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21. 发明申请

WO2004064121A3 A SUPERCRITICAL FLUID CLEANING SYSTEM AND METHOD 审中-公开
标题翻译：超临界流体清洗系统及方法
公开(公告)号：WO2004064121A3
公开(公告)日：2005-01-27
申请号：PCT/US2004000640
申请日：2004-01-12
申请人： S C FLUIDS INC , MOUNT DAVID J
发明人： MOUNT DAVID J
IPC分类号： B08B7/00 , H01L21/00 , H01L21/02 , B08B3/10
CPC分类号： H01L21/02101 , B08B7/0021 , H01L21/67051 , H01L21/6719
摘要： A supercritical fluid cleaning system and method comprising mainly a pressure chamber (2), a closable lid, a substrate support for holding at least one substrate, a rotable shaft (14) extending outward from within the chamber, an external rotary power source coupled magnetically or otherwise to the shaft (14), and a rotable component or impeller (20) attached to the chamber end of the shaft in close proximity to the substrate holding position, and baffles (16) located close to the rotable component. The rotable component is configured for rotation within the supercritical phase fluid in the chamber close to the surface of the wafer for causing agitation and turbulent fluid flow against the surface of the substrate, and increased intra-chamber fluid circulation.
摘要翻译：一种超临界流体清洁系统和方法，主要包括压力室（2），可关闭盖，用于保持至少一个基板的基板支撑件，从室内向外延伸的可旋转轴（14），磁耦合的外部旋转电源或其他方式连接到轴（14）上，以及可旋转的组件或叶轮（20），其附接到轴的腔室端部，其紧邻衬底保持位置，以及靠近可旋转部件的挡板（16）。可旋转部件被配置为在室内的超临界相流体内旋转，靠近晶片表面，以引起对衬底表面的搅动和湍流流体流动，并增加了室内流体循环。

22. 发明申请

WO2004105093A2 TETRA-ORGANIC AMMONIUM FLUORIDE AND HF IN SUPERCRITICAL FLUID FOR PHOTORESIST AND RESIDUE REMOVAL 审中-公开
标题翻译：超临界流体中的有机氟化钼和氟化氢用于光催化剂和残留物去除
公开(公告)号：WO2004105093A2
公开(公告)日：2004-12-02
申请号：PCT/US2004015362
申请日：2004-05-13
申请人： SUPERCRITICAL SYSTEMS INC
发明人： SCHILLING PAUL E
IPC分类号： B08B3/00 , B08B7/00 , C23G1/00 , G03F7/42 , H01L20060101 , H01L21/00 , H01L21/311 , H01L
CPC分类号： B08B7/0021 , G03F7/427 , H01L21/31133 , H01L21/67028
摘要： A method of removing a material from an oxide surface of a substrate, where the material is selected from the group consisting of photoresist, photoresist residue, etch residue, and a combination thereof, comprises first and second steps. The first step comprises maintaining a supercritical fluid, a carrier solvent, a tetra-organic ammonium fluoride, and HF in contact with the substrate until the material separates from the oxide surface, thereby forming separated material. The second step comprises removing the separated material from the vicinity of the substrate.
摘要翻译：一种从衬底的氧化物表面去除材料的方法，其中材料选自光致抗蚀剂，光致抗蚀剂残留物，蚀刻残渣及其组合，包括第一和第二步骤。第一步包括保持与基材接触的超临界流体，载体溶剂，四有机氟化铵和HF，直到材料与氧化物表面分离，从而形成分离的材料。第二步骤包括从衬底附近去除分离的材料。

23. 发明申请

WO2004094696A1 MICROELECTRONIC DEVICE MANUFACTURING IN COORDINATED CARBON DIOXIDE PROCESSING CHAMBERS 审中-公开
标题翻译：协调二氧化碳加工炉中的微电子设备制造
公开(公告)号：WO2004094696A1
公开(公告)日：2004-11-04
申请号：PCT/US2004/005220
申请日：2004-02-23
申请人： MICELL TECHNOLOGIES INC. , DEYOUNG, James, P. , MCCLAIN, James, B.
发明人： DEYOUNG, James, P. , MCCLAIN, James, B.
IPC分类号： C23F1/00
CPC分类号： H01L21/67207 , B08B7/0021 , H01L21/67253
摘要： A system for processing microelectronic substrates in a liquid or supercritical carbon dioxide process media comprises (a) a plurality of carbon dioxide processing chambers; (b) a carbon dioxide supply vessel operatively associated with each of the carbon dioxide processing chambers; (c) a first process chemical supply vessel operatively associated with at least one of the carbon dioxide processing chambers; (d) a waste collection vessel operatively associated with at least one of the carbon dioxide processing chambers; and (e) a controller operatively associated with the plurality of processing chambers, the carbon dioxide supply vessel, the vacuum pump if present, the first process chemical supply vessel, and the waste collection vessel, the controller configured to independently process microelectronic substrates in each of the processing chambers.
摘要翻译：用于在液体或超临界二氧化碳过程介质中处理微电子衬底的系统包括（a）多个二氧化碳处理室; （b）与每个二氧化碳处理室可操作地连接的二氧化碳供应容器; （c）可操作地与至少一个二氧化碳处理室相关联的第一过程化学品供给容器; （d）与至少一个二氧化碳处理室可操作地相关联的废物收集容器; 和（e）与所述多个处理室，所述二氧化碳供应容器，所述真空泵（如果存在的话），所述第一过程化学品供应容器和所述废物收集容器操作地相关联的控制器，所述控制器被配置为在每个处理室中独立地处理微电子衬底的处理室。

