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1. 发明申请

WO2011115238A1 CANNED ELECTRIC ROTATING MACHINE 审中-公开
标题翻译： CANNED电动旋转机
公开(公告)号：WO2011115238A1
公开(公告)日：2011-09-22
申请号：PCT/JP2011/056512
申请日：2011-03-14
申请人： EBARA CORPORATION , KATO, Hiroyuki
发明人： KATO, Hiroyuki
IPC分类号： H02K5/128
CPC分类号： H02K5/128
摘要： A canned electric rotating machine is suitable for use in an electric motor for driving a seal-less pump (non-seal pump) having a rotor chamber filled with a high-pressure pump working liquid. The canned electric rotating machine includes a cylindrical frame (11), a stator (17) having a stator core (17a) and a stator winding (17b) and housed in the cylindrical frame (11), a can (21) configured to enclose the stator (17), and a rotor (20) rotatably provided in a space surrounded by the can (21). The can (21) comprises a first layer (21a) composed of resin and a second layer (21b) composed of a thin metal plate, and a bellows (21c) or a diaphragm is provided at an end portion of the second layer (21b).
摘要翻译：一种罐装旋转电机适用于电动机驱动无密封泵（非密封泵），其具有填充有高压泵工作液体的转子室。所述罐式旋转电机包括圆柱形框架（11），具有定子芯（17a）的定子（17）和定子绕组（17b）并容纳在所述圆柱形框架（11）中;罐（21）定子（17）和可旋转地设置在由罐（21）包围的空间中的转子（20）。罐（21）包括由树脂构成的第一层（21a）和由薄金属板构成的第二层（21b），并且在第二层（21b）的端部设置有波纹管（21c）或隔膜）。

2. 发明申请

WO2010021297A1 METHOD AND APPARATUS FOR POLISHING A SUBSTRATE 审中-公开
标题翻译：抛光衬底的方法和装置
公开(公告)号：WO2010021297A1
公开(公告)日：2010-02-25
申请号：PCT/JP2009/064319
申请日：2009-08-07
申请人： EBARA CORPORATION , FUKUSHIMA, Makoto , TOGAWA, Tetsuji , SAITO, Shingo , INOUE, Tomoshi
发明人： FUKUSHIMA, Makoto , TOGAWA, Tetsuji , SAITO, Shingo , INOUE, Tomoshi
IPC分类号： B24B37/04 , H01L21/304
CPC分类号： B24B37/20 , B24B37/005 , B24B37/042 , B24B37/32 , B24B49/10 , B24B49/12
摘要： A polishing method is used for polishing a substrate such as a semiconductor wafer to a flat mirror finish. A method of polishing a substrate by a polishing apparatus includes a polishing table (100) having a polishing surface, a top ring (1) for holding a substrate and pressing the substrate against the polishing surface, and a vertically movable mechanism (24) for moving the top ring (1) in a vertical direction. The top ring (1) is moved to a first height before the substrate is pressed against the polishing surface, and then the top ring (1) is moved to a second height after the substrate is pressed against the polishing surface.
摘要翻译：抛光方法用于将半导体晶片等基板研磨成平面镜面。通过研磨装置研磨基板的方法包括具有研磨面的研磨台（100），用于保持基板并将基板压靠在研磨面上的顶环（1），以及可升降机构沿垂直方向移动顶环（1）。在将衬底压靠在抛光表面之前，将顶环（1）移动到第一高度，然后在衬底被压靠在抛光表面上之后将顶环（1）移动到第二高度。

