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31. 发明申请

WO2007102882A3 MULTIPLE ZONE SPUTTERING TARGET CREATED THROUGH CONDUCTIVE AND INSULATION BONDING 审中-公开
公开(公告)号：WO2007102882A3
公开(公告)日：2007-09-13
申请号：PCT/US2006/060069
申请日：2006-10-19
申请人： APPLIED MATERIALS, INC. , YE, Yan , WHITE, John M. , HOSOKAWA, Akihiro , LE, Hien-minh Huu , NISPEROS, Elpidio C. , STIMSON, Bradley O.
发明人： YE, Yan , WHITE, John M. , HOSOKAWA, Akihiro , LE, Hien-minh Huu , NISPEROS, Elpidio C. , STIMSON, Bradley O.
IPC分类号： C23C14/32
摘要： The present invention generally provides a sputtering apparatus and method in which a sputtering target has a plurality of target sections bonded to a common backing plate. Each segment can be bonded to the common backing plate using a different bonding material. One target segment can be bonded to the backing plate using electrically conductive bonding material while another section is bonded to the backing plate using electrically insulating bonding material. Additionally, each different target section can be separately biased.

32. 发明申请

WO2005101100A2 METHOD AND APPARATUS FOR IN-SITU FILM STACK PROCESSING 审中-公开
标题翻译：用于现场薄膜堆叠处理的方法和装置
公开(公告)号：WO2005101100A2
公开(公告)日：2005-10-27
申请号：PCT/US2005/011319
申请日：2005-04-01
申请人： APPLIED MATERIALS, INC. , MERRY, Walter R. , SHANG, Quanyuan , WHITE, John M.
发明人： MERRY, Walter R. , SHANG, Quanyuan , WHITE, John M.
IPC分类号： G02F
CPC分类号： H01J37/3244 , H01J37/32357 , H01J37/32522 , H01J37/32788 , H01J2237/3325 , H01J2237/334
摘要： Embodiments of a cluster tool, processing chamber and method for processing a film stack are provided. In one embodiment, a method for in-situ etching of silicon and metal layers of a film stack is provided that includes the steps of etching an upper metal layer of the film stack in a processing chamber to expose a portion of an underlying silicon layer, and etching a trench in the silicon layer without removing the substrate from the processing chamber. The invention is particularly useful for thin film transistor fabrication for flat panel displays.
摘要翻译：提供了一种用于处理薄膜叠层的集群工具，处理室和方法的实施例。在一个实施例中，提供了一种用于原位蚀刻膜堆叠的硅和金属层的方法，其包括以下步骤：在处理室中蚀刻膜堆叠的上金属层以暴露下层硅层的一部分，并且在硅层中蚀刻沟槽而不从处理室移除衬底。本发明对于平板显示器的薄膜晶体管制造特别有用。

33. 发明申请

WO2018171907A1 APPARATUS AND METHOD FOR HOLDING A SUBSTRATE, METHOD FOR LOADING A SUBSTRATE INTO A VACUUM PROCESSING MODULE, AND SYSTEM FOR VACUUM PROCESSING OF A SUBSTRATE 审中-公开
公开(公告)号：WO2018171907A1
公开(公告)日：2018-09-27
申请号：PCT/EP2017/059667
申请日：2017-04-24
申请人： APPLIED MATERIALS, INC. , LINDENBERG, Ralph , VINCENT, Joseph , WHITE, John M.
发明人： LINDENBERG, Ralph , VINCENT, Joseph , WHITE, John M.
IPC分类号： H01L21/683
CPC分类号： H01L21/6838
摘要： An apparatus (100) for holding a substrate (10) is described. The apparatus (100) includes a Bernoulli-type holder (110) having a surface (112) configured to face the substrate (10), and one or more adjusting means (188) configured to adjust the gap (114) between the surface (112) and the substrate (10).