24. 发明申请

WO2004093166A2 CHAMBER AND ASSOCIATED METHODS FOR WAFER PROCESSING 审中-公开
标题翻译：用于波浪加工的室和相关方法
公开(公告)号：WO2004093166A2
公开(公告)日：2004-10-28
申请号：PCT/US2004008994
申请日：2004-03-23
申请人： LAM RES CORP , PARKS JOHN
发明人： PARKS JOHN
IPC分类号： B08B7/00 , H01L21/00 , H01L21/683 , H01L21/687
CPC分类号： H01L21/67126 , B08B7/0021 , H01L21/67051 , H01L21/67109 , H01L21/67751 , H01L21/6838
摘要： A wafer processing chamber is provided for allowing a fluid flow and a fluid pressure within the chamber to be controlled in a variable manner. The chamber utilizes removable plates that can be configured to control the fluid flow and the fluid pressure in an inner volume within the chamber. Also, the removable plates can be used to separate the inner volume within the chamber from an outer volume within the chamber. Additionally, a wafer clamping apparatus is provided for use in the chamber. The wafer clamping apparatus uses a pressure differential between a top surface and a bottom surface of the wafer to pull the wafer toward a wafer support structure in contact with the wafer bottom surface, whereby the wafer is secured and maintained in an immobile state. Furthermore, high-pressure chamber configurations are provided.
摘要翻译：提供晶片处理室以允许以可变的方式控制腔室内的流体流动和流体压力。该室利用可移动的板，其可被构造成控制腔内的内部体积中的流体流动和流体压力。而且，可拆卸的板可用于将腔室内的体积与室内的外部容积分开。此外，提供晶片夹紧装置用于室中。晶片夹紧装置使用晶片的顶表面和底表面之间的压力差将晶片拉向与晶片底表面接触的晶片支撑结构，由此晶片被固定并保持在固定状态。此外，还提供了高压室配置。

25. 发明申请

WO2004090339A2 METHOD AND APPARATUS FOR ROTATION OF A WORKPIECE IN SUPERCRITICAL FLUID SOLUTIONS FOR REMOVING PHOTO RESIST, RESIDUES AND PARTICLES THEREFROM 审中-公开
标题翻译：用于转移超临界流体溶液中的工作原理的方法和装置，用于去除抗蚀剂，残留物和颗粒物
公开(公告)号：WO2004090339A2
公开(公告)日：2004-10-21
申请号：PCT/US2004/010533
申请日：2004-04-05
申请人： S. C. FLUIDS, INC. , POPE, Keith , MOUNT, David, J. , ROTHMAN, Laura , WHITE, Rick, C. , BUSBY, Clifton , DOUGLAS, Steven , DOW, III, Raymond, J.
发明人： POPE, Keith , MOUNT, David, J. , ROTHMAN, Laura , WHITE, Rick, C. , BUSBY, Clifton , DOUGLAS, Steven , DOW, III, Raymond, J.
IPC分类号： F15B
CPC分类号： H01L21/67051 , B08B7/0021 , H01L21/67023 , Y10S134/902
摘要： A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.
摘要翻译：超临界流体清洁系统使用过程流体来操作腔室中的旋转马达，其具有用于旋转工件和叶轮的流体轴承和流体负载悬挂。旋转速度和方向传感器和原位定位器便于马达控制。叶轮进一步搅拌了室内的流体，加快了处理速度，提高了超临界流体组分的均匀性，并增加了流体到处理过的表面的传质。离心操作的夹子和盒子保持晶片和叶轮。非接触，流体操作的旋转机构减少污染。物理，旋转和剪切影响通过离心力增强，离心力可以引起膜的局部沉积物或反应物的分子产物与表面的分离。伴随着流体的搅动，以及赋予加工表面特征的连续角加速度。