3. 发明申请

WO2006059749A1 GAS TURBINE APPARATUS 审中-公开
标题翻译：气体涡轮装置
公开(公告)号：WO2006059749A1
公开(公告)日：2006-06-08
申请号：PCT/JP2005/022245
申请日：2005-11-29
申请人： EBARA CORPORATION , KATAOKA, Tadashi , HAMANO, Nobuhiko
发明人： KATAOKA, Tadashi , HAMANO, Nobuhiko
IPC分类号： F02C7/08 , F02C3/20 , F02C7/22 , F02C9/40 , F02C9/26
CPC分类号： F02C9/40 , F02C7/08 , F02C7/22 , F02C9/263 , F05D2220/64 , F05D2220/766 , F05D2220/768 , F05D2260/85 , F05D2270/303
摘要： A gas turbine apparatus (2) has an air compressor (20) for compressing air, a combustor (21) for combusting the compressed air, a turbine (22) rotatable by a gas discharged from the combustor (21), and a recuperator (23) for exchanging heat between the air supplied from the air compressor (20) and an exhaust gas discharged from the turbine (22). The gas turbine apparatus (2) includes a fuel supply system (24) having a first fuel supply device (50) for supplying a fuel (HG) to the combustor (21), a second fuel supply device (51) for supplying a gas (LG) having a small heating value to the combustor (21), and a switching device (56) operable to switch the first fuel supply device (50) and the second fuel supply device (51) based on a temperature of the air compressed by the air compressor (20) or the exhaust gas discharged from the turbine (22).
摘要翻译：燃气轮机装置（2）具有用于压缩空气的空气压缩机（20），用于燃烧压缩空气的燃烧器（21），可从燃烧器（21）排出的气体旋转的涡轮机（22），和换热器 23），用于在从空气压缩机（20）供应的空气与从涡轮机（22）排出的废气之间进行热交换。燃气轮机装置（2）包括具有用于向燃烧器（21）供给燃料（HG）的第一燃料供给装置（50）的燃料供给系统（24），供给燃料（LG）具有对燃烧器（21）的小的加热值;以及开关装置（56），其可操作以基于压缩的空气的温度来切换第一燃料供给装置（50）和第二燃料供给装置（51）通过空气压缩机（20）或从涡轮机（22）排出的排气。

4. 发明申请

WO2006041196A1 POLISHING APPARATUS AND POLISHING METHOD 审中-公开
标题翻译：抛光设备和抛光方法
公开(公告)号：WO2006041196A1
公开(公告)日：2006-04-20
申请号：PCT/JP2005/019165
申请日：2005-10-12
申请人： Kabushiki Kaisha Toshiba , EBARA CORPORATION , KUBOTA, Takeo , SHIGETA, Atsushi , TOYOTA, Gen , TAKAHASHI, Tamami , FUKUOKA, Daisaku , ITO, Kenya
发明人： KUBOTA, Takeo , SHIGETA, Atsushi , TOYOTA, Gen , TAKAHASHI, Tamami , FUKUOKA, Daisaku , ITO, Kenya
IPC分类号： H01L21/304 , B24B9/00 , B24B21/00
CPC分类号： H01L21/02021 , B24B9/065 , B24B21/002
摘要： A polishing apparatus has a polishing tape (21), a supply reel (22) for supplying the polishing tape (21) to a contact portion (30) at which the polishing tape (21) is brought into contact with a notch portion (11) of a substrate (10), and a take-up reel (23) for winding up the polishing tape (21) from the contact portion (30). The polishing apparatus also has a first guide portion (24) having a guide surface (241) for supplying the polishing tape (21) directly to the contact portion (30), and a second guide portion (25) having a guide surface for supplying the polishing tape (21) to the take-up reel (23). The guide surface (241) of the first guide portion (24) and/or the guide surface of the second guide portion (25) has a shape corresponding to a shape of the notch portion (11) of the substrate (10).
摘要翻译：抛光装置具有抛光带（21），用于将抛光带（21）供应到带有抛光带（21）的接触部分（30）的供应带盘（22）与基片（10）的切口部分（11）接触;以及卷取卷轴（23），用于从接触部分（30）卷绕抛光带（21）。该抛光装置还具有第一导向部分（24）和第二导向部分（25），该第一导向部分具有用于将抛光带（21）直接供应到接触部分（30）的导向表面（241）将研磨带（21）送到卷取卷轴（23）。第一引导部分（24）的引导表面（241）和/或第二引导部分（25）的引导表面具有与基板（10）的凹口部分（11）的形状相对应的形状。 / p>

