会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • APPARATUS AND METHODS FOR PROVIDING A FLOW OF A HEAT TRANSFER FLUID IN A MICROENVIRONMENT
    • 在微环境中提供热转移流体的装置和方法
    • WO2007027555A2
    • 2007-03-08
    • PCT/US2006033404
    • 2006-08-28
    • FORTHRIGHT ENGINEERING PLLCWORM STEVE L
    • WORM STEVE L
    • A61F7/00F25D23/12
    • F25D3/107A62B17/005F25D2400/26
    • A microenvironment system for use with a heat transfer fluid includes a microenvironment structure and a fluid handling apparatus. The microenvironment structure defines a flow passage to receive a flow of the heat transfer fluid therethrough. The fluid handling apparatus is adapted to provide a flow of the heat transfer fluid through the flow passage. The fluid handling apparatus includes a gas driven pump and a supply of a phase change material (PCM). The gas driven pump is operable to force the flow of the heat transfer fluid through the flow passage. The supply of the PCM is convertible from a solid and/or liquid phase to a gas phase to provide a pressurized drive gas. The fluid handling apparatus is configured to drive the gas driven pump using the pressurized drive gas from the supply of the PCM.
    • 与传热流体一起使用的微环境系统包括微环境结构和流体处理装置。 微环境结构限定了流动通道以接收通过其中的传热流体的流动。 流体处理装置适于提供通过流动通道的传热流体的流动。 流体处理装置包括气体驱动泵和相变材料(PCM)的供给。 气体驱动泵可操作以迫使传热流体流过流动通道。 PCM的供应可从固相和/或液相转化为气相,以提供加压的驱动气体。 流体处理装置构造成使用来自PCM的供应源的加压驱动气体来驱动气体驱动泵。
    • 7. 发明申请
    • PRESSURE CHAMBER ASSEMBLY INCLUDING DRIVE MEANS
    • 压力室组件包括驱动装置
    • WO2003023827A1
    • 2003-03-20
    • PCT/US2002/024004
    • 2002-07-30
    • MICELL TECHNOLOGIES, INC.WORM, Steve, L.
    • WORM, Steve, L.
    • H01L21/00
    • H01L21/68785B08B7/0021H01L21/67126H01L21/68792
    • A pressure chamber assembly (400) for processing a substrate (5) includes a pressure vessel defining an enclosed pressure chamber (410). A substrate holder (552) is disposed in the pressure chamber (410) and is adapted to hold the substrate (5). A drive assembly (580) is operable to move the substrate holder (552). The drive assembly (580) includes a first drive member (560, 590) connected to the substrate holder (552) for movement therewith relative to the pressure vessel and a second drive member (592, 594) fluidly isolated from the first drive member and the pressure chamber. A drive unit (582) is operable to move the second drive member (592, 594). The drive unit (582) is fluidly isolated from the first drive member (560, 590) and the pressure chamber (410). The second drive member (592, 594) is non-mechanically coupled to the first drive member (560, 590) such that the drive unit (582) can move the substrate holder (552) via the first and second drive members.
    • 用于处理衬底(5)的压力室组件(400)包括限定封闭压力室(410)的压力容器。 衬底保持器(552)设置在压力室(410)中并且适于保持衬底(5)。 驱动组件(580)可操作以移动衬底保持器(552)。 驱动组件(580)包括连接到衬底保持器(552)上以便相对于压力容器移动的第一驱动构件(560,590)和与第一驱动构件流体隔离的第二驱动构件(592,594)和 压力室。 驱动单元(582)可操作以移动第二驱动构件(592,594)。 驱动单元(582)与第一驱动构件(560,590)和压力室(410)流体隔离。 第二驱动构件(592,594)非机械地联接到第一驱动构件(560,590),使得驱动单元(582)可以经由第一和第二驱动构件移动衬底保持器(552)。
    • 8. 发明申请
    • METHODS AND APPARATUS FOR HOLDING A SUBSTRATE IN A PRESSURE CHAMBER
    • 用于在压力室中保持基底的方法和装置
    • WO2003023826A2
    • 2003-03-20
    • PCT/US2002/024003
    • 2002-07-30
    • MICELL TECHNOLOGIES, INC.WORM, Steve, L.
    • WORM, Steve, L.
    • H01L21/00
    • H01L21/67051H01L21/6838Y10S134/902
    • A process chamber assembly for use with a substrate includes a vessel and a substrate holder. The vessel defines a chamber. The substrate holder has a rotational axis and includes front and rear opposed surfaces. The front surface is adapted to support the substrate. At least one impeller vane extends rearwardly from the rear surface and radially with respect to the rotational axis. The impeller vane is operative to generate a pressure differential tending to hold the substrate to the substrate holder when the substrate holder is rotated about the rotational axis. Preferably, the process chamber assembly includes a plurality of the impeller vanes extending rearwardly from the rear surface and radially with respect to the rotational axis.
    • 用于衬底的处理室组件包括容器和衬底保持器。 容器限定一个室。 衬底保持器具有旋转轴线并且包括前和后相对表面。 前表面适于支撑基底。 至少一个叶轮叶片从后表面向后延伸并且相对于旋转轴线径向延伸。 当衬底保持器围绕旋转轴线旋转时,叶轮叶片可操作以产生趋向于将衬底保持到衬底保持器的压差。 优选地,处理室组件包括从后表面向后延伸并且相对于旋转轴线径向延伸的多个叶轮叶片。