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1. 发明申请

WO2010077659A3 CLOSED DRIFT MAGNETIC FIELD ION SOURCE APPARATUS CONTAINING SELF-CLEANING ANODE AND A PROCESS FOR SUBSTRATE MODIFICATION THEREWITH 审中-公开
标题翻译：包含自清洁阳极的闭式漂移磁场离子源装置和用于基板修改的过程
公开(公告)号：WO2010077659A3
公开(公告)日：2010-09-10
申请号：PCT/US2009067149
申请日：2009-12-08
申请人： GEN PLASMA INC , MADOCKS JOHN
发明人： MADOCKS JOHN
IPC分类号： H01J37/317 , H01J37/08
CPC分类号： H01J37/08 , H01J27/143 , H01J37/3053 , H01J37/317 , H01J37/32862 , H01J37/3405 , H01J2237/081
摘要： A process for modifying a surface of a substrate is provided that includes supplying electrons to an electrically isolated anode electrode of a closed drift ion source. The anode electrode has an anode electrode charge bias that is positive while other components of the closed drift ion source are electrically grounded or support an electrical float voltage. The electrons encounter a closed drift magnetic field that induces ion formation. Anode contamination is prevented by switching the electrode charge bias to negative in the presence of a gas, a plasma is generated proximal to the anode electrode to clean deposited contaminants from the anode electrode. The electrode charge bias is then returned to positive in the presence of a repeat electron source to induce repeat ion formation to again modify the surface of the substrate. An apparatus for modification of a surface of a substrate by this process is provided.
摘要翻译：提供了用于修改衬底的表面的工艺，其包括将电子供应到闭合漂移离子源的电绝缘阳极电极。阳极电极具有正的阳极电荷偏压，而闭合的漂移离子源的其他部件电接地或支持电浮动电压。电子遇到诱导离子形成的闭合漂移磁场。通过在存在气体的情况下将电极充电偏压切换至负极来防止阳极污染，在阳极电极附近产生等离子体以从阳极电极清除沉积的污染物。然后在存在重复电子源的情况下将电极电荷偏置返回到正值以诱导重复离子形成以再次改变衬底的表面。提供了一种通过该过程来修改基板表面的设备。

2. 发明申请

WO2008014332A2 METHODS AND APPARATUSES FOR DIRECTING AN ION BEAM SOURCE 审中-公开
标题翻译：用于指导离子束源的方法和装置
公开(公告)号：WO2008014332A2
公开(公告)日：2008-01-31
申请号：PCT/US2007074341
申请日：2007-07-25
申请人： CARDINAL CG CO , GEN PLASMA INC , GERMAN JOHN , HARTIG KLAUS , MADOCKS JOHN E
发明人： GERMAN JOHN , HARTIG KLAUS , MADOCKS JOHN E
CPC分类号： H01J27/143 , C23C14/221 , C23C14/225 , C23C14/562 , C23C14/564 , H01J37/08 , H01J2237/061 , H01J2237/083 , H01J2237/3151
摘要： A method and apparatus for directing an ion beam toward a surface of a substrate is disclosed. Certain embodiments of the invention relate generally to ion beam sources adapted to direct ion beams toward a surface of a substrate at an oblique angle of incidence relative to the surface. Certain embodiments of the invention are adapted to direct two ion beam portions toward a substrate surface, the ion beam portions having substantially equal throw distances. Preferred embodiments of the invention may be useful in etching applications, where the angle of incidence and throw distance of two ion beam portions are well suited for etching the surface of a substrate.
摘要翻译：公开了一种用于将离子束朝向衬底的表面引导的方法和装置。本发明的某些实施例一般涉及适于将离子束以相对于表面的入射角倾斜地朝向衬底表面的离子束源。本发明的某些实施例适于将两个离子束部分引向衬底表面，离子束部分具有基本相等的投射距离。本发明的优选实施例可用于蚀刻应用，其中两个离子束部分的入射角和投射距离非常适合蚀刻衬底的表面。

