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51. 发明申请

WO2017044754A1 PLASMA MODULE WITH SLOTTED GROUND PLATE 审中-公开
标题翻译：带有接地板的等离子体模块
公开(公告)号：WO2017044754A1
公开(公告)日：2017-03-16
申请号：PCT/US2016/050956
申请日：2016-09-09
申请人： APPLIED MATERIALS, INC.
发明人： YUDOVSKY, Joseph , FORSTER, John C. , BERA, Kallol , KHANDELWAL, Somesh , SRIRAM, Mandyam , TANAKA, Keiichi , TAKESHITA, Kenji , SAKAMOTO, Nobuhiro , YANAGAWA, Takumi
IPC分类号： H01J37/32 , C23C16/44
CPC分类号： H01J37/32623 , C23C16/45536 , C23C16/45544 , C23C16/45551 , C23C16/4584 , H01J37/32082 , H01J37/3244 , H01J37/32651 , H01J37/32752
摘要： A plasma source assembly comprises a housing, a blocker plate in electrical communication with the housing, a blocker plate in electrical communication with the housing, the blocker plate having an inner peripheral edge, an outer peripheral edge, a first side and a second side defining a field, an elongate slot is within the field and extends through the blocker plate, the elongate slot having a length and a width, and an RF hot electrode within the housing, the RF hot electrode having a front face and a back face, an inner peripheral end and an outer peripheral end, the front face of the RF hot electrode spaced from the blocker plate to define a gap.
摘要翻译：等离子体源组件包括壳体，与壳体电连通的阻挡板，与壳体电连通的阻挡板，阻挡板具有内周边缘，外周缘，第一侧和第二侧，限定一个场，一个细长的槽在场内并且延伸穿过阻挡板，细长槽具有长度和宽度，以及RF壳体内的RF热电极，RF热电极具有正面和背面，内周端和外周端，RF热电极的前表面与阻挡板间隔开以限定间隙。

52. 发明申请

WO2016205510A1 INJECTOR FOR BATCH PROCESSING AND METHODS OF USE 审中-公开
标题翻译：用于批处理的注射器和使用方法
公开(公告)号：WO2016205510A1
公开(公告)日：2016-12-22
申请号：PCT/US2016/037867
申请日：2016-06-16
申请人： APPLIED MATERIALS, INC.
发明人： YUDOVSKY, Joseph , GRIFFIN, Kevin , SRIRAM, Mandyam
IPC分类号： H01L21/02 , H01L21/28 , H01L21/265
CPC分类号： C23C16/45502 , C23C16/45546 , C23C16/45563
摘要： Apparatus and methods for processing a substrate including an injector unit, comprising a leading reactive gas port extending along a length of the injector unit, a trailing reactive gas port extending along the length of the injector unit, and a merge vacuum port forming a boundary around and enclosing the leading reactive gas port and the trailing reactive gas port.
摘要翻译：用于处理包括喷射器单元的基板的装置和方法，包括沿喷射器单元的长度延伸的前导反应气体端口，沿着喷射器单元的长度延伸的拖尾反应气体端口和形成边界的合并真空端口并封闭前导反应气体端口和尾随的反应气体端口。

53. 发明申请

WO2015161225A1 APPARATUS FOR SUSCEPTOR TEMPERATURE VERIFICATION AND METHODS OF USE 审中-公开
标题翻译：用于SUSCEPTOR温度验证的设备及其使用方法
公开(公告)号：WO2015161225A1
公开(公告)日：2015-10-22
申请号：PCT/US2015/026429
申请日：2015-04-17
申请人： APPLIED MATERIALS, INC.
发明人： YUDOVSKY, Joseph , GRIFFIN, Kevin
IPC分类号： H01L21/205 , H01L21/683
CPC分类号： C23C16/52 , C23C16/45519 , C23C16/45551
摘要： Apparatus and methods for processing a semiconductor wafer in which a sensor (e.g., a contact thermocouple) is positioned in the gas distribution assembly measures temperature and/or a film parameter before, during and/or after deposition are described.
摘要翻译：描述用于处理其中传感器（例如，接触热电偶）位于气体分配组件中的半导体晶片的装置和方法在沉积之前，期间和/或之后测量温度和/或膜参数。

