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1. 发明申请

WO2005097363A1 LOADBEARING PLATFORM WITH FLUID SUPPORT, ISOLATION AND ROTATION 审中-公开
标题翻译：具有流体支持，隔离和旋转的负载平台
公开(公告)号：WO2005097363A1
公开(公告)日：2005-10-20
申请号：PCT/US2005/011682
申请日：2005-04-05
申请人： S.C. FLUIDS, INC. , WHITE, Rick, C. , POPE, Keith , MOUNT, David, J. , ROTHMAN, Laura , BUSBY, Clifton , DOW, Ryamond, J, III
发明人： WHITE, Rick, C. , POPE, Keith , MOUNT, David, J. , ROTHMAN, Laura , BUSBY, Clifton , DOW, Ryamond, J, III
IPC分类号： B08B7/00
CPC分类号： H01L21/68792 , B08B3/10 , B08B7/0021 , B08B11/02
摘要： Device for fluidic support and bi-directional rotation of an item in a process chamber where the operating fluid is compatible with the process. The device has a rotable load bearing platform with a load bearing interface between it and a base in the chamber. Fluid, which may be supercritical fluid, is applied through load bearing ports into the interface to fluidly support the weight and create rotational forces on the load platform. A turbine on the load platform is actuated by fluid flow directed from turbine ports in the chamber connected to the fluid source. Markers on the load platform and sensors in the chamber provide speed and direction sensing. An electromagnetic source in the chamber reacts with a permanent magnet in the rotable platform to provide an electromagnetic force for moving, or changing or holding the relative position of the load platform.
摘要翻译：用于流体支撑和在工作流体与工艺相容的处理室中的物品的双向旋转的装置。该装置具有可旋转的承载平台，在其与腔室中的基座之间具有承载界面。流体，其可以是超临界流体，通过承载端口施加到界面中以流体地支撑重物并在负载平台上产生旋转力。负载平台上的涡轮机由连接到流体源的腔室中的涡轮端口的流体流动致动。负载平台上的标记和室内的传感器提供速度和方向感测。室中的电磁源与可旋转平台中的永磁体发生反应，以提供用于移动或改变或保持负载平台的相对位置的电磁力。

2. 发明申请

WO2004090339A3 METHOD AND APPARATUS FOR ROTATION OF A WORKPIECE IN SUPERCRITICAL FLUID SOLUTIONS FOR REMOVING PHOTO RESIST, RESIDUES AND PARTICLES THEREFROM 审中-公开
标题翻译：用于转移超临界流体溶液中的工作原理的方法和装置，用于去除抗蚀剂，残留物和颗粒物
公开(公告)号：WO2004090339A3
公开(公告)日：2005-09-29
申请号：PCT/US2004010533
申请日：2004-04-05
申请人： S C FLUIDS INC , POPE KEITH , MOUNT DAVID J , ROTHMAN LAURA , WHITE RICK C , BUSBY CLIFTON , DOUGLAS STEPHEN B , DOW III RAYMOND J
发明人： POPE KEITH , MOUNT DAVID J , ROTHMAN LAURA , WHITE RICK C , BUSBY CLIFTON , DOUGLAS STEPHEN B , DOW III RAYMOND J
IPC分类号： B08B7/00 , H01L21/00 , B08B7/04 , B08B3/00 , B08B9/00
CPC分类号： H01L21/67051 , B08B7/0021 , H01L21/67023 , Y10S134/902
摘要： A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.
摘要翻译：超临界流体清洁系统使用过程流体来操作腔室中的旋转马达，其具有用于旋转工件和叶轮的流体轴承和流体负载悬挂。旋转速度和方向传感器和原位定位器便于马达控制。叶轮进一步搅拌了室内的流体，加快了处理速度，提高了超临界流体组分的均匀性，并增加了流体到处理过的表面的传质。离心操作的夹子和盒子保持晶片和叶轮。非接触，流体操作的旋转机构减少污染。物理，旋转和剪切影响通过离心力增强，离心力可以引起膜的局部沉积物或反应物的分子产物与表面的分离。伴随着流体的搅动，以及赋予加工表面特征的连续角加速度。