5. 发明申请

WO2016117709A1 CENTRIFUGAL IMPELLER FOR FLUID-OPERATED PUMPS, AND METHOD FOR MANUFACTURING THE IMPELLER 审中-公开
标题翻译：用于流体动力泵的离心式叶轮及其制造方法
公开(公告)号：WO2016117709A1
公开(公告)日：2016-07-28
申请号：PCT/JP2016/051948
申请日：2016-01-18
申请人： EBARA CORPORATION
发明人： CIROLINI, Andrea , MAULE, Mauro , ARMIENTO, Marco
IPC分类号： F04D29/22 , F04D29/28
CPC分类号： F04D29/2227 , B29C65/08 , B29C65/7814 , B29C66/301 , B29C66/30223 , B29C66/54 , B29C66/73921 , B29L2031/08 , B29L2031/7496 , F04D29/026 , F05D2300/43
摘要： A centrifugal impeller, particularly for fluid-operated pumps, comprising a first disk- shaped body and a second disk-shaped body, which are coaxial and mutually opposite so as to form an interspace within which multiple radial vanes are arranged; the impeller is centrally provided with means for coupling to a transmission shaft. The impeller has a first impeller portion and a second impeller portion, which are mutually engaged; the first impeller portion comprises the first disk-shaped body and a part of the vanes, while the second impeller portion comprises the second disk-shaped body and the remaining part of said vanes. The present invention also relates to a method for manufacturing a centrifugal impeller, particularly for fluid-operated pumps.
摘要翻译：一种特别用于流体泵的离心式叶轮，包括第一盘状体和第二圆盘状体，该第一圆盘状体和第二圆盘状体同轴且相互相对，以形成多个径向叶片布置在其中的间隙; 叶轮中央设置有用于联接到传动轴的装置。叶轮具有相互接合的第一叶轮部分和第二叶轮部分; 第一叶轮部分包括第一盘状体和叶片的一部分，而第二叶轮部分包括第二盘形体和所述叶片的其余部分。本发明还涉及一种用于制造离心式叶轮的方法，特别是用于流体泵的泵。

6. 发明申请

WO2012046334A1 SYNERGETIC GARMENTS FOR MULTI-FUNCTIONAL AND MULTI-DIMENSIONAL USE 审中-公开
标题翻译：用于多功能和多维使用的协同服装
公开(公告)号：WO2012046334A1
公开(公告)日：2012-04-12
申请号：PCT/JP2010/067710
申请日：2010-10-04
申请人： GORDON, Gregory Stennatt
发明人： GORDON, Gregory Stennatt
IPC分类号： A41D1/00
CPC分类号： A41D1/00 , A41D15/00 , A41D2300/30 , A41D2300/324
摘要： The present invention relates to a synergetic garment for multi-functional and multi-dimensional use, and more particularly to the design, construction and wearing of upper and lower body garments that may accommodate multi-dimensional and/or multi-functional use on the human frame. A synergetic garment for multi-functional and multi-dimensional use, includes a fabric piece for a front body (1) and a fabric piece for a back body (2), the fabric piece for a front body (1) and the fabric piece for a back body (2) having the identical or similar geometric shape, the fabric piece for a front body (1) and the fabric piece for a back body (2) being partially joined with detachable devices (11) or seams to provide a plurality of openings on peripheries of the fabric pieces, and the plurality of openings being adjustable.
摘要翻译：本发明涉及用于多功能和多维度使用的协同服装，更具体地涉及上下身衣服的设计，构造和穿着，其可以适应人的多维和/或多功能使用帧。用于多功能和多维度使用的协同服装包括用于前身（1）的织物片和用于后身（2）的织物片，用于前身（1）的织物片和织物片对于具有相同或相似几何形状的后身（2），用于前身（1）的织物片和用于后身（2）的织物片部分地与可拆卸的装置（11）或接缝接合，以提供织物片的周边上的多个开口，并且多个开口是可调节的。