54. 发明申请

WO2005044474A1 SCRUBBER BOX AND METHOD FOR USING THE SAME 审中-公开
标题翻译： SCRUBBER BOX及其使用方法
公开(公告)号：WO2005044474A1
公开(公告)日：2005-05-19
申请号：PCT/US2004/035745
申请日：2004-10-28
申请人： APPLIED MATERIALS, INC.
发明人： YUDOVSKY, Joseph , TEPMAN, Avi , REYNOLDS, Kenneth, R. , ACHKIRE, Younes , MAROHL, Dan, A. , GHANAYEM, Steve, G. , POLYAK, Alexander, S. , ETTINGER, Gary , ZHANG, Haochuan , CHEN, Hui?
IPC分类号： B08B1/04
CPC分类号： H01L21/67046 , B08B1/04
摘要： A scrubber box (101) is provided that includes a tank (103) adapted to receive a substrate (w) for cleaning, supports (107, 109) outside of the tank and adapted to couple to ends of scrubber brushes (106a, 106b) disposed within the tank, a motor (111) mounted to each of the supports and adapted to rotate the scrubber brushes, a base (113) to which the supports are pivotally mounted via spherical bearings (127) adapted to permit toe-in of the scrubber brushes, brush gap actuator adapted, via a crank and rocker mechanism, (117) to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.
摘要翻译：提供了一种洗涤器箱（101），其包括适于接收用于清洁罐的支撑件（107,109）并适于联接到洗涤器刷（106a，106b）的端部的衬底（w）的罐（103）设置在所述罐内的马达（111），其安装到每个所述支撑件上并且适于旋转所述洗涤器刷;基座（113），所述支撑件通过经由球形轴承（127）可枢转地安装到所述基座上，洗涤器刷子，刷间隙致动器，其经由曲柄和摇臂机构（117）适当地基本上同时地将支撑件朝向或远离彼此枢转，以便允许洗涤器刷基本上同时实现或断开与衬底的接触，并且适于将两个球面轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器刷之间的趾角。

55. 发明申请

WO2021041076A1 ELECTRON BEAM PVD ENDPOINT DETECTION AND CLOSED-LOOP PROCESS CONTROL SYSTEMS 审中-公开
公开(公告)号：WO2021041076A1
公开(公告)日：2021-03-04
申请号：PCT/US2020/046659
申请日：2020-08-17
申请人： APPLIED MATERIALS, INC.
发明人： ISHIKAWA, David Masayuki , FRANKEL, Jonathan , YUDOVSKY, Joseph , BRITZ, David Alexander
IPC分类号： C23C14/54 , C23C14/50 , C23C14/30 , G01B11/06
摘要： Embodiments described herein provide apparatus, software applications, and methods of a coating process, such as an Electron Beam Physical Vapor Deposition (EBPVD) of thermal barrier coatings (TBCs) on objects. The objects may include aerospace components, e.g., turbine vanes and blades, fabricated from nickel and cobalt-based super alloys. The apparatus, software applications, and methods described herein provide at least one of the ability to detect an endpoint of the coating process, i.e., determine when a thickness of a coating satisfies a target value, and the ability for closed-loop control of process parameters.

56. 发明申请

WO2018106627A1 TEMPORAL ATOMIC LAYER DEPOSITION PROCESSING CHAMBER 审中-公开
公开(公告)号：WO2018106627A1
公开(公告)日：2018-06-14
申请号：PCT/US2017/064598
申请日：2017-12-05
申请人： APPLIED MATERIALS, INC.
发明人： POLYAK, Alexander S. , YUDOVSKY, Joseph
IPC分类号： H01L21/67 , H01L21/683
摘要： A dual channel showerhead comprising a first plurality of channels formed in the back surface of the showerhead and extending from a first end to a second end, a second plurality of channels formed through the thickness of the showerhead and extending from a first end to a second end, a first end plenum in fluid connection with the second plurality of channels at the first end and a second end plenum in fluid connection with the second plurality of channels at the second end. Processing chambers including the dual channel showerhead and a blocker ring separating the edge ring from the pumping ring are also discussed.

57. 发明申请

WO2017210590A1 GATE VALVE FOR CONTINUOUS TOW PROCESSING 审中-公开
标题翻译：用于连续牵引加工的闸门阀
公开(公告)号：WO2017210590A1
公开(公告)日：2017-12-07
申请号：PCT/US2017/035735
申请日：2017-06-02
申请人： APPLIED MATERIALS, INC.
发明人： YUDOVSKY, Joseph , ISHIKAWA, David , TESCH, Travis
IPC分类号： H01L21/67
摘要： Embodiments of gate valves and methods for using same are provided herein. In some embodiments, a gate valve for processing a continuous substrate includes: a body; a plurality of seals disposed within the body and configured to move between a closed position and an open position; a plurality of volumes disposed between adjacent ones of the plurality of seals and defined by the plurality of seals and the body; a gas inlet disposed through a first side of the body and fluidly coupled to an innermost one of the plurality of volumes; and a gas outlet disposed through a second side of the body opposite the first side and fluidly coupled to other ones of the plurality of volumes disposed on either side of the innermost one of the plurality of volumes.
摘要翻译：本文提供了闸阀的实施例及其使用方法。在一些实施例中，用于处理连续基板的闸阀包括：本体; 多个密封件，所述多个密封件设置在所述主体内并且构造成在关闭位置和打开位置之间移动; 多个体积，所述多个体积布置在所述多个密封件中的相邻密封件之间并且由所述多个密封件和所述主体限定; 气体入口，所述气体入口设置成穿过所述主体的第一侧并且流体地联接到所述多个容积中最内侧的一个; 以及气体出口，所述气体出口设置成穿过所述主体的与所述第一侧相对的第二侧，并流体地联接到设置在所述多个容积中的所述最内侧容积的任一侧上的所述多个容积中的其他容积。