3. 发明申请

WO2015085283A8 DURABLE ANTI-REFLECTIVE COATED SUBSTRATES FOR USE IN ELECTRONIC-DEVICE DISPLAYS AND OTHER RELATED TECHNOLOGY 审中-公开
标题翻译：用于电子设备显示器和其他相关技术的耐用抗反射涂层基板
公开(公告)号：WO2015085283A8
公开(公告)日：2015-09-03
申请号：PCT/US2014068966
申请日：2014-12-06
申请人： GEN PLASMA INC , NGO PHONG , MADOCKS JOHN
发明人： NGO PHONG , MADOCKS JOHN
IPC分类号： B05D5/06 , B05D5/00
CPC分类号： G02B1/115
摘要： A coated substrate in accordance with a particular embodiment includes a base substrate and an anti-reflective coating having at least six chemically deposited layers on the base substrate. At least a 15 cm2 region of the anti-reflective coating is continuous has an optical thickness variation of not more than 3% over a maximum dimension of the region. The anti-reflective coating, at the region, has an average reflectance of not more than 1% for normal incident visible light, an average nanoindentation hardness of at least 9 GPa, and a reflectance color at incident angles within a range from -45° to 45° having both a* and b* in CIELAB color space within a range from -2.0 to 2.0. The layers include S13N4 high-refractive-index layers interspersed with S1O2 low-refractive-index layers. The coated substrate overlies display circuitry within a housing of an electronic device, such as a mobile phone.
摘要翻译：根据特定实施例的涂覆的基底包括基底基底和在基底基底上具有至少六个化学沉积层的抗反射涂层。抗反射涂层的至少15cm 2区域是连续的，在该区域的最大尺寸上具有不超过3％的光学厚度变化。在该区域的抗反射涂层对于正常入射的可见光的平均反射率为不大于1％，平均纳米压痕硬度为至少9GPa，入射角的反射率颜色为-45° 在CIELAB颜色空间中的a *和b *在-2.0至2.0的范围内的45°。这些层包括散布有S1O 2低折射率层的S13N4高折射率层。涂覆的基底覆盖在诸如移动电话的电子设备的壳体内的显示电路。

4. 发明申请

WO2010063027A3 BIPOLAR RECTIFIER POWER SUPPLY 审中-公开
标题翻译：双极整流器电源
公开(公告)号：WO2010063027A3
公开(公告)日：2010-08-26
申请号：PCT/US2009066108
申请日：2009-11-30
申请人： GEN PLASMA INC , MADOCKS JOHN , CAMUS CURTIS CHARLES , MARCUS PATRICK
发明人： MADOCKS JOHN , CAMUS CURTIS CHARLES , MARCUS PATRICK
IPC分类号： H02M7/04 , H02M7/48
CPC分类号： H02M5/297
摘要： A process for powering an electrical load includes applying a rectified alternating current waveform across the load for a first time period with only a single power supply for at least two half cycles. At least one half cycle of an alternating current waveform of opposite polarity are then applied relative to the rectified alternating current waveform across the load for a second time period. Rectified alternating current waveform is then again applied across the load for at least two half cycles for a third time period to power the electrical load. The rectified alternating current waveform can be applied a direct current offset. A power supply is provided for provided power across the load according to this process.
摘要翻译：用于为电负载供电的过程包括在仅有单个电源的第一时间段内在整个负载上施加整流的交流电波形至少两个半周期。然后在第二时间段内相对于整流负载上的经整流的交流电波形施加相反极性的交流电波形的至少一个半周期。然后在整个负载上再次施加整流交流电波形至少两个半周期第三时间周期以为电力负载供电。整流的交流电流波形可以施加直流偏移。根据这个过程提供电源以提供跨过负载的电力。

