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21. 发明申请

WO2012015694A3 DETECTION OF LAYER CLEARING USING SPECTRAL MONITORING 审中-公开
公开(公告)号：WO2012015694A3
公开(公告)日：2012-02-02
申请号：PCT/US2011/045025
申请日：2011-07-22
申请人： APPLIED MATERIALS, INC. , ZHANG, Jimin , WANG, Zhihong , LEE, Harry Q. , TU, Wen-Chiang
发明人： ZHANG, Jimin , WANG, Zhihong , LEE, Harry Q. , TU, Wen-Chiang
IPC分类号： H01L21/304 , H01L21/66
摘要： A method of polishing includes polishing a substrate having a second layer overlying a first layer, measuring a sequence of groups of spectra of light from the substrate while the substrate is being polished, each group of the groups of spectra including spectra from different locations on the substrate, for each group, calculating a value for a dispersion parameter of the spectra in the group to generate a sequence of dispersion values, and detecting exposure of the first layer based on the sequence of dispersion values.

22. 发明申请

WO2012015694A2 DETECTION OF LAYER CLEARING USING SPECTRAL MONITORING 审中-公开
标题翻译：光谱监测法检测分层
公开(公告)号：WO2012015694A2
公开(公告)日：2012-02-02
申请号：PCT/US2011045025
申请日：2011-07-22
申请人： APPLIED MATERIALS INC , ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
发明人： ZHANG JIMIN , WANG ZHIHONG , LEE HARRY Q , TU WEN-CHIANG
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/013 , B24B37/042 , G01B11/0633 , G01B11/0683 , H01L21/3212 , H01L22/12 , H01L22/26
摘要： A method of polishing includes polishing a substrate having a second layer overlying a first layer, measuring a sequence of groups of spectra of light from the substrate while the substrate is being polished, each group of the groups of spectra including spectra from different locations on the substrate, for each group, calculating a value for a dispersion parameter of the spectra in the group to generate a sequence of dispersion values, and detecting exposure of the first layer based on the sequence of dispersion values.
摘要翻译：一种抛光方法包括抛光具有覆盖第一层的第二层的衬底，在抛光衬底的同时测量来自衬底的光谱组的序列，每组光谱包括来自衬底上的不同位置的光谱衬底，对于每个组，计算该组中的光谱的色散参数的值以产生色散值序列，并且基于该色散值序列检测第一层的曝光。

23. 发明申请

WO2011139524A2 AUTOMATIC GENERATION OF REFERENCE SPECTRA FOR OPTICAL MONITORING 审中-公开
标题翻译：用于光学监测的参考光谱自动生成
公开(公告)号：WO2011139524A2
公开(公告)日：2011-11-10
申请号：PCT/US2011/032650
申请日：2011-04-15
申请人： APPLIED MATERIALS, INC. , DAVID, Jeffrey, Drue , LEE, Harry, Q. , QIAN, Jun , ZHANG, Jimin
发明人： DAVID, Jeffrey, Drue , LEE, Harry, Q. , QIAN, Jun , ZHANG, Jimin
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/042 , B24B37/005 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each spectrum in the sequence of spectra with a index value equal to a number of platen rotations at which the each spectrum was measured, and storing the sequence of spectra as reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括在具有可旋转压板的抛光设备中抛光第一衬底，在用原位监测系统抛光期间测量来自衬底的光谱序列，将光谱序列中的每个光谱与指示值等于测量每个光谱的平板旋转数，并将光谱序列存储为参考光谱。

24. 发明申请

WO2011127326A1 ULTRASOUND MONITORING SYSTEMS, METHODS AND COMPONENTS 审中-公开
标题翻译：超声波监测系统，方法和组件
公开(公告)号：WO2011127326A1
公开(公告)日：2011-10-13
申请号：PCT/US2011/031643
申请日：2011-04-07
申请人： PHYSIOSONICS, INC. , ZHANG, Jimin , SERROELS, Randy , LIN, Ingrid , HUBLER, Robert Bruce , SULLIVAN, Joseph Patrick , LEONARD, Paul C. , ARAGON, Joel , FRYER, Luke , BROWN, Harold A. , LONG, Clare , DALE, Nathan J.
发明人： ZHANG, Jimin , SERROELS, Randy , LIN, Ingrid , HUBLER, Robert Bruce , SULLIVAN, Joseph Patrick , LEONARD, Paul C. , ARAGON, Joel , FRYER, Luke , BROWN, Harold A. , LONG, Clare , DALE, Nathan J.
IPC分类号： A61B19/00
CPC分类号： A61B8/0808 , A61B8/4227 , A61B8/4472
摘要： Ultrasound monitoring systems and components used in ultrasound monitoring systems, such as Transcranial Dopper (TCD) systems, are disclosed. Components include framework systems for mounting, locating and maintaining one or more ultrasound probes in contact with an anatomical surface, adjustable probe mounting systems, and probe interface components providing an acoustically transmissive interface between a probe mounting system and the emissive face of the ultrasound probe.
摘要翻译：公开了超声波监测系统和用于超声监测系统中的组件，例如经颅多普勒（TCD）系统。组件包括用于安装，定位和维护与解剖表面接触的一个或多个超声波探头的框架系统，可调节的探针安装系统和探针接口部件，其在探针安装系统和超声波探头的发射面之间提供声学透射的界面。