26. 发明申请

WO2004012877A1 METHOD AND APPARATUS FOR REMOVING SUBSTANCES FROM SOLID MATRIX WITH ENERGY SAVING 审中-公开
标题翻译：从能量节省固体基质中去除物质的方法和装置
公开(公告)号：WO2004012877A1
公开(公告)日：2004-02-12
申请号：PCT/IT2002/000521
申请日：2002-08-06
申请人： FEDEGARI AUTOCLAVI SPA , FEDEGARI, Fortunato , SCULLINO, Andrea , PALLADO, Paolo
发明人： FEDEGARI, Fortunato , SCULLINO, Andrea , PALLADO, Paolo
IPC分类号： B08B7/00
CPC分类号： B09B3/0058 , B01D11/0203 , B01D11/0296 , B08B7/0021
摘要： A method and apparatus for washing solid matrices such as swarf from machining operations, bottles or other containers, contaminated with lubricating oils or similar substances, are described. The method is implemented with liquid CO 2 which dissolves the organic substances and is then separated therefrom by evaporation; the evaporated CO 2 is then compressed and condensed in order to recommence the cycle. An advantage of the method and apparatus is that some of the heat supplied to the CO 2 for its evaporation and some of that removed for its condensation are obtained by providing for an exchange of heat between the evaporator and the condenser of the system.
摘要翻译：描述了用于从加工操作，瓶子或其他容器中洗涤固体基质如切屑的方法和装置，被润滑油或类似物质污染。该方法用溶解有机物质的液体CO 2实现，然后通过蒸发与其分离; 然后将蒸发的CO 2压缩并浓缩，以重新开始循环。该方法和设备的优点在于，通过在蒸发器和系统的冷凝器之间提供热量来获得供应给CO 2的用于其蒸发的一些热量以及通过其进行冷凝除去的一些热量。

27. 发明申请

WO2003074202A1 APPARATUS FOR CONTAMINANT TEMOVAL USING NATURAL CONVECTION FLOW AND CHANGES IN SOLUBILITY CONCENTRATIONS BY TEMPERATURE 审中-公开
标题翻译：使用自然对流流动和温度变化可溶性浓度的污染物TEMOVAL设备
公开(公告)号：WO2003074202A1
公开(公告)日：2003-09-12
申请号：PCT/US2003/005187
申请日：2003-02-21
申请人： SOUTHWEST RESEARCH INSTITUTE
发明人： MARSHALL, Mary, C. , FRANJIONE, John, G. , FREITAS, Christopher, J. , ROBERDS, William, T. , POLLARD, Gordon, T. , BLAKE, Jill
IPC分类号： B08B7/00
CPC分类号： B08B7/0064 , B08B7/0021
摘要： An apparatus comprising multiple heating, cooling, and/or cleaning zones. The apparatus produces a jet flow of solvent/cleaning fluid onto an article to be cleaned without the need for a pump or compressor. The jet flow provides more effective contaminant removal. The mulptiple zones result in increased residence time for increased efficiency in separating the solubilized contaminant from the solvent/cleaning fluid.
摘要翻译：一种包括多个加热，冷却和/或清洁区域的设备。该设备在不需要泵或压缩机的情况下产生溶剂/清洁流体的喷射流到待清洁的物品上。喷射流提供更有效的污染物去除。造粒区域增加了停留时间，从而提高了将溶解的污染物与溶剂/清洗液分离的效率。