3. 发明申请

WO2004064121A2 ADDING ENERGY TO A CLEANING PROCESS FLUID FOR REMOVING PHOTO RESIST, RESIDUES AND PARTICLES FROM SEMICONDUCTOR SUBSTRATES, PHOTO MASKS, RETICULES, DISKS AND FLAT-PANEL DISPLAYS 审中-公开
标题翻译：将能量提取到清洁过程流体，用于从半导体基板，照相胶片，胶体，磁盘和平板显示器中移除耐光性，残留物和颗粒
公开(公告)号：WO2004064121A2
公开(公告)日：2004-07-29
申请号：PCT/US2004/000640
申请日：2004-01-12
申请人： S.C. FLUIDS INC. , MOUNT, David, J.
发明人： MOUNT, David, J.
IPC分类号： H01L
CPC分类号： H01L21/02101 , B08B7/0021 , H01L21/67051 , H01L21/6719
摘要： A supercritical fluid cleaning system and method comprising mainly a pressure chamber, a closable lid, a substrate support for holding at least one substrate, a rotable shaft extending outward from within the chamber, an external rotary power source coupled magnetically or otherwise to the shaft, and a rotable component or impeller attached to the chamber end of the shaft in close proximity to the substrate holding position, and baffles located close to the rotable component. The rotable component is configured for rotation within the supercritical phase fluid in the chamber close to the surface of the wafer for causing agitation and turbulent fluid flow against the surface of the substrate, and increased intra-chamber fluid circulation.
摘要翻译：一种超临界流体清洁系统和方法，主要包括压力室，可关闭盖，用于保持至少一个基板的基板支撑件，从室内向外延伸的可旋转轴，以磁性或其他方式耦合到轴的外部旋转动力源，以及可靠的组件或叶轮，其附接到轴的腔室端部，其紧邻基板保持位置，以及靠近可旋转部件的挡板。可旋转部件被配置为在室内的超临界相流体内旋转，靠近晶片表面，以引起对衬底表面的搅动和湍流流体流动，并增加了室内流体循环。

4. 发明申请

WO2004064244A3 METHOD FOR RELEASING AND DRYING MOVEABLE ELEMENTS OF MICRO-ELECTRONIC MECHANICAL STRUCTURES WITH ORGANIC THIN FILM SACRIFICIAL LAYERS 审中-公开
标题翻译：微电子机械结构与有机薄膜真空层的移动和干燥方法
公开(公告)号：WO2004064244A3
公开(公告)日：2004-11-25
申请号：PCT/US2004000777
申请日：2004-01-13
申请人： S C FLUIDS INC , MOUNT DAVID J
发明人： MOUNT DAVID J
IPC分类号： B08B7/00 , B81C1/00 , B08B3/00
CPC分类号： B81C1/00928 , B08B7/0021 , B81C2201/117
摘要： One embodiment of the present invention provides a method for the removal of organic sacrificial layers from a micro-electromechanical structure including the steps of: immersing the structure in at least one bath of at least a first organic solvent, thereby removing substantially all of the organic sacrificial layers; rinsing the structure in a bath of a second organic solvent; transferring the structure to a pressure chamber without substantial evaporation of the second organic solvent wherein the structure is immersed in a second bath of the second organic solvent; closing, pressurizing and filling the pressure chamber with liquid carbon dioxide whereby the second solvent is substantially displaced; heating the liquid carbon dioxide above its critical temperature, thereby permitting the carbon dioxide to undergo a phase change to the supercritical phase; venting the carbon dioxide to the atmosphere.
摘要翻译：本发明的一个实施方案提供了一种从微机电结构去除有机牺牲层的方法，包括以下步骤：将结构浸入至少一个至少第一有机溶剂的浴中，从而除去基本上所有的有机溶剂牺牲层; 在第二有机溶剂的浴中冲洗结构; 将结构转移到压力室，而不会使第二有机溶剂基本蒸发，其中该结构被浸入第二有机溶剂的第二浴中; 用液体二氧化碳关闭，加压和填充压力室，由此第二溶剂基本上位移; 加热液体二氧化碳超过其临界温度，从而使二氧化碳经历相转变为超临界相; 将二氧化碳排放到大气中。