58. 发明申请

WO2017189412A1 ENHANCED SPATIAL ALD OF METALS THROUGH CONTROLLED PRECURSOR MIXING 审中-公开
标题翻译：通过控制前驱混合提高金属的空间范围
公开(公告)号：WO2017189412A1
公开(公告)日：2017-11-02
申请号：PCT/US2017/029085
申请日：2017-04-24
申请人： APPLIED MATERIALS, INC.
发明人： CHAN, Kelvin , CHEN, Yihong , LEE, Jared Ahmad , GRIFFIN, Kevin , GANDIKOTA, Srinivas , YUDOVSKY, Joseph , SRIRAM, Mandyam
IPC分类号： C23C16/455 , C23C16/52
CPC分类号： C23C16/45527 , C23C16/08 , C23C16/45551 , C23C16/50
摘要： Methods of depositing a film by atomic layer deposition are described. The methods comprise exposing a substrate surface to a first process condition comprising a first reactive gas and a second reactive gas and exposing the substrate surface to a second process condition comprising the second reactive gas. The first process condition comprises less than a full amount of the second reactive gas for a CVD process.
摘要翻译：描述了通过原子层沉积沉积膜的方法。该方法包括将衬底表面暴露于包括第一反应气体和第二反应气体的第一工艺条件，并将衬底表面暴露于包含第二反应气体的第二工艺条件。第一种工艺条件包括用于CVD工艺的少于全量的第二反应气体。

59. 发明申请

WO2016118572A1 INTELLIGENT HARDSTOP FOR GAP DETECTION AND CONTROL MECHANISM 审中-公开
标题翻译：用于GAP检测和控制机制的智能硬件
公开(公告)号：WO2016118572A1
公开(公告)日：2016-07-28
申请号：PCT/US2016/014039
申请日：2016-01-20
申请人： APPLIED MATERIALS, INC.
发明人： KHANDELWAL, Somesh , KWONG, Garry K , GRIFFIN, Kevin , YUDOVSKY, Joseph
IPC分类号： H01L21/205
CPC分类号： G01B11/14 , C23C16/455 , C23C16/45551 , C23C16/52 , G01D5/34 , H01L21/67259 , H01L21/681 , H01L21/68764
摘要： Apparatus and methods for measuring the proximity between two components using a hardstop, an actuator and an emitter/detector passing light through a passage in the actuator are disclosed. The passage provides attenuation to the light which changes as the gap between the components changes allowing the measurement and control of the gap. Methods of determining the topology of the components using the apparatus are also described.
摘要翻译：公开了一种用于测量两个部件之间的接近度的装置和方法，所述部件使用硬止动件，致动器和使光穿过致动器中的通道的发射器/检测器。该通道为光线提供衰减，随着组件之间的间隙变化，从而允许间隙的测量和控制。还描述了使用该装置确定部件的拓扑结构的方法。

60. 发明申请

WO2016054397A1 SPRING-LOADED PINS FOR SUSCEPTOR ASSEMBLY AND PROCESSING METHODS USING SAME 审中-公开
标题翻译：用于SUSCEPTOR组装的弹簧引脚和使用相同的加工方法
公开(公告)号：WO2016054397A1
公开(公告)日：2016-04-07
申请号：PCT/US2015/053529
申请日：2015-10-01
申请人： APPLIED MATERIALS, INC.
发明人： YUDOVSKY, Joseph
IPC分类号： H01L21/683 , H01L21/205
CPC分类号： H01L21/68742 , H01L21/6838 , H01L21/68764 , H01L21/68771 , H01L21/68785
摘要： Apparatus and methods for processing a semiconductor wafer including a susceptor assembly with recesses comprising at least three lift pins. The lift pins include a sleeve with a spring and pin positioned therein. The spring and pin elevate the wafer to a position where the wafer can be pre-heated and, upon compression, lowers the wafer to a processing position.
摘要翻译：包括用于处理半导体晶片的装置和方法，所述半导体晶片包括具有至少三个提升销的凹槽的基座组件。提升销包括具有弹簧和定位在其中的销的套筒。弹簧和针将晶片升高到可以预加热晶片的位置，并且在压缩时将晶片降低到处理位置。

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