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11. 发明申请

WO2004081503A3 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A3
公开(公告)日：2005-10-06
申请号：PCT/US2004006551
申请日：2004-03-03
申请人： CYMER INC , PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
发明人： PARTLO WILLIAM N , BLUMENSTOCK GERRY M , BOWERING NORBERT , BRUZZONE KENT A , COBB DENNIS W , DYER TIMOTHY S , DUNLOP JOHN , FOMENKOV IGOR V , HYSHAM JAMES CHRISTOPHER , OLIVER ROGER I , PALENSCHAT FREDERICK A , PAN XIAOJIANG J , RETTIG CURTIS L , SIMMONS RODNEY S , WALKER JOHN , WEBB KYLE R , HOFMANN THOMAS , KHODYKIN OLEH
IPC分类号： G01J20060101 , G03F7/20 , H01J1/52 , H01S3/00 , H01S3/225 , H05G2/00 , H05H1/06
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An EUV source (20) includes a debris mitigation apparatus (60) employing a metal halogen gas producing a metal halide from debris exiting the plasma, a debris shield (36) having a plurality of curvilinear shield members (102) having inner and outer surface connected by light passages (104) and electrodes (28,88) for providing a discharged plasma (32) in a chamber (22).
摘要翻译： EUV源（20）包括使用从离开等离子体的碎屑产生金属卤化物的金属卤素气体的碎片减缓装置（60），具有多个曲线形屏蔽构件（102）的碎片屏蔽（36），其具有内表面和外表面通过光通道（104）和用于在腔室（22）中提供排出的等离子体（32））的电极（28,88）连接。

12. 发明申请

WO01099143A1 PLASMA FOCUS LIGHT SOURCE WITH TANDEM ELLIPSOIDAL MIRROR UNITS 审中-公开
标题翻译：等离子体聚焦光源，带有TANDEM ELLIPSOIDAL MIRROR UNITS
公开(公告)号：WO01099143A1
公开(公告)日：2001-12-27
申请号：PCT/US2001/018758
申请日：2001-06-07
IPC分类号： G03F7/20 , H05G2/00 , H05H1/06 , H01J35/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes forming a plasma pinch source (46) are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 pi steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system (404) having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer (406) for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.
摘要翻译：高能光子源。形成等离子体夹紧源（46）的一对等离子体夹持电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源以1000Hz或更大的重复频率提供电脉冲，并且在足够高的电压下产生电极之间的放电，以在工作气体中产生非常高温度的高密度等离子体夹持，从而在源的光谱线处提供辐射或活性气体。描述了第四代单元，其以氙气作为活性气体以2000Hz的重复频率产生20mJ，13.5nm脉冲到2π立体声中。该单元包括具有对充电电容器组充电的谐振充电器的脉冲电力系统（404）和包括脉冲变压器（406）的磁性压缩电路，该脉冲变压器用于以2000Hz或更大的重复频率产生高电压电脉冲。

13. 发明申请

WO2011011702A2 RADIONUCLIDE PRODUCTION USING A Z-PINCH NEUTRON SOURCE 审中-公开
公开(公告)号：WO2011011702A2
公开(公告)日：2011-01-27
申请号：PCT/US2010043077
申请日：2010-07-23
申请人： DAWES DANIEL L , WESSEL FRANK J , RAHMAN HAFIZ
发明人： WESSEL FRANK J , RAHMAN HAFIZ
IPC分类号： G21G1/06
CPC分类号： G21G1/06 , G21B1/03 , H05H1/06 , H05H3/06 , Y02E30/14
摘要： Radionuclides are produced with a pulsed neutron flux from a multiple repetition rate staged Z-pinch machine, the pulsed neutron flux is moderated, an activatable radionuclide precursor is exposed to the moderated pulsed neutron flux, and a corresponding radionuclide from the activatable radionuclide precursor is produced. High current pulses are passed through a target plasma of fusible material enclosed in a cylindrical liner plasma composed of a high-Z plasma to generate a magnetic field that compresses the liner plasma, and generates shock waves. The shock implodes the target plasma. The shock front propagates between an outer shock front and an axis of the target plasma so it is heated through shock dissipation and by adiabatic compression due to an imploding shock front produced in the outer liner plasma to fuse light nuclei and generate alpha particles and neutrons. Alpha particles trapped within the magnetic field further heat the target plasma.