5. 发明申请

WO2004064244A2 METHOD FOR RELEASING AND DRYING MOVEABLE ELEMENTS OF MICRO-ELECTRONIC MECHANICAL STRUCTURES WITH ORGANIC THIN FILM SACRIFICIAL LAYERS 审中-公开
标题翻译：使用有机薄膜牺牲层来释放和干燥微电子机械结构的可移动元件的方法
公开(公告)号：WO2004064244A2
公开(公告)日：2004-07-29
申请号：PCT/US2004/000777
申请日：2004-01-13
申请人： S.C. FLUIDS INC. , MOUNT, David, J.
发明人： MOUNT, David, J.
IPC分类号： H03B
CPC分类号： B81C1/00928 , B08B7/0021 , B81C2201/117
摘要： One embodiment of the present invention provides a method for the removal of organic sacrificial layers from a micro-electromechanical structure including the steps of: immersing the structure in at least one bath of at least a first organic solvent, thereby removing substantially all of the organic sacrificial layers; rinsing the structure in a bath of a second organic solvent; transferring the structure to a pressure chamber without substantial evaporation of the second organic solvent wherein the structure is immersed in a second bath of the second organic solvent; closing, pressurizing and filling the pressure chamber with liquid carbon dioxide whereby the second solvent is substantially displaced; heating the liquid carbon dioxide above its critical temperature, thereby permitting the carbon dioxide to undergo a phase change to the supercritical phase; venting the carbon dioxide to the atmosphere.
摘要翻译：本发明的一个实施例提供了一种用于从微机电结构去除有机牺牲层的方法，该方法包括以下步骤：将该结构浸入至少一个至少第一有机溶剂从而基本上去除了所有的有机牺牲层; 在第二有机溶剂浴中冲洗该结构; 将所述结构转移到压力室而基本不蒸发所述第二有机溶剂，其中所述结构浸没在所述第二有机溶剂的第二浴中; 用液态二氧化碳关闭，加压并填充压力室，由此第二溶剂基本上被置换; 将液态二氧化碳加热至其临界温度以上，从而使二氧化碳经历相变为超临界相; 将二氧化碳排放到大气中。

6. 发明申请

WO2003061860A1 SUPERCRITICAL FLUID PROCESSES WITH MEGASONICS 审中-公开
标题翻译：超临界流体工艺与MEGASONICS
公开(公告)号：WO2003061860A1
公开(公告)日：2003-07-31
申请号：PCT/US2003/002113
申请日：2003-01-24
申请人： S. C. FLUIDS INC. , ROTHMAN, Laura, B. , ROBEY, Raymond, J. , WHITE, Rick , MOUNT, David, J. , FARMER, Robert, B. , POPE, Keith
发明人： ROTHMAN, Laura, B. , ROBEY, Raymond, J. , WHITE, Rick , MOUNT, David, J. , FARMER, Robert, B. , POPE, Keith
IPC分类号： B08B3/12
CPC分类号： H01L21/67051 , B08B3/12 , B08B7/0021
摘要： An apparatus and process for cleaning residual matter, photoresist and other foreign materials off wafers, substrates and semiconductor work pieces using megasonic techniques in conjunction with supercritical fluid cleaning processes including supercritical carbon dioxide processing with co-solvents and surfactants, using cycles of soak, rapid decompression and flushing, to improve cleaning capability and to remove submicron particles from the surfaces of wafers. The apparatus includes a pressure vessel (10) defined by chamber (12) with vertically movable lid (14), rotary wafer holder (16) piercing a lower heated platen (18), fluid source nozzle (20) supplied by center hole (32), fluid drain outlet (24), and megasonic transducer (30) with electrical supply feedthroughs (34).
摘要翻译：一种使用超声波技术结合超临界流体清洗方法（包括使用辅助溶剂和表面活性剂进行超临界二氧化碳处理）的残余物质，光致抗蚀剂和其他异物清除残余物质，光致抗蚀剂和其他异物的方法，减压和冲洗，以提高清洁能力并从晶片表面去除亚微米颗粒。该设备包括由具有可垂直移动的盖（14）的腔室（12）限定的压力容器（10），刺穿下加热压板（18）的旋转晶片保持器（16），由中心孔（32）供应的流体源喷嘴），流体排放出口（24）和具有电源馈通（34）的兆声换能器（30）。