7. 发明申请

WO2011099603A1 CANNED ELECTRIC ROTATING MACHINE 审中-公开
标题翻译： CANNED电动旋转机
公开(公告)号：WO2011099603A1
公开(公告)日：2011-08-18
申请号：PCT/JP2011/053060
申请日：2011-02-08
申请人： EBARA CORPORATION , YOSHIDA, Kazutaka , KATAOKA, Tadashi , MATAKE, Kozo , IMAFUKU, Masaaki
发明人： YOSHIDA, Kazutaka , KATAOKA, Tadashi , MATAKE, Kozo , IMAFUKU, Masaaki
IPC分类号： H02K5/128 , H02K9/08
CPC分类号： H02K5/128
摘要： A canned electric rotating machine is used in an electric motor for driving a seal-less pump (non-seal pump) having a rotor chamber (15) filled with a high-pressure pump working liquid. The canned electric rotating machine includes a cylindrical frame (11), a stator (17) having a stator core (17a) and a stator winding (17b) and housed in the cylindrical frame, a can (21) configured to enclose the stator (17), and a rotor (20) rotatably provided in a space surrounded by the can (21). The can (21) is composed of a single layer of fiber-reinforced plastics comprising one resin of polyether ether ketone (PEEK), polyimide (PI), polyester amide imide, polyhydantoin, isocyanurate denatured polyester imide, polyamide-imide, polyester and epoxide, which is reinforced with carbon fiber or glass fiber or aramid fiber.
摘要翻译：一种用于驱动具有填充有高压泵工作液的转子室（15）的无密封泵（非密封泵）的电动机中的罐装旋转电机。罐式旋转电机包括：圆柱形框架（11），具有定子铁心（17a）和定子绕组（17b）的定子（17）和容纳在圆柱形框架中的壳体（21），其构造成围绕定子（ 17）和可旋转地设置在由罐（21）包围的空间中的转子（20）。罐（21）由单层纤维增强塑料构成，包括一种聚醚醚酮树脂（PEEK），聚酰亚胺（PI），聚酰胺酰亚胺，聚乙内酰脲，异氰脲酸酯变性聚酯酰亚胺，聚酰胺酰亚胺，聚酯和环氧化物，其用碳纤维或玻璃纤维或芳族聚酰胺纤维增强。

8. 发明申请

WO2009102047A1 POLISHING APPARATUS 审中-公开
标题翻译：抛光装置
公开(公告)号：WO2009102047A1
公开(公告)日：2009-08-20
申请号：PCT/JP2009/052456
申请日：2009-02-09
申请人： EBARA CORPORATION , FUKUSHIMA, Makoto , TOGAWA, Tetsuji , YASUDA, Hozumi , SAITO, Koji , NABEYA, Osamu , INOUE, Tomoshi
发明人： FUKUSHIMA, Makoto , TOGAWA, Tetsuji , YASUDA, Hozumi , SAITO, Koji , NABEYA, Osamu , INOUE, Tomoshi
IPC分类号： B24B37/04
CPC分类号： B24B37/30
摘要： A polishing apparatus is used for polishing a substrate such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a polishing table (100) having a polishing surface (101a), a top ring body (2) configured to hold and press a substrate against the polishing surface (101a), and a retainer ring (3) provided at an outer peripheral portion of the top ring body (2) and configured to press the polishing surface (101a). A fulcrum for receiving a lateral force applied from the substrate to the retainer ring (3) during polishing of the substrate is located above a central portion of the substrate.
摘要翻译：抛光装置用于将半导体晶片等基板研磨成平面镜面。抛光装置包括具有抛光面（101a）的抛光台（100），被配置为将基板保持并压靠在抛光表面（101a）上的顶环体（2），以及设置在抛光表面所述顶环体（2）的外周部分构造成按压所述抛光表面（101a）。用于在衬底抛光期间接收从衬底施加到保持环（3）的侧向力的支点位于衬底的中心部分的上方。