5. 发明申请

WO2011146673A3 HIGH TARGET UTILIZATION MOVING MAGNET PLANAR MAGNETRON SCANNING METHOD 审中-公开
标题翻译：高目标应用移动磁铁平面磁控扫描方法
公开(公告)号：WO2011146673A3
公开(公告)日：2012-04-05
申请号：PCT/US2011037075
申请日：2011-05-19
申请人： GEN PLASMA INC , NGO PHONG
发明人： NGO PHONG
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/3407 , H01J37/3405 , H01J37/3455
摘要： A method for operating a moving magnet magnetron is provided enhanced target utilization. A magnet pack is moved in a first 2-D motion profile with a variable velocity. The magnet pack is then translated in a second 2-D motion profile that varies relative to the first profile. This process moving and translating is repeated to provide enhanced target utilization. These varied movement and translation profiles preclude the formation of a diamond-shaped erosion area common to the prior art. Representative to such profiles are intersecting sigmoidal curves. The resultant target is characterized by a metal from that has better target utilization as the wear pattern precludes the diamond shaped erosion area common to the prior art and instead has a multiple erosion peaks.
摘要翻译：提供了一种用于操作移动磁体磁控管的方法，其增强了目标利用率。磁体包以可变速度在第一个2-D运动轮廓中移动。磁体包然后以相对于第一轮廓变化的第二2-D运动轮廓平移。重复此过程移动和翻译以提高目标利用率。这些不同的运动和平移轮廓排除了现有技术共同的钻石形侵蚀区域的形成。这种轮廓的代表是相交的S形曲线。所得目标的特征在于具有更好的目标利用率的金属，因为磨损图案排除了现有技术共有的菱形侵蚀区域，而是具有多次侵蚀峰值。

6. 发明申请

WO2011056581A3 ROTARY MAGNETRON MAGNET BAR AND APPARATUS CONTAINING THE SAME FOR HIGH TARGET UTILIZATION 审中-公开
标题翻译：旋转MAGNETRON磁条和包含相同目标的设备用于高目标使用
公开(公告)号：WO2011056581A3
公开(公告)日：2011-09-09
申请号：PCT/US2010054111
申请日：2010-10-26
申请人： GEN PLASMA INC , MADOCKS JOHN , MORSE PATRICK LAWRENCE
发明人： MADOCKS JOHN , MORSE PATRICK LAWRENCE
IPC分类号： C23C14/35 , C23C14/14 , C23C14/34
CPC分类号： C23C14/54 , C23C14/3407 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3452 , H01J37/3482 , H01J2237/24585 , H01J2237/332
摘要： An apparatus for coating a substrate is provided that includes a racetrack- shaped plasma source having two straight portions and at least one terminal turnaround portion connecting said straight portions. A tubular target formed of a target material that forms a component of the coating has an end. The target is in proximity to the plasma source for sputtering of the target material. The target is secured to a tubular backing cathode, with both being rotatable about a central axis. A set of magnets are arranged inside the cathode to move an erosion zone aligned with the terminal turnaround toward the end of the target as the target is utilized to deposit the coating on the substrate. Target utilization of up to 87 weight percent the initial target weight is achieved.
摘要翻译：提供了一种用于涂覆基底的装置，其包括具有两个直线部分的跑道形等离子体源和连接所述直线部分的至少一个终端周转部分。由形成涂层组分的目标材料形成的管状目标具有一端。目标在等离子体源附近用于目标材料的溅射。目标被固定到管状背衬阴极，两者都可围绕中心轴线旋转。一组磁体布置在阴极内部，以便当靶被用于将涂层沉积在基底上时，将与端子周转的侵蚀区域朝向靶的端部移动。目标利用率达到初始目标重量的87％（重量）。

