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    • 5. 发明申请
    • HIGH THROUGHPUT CLEANER CHAMBER
    • 高通量清洁器
    • WO2009120360A2
    • 2009-10-01
    • PCT/US2009/001900
    • 2009-03-27
    • LAM RESEARCH CORPORATIONLENZ, Eric, H.
    • LENZ, Eric, H.
    • H01L21/677H01L21/302
    • H01L21/68764H01L21/6719H01L21/68771
    • A wafer cleaning chamber comprising a plurality of carrier arms each having concentrically-mounted midpoints between opposing ends of the carrier arms with a wafer carrier mounted on each of the opposing ends of the carrier arms. A hub includes a plurality of concentrically mounted drives where each of the plurality of drives is coupled near the midpoint of a respective one of the plurality of carrier arms. Each of the plurality of drives is configured to be controlled independently of the remaining plurality of concentrically-mounted drives. A respective motor is coupled to each of the concentrically mounted drives and is configured to move the coupled carrier arm in a rotary manner under control of a program containing a velocity profile. At least one cleaning chemical-supply head is positioned proximate to a path of the wafer carriers.
    • 一种晶片清洁室,包括多个承载臂,每个承载臂在承载臂的相对端之间具有同心安装的中点,其中晶片载体安装在承载臂的每个相对端上。 集线器包括多个同心安装的驱动器,其中多个驱动器中的每一个驱动器在多个承载臂中的相应一个的臂的中点附近耦合。 多个驱动器中的每一个被配置为独立于剩余的多个同心安装的驱动器来控制。 相应的电动机联接到每个同心安装的驱动器,并且被配置为在包含速度曲线的程序的控制下以旋转方式移动耦合的行星架臂。 至少一个清洁化学品供应头位于晶片载体的路径附近。