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1. 发明授权

US09076643B2 Supercritical processing apparatus, substrate processing system and supercritical processing method 有权
标题翻译：超临界处理装置，基板处理系统和超临界处理方法
公开(公告)号：US09076643B2
公开(公告)日：2015-07-07
申请号：US12652794
申请日：2010-01-06
申请人： Takayuki Toshima , Kazuo Terada
发明人： Takayuki Toshima , Kazuo Terada
IPC分类号： H01L21/02
CPC分类号： H01L21/02057 , H01L21/02101
摘要： Disclosed is a supercritical processing apparatus which can suppress the occurrence of pattern collapse, improve the throughput, and prolong a maintenance interval. In the disclosed supercritical processing apparatus to remove a liquid remained on a substrate by a super-critical state processing fluid, a heating unit heats the processing fluid to place the processing fluid into a processing receptacle in a supercritical state, and a cooling mechanism forcibly cools an area capable of transferring the heat to the substrate from the heating unit in order to suppress the liquid from being evaporated from the substrate until the substrate is disposed on a seating unit.
摘要翻译：公开了一种超临界处理装置，其可以抑制图案崩溃的发生，提高生产量，并延长维护间隔。在公开的超临界处理装置中，通过超临界状态处理流体去除残留在基板上的液体，加热单元加热处理流体，将处理流体置于超临界状态的处理容器中，冷却机构强制冷却能够从加热单元将热量传递到基板的区域，以便抑制液体从基板蒸发直到基板设置在就座单元上。

2. 发明授权

US08235061B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US08235061B2
公开(公告)日：2012-08-07
申请号：US12824565
申请日：2010-06-28
申请人： Takayuki Toshima , Kazuo Terada , Kazuyuki Honda
发明人： Takayuki Toshima , Kazuo Terada , Kazuyuki Honda
IPC分类号： B08B3/08 , B08B3/10
CPC分类号： B08B3/10 , H01L21/67057 , H01L21/67751 , Y10S134/902
摘要： Provided are a substrate processing apparatus and a substrate processing method capable of processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The substrate processing apparatus includes a cleaning bath configured to accommodate a substrate and clean the substrate by flowing a cleaning solution, and a processing vessel configured to accommodate the cleaning bath and process the substrate with a supercritical fluid.
摘要翻译：提供了一种基板处理装置和基板处理方法，其能够使用超临界流体处理基板，而不将形成在基板上的图案暴露于大气环境。基板处理装置包括：清洗槽，其配置为容纳基板并通过流动清洁溶液清洁基板;以及处理容器，其构造成容纳清洗槽并用超临界流体处理基板。

3. 发明申请

US20080182217A1 HEATING DEVICE, HEATING METHOD AND STORAGE MEDIUM 审中-公开
标题翻译：加热装置，加热方法和储存介质
公开(公告)号：US20080182217A1
公开(公告)日：2008-07-31
申请号：US12020898
申请日：2008-01-28
申请人： Tetsuo Fukuoka , Takahiro Kitano , Kazuo Terada
发明人： Tetsuo Fukuoka , Takahiro Kitano , Kazuo Terada
IPC分类号： F27D15/02 , F27D3/00
CPC分类号： F27B17/0025 , H01L21/67109 , H01L21/67248
摘要： A heating device 1 includes a flat heating chamber 3 provided with a side opening. A substrate W is carried in a horizontal position through the side opening into the processing chamber 3, and is subjected to a heating process in the heating chamber 3. the heating chamber 3 is provided with heating plates 34 and 35 respectively provided with heating elements 34a and 35a, and a cooling mechanism 2 for cooling the heating plates 34 and 35. A controller 7 controls the cooling mechanism such that the heating plates 34 and 35 are cooled after the completion of the heating process for heating the substrate W and before a succeeding substrate W is carried into the heating chamber 3, and controls the heating elements 34a and 35a such that the heating plates 34 and 35 are heated at a processing temperature after the succeeding substrate has been carried into the heating chamber 3.
摘要翻译：加热装置1包括具有侧开口的平坦加热室3。基板W通过侧开口在水平位置被运送到处理室3中，并且在加热室3中进行加热处理。加热室3设置有分别设有加热元件31a和35a的加热板34和35，以及用于冷却加热板34和35的冷却机构2。控制器7控制冷却机构，使得加热板34和35在完成用于加热基板W的加热过程之后并且在将下一个基板W运送到加热室3之前被冷却，并且控制加热元件34a 和35a，使得加热板34和35在后续基板被运送到加热室3之后的加工温度下被加热。

