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    • 1. 发明申请
    • Terminal structure of multi-layer substrate and method for forming the same
    • 多层基板的端子结构及其形成方法
    • US20040262785A1
    • 2004-12-30
    • US10791718
    • 2004-03-04
    • Seok Taek Jun
    • H01L029/40
    • H05K3/3442H01L23/13H01L23/49805H01L23/49827H01L23/49833H01L2224/48227H01L2924/09701H05K2201/09172H05K2201/10727Y02P70/613
    • Disclosed is a terminal structure of a multi-layer substrate and a method for forming the same. In the terminal structure, a plurality of terminals are formed on at least two adjacent substrate layers, each of the terminals being spaced from adjacent ones to a predetermined interval. Openings are formed in at least one of the substrate layers. Each of the openings is formed between each adjacent ones of first terminals in the at least one substrate layer, and spaced from the each first terminals to a predetermined gap, and has a size same as that of the first terminals. The substrate layers are stacked one atop another and compressed together so that second terminals formed on at least one corresponding substrate layer are projected to a plane of an outermost substrate layer on which corresponding terminals are formed. The terminal structure and the method can secure a predetermined interval to a plurality of terminals in a package when the terminals are formed as well as simplify formation thereof.
    • 公开了多层基板的端子结构及其形成方法。 在端子结构中,在至少两个相邻的基板层上形成多个端子,每个端子与相邻的基板间隔开至预定间隔。 开口形成在至少一个基板层中。 每个开口形成在至少一个基板层中的每个相邻的第一端子之间,并且与每个第一端子间隔开至预定的间隙,并且具有与第一端子的尺寸相同的尺寸。 将基板层叠在一起并压缩在一起,使形成在至少一个对应基板层上的第二端子突出到形成相应端子的最外层基板层的平面上。 当端子形成时,端子结构和方法可以确保封装中的多个端子的预定间隔,并且简化其形成。
    • 10. 发明申请
    • Semiconductor device having multilayer interconnection structure and method for manufacturing the device
    • 具有多层互连结构的半导体器件及其制造方法
    • US20040188845A1
    • 2004-09-30
    • US10805403
    • 2004-03-22
    • NEC Electronics Corporation
    • Manabu IguchiAkira MatumotoMasahiro Komuro
    • H01L029/40
    • H01L23/564H01L23/5226H01L23/5329H01L2924/0002H01L2924/00
    • A semiconductor device having a multilayer interconnection structure includes a chip semiconductor substrate, a plurality of interlayer insulating layers disposed on the chip semiconductor substrate, a circuit section disposed on the chip semiconductor substrate, and a plurality of walls that extend through the interlayer insulating layers and are arranged along the peripheral portions of the chip semiconductor substrate such that the walls surround the circuit section. The walls include upper sub-walls and lower sub-walls. The upper sub-walls extend through one of the interlayer insulating layers and further extend into another one of the interlayer insulating layers disposed under the layer through which the upper sub-walls extend. The lower sub-walls extend through one of the interlayer insulating layers disposed under the layer through which the upper sub-walls extend. Lower portions of the upper sub-walls each extend into corresponding upper portions of the lower sub-walls.
    • 具有多层互连结构的半导体器件包括芯片半导体衬底,设置在芯片半导体衬底上的多个层间绝缘层,设置在芯片半导体衬底上的电路部分和延伸穿过层间绝缘层的多个壁,以及 沿着芯片半导体衬底的周边部分布置,使得壁围绕电路部分。 墙壁包括上部的下部墙壁和下部的下部墙壁。 上侧壁延伸穿过层间绝缘层之一并进一步延伸到设置在上部底壁延伸的层下方的另一层间绝缘层中。 下侧壁延伸穿过设置在上部下壁延伸的层下方的层间绝缘层之一。 上部下壁的下部各自延伸到下部副壁的对应的上部。