34. 发明申请

WO2017207053A1 GUIDING DEVICES AND WEB COATING PROCESS 审中-公开
标题翻译：指导设备和网涂工艺
公开(公告)号：WO2017207053A1
公开(公告)日：2017-12-07
申请号：PCT/EP2016/062539
申请日：2016-06-02
申请人： APPLIED MATERIALS, INC. , METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
发明人： METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , B65H23/00
CPC分类号： C23C14/562 , B65H20/14 , B65H2406/361 , B65H2801/87
摘要： A roller device (100) for guiding a web (200) and for controlling the temperature of the web (200) in contact with the roller device in a web coating process under vacuum conditions is described. The roller device includes a curved surface (101) of the roller device (100) for contacting the web (200), wherein the curved surface (101) includes a web guiding region (103). The roller device further includes a group of gas outlets (104) in the curved surface (101) and a gas distribution system (105) for selectively providing the gas flow to a first subgroup of gas outlets (104) and for selectively preventing the gas from flowing to a second subgroup of the gas outlets (104). The roller device further includes a driving unit (110) for rotating the curved surface (101), wherein the curved surface (101) is adapted for inducing a movement of the web (200) upon rotation of the curved surface.
摘要翻译：描述了用于在真空条件下在幅材涂布工艺中引导幅材（200）并且用于控制幅材（200）与辊子设备接触的温度的辊子装置（100）。滚轮装置包括用于接触腹板（200）的滚轮装置（100）的弯曲表面（101），其中弯曲表面（101）包括腹板引导区域（103）。该滚轮装置还包括在弯曲表面（101）中的一组气体出口（104）和用于选择性地将气流提供给第一组气体出口（104）并用于选择性地防止气体从流动到气体出口（104）的第二子组。所述滚轮装置还包括用于旋转所述弯曲表面（101）的驱动单元（110），其中所述弯曲表面（101）适于在所述弯曲表面旋转时引起所述腹板（200）的移动。

35. 发明申请

WO2006065571A2 FUEL CELL CONDITIONING LAYER 审中-公开
标题翻译：燃料电池调节层
公开(公告)号：WO2006065571A2
公开(公告)日：2006-06-22
申请号：PCT/US2005/043912
申请日：2005-12-05
申请人： APPLIED MATERIALS, INC. , WON, Tae Kyung , BACHRACH, Robert , WHITE, John M. , BLONIGAN, Wendell, T.
发明人： WON, Tae Kyung , BACHRACH, Robert , WHITE, John M. , BLONIGAN, Wendell, T.
IPC分类号： H01M8/02 , B05D5/12 , C23C16/00
CPC分类号： C23C16/24 , C23C16/345 , H01M8/0213 , H01M8/0215 , H01M8/0226 , H01M8/0228
摘要： A method and apparatus for depositing a material layer to treat and condition a substrate, such as a fuel cell part, is described. The method includes depositing a hydrophilic material layer on a portion of the surface of the substrate in a process chamber from a mixture of precursors of the hydrophilic material layer. In addition, the method includes reducing a fluid contact angle of the substrate surface. The hydrophilic material layer comprises a wet etch rate of less than about 0.03 Å/min in the presence of about 10 ppm of hydrofluoric acid in water. The material layer can be used to condition various parts of a fuel cell useful in applications to generate electricity.
摘要翻译：描述了用于沉积材料层以处理和调节诸如燃料电池部件的基板的方法和装置。该方法包括在亲水材料层的前体的混合物的处理室中的基底表面的一部分上沉积亲水材料层。此外，该方法包括降低衬底表面的流体接触角。在大约10ppm氢氟酸存在下，亲水性材料层包括小于约0.03 /分钟的湿蚀刻速率。材料层可用于调节用于发电的燃料电池的各种部件。

36. 发明申请

WO2018210408A1 APPARATUS FOR PROCESSING A SUBSTRATE, PROCESSING SYSTEM AND METHOD THEREFOR 审中-公开
公开(公告)号：WO2018210408A1
公开(公告)日：2018-11-22
申请号：PCT/EP2017/061728
申请日：2017-05-16
申请人： APPLIED MATERIALS, INC. , WHITE, John M. , CAN, Linh , LINDENBERG, Ralph
发明人： WHITE, John M. , CAN, Linh , LINDENBERG, Ralph
IPC分类号： C23C14/56 , C23C14/50 , C23C16/458 , C23C16/54 , H01L21/677
CPC分类号： C23C14/568 , C23C14/50 , C23C14/562 , C23C16/4587 , C23C16/545 , H01L21/67712 , H01L21/67718 , H01L21/6776
摘要： An apparatus (100) for processing a substrate is described. The apparatus includes a first vacuum processing arrangement (101), a second vacuum processing arrangement (102), and a support structure (103) arranged in an atmospheric space (108) between the first vacuum processing arrangement (101) and the second vacuum processing arrangement (102).