7. 发明申请

WO2004064121A3 A SUPERCRITICAL FLUID CLEANING SYSTEM AND METHOD 审中-公开
标题翻译：超临界流体清洗系统及方法
公开(公告)号：WO2004064121A3
公开(公告)日：2005-01-27
申请号：PCT/US2004000640
申请日：2004-01-12
申请人： S C FLUIDS INC , MOUNT DAVID J
发明人： MOUNT DAVID J
IPC分类号： B08B7/00 , H01L21/00 , H01L21/02 , B08B3/10
CPC分类号： H01L21/02101 , B08B7/0021 , H01L21/67051 , H01L21/6719
摘要： A supercritical fluid cleaning system and method comprising mainly a pressure chamber (2), a closable lid, a substrate support for holding at least one substrate, a rotable shaft (14) extending outward from within the chamber, an external rotary power source coupled magnetically or otherwise to the shaft (14), and a rotable component or impeller (20) attached to the chamber end of the shaft in close proximity to the substrate holding position, and baffles (16) located close to the rotable component. The rotable component is configured for rotation within the supercritical phase fluid in the chamber close to the surface of the wafer for causing agitation and turbulent fluid flow against the surface of the substrate, and increased intra-chamber fluid circulation.
摘要翻译：一种超临界流体清洁系统和方法，主要包括压力室（2），可关闭盖，用于保持至少一个基板的基板支撑件，从室内向外延伸的可旋转轴（14），磁耦合的外部旋转电源或其他方式连接到轴（14）上，以及可旋转的组件或叶轮（20），其附接到轴的腔室端部，其紧邻衬底保持位置，以及靠近可旋转部件的挡板（16）。可旋转部件被配置为在室内的超临界相流体内旋转，靠近晶片表面，以引起对衬底表面的搅动和湍流流体流动，并增加了室内流体循环。

8. 发明申请

WO2004090339A2 METHOD AND APPARATUS FOR ROTATION OF A WORKPIECE IN SUPERCRITICAL FLUID SOLUTIONS FOR REMOVING PHOTO RESIST, RESIDUES AND PARTICLES THEREFROM 审中-公开
标题翻译：用于转移超临界流体溶液中的工作原理的方法和装置，用于去除抗蚀剂，残留物和颗粒物
公开(公告)号：WO2004090339A2
公开(公告)日：2004-10-21
申请号：PCT/US2004/010533
申请日：2004-04-05
申请人： S. C. FLUIDS, INC. , POPE, Keith , MOUNT, David, J. , ROTHMAN, Laura , WHITE, Rick, C. , BUSBY, Clifton , DOUGLAS, Steven , DOW, III, Raymond, J.
发明人： POPE, Keith , MOUNT, David, J. , ROTHMAN, Laura , WHITE, Rick, C. , BUSBY, Clifton , DOUGLAS, Steven , DOW, III, Raymond, J.
IPC分类号： F15B
CPC分类号： H01L21/67051 , B08B7/0021 , H01L21/67023 , Y10S134/902
摘要： A supercritical fluid cleaning system uses process fluid for operating rotary motors in the chamber with fluid bearings and fluid load levitation for rotating workpieces and impellers. Rotating speed and direction sensors and a home position locator facilitate motor control. Impellers add further agitation of the fluid in the chamber, faster processing, and greater uniformity of supercritical fluid components and increase mass transfer of fluid to the processed surface. Centrifugal operated clips and cassettes hold wafers and impellers. Non-contact, fluid operated rotating mechanisms reduce contamination. Physical, rotational, and shear affects are enhanced through centrifugal forces which can induce the separation of films localized deposits or molecular products of the reaction from the surface. There is a concomitant agitation of fluid, and continuous angular acceleration imparted to the processed surface features.
摘要翻译：超临界流体清洁系统使用过程流体来操作腔室中的旋转马达，其具有用于旋转工件和叶轮的流体轴承和流体负载悬挂。旋转速度和方向传感器和原位定位器便于马达控制。叶轮进一步搅拌了室内的流体，加快了处理速度，提高了超临界流体组分的均匀性，并增加了流体到处理过的表面的传质。离心操作的夹子和盒子保持晶片和叶轮。非接触，流体操作的旋转机构减少污染。物理，旋转和剪切影响通过离心力增强，离心力可以引起膜的局部沉积物或反应物的分子产物与表面的分离。伴随着流体的搅动，以及赋予加工表面特征的连续角加速度。

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