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    • 84. 发明申请
    • STAIRSTEP INTERPOSERS WITH INTEGRATED SHIELDING FOR ELECTRONICS PACKAGES
    • STAIRSTEP INTERPOSERS集成屏蔽电子套件
    • WO2017160284A1
    • 2017-09-21
    • PCT/US2016/022549
    • 2016-03-16
    • INTEL CORPORATION
    • CHEAH, Bok EngLO, Hungying Louis
    • H01L25/065H01L23/60H01L23/48
    • Disclosed herein are stairstep interposers with integrated conductive shields, and related assemblies and techniques. In some embodiments, an interposer may include: an insulating material having a stairstep structure with a first step surface, a second step surface, and a bottom surface to face a package substrate, wherein a first thickness of the insulating material between the first step surface and the bottom surface is greater than a second thickness of the insulating material between the second step surface and the bottom surface; a conductive signal pathway extending from the first step surface to the bottom surface; and a conductive shield disposed within the insulating material to shield the conductive signal pathway.
    • 这里公开了具有集成导电屏蔽的阶梯式中介层以及相关的组件和技术。 在一些实施例中,插入件可以包括:具有阶梯结构的绝缘材料,该阶梯结构具有第一台阶表面,第二台阶表面以及面对封装基板的底表面,其中第一台阶表面 并且所述底表面大于所述第二台阶表面和所述底表面之间的所述绝缘材料的第二厚度; 从第一台阶表面延伸到底表面的导电信号路径; 以及设置在绝缘材料内以屏蔽导电信号路径的导电屏蔽。
    • 85. 发明申请
    • WAFER RETAINER RINGS FOR CHEMICAL MECHANICAL POLISHING
    • 用于化学机械抛光的晶片固定环
    • WO2017146720A1
    • 2017-08-31
    • PCT/US2016/019722
    • 2016-02-26
    • INTEL CORPORATION
    • TREGUB, Alexander
    • H01L21/304
    • B24B37/32B24B53/017
    • Disclosed herein are wafer retainer rings for chemical mechanical polishing (CMP) systems. In some embodiments, a wafer retainer ring may include a top surface; a bottom surface; an inner surface; an outer surface; and a plurality of openings extending from the inner surface to the outer surface, wherein individual openings of the plurality of openings are disposed between and spaced away from the top surface and the bottom surface. During use, the top surface may contact a polishing pad, and slurry may flow through the openings to help polish a wafer retained in the wafer retainer ring.
    • 这里公开了用于化学机械抛光(CMP)系统的晶片保持环。 在一些实施例中,晶片固定环可以包括顶面; 底面; 内表面; 外表面; 以及从所述内表面延伸到所述外表面的多个开口,其中所述多个开口中的各个开口设置在所述顶表面和所述底表面之间并且与所述顶表面和所述底表面间隔开。 在使用期间,顶面可以接触抛光垫,并且浆料可以流过开口以帮助抛光保留在晶片固定环中的晶片。