37. 发明申请

WO2017071831A1 APPARATUS FOR TREATMENT OF A SUBSTRATE FOR A VACUUM DEPOSITION PROCESS IN A VACUUM PROCESSING MODULE, SYSTEM FOR TREATMENT AND HANDLING OF A SUBSTRATE, METHOD FOR TREATMENT OF A SUBSTRATE FOR A VACUUM DEPOSITION PROCESS IN A VACUUM PROCESSING MODULE, AND APPARATUS FOR LOADING A SUBSTRATE CARRIER INTO A VACUUM PROCESSING SYSTEM 审中-公开
标题翻译：用于处理真空处理模块中的真空沉积处理的基板的设备，处理和处理基板的系统，处理真空处理模块中的真空沉积处理的基板的方法以及用于载入基板载体的设备进入真空处理系统
公开(公告)号：WO2017071831A1
公开(公告)日：2017-05-04
申请号：PCT/EP2016/059536
申请日：2016-04-28
申请人： APPLIED MATERIALS, INC. , WHITE, John M. , BUSCH, John D. , KIM, Kyung Bong , LINDENBERG, Ralph
发明人： WHITE, John M. , BUSCH, John D. , KIM, Kyung Bong , LINDENBERG, Ralph
IPC分类号： C23C14/04 , C23C16/04 , C23C14/02 , C23C14/50 , C23C14/56 , H01L21/02 , H01L21/67
CPC分类号： C23C14/566 , C23C14/352 , C23C14/568 , C23C16/54
摘要： The present disclosure provides an apparatus (100) configured for treatment of a substrate (10) for a vacuum deposition process in a vacuum processing module. The apparatus (100) includes a substrate holder (110) configured to hold the substrate (10), a gas supply (130) configured to direct a stream of gas along a substrate surface of the substrate (10), and one or more conditioning devices configured for adjusting at least one physical and/or chemical property of the gas directed along the substrate surface, wherein the physical and/or chemical property of the gas is selected for a treatment of the substrate (10).
摘要翻译：本公开提供了一种设备（100），其被配置用于在真空处理模块中处理用于真空沉积工艺的衬底（10）。该设备（100）包括被配置成保持衬底（10）的衬底保持器（110），被配置为引导气体流沿着衬底（10）的衬底表面的气体供应（130），以及一个或多个调节被配置用于调节沿着衬底表面引导的气体的至少一种物理和/或化学性质的装置，其中选择气体的物理和/或化学性质用于衬底（10）的处理。

38. 发明申请

WO2012109113A2 METHOD FOR ENCAPSULATING AN ORGANIC LIGHT EMITTING DIODE 审中-公开
标题翻译：封装有机发光二极管的方法
公开(公告)号：WO2012109113A2
公开(公告)日：2012-08-16
申请号：PCT/US2012/023853
申请日：2012-02-03
申请人： APPLIED MATERIALS, INC. , HAAS, Dieter , WHITE, John M. , KWAK, Byung-Sung Leo , CHOI, Soo Young , CHEN, Jrjyan Jerry , DIEGUEZ-CAMPO, Jose Manuel
发明人： HAAS, Dieter , WHITE, John M. , KWAK, Byung-Sung Leo , CHOI, Soo Young , CHEN, Jrjyan Jerry , DIEGUEZ-CAMPO, Jose Manuel
IPC分类号： H01L51/50 , H05B33/04 , H01L51/56
CPC分类号： H01L51/0014 , H01L51/5253
摘要： Methods for encapsulating OLED structures disposed on a substrate using a soft/polymer mask technique are provided. The soft/polymer mask technique can efficiently provide a simple and low cost OLED encapsulation method, as compared to convention hard mask patterning techniques. The soft/polymer mask technique can utilize a single polymer mask to complete the entire encapsulation process with low cost and without alignment issues present when using conventional metal masks. Rather than utilizing a soft/polymer mask, the encapsulation layers may be blanked deposited and then laser ablated such that no masks are utilized during the encapsulation process.
摘要翻译：提供了使用软/聚合物掩模技术来封装设置在衬底上的OLED结构的方法。与常规硬掩模图案化技术相比，软/聚合物掩模技术可以有效地提供简单且低成本的OLED封装方法。软/聚合物掩模技术可以利用单个聚合物掩模以低成本完成整个封装过程，并且在使用传统金属掩模时不存在对准问题。除了使用软/聚合物掩模之外，封装层可以被冲切沉积，然后被激光烧蚀，使得在封装过程中不使用掩模。