25. 发明申请

WO2010126902A2 TEMPERATURE CONTROL OF CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：化学机械抛光温度控制
公开(公告)号：WO2010126902A2
公开(公告)日：2010-11-04
申请号：PCT/US2010/032609
申请日：2010-04-27
申请人： APPLIED MATERIALS, INC. , XU, Kun , ZHANG, Jimin , JEW, Stephen , OSTERHELD, Thomas H.
发明人： XU, Kun , ZHANG, Jimin , JEW, Stephen , OSTERHELD, Thomas H.
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B55/02 , B24B37/015
摘要： A chemical mechanical polishing apparatus including a platen for holding a pad having a polishing surface, a subsystem for holding a substrate and the polishing surface together during a polishing step, and a temperature sensor oriented to measure a temperature of the polishing surface, wherein the subsystem accepts the temperature measured by the sensor and is programmed to vary a polishing process parameter in response to the measured temperature. In an aspect, a chemical mechanical polishing apparatus having a platen for holding a pad having a polishing surface, a fluid delivery system for transporting a fluid from a source to the polishing surface, and a temperature controller which during operation controls the temperature of the fluid transported by the delivery system.
摘要翻译：一种化学机械抛光装置，包括用于在抛光步骤期间将用于保持具有抛光表面的焊盘的垫板，用于保持基板和抛光表面的子系统以及用于测量抛光表面的温度的温度传感器，其中所述子系统接受由传感器测量的温度，并被编程以响应于测量的温度来改变抛光工艺参数。一方面，一种具有用于保持具有抛光表面的焊盘的压板的化学机械抛光装置，用于将流体从源传送到抛光表面的流体输送系统以及在操作期间控制流体温度的温度控制器由运送系统运输。

26. 发明申请

WO2010053804A3 ENDPOINT CONTROL OF MULTIPLE-WAFER CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：多波长化学机械抛光的端点控制
公开(公告)号：WO2010053804A3
公开(公告)日：2010-07-22
申请号：PCT/US2009062433
申请日：2009-10-28
申请人： APPLIED MATERIALS INC , ZHANG JIMIN , OSTERHELD THOMAS H , CARLSSON INGEMAR , SWEDEK BOGUSLAW A , JEW STEPHEN
发明人： ZHANG JIMIN , OSTERHELD THOMAS H , CARLSSON INGEMAR , SWEDEK BOGUSLAW A , JEW STEPHEN
IPC分类号： H01L21/304 , B24B37/013
CPC分类号： B24B37/013 , B24B49/04
摘要： A computer-implemented method includes polishing substrates simultaneously in a polishing apparatus. Each substrate has a polishing rate independently controllable by an independently variable polishing parameter. Measurement data that varies with the thickness of each of the substrates is acquired from each of the substrates during polishing with an in-situ monitoring system. A projected thickness that each substrate will have at a target time is determined based on the measurement data. The polishing parameter for at least one substrate is adjusted to adjust the polishing rate of the at least one substrate such that the substrates have closer to the same thickness at the target time than without the adjustment.
摘要翻译：计算机实现的方法包括在抛光装置中同时抛光衬底。每个基底具有通过独立可变抛光参数独立控制的抛光速率。随着每个基板的厚度变化的测量数据在用原位监测系统进行抛光时从每个基板获得。基于测量数据确定每个基板在目标时间具有的投影厚度。调整至少一个基板的抛光参数以调节至少一个基板的抛光速率，使得基板在目标时间比不进行调节更接近相同的厚度。

27. 发明申请

WO2008005951A2 POLISHING PAD WITH WINDOW HAVING MULTIPLE PORTIONS 审中-公开
标题翻译：具有多个部分的窗户的抛光垫
公开(公告)号：WO2008005951A2
公开(公告)日：2008-01-10
申请号：PCT/US2007072690
申请日：2007-07-02
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC , SWEDEK BOGUSLAW , ZHANG JIMIN
发明人： BENVEGNU DOMINIC , SWEDEK BOGUSLAW , ZHANG JIMIN
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B49/12
摘要： A polishing pad has an opaque polishing layer with an aperture therethrough and a polishing surface, and a solid light-transmissive window in the aperture. The solid light-transmissive window includes an outer portion secured to the polishing layer and an inner portion secured to the outer portion. The outer portion has a upper surface recessed relative to the polishing surface, whereas the inner portion has an upper surface that is substantially co-planar with the polishing surface.
摘要翻译：抛光垫具有穿透其中的孔的不透明抛光层和抛光表面，以及孔中的固体透光窗。固体透光窗包括固定到抛光层的外部部分和固定到外部部分的内部部分。外部具有相对于抛光表面凹陷的上表面，而内部具有与抛光表面基本共面的上表面。

