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1. 发明申请

WO0163359A3 THIN LAYER IMAGING PROCESS FOR MICROLITHOGRAPHY USING RADIATION AT STRONGLY ATTENUATED WAVELENGTHS 审中-公开
标题翻译：使用强烈衰减波长的辐射微结构的薄层成像方法
公开(公告)号：WO0163359A3
公开(公告)日：2002-01-10
申请号：PCT/US0027594
申请日：2000-10-05
申请人： EUV LLC , WHEELER DAVID R
发明人： WHEELER DAVID R
IPC分类号： G03F7/004 , G03F7/039 , G03F7/09 , G03F7/16
CPC分类号： G03F7/09 , G03F7/0045 , G03F7/039 , G03F7/168
摘要： A method for patterning of resist surfaces which is particularly advantageous for systems having low photon flux and highly energetic, strongly attenuated radiation. A thin imaging layer is created with uniform silicon distribution in a bilayer format. An image is formed by exposing selected regions of the silylated imaging layer to radiation. The radiation incident upon the silyliated resist material results in acid generation which either catalyzes cleavage of Si-O bonds to produce moieties that are volatile enough to be driven off in a post exposure bake step or produces a resist material where the exposed portions of the imaging layer are soluble in a basic solution, thereby desilylating the exposed areas of the imaging layer. The process is self limiting due to the limited quantity of silyl groups within each region of the pattern. Following the post exposure bake step, an etching step, generally an oxygen plasma etch, removes the resist material from the de-silylated areas of the imaging layer.
摘要翻译：用于抗蚀剂表面图案化的方法，其特别有利于具有低光子通量和高能量，强衰减辐射的系统。以双层格式制造具有均匀硅分布的薄成像层。通过将甲硅烷基化成像层的选定区域暴露于辐射而形成图像。入射到甲硅烷基抗蚀剂材料上的辐射导致酸产生，其催化Si-O键的裂解以产生足够挥发的部分，以在后曝光烘烤步骤中被驱除，或产生抗蚀剂材料，其中成像的暴露部分层可溶于碱性溶液，从而对成像层的曝光区域进行去溶剂化。由于图案的每个区域内甲硅烷基的量有限，因此该过程是自限制的。在曝光后烘烤步骤之后，蚀刻步骤（通常为氧等离子体蚀刻）从成像层的去甲硅烷基化区域去除抗蚀剂材料。

2. 发明申请

WO03026363A8 DISCHARGE SOURCE WITH GAS CURTAIN FOR PROTECTING OPTICS FROM PARTICLES 审中-公开
标题翻译：放射源用于保护颗粒中的光学玻璃
公开(公告)号：WO03026363A8
公开(公告)日：2004-02-19
申请号：PCT/US0224092
申请日：2002-07-29
申请人： EUV LLC , FORNACIARI NEAL R , KANOUFF MICHAEL P
发明人： FORNACIARI NEAL R , KANOUFF MICHAEL P
IPC分类号： G21K1/00 , G03F7/20 , G21K5/08 , H05G2/00 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70908 , H05G2/005
摘要： A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography. Preferably, the gas curtain flows at supersonic speeds.
摘要翻译：气幕装置用于偏转由诸如放电等离子体源的极紫外和软X射线放射源产生的碎片。气幕装置在辐射路径上投射气流以将碎屑颗粒偏转成与辐射路径不同的方向。可以使用气幕来防止在光刻中使用的光学器件上的碎片积聚。优选地，气幕以超音速流动。

3. 发明申请

WO2005073813A3 CONDENSER OPTIC WITH SACRIFICIAL REFLECTIVE SURFACE 审中-公开
标题翻译：冷凝器光学与反射表面
公开(公告)号：WO2005073813A3
公开(公告)日：2006-04-06
申请号：PCT/US2005000839
申请日：2005-01-12
申请人： EUV LLC , TICHENOR DANIEL A , KUBIAK GLENN D , LEE SANG HUN
发明人： TICHENOR DANIEL A , KUBIAK GLENN D , LEE SANG HUN
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G03F7/70175 , Y10S359/90
摘要： Employing collector optics that have a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics are normally subject to erosion by debris from laser plasma source of radiation. The presence of an upper sacrificial reflective surface over the underlying reflective surface effectively increases the life of the optics while relaxing the constraints on the radiation source. Spatial and temporally varying reflectivity that results from the use of the sacrificial reflective surface can be accommodated by proper condenser design.
摘要翻译：使用具有牺牲反射表面的收集器光学器件可以显着延长收集器光学器件的使用寿命以及其中结合有收集器光学元件的冷凝器的整体性能。收集器光学器件通常受到来自激光等离子体辐射源的碎片的侵蚀。在下面的反射表面上存在上牺牲反射表面有效地增加了光学元件的寿命，同时放松了对辐射源的约束。通过使用牺牲反射表面产生的空间和时间变化的反射率可以通过适当的冷凝器设计来适应。