28. 发明申请

WO2003033114A1 CENTRAL CARBON DIOXIDE PURIFIER 审中-公开
标题翻译：中央二氧化碳净化器
公开(公告)号：WO2003033114A1
公开(公告)日：2003-04-24
申请号：PCT/US2002/033453
申请日：2002-10-17
申请人： PRAXAIR TECHNOLOGY, INC. , BILLINGHAM, John, Frederic , HOWARD, Henry, Edward , HERSHEY, Kimberly
发明人： BILLINGHAM, John, Frederic , HOWARD, Henry, Edward , HERSHEY, Kimberly
IPC分类号： B01D53/04
CPC分类号： F25J3/0266 , B01D3/14 , B01D3/146 , B01D15/00 , B01D53/04 , B01D2256/22 , B01D2256/26 , B08B7/0021 , C01B32/50 , F25J3/08 , F25J2200/02 , F25J2200/30 , F25J2200/74 , F25J2200/78 , F25J2205/04 , F25J2210/80 , F25J2220/80 , F25J2220/82 , F25J2220/84 , F25J2235/80 , F25J2245/02 , F25J2260/80 , F25J2270/90 , F25J2290/50 , G01N1/2202 , G01N1/40 , G01N1/42 , G01N15/04 , G01N15/06 , G01N2001/2238 , G01N2001/2282 , Y02C10/12 , Y02P20/152 , Y02P20/544 , Y02P70/34
摘要： The invention disclosed herein generally relates to a system and a method for supplying a carbon dioxide fluid feed to a plurality of applications (32, 34, 36). The method of the invention comprises the steps of directing a fluid feed, that includes a carbon dioxide component, from a carbon dioxide purifying means (11) to a plurality of applications including at least two distinct applications, whereby contaminants are combined with the fluid at said applications, thereby forming an effluent that includes at least a portion of the carbon dioxide component and at least a portion of said contaminants; directing said effluent from at least one of the applications to said carbon dioxide purifying means; and purifying the carbon dioxide of the effluent at the carbon dioxide purifying means, thereby producing the carbon dioxide component of the fluid feed. The system of the invention is an apparatus (22) for conducting the method of the invention.
摘要翻译：本文公开的本发明一般涉及用于将二氧化碳流体进料供应到多个应用（32,34,36）的系统和方法。本发明的方法包括以下步骤：将来自二氧化碳净化装置（11）的流体进料（包括二氧化碳组分）引导至包括至少两个不同应用的多种应用，其中污染物与流体组合在一起从而形成包含至少一部分二氧化碳组分和至少一部分所述污染物的流出物; 将来自至少一个应用的流出物引导到所述二氧化碳净化装置; 并在二氧化碳净化装置中纯化流出物的二氧化碳，从而产生流体进料的二氧化碳组分。本发明的系统是用于实施本发明的方法的装置（22）。

29. 发明申请

WO2003023840A2 METHODS AND APPARATUS FOR CLEANING AND/OR TREATING A SUBSTRATE USING CO2 审中-公开
标题翻译：用于清洁和/或处理使用二氧化碳的基板的方法和装置
公开(公告)号：WO2003023840A2
公开(公告)日：2003-03-20
申请号：PCT/US2002/024007
申请日：2002-07-30
申请人： MICELL TECHNOLOGIES, INC. , DEYOUNG, James, P. , MCCLAIN, James, P. , COLE, Michael, E. , WORM, Steve, L. , BRAINARD, David, E.
发明人： DEYOUNG, James, P. , MCCLAIN, James, P. , COLE, Michael, E. , WORM, Steve, L. , BRAINARD, David, E.
IPC分类号： H01L21/306
CPC分类号： C23G5/00 , B08B7/0021 , B81C1/00841 , B81C2201/117 , H01L21/02063 , H01L21/67051 , Y10S134/902
摘要： According to method embodiments of the present invention, a method for cleaning a microelectronic substrate includes placing the substrate in a pressure chamber. A process fluid including dense phase CO 2 is circulated through the chamber such that the process fluid contacts the substrate. The phase of the CO 2 is cyclically modulated during at least a portion of the step of circulating the process fluid.
摘要翻译：根据本发明的方法实施例，一种用于清洁微电子衬底的方法包括将衬底放置在压力室中。包括密相CO 2的工艺流体循环通过室，使得工艺流体接触基板。在循环过程流体的步骤的至少一部分期间，循环调节CO 2的相。

30. 发明申请

WO2003023828A1 GUARD HEATER AND PRESSURE CHAMBER ASSEMBLY INCLUDING THE SAME 审中-公开
标题翻译：加热器和压力室组件，包括它们
公开(公告)号：WO2003023828A1
公开(公告)日：2003-03-20
申请号：PCT/US2002/024006
申请日：2002-07-30
申请人： MICELL TECHNOLOGIES, INC. , WORM, Steve, L. , MCCLAIN, James, B.
发明人： WORM, Steve, L. , MCCLAIN, James, B.
IPC分类号： H01L21/00
CPC分类号： H01L21/67248 , B08B7/0021 , H01L21/67103 , H01L2924/0002 , H02N13/00 , H01L2924/00
摘要： A pressure chamber assembly (400) includes a pressure vessel and a guard heater assembly (460). The pressure vessel defines an enclosed chamber (410). The guard heater assembly (460) includes a guard heater (462, 472) disposed in the chamber (410) and interposed between a surrounding portion of the pressure vessel and a holding volume (411). The guard heater (462, 472) is adapted to control a temperature of the holding volume (411). The guard heater (462, 472) is insulated from the surrounding portion of the pressure vessel.
摘要翻译：压力室组件（400）包括压力容器和保护加热器组件（460）。压力容器限定一个封闭的腔室（410）。防护加热器组件（460）包括设置在腔室（410）中并置于压力容器的周围部分和保持容积（411）之间的防护加热器（462,472）。防护加热器（462,472）适于控制保持容积（411）的温度。防护加热器（462,472）与压力容器的周围部分绝缘。

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