39. 发明申请

WO2011009007A3 IMPROVED LIFT PIN GUIDES 审中-公开
公开(公告)号：WO2011009007A3
公开(公告)日：2011-01-20
申请号：PCT/US2010/042199
申请日：2010-07-15
申请人： APPLIED MATERIALS, INC. , PAI, Uday , LOPEZ, Oscar , OH, Jeonghoon , CHO, Tom K. , WHITE, John M. , JAMES, Silja , POLYAK, Alexander S.
发明人： PAI, Uday , LOPEZ, Oscar , OH, Jeonghoon , CHO, Tom K. , WHITE, John M. , JAMES, Silja , POLYAK, Alexander S.
IPC分类号： H01L21/68 , H01L21/205 , G02F1/13
摘要： Lift pin guides include bearing elements with rollers having liners comprised of a material that provides both self lubrication and cushioning in order to prevent lift pin binding and extend the life of the lift pins and the lift pin guides. In one embodiment, each lift pin guide includes an upper bearing element near the upper surface of a substrate support and a lower bearing element disposed a distance beneath the substrate support in order to reduce stresses experienced by the lift pin. The lift pin guides may be used in a vacuum deposition chamber adapted to deposit materials onto substrates to form electronic devices such as thin film transistors, organic light emitting diodes, photovoltaic devices or solar cells, including chemical vapor deposition chambers and physical vapor deposition chambers. The lift pin guides may also be used in load lock chambers, etching chambers or other applications where lift pins are utilized.

40. 发明申请

WO2009114242A1 WATER-BARRIER ENCAPSULATION METHOD 审中-公开
标题翻译：水障碍包埋方法
公开(公告)号：WO2009114242A1
公开(公告)日：2009-09-17
申请号：PCT/US2009/034266
申请日：2009-02-17
申请人： APPLIED MATERIALS, INC. , WON, Tae Kyung , CAMPO, Jose Manuel Dieguez , WHITE, John M. , YADAV, Sanjay D.
发明人： WON, Tae Kyung , CAMPO, Jose Manuel Dieguez , WHITE, John M. , YADAV, Sanjay D.
IPC分类号： H05B33/04 , H05B33/10 , H01L51/52
CPC分类号： H01L21/6715 , H01L51/5256
摘要： The present invention generally relates to organic light emitting diode (OLED) structures and methods for their manufacture. To increase the lifetime of an OLED structure, an encapsulating layer may be deposited over the OLED structure. The encapsulating layer may fully enclose or 'encapsulate' the OLED structure. The encapsulating layer may have a substantially planar surface opposite to the interface between the OLED structure and the encapsulating layer. The planar surface permits successive layers to be evenly deposited over the OLED structure. The encapsulating layer reduces any oxygen penetration into the OLED structure and may increase the lifetime of the OLED structure.
摘要翻译：本发明一般涉及有机发光二极管（OLED）结构及其制造方法。为了增加OLED结构的寿命，可以在OLED结构上沉积封装层。封装层可以完全包围或“封装”OLED结构。封装层可以具有与OLED结构和封装层之间的界面相对的基本平坦的表面。平面表面允许连续的层均匀地沉积在OLED结构上。封装层减少了OLED结构中的氧渗透，并且可能增加OLED结构的寿命。

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