4. 发明申请

WO2005073813A2 CONDENSER OPTIC WITH SACRIFICIAL REFLECTIVE SURFACE 审中-公开
标题翻译：冷凝器光学与反射表面
公开(公告)号：WO2005073813A2
公开(公告)日：2005-08-11
申请号：PCT/US2005/000839
申请日：2005-01-12
申请人： EUV LLC , TICHENOR, Daniel, A. , KUBIAK, Glenn, D. , LEE, Sang, Hun
发明人： TICHENOR, Daniel, A. , KUBIAK, Glenn, D. , LEE, Sang, Hun
IPC分类号： G03F7/20
CPC分类号： G03F7/70958 , G03F7/70175 , Y10S359/90
摘要： Employing collector optics that have a sacrificial reflective surface can significantly prolong the useful life of the collector optics and the overall performance of the condenser in which the collector optics are incorporated. The collector optics are normally subject to erosion by debris from laser plasma source of radiation. The presence of an upper sacrificial reflective surface over the underlying reflective surface effectively increases the life of the optics while relaxing the constraints on the radiation source. Spatial and temporally varying reflectivity that results from the use of the sacrificial reflective surface can be accommodated by proper condenser design.
摘要翻译：使用具有牺牲反射表面的收集器光学器件可以显着延长收集器光学器件的使用寿命以及其中结合有收集器光学元件的冷凝器的整体性能。收集器光学器件通常受到来自激光等离子体辐射源的碎片的侵蚀。在下面的反射表面上存在上牺牲反射表面有效地增加了光学元件的寿命，同时放松了对辐射源的约束。通过使用牺牲反射表面产生的空间和时间变化的反射率可以通过适当的冷凝器设计来适应。

5. 发明申请

WO02054115A3 A SELF-CLEANING OPTIC FOR EXTREME ULTRAVIOLET LITHOGRAPHY 审中-公开
标题翻译：一种自动清除光学超极紫外光刻技术
公开(公告)号：WO02054115A3
公开(公告)日：2003-09-25
申请号：PCT/US0144707
申请日：2001-12-12
申请人： EUV LLC , KLEBANOFF LEONARD E , STULEN RICHARD H
发明人： KLEBANOFF LEONARD E , STULEN RICHARD H
IPC分类号： G21K5/00 , B08B17/02 , G02B5/08 , G02B5/26 , G02B5/28 , G03F1/24 , G03F7/20 , G21K1/06 , G21K5/02 , H01L21/027 , G02B1/10
CPC分类号： B82Y10/00 , B08B17/02 , B82Y40/00 , G03F1/24 , G03F7/708 , G21K1/062 , G21K2201/067
摘要： A multilayer reflective optic or mirror for lithographic applications, and particularly extreme ultraviolet (EUV) lithography, having a surface or "capping" layer which in combination with incident radiation and gaseous molecular species such as O2, H2, H2O provides for continuous cleaning of carbon deposits from the optic surface. The metal capping layer is required to be oxidation resistant and capable of transmitting at least 90% of incident EUV radiation. Materials for the capping layer include Ru, Rh, Pd, Ir, Pt and Au and combinations thereof.
摘要翻译：用于光刻应用的多层反射光学器件或反射镜，特别是具有表面或“封盖”层的特殊的极紫外（EUV）光刻层，其结合入射辐射和气态分子物质如O 2，H 2，H 2 O提供连续清洁碳从光学表面沉积。金属覆盖层需要耐氧化并能够传输至少90％的入射EUV辐射。覆盖层的材料包括Ru，Rh，Pd，Ir，Pt和Au及其组合。

6. 发明申请

WO0212928A2 DIFFRACTION SPECTRAL FILTER FOR USE IN EXTREME-UV LITHOGRAPHY CONDENSER 审中-公开
标题翻译：用于超紫外光刻冷凝器的衍射光谱过滤器
公开(公告)号：WO0212928A2
公开(公告)日：2002-02-14
申请号：PCT/US0123103
申请日：2001-07-20
申请人： EUV LLC , SWEATT WILLIAM C , TICHENOR DANIEL A , BERNARDEZ LUIS J
发明人： SWEATT WILLIAM C , TICHENOR DANIEL A , BERNARDEZ LUIS J
IPC分类号： G02B5/18 , G02B27/30 , G03F7/20 , G21K1/06 , H01L21/027 , G02B5/20
CPC分类号： G03F7/70158 , G02B27/30 , G03F7/70066 , G03F7/70191 , G03F7/702 , G03F7/70575 , G03F7/70875 , G21K1/06 , G21K1/10 , G21K2201/06 , G21K2201/064 , G21K2201/067
摘要： A condenser system for generating a beam of radiation includes a source of radiation light that generates a continuous spectrum of radiation light; a condenser comprising one or more first optical elements for collecting radiation from said source of radiation light and for generating a beam of radiation; and a diffractive spectral filter for separating first radiation light having a particular wavelength from the continuous spectrum of radiation light. Cooling devices can be employed to remove heat generated. The condenser system can be used with a ringfield camera in projection lithography.
摘要翻译：用于产生辐射束的聚光器系统包括产生连续的辐射光谱的辐射光源; 冷凝器，包括用于收集来自所述辐射光源的辐射并用于产生辐射束的一个或多个第一光学元件; 以及用于将具有特定波长的第一辐射光与辐射光的连续光谱分离的衍射光谱滤波器。可以使用冷却装置来除去产生的热量。冷凝器系统可与投影光刻中的环形相机一起使用。

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