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    • 14. 发明申请
    • PLASMA ELECTROPLATING
    • 等离子体电镀
    • WO02038827A1
    • 2002-05-16
    • PCT/AU2001/001435
    • 2001-11-08
    • H05H1/24C23C16/50C23C26/00C25D5/00C25D5/18C25D5/20C25D7/00C25D9/02C25D9/04C25D21/02C25D21/12C23C18/00
    • C25D11/00C23C16/50C23C26/00C25D5/08C25D5/20C25D11/026C25D17/00C25D17/10C25D21/02
    • A method for depositing a film of an advanced material on a surface of an article is disclosed. The method comprises placing the article within a bath having a pair of spaced electrodes one of which is formed by said article and an electrolyte containing a source of the material to be deposited. A stream of bubbles is generated within the electrolyte adjacent to the cathode. There are a number of techniques for generating the stream of bubbles, e.g. electrolysis, ebullition, cavitation, entrainment and sparging. The method also includes applying a potential difference across the cathode and anode such that a glow discharge is formed in the bubble region so as form a plasma of ionised gaseous molecules within the bubble. This highly energised gaseous plasma then acts to deposit a film of material on the surface of the article. The method may be carried out at atmospheric pressure and does not require a vacuum apparatus. The body of electrolyte liquid acts as a source of containment for the plasma. In large potential difference or voltage drop across the stream of bubbles facilitates the formation of a glow discharge in this region which energises and ionises the molecules to be deposited. An apparatus for carrying out this method is also disclosed.
    • 公开了一种在物品表面上沉积高级材料的膜的方法。 该方法包括将物品放置在具有一对间隔电极的浴中,其中一个间隔开的电极由所述制品形成,电解液含有待沉积材料的源。 在与阴极相邻的电解质内产生气泡。 存在许多用于产生气泡流的技术,例如, 电解,沸腾,气蚀,夹带和喷射。 该方法还包括在阴极和阳极之间施加电位差,使得在气泡区域中形成辉光放电,从而在气泡内形成电离气态分子的等离子体。 然后,这种高能量的气体等离子体用于在物品的表面上沉积一层材料。 该方法可以在大气压下进行,不需要真空装置。 电解质液体作为等离子体的容纳源。 在气泡流中的大的电位差或电压降促进了在该区域中形成辉光放电,该能量激发和离子化待沉积的分子。 还公开了一种用于执行该方法的装置。
    • 16. 发明申请
    • APPARATUS AND METHOD FOR UNIFORM METALLIZATION ON SUBSTRATE
    • 在基板上均匀金属化的装置和方法
    • WO2016082093A1
    • 2016-06-02
    • PCT/CN2014/092118
    • 2014-11-25
    • ACM RESEARCH (SHANGHAI) INC.
    • WANG, XiWANG, Hui
    • C25D5/20
    • C25D5/20C25D5/04C25D17/001C25D17/002C25D17/06C25D21/10
    • An apparatus and method for uniform metallization on substrate are provided, achieving highly uniform metallic film deposition at a rate far greater than a conventional film growth rate in electrolyte solutions. The apparatus includes an immersion bath (3021), at least one set of electrode (3002), a substrate holder (3003), at least one ultra/mega sonic device (3004), a reflection plate (3005), and a rotating actuator (3030). The immersion bath contains at least one metal salt electrolyte (3020). The at least one set of electrode (3002) connects to an independent power supply. The substrate holder (3003) holds at least one substrate and electrically connects with a conductive side of the substrate. The conductive side of the substrate is exposed to face the electrode. The at least one ultra/mega sonic device (3004) and the reflection plate (3005) are disposed parallel for generating ultra/mega sonic standing wave in the immersion bath. The rotating actuator (3030) rotates the substrate holder (3003) along its axis in the standing wave field, so as to result in a uniform overall power intensity distribution across the substrate in an accumulated time.
    • 提供了一种在基板上均匀金属化的装置和方法,其实现了高于电解质溶液中常规膜生长速率的高度均匀的金属膜沉积。 所述设备包括浸没池(3021),至少一组电极(3002),衬底保持器(3003),至少一个超声波设备(3004),反射板(3005)和旋转致动器 (3030)。 浸渍浴含有至少一种金属盐电解质(3020)。 至少一组电极(3002)连接到独立电源。 衬底保持器(3003)保持至少一个衬底并与衬底的导电侧电连接。 衬底的导电面暴露于面对电极。 所述至少一个超/超声波装置(3004)和反射板(3005)平行布置以在浸浴中产生超声/超声波驻波。 旋转致动器(3030)在驻波场中沿其轴线旋转衬底保持器(3003),从而在累积时间内在整个衬底上产生均匀的整体功率强度分布。