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1. 发明申请

WO2011146673A3 HIGH TARGET UTILIZATION MOVING MAGNET PLANAR MAGNETRON SCANNING METHOD 审中-公开
标题翻译：高目标应用移动磁铁平面磁控扫描方法
公开(公告)号：WO2011146673A3
公开(公告)日：2012-04-05
申请号：PCT/US2011037075
申请日：2011-05-19
申请人： GEN PLASMA INC , NGO PHONG
发明人： NGO PHONG
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/3407 , H01J37/3405 , H01J37/3455
摘要： A method for operating a moving magnet magnetron is provided enhanced target utilization. A magnet pack is moved in a first 2-D motion profile with a variable velocity. The magnet pack is then translated in a second 2-D motion profile that varies relative to the first profile. This process moving and translating is repeated to provide enhanced target utilization. These varied movement and translation profiles preclude the formation of a diamond-shaped erosion area common to the prior art. Representative to such profiles are intersecting sigmoidal curves. The resultant target is characterized by a metal from that has better target utilization as the wear pattern precludes the diamond shaped erosion area common to the prior art and instead has a multiple erosion peaks.
摘要翻译：提供了一种用于操作移动磁体磁控管的方法，其增强了目标利用率。磁体包以可变速度在第一个2-D运动轮廓中移动。磁体包然后以相对于第一轮廓变化的第二2-D运动轮廓平移。重复此过程移动和翻译以提高目标利用率。这些不同的运动和平移轮廓排除了现有技术共同的钻石形侵蚀区域的形成。这种轮廓的代表是相交的S形曲线。所得目标的特征在于具有更好的目标利用率的金属，因为磨损图案排除了现有技术共有的菱形侵蚀区域，而是具有多次侵蚀峰值。

2. 发明申请

WO2015085283A8 DURABLE ANTI-REFLECTIVE COATED SUBSTRATES FOR USE IN ELECTRONIC-DEVICE DISPLAYS AND OTHER RELATED TECHNOLOGY 审中-公开
标题翻译：用于电子设备显示器和其他相关技术的耐用抗反射涂层基板
公开(公告)号：WO2015085283A8
公开(公告)日：2015-09-03
申请号：PCT/US2014068966
申请日：2014-12-06
申请人： GEN PLASMA INC , NGO PHONG , MADOCKS JOHN
发明人： NGO PHONG , MADOCKS JOHN
IPC分类号： B05D5/06 , B05D5/00
CPC分类号： G02B1/115
摘要： A coated substrate in accordance with a particular embodiment includes a base substrate and an anti-reflective coating having at least six chemically deposited layers on the base substrate. At least a 15 cm2 region of the anti-reflective coating is continuous has an optical thickness variation of not more than 3% over a maximum dimension of the region. The anti-reflective coating, at the region, has an average reflectance of not more than 1% for normal incident visible light, an average nanoindentation hardness of at least 9 GPa, and a reflectance color at incident angles within a range from -45° to 45° having both a* and b* in CIELAB color space within a range from -2.0 to 2.0. The layers include S13N4 high-refractive-index layers interspersed with S1O2 low-refractive-index layers. The coated substrate overlies display circuitry within a housing of an electronic device, such as a mobile phone.
摘要翻译：根据特定实施例的涂覆的基底包括基底基底和在基底基底上具有至少六个化学沉积层的抗反射涂层。抗反射涂层的至少15cm 2区域是连续的，在该区域的最大尺寸上具有不超过3％的光学厚度变化。在该区域的抗反射涂层对于正常入射的可见光的平均反射率为不大于1％，平均纳米压痕硬度为至少9GPa，入射角的反射率颜色为-45° 在CIELAB颜色空间中的a *和b *在-2.0至2.0的范围内的45°。这些层包括散布有S1O 2低折射率层的S13N4高折射率层。涂覆的基底覆盖在诸如移动电话的电子设备的壳体内的显示电路。

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