14. 发明申请

WO2004081503A2 DISCHARGE PRODUCED PLASMA EUV LIGHT SOURCE 审中-公开
标题翻译：排放生产等离子体光源
公开(公告)号：WO2004081503A2
公开(公告)日：2004-09-23
申请号：PCT/US2004/006551
申请日：2004-03-03
申请人： CYMER, INC. , PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
发明人： PARTLO, William, N. , BLUMENSTOCK, Gerry, M. , BOWERING, Norbert , BRUZZONE, Kent, A. , COBB, Dennis, W. , DYER, Timothy, S. , DUNLOP, John , FOMENKOV, Igor, V. , HYSHAM, James, Christopher , OLIVER, Roger, I. , PALENSCHAT, Frederick, A. , PAN, Xiaojiang, J. , RETTIG, Curtis, L. , SIMMONS, Rodney, S. , WALKER, John , WEBB, Kyle, R. , HOFMANN, Thomas
IPC分类号： G01J
CPC分类号： H01S3/005 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70908 , G03F7/70916 , H01S3/225 , H05G2/003 , H05G2/005 , H05H1/06
摘要： An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members having inner and outer surfaces connected by light passages aligned to a focal point, which shield members may be alternated with open spaces between them and may have surfaces that form a circle in one axis of rotation and an ellipse in another. The electrodes may be supplied with a discharge pulse shaped to produce a modest current during the axial run out phase of the discharge and a peak occurring during the radial compression phase of the discharge. The light source may comprise a turbomolecular pump having an inlet connected to the generation chamber and operable to preferentially pump more of the source gas than the buffer gas from the chamber. The source may comprise a tuned electrically conductive electrode comprising: a differentially doped ceramic material doped in a first region to at least select electrical conductivity and in a second region at least to select thermal conductivity. The first region may be at or near the outer surface of the electrode structure and the ceramic material may be SiC or alumina and the dopant is BN or a metal oxide, including SiO or TiO 2 . The source may comprise a moveable electrode assembly mount operative to move the electrode assembly mount from a replacement position to an operating position, with the moveable mount on a bellows. The source may have a temperature control mechanism operatively connected to the collector and operative to regulate the temperature of the respective shell members to maintain a temperature related geometry optimizing the glancing angle of incidence reflections from the respective shell members, or a mechanical positioner to position the shell members. The shells may be biased with a voltage. The debris shield may be fabricated using off focus laser radiation. The anode may be cooled with a hollow interior defining two coolant passages or porous metal defining the passages. The debris shield may be formed of pluralities of large, intermediate and small fins attached either to a mounting ring or hub or to each other with interlocking tabs that provide uniform separation and strengthening and do not block any significant amount of light.
摘要翻译：公开了一种DPP EUV源，其可以包括使用从离开等离子体的碎片产生金属卤化物的金属卤素气体的碎片减缓装置。 EUV源可以具有碎片屏蔽，其可以包括多个曲线屏蔽构件，其具有通过与焦点对准的光通道连接的内表面和外表面，该屏蔽构件可以与它们之间的开放空间交替，并且可以具有形成在一个旋转轴上的圆圈和另一个轴上的椭圆。电极可以被供给放电脉冲，该放电脉冲在放电的轴向耗尽阶段期间产生适度的电流，并且在放电的径向压缩阶段期间发生峰值。光源可以包括涡轮分子泵，其具有连接到发电室的入口，并且可操作以比来自该室的缓冲气体优先地泵送更多的源气体。源可以包括调谐的导电电极，包括：掺杂在第一区域中以至少选择电导率的差分掺杂陶瓷材料，并且在第二区域中至少选择导热性。第一区域可以在电极结构的外表面处或附近，并且陶瓷材料可以是SiC或氧化铝，并且掺杂剂是BN或包括SiO或TiO 2的金属氧化物。源可以包括可移动电极组件安装件，其可操作以将电极组件安装座从更换位置移动到操作位置，可移动安装件在波纹管上。源可以具有可操作地连接到收集器的温度控制机构，并且可操作地调节相应壳体部件的温度，以保持温度相关几何形状优化来自相应外壳部件的入射反射的扫掠角，或机械定位器壳成员。壳可能会被电压偏置。可以使用离焦激光辐射来制造碎片屏蔽。阳极可以用限定两个冷却剂通道或限定通道的多孔金属的中空内部冷却。碎片屏蔽可以由连接到安装环或轮毂的多个大的，中间的和小的翅片形成，或者彼此具有提供均匀分离和强化并且不阻挡任何显着量的光的互锁突起。