28. 发明申请

WO2012019040A2 SPECTROGRAPHIC MONITORING USING INDEX TRACKING AFTER DETECTION OF LAYER CLEARING 审中-公开
标题翻译：检测层清除后使用索引跟踪进行光谱监测
公开(公告)号：WO2012019040A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/046642
申请日：2011-08-04
申请人： APPLIED MATERIALS, INC. , ZHANG, Jimin , WANG, Zhihong , LEE, Harry Q. , TU, Wen-Chiang
发明人： ZHANG, Jimin , WANG, Zhihong , LEE, Harry Q. , TU, Wen-Chiang
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/042 , B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value, polishing a substrate having a second layer overlying a first layer, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum to generate a sequence of best matching reference spectra, determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values, detecting exposure of the first layer, fitting a function to a portion of the sequence of index values corresponding to spectra measured after detection of exposure of the first layer, and determining a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储具有多个参考光谱的库，多个参考光谱的每个参考光谱具有存储的相关索引值，抛光具有覆盖第一层的第二层的衬底，测量第对于光谱序列的每个测量光谱，找到最佳匹配参考光谱以产生最佳匹配参考光谱序列，从最佳匹配参考序列确定每个最佳匹配光谱的相关索引值光谱以产生索引值序列，检测第一层的曝光，将功能拟合到对应于在检测到第一层的曝光之后测量的光谱的索引值序列的一部分，以及确定抛光终点或调整基于功能的抛光速率。

29. 发明申请

WO2010126901A2 METHOD OF MAKING AND APPARATUS HAVING WINDOWLESS POLISHING PAD AND PROTECTED FIBER 审中-公开
标题翻译：具有无窗抛光垫和保护纤维的制造方法
公开(公告)号：WO2010126901A2
公开(公告)日：2010-11-04
申请号：PCT/US2010032607
申请日：2010-04-27
申请人： APPLIED MATERIALS INC , ZHANG JIMIN , DUBOUST ALAIN , BENNETT DOYLE E
发明人： ZHANG JIMIN , DUBOUST ALAIN , BENNETT DOYLE E
IPC分类号： H01L21/304 , H01L21/66
CPC分类号： B24B37/205 , B24B37/013 , B24B49/12
摘要： A polishing system includes a polishing pad with an aperture that extends through all layers of the polishing pad and a light transmissive film positioned on top of a light-generating or light-guiding element of an optical monitoring system.
摘要翻译：抛光系统包括具有延伸穿过抛光垫的所有层的孔的抛光垫和位于光学监控系统的发光或光导元件顶部的透光膜。

30. 发明申请

WO2008154185A3 THIN POLISHING PAD WITH WINDOW AND MOLDING PROCESS 审中-公开
标题翻译：具有窗口和成型工艺的薄型抛光垫
公开(公告)号：WO2008154185A3
公开(公告)日：2009-02-12
申请号：PCT/US2008065316
申请日：2008-05-30
申请人： APPLIED MATERIALS INC , BENVEGNU DOMINIC J , ZHANG JIMIN , OSTERHELD THOMAS H , SWEDEK BOGUSLAW A
发明人： BENVEGNU DOMINIC J , ZHANG JIMIN , OSTERHELD THOMAS H , SWEDEK BOGUSLAW A
IPC分类号： B24B37/04
CPC分类号： B24B37/205 , B24B37/013
摘要： A polishing pad is described that has a polishing layer with a polishing surface, an adhesive layer on a side of the polishing layer opposite the polishing layer, and a solid light-transmitting window extending through and molded to the polishing layer. The window has a top surface coplanar with the polishing surface and a bottom surface coplanar with a lower surface of the adhesive layer. A method of making a polishing pad includes forming an aperture through a polishing layer and an adhesive layer, securing a backing piece to the adhesive layer on a side opposite a polishing surface of the polishing layer, dispensing a liquid polymer into the aperture, and curing the liquid polymer to form a window.
摘要翻译：描述了具有抛光层的抛光垫，抛光层具有抛光表面，在抛光层的与抛光层相对的一侧上的粘合剂层以及延伸穿过模制到抛光层的固体透光窗。窗口具有与抛光表面共面的顶表面和与粘合剂层的下表面共面的底表面。制造抛光垫的方法包括通过抛光层和粘合剂层形成孔，将背衬片固定在与抛光层的抛光表面相对的一侧上的粘合剂层上，将液体聚合物分配到孔中，并固化液体聚合物形成窗口。

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