redistribute, without blocking any light, a spatial and/or an angular irradiance distribution of the associated light beams. A control device (66) controls the modulator units (60; 160; 260) if it receives an input command that the field dependency of the angular irradiance distribution in the mask plane (78) shall be modified.
摘要翻译：微光刻投影曝光装置（10）的照明系统包括光学积分器（52; 152），其包括光栅元件（56; 156）的阵列（54c; 154b）。冷凝器（72）将与光栅元件相关联的光束叠加在公共场平面（71）中。调制器（62; 162; 262）修改照明场中的角度辐照度分布的场依赖性。调制器的单元（60; 160; 260）与一个光束相关联并且被布置在聚光器（72）的前面的位置处，使得仅相关联的光束撞击在单个调制器单元（60）上。这些单元还被配置为可变地重新分布相关联的光束的空间和/或角度辐照度分布，而不阻挡任何光。如果调制器单元（60; 160; 260）接收到必须修改掩模平面（78）中角度辐照度分布的场依赖性的输入命令，则控制装置（66）控制调制器单元（60; 160; 260）。

7. 发明申请

WO2011101331A1 ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION APPARATUS 审中-公开
标题翻译：面罩检测装置的照明系统和投影目标
公开(公告)号：WO2011101331A1
公开(公告)日：2011-08-25
申请号：PCT/EP2011/052184
申请日：2011-02-15
申请人： CARL ZEISS SMT GMBH , FELDMANN, Heiko , SOHMEN, Erik Matthias , STÜHLER, Joachim , GROMER, Oswald , MÜLLER, Ulrich , LAYH, Michael , SCHWAB, Markus
发明人： FELDMANN, Heiko , SOHMEN, Erik Matthias , STÜHLER, Joachim , GROMER, Oswald , MÜLLER, Ulrich , LAYH, Michael , SCHWAB, Markus
IPC分类号： G03F1/00 , G03F7/20 , G01N21/00
CPC分类号： G03F7/70091 , G01N21/956 , G01N2021/95676 , G03F1/84
摘要： The invention concerns an illumination system and a projection objective of a mask inspection apparatus. In accordance with an aspect of the invention an illumination system (610) in operation of the mask inspection apparatus illuminates a mask (630) with an illumination bundle of rays (615) having a centroid ray, wherein said centroid ray has a direction dependent on the location of the incidence of the illumination bundle of rays (615) on the mask (630).
摘要翻译：本发明涉及一种面罩检查装置的照明系统和投影物镜。根据本发明的一个方面，在掩模检查设备的操作中的照明系统（610）用具有质心射线的照射光束（615）照射掩模（630），其中所述质心射线具有取决于照射光束束（615）入射到掩模（630）上的位置。

8. 发明申请

WO2011039261A2 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 审中-公开
标题翻译：显微照相系统
公开(公告)号：WO2011039261A2
公开(公告)日：2011-04-07
申请号：PCT/EP2010/064467
申请日：2010-09-29
申请人： CARL ZEISS SMT GMBH , KIRCH, Marc , FIOLKA, Damian , ZIEGLER, Gerhard-Wilhelm , DEGÜNTHER, Markus , SCHWAB, Markus
发明人： KIRCH, Marc , FIOLKA, Damian , ZIEGLER, Gerhard-Wilhelm , DEGÜNTHER, Markus , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70075 , G02B27/0905 , G02B27/0961 , G03F7/70066
摘要： Microlithographic projection exposure apparatus comprising an illumination device and ex projection objective), wherein, during the operation of the projection exposure apparatus, the illumination device an least partly illuminates a reticle in an object plane or the projection objective and the projection objective images this illuminated part of this object plane with a scale M onto at least one part of the wafer in the image plane, and wherein the wafer can be moved synchronously with the reticle perpendicular to the optical axis and providing a fly' s eye condenser for illuminating a plane.
摘要翻译：包括照明装置和前投影物镜的微光投影曝光装置，其中，在投影曝光装置的操作期间，照明装置至少部分地照亮物平面中的标线或投影物镜并且投影物镜将该物体平面的该被照射部分以标尺M成像到像平面中的晶片的至少一部分上，并且其中晶片可以与垂直于光轴的标线同步地移动，用于照亮飞机的聚光镜。

9. 发明申请

WO2005031467A2 MICROLITHOGRAPHIC ILLUMINATION METHOD AS WELL AS A PROJECTION ILLUMINATION SYSTEM FOR CARRYING OUT THE METHOD 审中-公开
标题翻译：作为执行方法的投影照明系统的微观照明方法
公开(公告)号：WO2005031467A2
公开(公告)日：2005-04-07
申请号：PCT/EP2003/011977
申请日：2003-10-29
申请人： CARL ZEISS SMT AG , GRUNER, Toralf , KRAEHMER, Daniel , TOTZECK, Michael , WANGLER, Johannes , BROTSACK, Markus , DIECKMANN, Nils , GOEHNERMEIER, Aksel , SCHWAB, Markus
发明人： GRUNER, Toralf , KRAEHMER, Daniel , TOTZECK, Michael , WANGLER, Johannes , BROTSACK, Markus , DIECKMANN, Nils , GOEHNERMEIER, Aksel , SCHWAB, Markus
IPC分类号： G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an illumination method for illuminating a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection illumination system for performing that method output radiation directed at the substrate and having an output polarization state is produced. By means of a variable adjustment of the output polarization state with the aid of at least one polarization manipulation device the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于照射布置在投影物镜的像面的区域中的基板以及在用于执行该方法的投影照明系统中的基板的照明方法中，产生了朝向基板并具有输出偏振状态的输出辐射。借助于至少一个偏振操纵装置借助于输出偏振状态的可变调节，可以形成输出偏振状态以接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

10. 发明申请

WO2013174680A3 ADJUSTMENT DEVICE AND MASK INSPECTION DEVICE WITH SUCH AN ADJUSTMENT DEVICE 审中-公开
公开(公告)号：WO2013174680A3
公开(公告)日：2013-11-28
申请号：PCT/EP2013/059973
申请日：2013-05-15
申请人： CARL ZEISS SMT GMBH
发明人： SCHWAB, Markus
IPC分类号： G03F7/20
摘要： An adjustment device (32) serves for adjusting mirrors (17, 25) for guiding used radiation (12) along a beam path. The adjustment device (32) has at least a first adjustment mark (33) and at least a second adjustment mark (39). At least one of the two adjustment marks (33, 39) is fixedly connected to one of the mirrors (17, 25) to be adjusted. The relative position of the adjustment marks (33, 39) with respect to one another is a measure for an adjustment parameter for the correspondence between an actual adjustment position of the mirrors (17, 25) to be adjusted and an intended adjustment position. The adjustment device (32) includes a spatially resolving detector (43) for detecting the adjustment parameter. At least one of the mirrors to be adjusted is a facet mirror (17, 25) with a plurality or multiplicity of mirror facets or mirror facet groups. The result of this is an adjustment device by means of which a predetermined adjustment precision for the relative position of the two mirrors with respect to one another is achieved.

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