7. 发明申请

WO2011029096A3 PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS 审中-公开
标题翻译：等离子体增强化学气相沉积设备
公开(公告)号：WO2011029096A3
公开(公告)日：2011-05-05
申请号：PCT/US2010047994
申请日：2010-09-07
申请人： GEN PLASMA INC , MADOCKS JOHN
发明人： MADOCKS JOHN
IPC分类号： C23C16/50 , C23C16/455 , C23C16/458
CPC分类号： C23C16/448 , C23C16/45514 , C23C16/50 , H01J37/3408 , H01J37/3485
摘要： PECVD apparatus for depositing material onto a moving substrate is provided comprising a process chamber, a precursor gas inlet to the process chamber, a pumped outlet, and a plasma source disposed within the process chamber. The plasma source produces one or more negative glow regions and one or more positive columns. At least one positive column is disposed toward the substrate. The plasma source and precursor gas inlet are disposed relative to each other and the substrate such that the precursor gas is injected into the positive column adjacent the substrate. Apparatus is provided to channel the precursor gas into the positive column away from the negative glow region.
摘要翻译：提供用于将材料沉积到移动基板上的PECVD设备，其包括处理室，处理室的前体气体入口，泵送出口和布置在处理室内的等离子体源。等离子体源产生一个或多个负辉光区域和一个或多个正柱。至少一个正极柱朝向基板设置。等离子体源和前体气体入口相对于彼此和衬底布置，使得前体气体被注入到邻近衬底的正柱中。提供装置以将前体气体引导到阳极柱中远离负辉光区。

8. 发明申请

WO2012109523A3 DEPOSITION OF THIN FILMS ON ENERGY SENSITIVE SURFACES 审中-公开
标题翻译：沉积在能量敏感表面上的薄膜
公开(公告)号：WO2012109523A3
公开(公告)日：2012-11-08
申请号：PCT/US2012024618
申请日：2012-02-10
申请人： GEN PLASMA INC , MADDOCKS JOHN , GEORGE MARK A , SEAMAN WALTER
发明人： MADDOCKS JOHN , GEORGE MARK A , SEAMAN WALTER
IPC分类号： C23C16/44 , C23C16/06 , C23C16/50
CPC分类号： C23C16/50 , C23C16/02 , C23C16/18 , C23C16/401 , C23C16/403 , C23C16/45563 , C23C16/509 , C23C16/54
摘要： A process for plasma deposition of a coating is provided that includes exposure of a surface of a substrate to a source of adsorbate molecules to form a protective layer on the surface. The protective layer is then exposed in-line to a plasma volume to react the protective film to form the coating. This process occurs without an intermediate evacuation to remove the adsorbate molecules prior to contact with the plasma volume. As a result, kinetic ion impact damage to the surface is limited while efficient operation of the plasma deposition system continues.
摘要翻译：提供了一种用于等离子体沉积涂层的方法，其包括将基底表面暴露于被吸附物质分子源以在表面上形成保护层。然后将保护层在线暴露于等离子体体积以使保护膜反应以形成涂层。在与等离子体体积接触之前，没有中间抽真空去除被吸附物质分子。结果，对等离子体沉积系统的有效操作继续进行，限制了对表面的动力学离子冲击损伤。

9. 发明申请

WO2011017314A3 CLOSED DRIFT ION SOURCE WITH SYMMETRIC MAGNETIC FIELD 审中-公开
标题翻译：具有对称磁场的闭式漂移离子源
公开(公告)号：WO2011017314A3
公开(公告)日：2011-06-09
申请号：PCT/US2010044235
申请日：2010-08-03
申请人： GEN PLASMA INC , MADOCKS JOHN
发明人： MADOCKS JOHN
IPC分类号： H01J37/08 , H05H1/02
CPC分类号： H01J37/08 , H01J27/143 , H01J37/30 , H01J2237/061
摘要： A closed drift ion source is provided comprising a single magnetic source, a first pole and a second pole. The ends of the first and second poles are separated by a gap. The magnetic source is disposed proximate to one of the first pole and second pole. A first magnetic path is provided between one magnetic pole of the single magnetic source and the end of the first pole. A second magnetic path is provided between the other magnetic pole of the single magnetic source and the end of the second pole. The first and second magnetic paths are selectively constructed to produce a symmetrical magnetic field in the gap.
摘要翻译：提供闭合漂移离子源，其包括单个磁源，第一极和第二极。第一和第二极的端部被间隙隔开。磁源靠近第一极和第二极中的一个设置。第一磁路设置在单个磁源的一个磁极和第一极的端部之间。第二磁路设置在单个磁源的另一个磁极和第二极的末端之间。第一和第二磁路被选择性地构造成在间隙中产生对称的磁场。

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