15. 发明申请

WO0178469A3 Z-PINCH PLASMA X-RAY SOURCE USING SURFACE DISCHARGE PREIONIZATION 审中-公开
标题翻译： Z-PINCH等离子体X射线源使用表面放电预处理
公开(公告)号：WO0178469A3
公开(公告)日：2002-02-28
申请号：PCT/US0109964
申请日：2001-03-28
申请人： PLEX LLC
发明人： MCGEOCH MALCOLM W
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , H05G2/005 , H05H1/06
摘要： A Z-pinch plasma X-ray source includes a chamber having an insulating wall and defining a pinch region, a pinch anode and a pinch cathode positioned at opposite ends of the pinch region, a first conductor defining an edge in close proximity to or contacting an inside surface of the insulating wall and a second conductor disposed around an outside surface of the insulating wall. A surface discharge is produced on the inside surface of the insulating wall in response to application of a voltage to the first and second conductors. The surface discharge causes the gas to ionize and to form a plasma shell near the inside surface of the insulating wall. The pinch anode and the pinch cathode produce a current through the plasma shell in an axial direction and produce an azimuthal magnetic field in the pinch region in response to application of a high energy electric pulse to the pinch anode and the pinch cathode. The azimuthal magnetic field causes the plasma shell to collapse to the central axis and to generate X-rays.
摘要翻译： Z夹式等离子体X射线源包括具有绝缘壁并限定夹持区域的腔室，夹紧阳极和位于夹持区域的相对端的夹紧阴极，第一导体限定靠近或接触的边缘所述绝缘壁的内表面和设置在所述绝缘壁的外表面周围的第二导体。响应于向第一和第二导体施加电压，在绝缘壁的内表面上产生表面放电。表面放电使得气体离子化并在绝缘壁的内表面附近形成等离子体壳。收缩阳极和夹紧阴极在轴向方向上产生通过等离子体壳体的电流，并且响应于向收缩阳极和夹点阴极施加高能电脉冲而在夹紧区域中产生方位磁场。方位角磁场使等离子体壳塌陷到中心轴线并产生X射线。

16. 发明申请

WO01037309A1 PLASMA FOCUS LIGHT SOURCE WITH IMPROVED PULSE POWER SYSTEM 审中-公开
标题翻译：具有改进脉冲电力系统的等离子体聚焦光源
公开(公告)号：WO01037309A1
公开(公告)日：2001-05-25
申请号：PCT/US2000/029750
申请日：2000-10-26
IPC分类号： G21K5/00 , G03F7/20 , G21K5/02 , H01L21/027 , H05G2/00 , H05H1/06 , H01J35/20 , H01S3/00 , H01S3/22
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005 , H05H1/06
摘要： A high energy photon source. A pair of plasma pinch electrodes (8) are located in a vacuum chamber in a plasma pinch unit (2). The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to produce a desired spectral line. A pulse power source (10) provides electrical pulses at high enough voltages to create electrical discharges between the electrodes. This produces high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source. The electrodes are configured coaxially with the anode on the axis. Active gas is introduced through the hollow anode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas.
摘要翻译：高能光子源。一对等离子体夹持电极（8）位于等离子体夹紧单元（2）中的真空室中。该室包含工作气体，其包括选择产生所需光谱线的贵重缓冲气体和活性气体。脉冲电源（10）以足够高的电压提供电脉冲以在电极之间产生放电。这在工作气体中产生高温，高密度等离子体夹持，从而在源的光谱线提供辐射。电极与轴上的阳极同轴配置。活性气体通过中空阳极引入。这允许对光谱线源进行优化和缓冲气体的单独优化。

17. 发明申请

WO1996025778A1 PULSE POWER GENERATING CIRCUIT WITH ENERGY RECOVERY 审中-公开
标题翻译：具有能量回收的脉冲发电电路
公开(公告)号：WO1996025778A1
公开(公告)日：1996-08-22
申请号：PCT/US1996001033
申请日：1996-01-26
申请人： CYMER LASER TECHNOLOGIES , ADVANCED PULSE POWER TECHNOLOGIES, INC.
发明人： CYMER LASER TECHNOLOGIES , ADVANCED PULSE POWER TECHNOLOGIES, INC. , BIRX, Daniel, L. , DAS, Palash, P. , FOMENKOV, Igor, V. , PARTLO, William, N. , WATSON, Tom, A.
IPC分类号： H01S03/00
CPC分类号： H05H1/06 , H01S3/097 , H01S3/225 , H03K3/57 , H03K17/80 , H03K2217/0036
摘要： A high voltage pulse power generating circuit (10) capable of providing energy recovery is disclosed. The energy efficient pulse generating circuit source comprises a high voltage charge storing element (C) which is periodically discharged into a compressor circuit (16). An energy recovery circuit coupled to the compressor circuit reverses the polarity of the energy dissipated by the pulse power generating circuit (10) and transfers the waste energy back to the power source (12). In a preferred embodiment, the pulse power generating circuit (10) of the present invention utilizes an SCR switch for periodically discharging the charge storing element (C). This embodiment of the present invention provides pulses consistently and will not provide even a single missed pulse.
摘要翻译：公开了一种能够提供能量回收的高压脉冲发生电路（10）。能量效率脉冲发生电路源包括周期性地排放到压缩机电路（16）中的高电压电荷存储元件（C）。耦合到压缩机电路的能量恢复电路反转由脉冲发电电路（10）消耗的能量的极性，并将废能转移回电源（12）。在优选实施例中，本发明的脉冲发生电路（10）利用SCR开关来周期性地对电荷存储元件（C）进行放电。本发明的该实施例一致地提供脉冲，并且甚至不会提供单个错过的脉冲。

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