9. 发明申请

WO2007032519A1 POLISHING METHOD AND POLISHING APPARATUS, AND PROGRAM FOR CONTROLLING POLISHING APPARATUS 审中-公开
标题翻译：抛光方法和抛光装置，以及用于控制抛光装置的程序
公开(公告)号：WO2007032519A1
公开(公告)日：2007-03-22
申请号：PCT/JP2006/318461
申请日：2006-09-12
申请人： EBARA CORPORATION , TORIKOSHI, Tsuneo , YAMAGUCHI, Kuniaki
发明人： TORIKOSHI, Tsuneo , YAMAGUCHI, Kuniaki
IPC分类号： B24B37/00 , B24B53/00 , H01L21/304
CPC分类号： B24B37/042 , B24B37/345 , B24B49/00
摘要： A polishing method can bring a polishing surface to the optimum condition for polishing, without using a dummy wafer or the like, before resuming polishing, thereby eliminating the cost of dummy wafer or the like. The polishing method comprises: carrying out a stand-by operation during a polishing-resting time period; carrying out a preparatory process to polishing, after completion of the stand-by operation, by dressing a polishing surface while supplying a polishing liquid to the polishing surface; and starting polishing of a workpiece after completion of the preparatory process to polishing. Determination as to whether to carry out the preparatory process to polishing after completion of the stand-by operation may be made based on the total operating time of the stand-by operation or the total effective number of the stand-by operations.
摘要翻译：抛光方法可以在恢复抛光之前将抛光表面带到抛光的最佳状态，而不使用虚拟晶片等，从而消除虚拟晶片等的成本。抛光方法包括：在抛光休息期间进行待机操作; 在完成待机操作之后，通过修整抛光表面同时向抛光表面提供抛光液体进行抛光的准备过程; 并且在完成准备处理之后开始对工件进行抛光。关于在完成备用操作之后是否进行抛光的准备过程的确定可以基于待机操作的总操作时间或备用操作的总有效数量进行。

10. 发明申请

WO2006112530A1 SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：基板加工设备
公开(公告)号：WO2006112530A1
公开(公告)日：2006-10-26
申请号：PCT/JP2006/308490
申请日：2006-04-18
申请人： EBARA CORPORATION , TAKAHASHI, Tamami , SHIRAKASHI, Mitsuhiko , ITO, Kenya , INOUE, Kazuyuki , YAMAGUCHI, Kenji , SEKI, Masaya
发明人： TAKAHASHI, Tamami , SHIRAKASHI, Mitsuhiko , ITO, Kenya , INOUE, Kazuyuki , YAMAGUCHI, Kenji , SEKI, Masaya
IPC分类号： H01L21/304 , B24B9/00
CPC分类号： H01L21/67219 , B24B9/065 , B24B49/04 , H01L21/302 , H01L21/461 , H01L21/67253 , H01L21/68707 , H01L21/68728
摘要： A substrate processing apparatus (1) includes first and second polishing units (70A, 70B) for polishing a peripheral portion of a substrate (W), a primary cleaning unit (100) for cleaning the substrate (W), a secondary cleaning and drying unit (110) for drying the substrate (W) cleaned in the primary cleaning unit (100), and a measurement unit (30) for measuring the peripheral portion of the substrate (W). The measurement unit (30) includes a mechanism for measurement required for polishing in the first and second polishing units (70A and 70B), such as a diameter measurement mechanism, a cross-sectional shape measurement mechanism, or a surface condition measurement mechanism.
摘要翻译：基板处理装置（1）具备：第一研磨单元（70A，70B），用于研磨基板周边部分;第一清洗单元（100），用于清洗基板（W）;二次清洗和干燥用于干燥在主清洗单元（100）中清洁的基板（W）的单元（110），以及用于测量基板（W）的周边部分的测量单元（30）。测量单元（30）包括用于在第一和第二研磨单元（70A和70B）中抛光所需的测量机构，例如直径测量机构，横截面形状测量机构或表面状态测量机构。

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