4. 发明授权

US5760452A Semiconductor memory and method of fabricating the same 失效
标题翻译：半导体存储器及其制造方法
公开(公告)号：US5760452A
公开(公告)日：1998-06-02
申请号：US732832
申请日：1996-10-15
申请人： Kazuo Terada
发明人： Kazuo Terada
IPC分类号： H01L27/108 , H01L29/105 , H01L29/94 , H01L31/062 , H01L31/113
CPC分类号： H01L27/10808 , H01L27/10805
摘要： Disclosed are an improved semiconductor memory cell suitable for high integration and a novel method of fabricating the same. The memory cell has a large capacitance and a small area. The memory cell also has a plurality of bit-lines buried in an isolation region in a semiconductor substrate. The bit-line has a very small width and thickness thereby reducing a parasitic capacity between the bit-line and the semiconductor substrate. The memory cell may further be provided with a noise shielding line. Further, disclosed is a novel memory cell array of a semiconductor memory. The buried bit-line is coupled with a bit-line connecting sub-arrays and both are separated by a insulation film. A plurality of pairs of the bit-lines are arranged in rows. A word-line is coupled with a sub-word line and both are separated by a insulation film. A plurality of pairs of the word-lines are arranged in columns. The memory cells are arranged at the intersections of the buried bit-lines and the word-lines. The memory cells are also alternatively arranged on the adjacent buried bit-lines so that the number of the memory cells arranged on one of the buried bit-lines are reduced.
摘要翻译：公开了一种适用于高集成度的改进的半导体存储器单元及其制造方法。存储单元具有大的电容和小的面积。存储单元还具有埋在半导体衬底中的隔离区域中的多个位线。位线具有非常小的宽度和厚度，从而减小位线和半导体衬底之间的寄生电容。存储单元还可以设置有噪声屏蔽线。此外，公开了一种半导体存储器的新型存储单元阵列。掩埋位线与位线连接子阵列耦合，并且两者都被绝缘膜隔开。多对位线排列成行。字线与子字线耦合，并且两者都被绝缘膜隔开。多个字线对被排列成列。存储单元布置在掩埋位线和字线的交点处。存储单元也交替地布置在相邻的掩埋位线上，使得布置在一个掩埋位线上的存储单元的数量减少。

5. 发明授权

US5334257A Treatment object supporting device 失效
标题翻译：治疗对象支持装置
公开(公告)号：US5334257A
公开(公告)日：1994-08-02
申请号：US66416
申请日：1993-05-25
申请人： Hironobu Nishi , Kazuo Terada
发明人： Hironobu Nishi , Kazuo Terada
IPC分类号： H01L21/22 , H01L21/673 , H01L21/677 , B05C13/02
CPC分类号： H01L21/67781 , Y10S269/903 , Y10S414/137 , Y10S414/138
摘要： A plurality of ring trays supporting loaded treatment objects are arranged in parallel at predetermined spacing in the vertical axis direction and are supported by rods at a minimum of three locations separated from the rod couplings. Cutouts are provided in each ring tray that do not extend to the ring tray center open area. Supporting teeth are provided on the arms driven by drive devices and are inserted via the cutouts. The supporting teeth straddle the ring tray and are shifted relatively on both sides of the vertical direction, and can exchange the wafers between the ring tray and the supporting teeth. By this, problems occurring with regard to various types of heat treatment of the treatment objects, such as treatment object slippage, can be prevented. In addition, a plurality of treatment objects can be exchanged at one time, thereby allowing the exchanging time to be shortened.
摘要翻译：支撑负载的处理对象的多个环形托盘在垂直轴线方向上以预定的间隔平行布置，并且在与杆联接件分开的至少三个位置处被杆支撑。每个环形托盘上都设有不延伸到环形托盘中心开放区域的切口。支撑齿设置在由驱动装置驱动的臂上，并经由切口插入。支撑齿跨越环形托盘并相对于垂直方向的两侧相对移动，并且可以在环形托盘和支撑齿之间交换晶片。由此，可以防止对处理对象的各种热处理（例如处理对象滑动）产生的问题。此外，可以一次交换多个处理对象，从而可以缩短交换时间。

6. 发明授权

US5061412A Process for producing a magnet of strontium ferrite having high performance 失效
标题翻译：具有高性能的锶铁氧体磁体的制造方法
公开(公告)号：US5061412A
公开(公告)日：1991-10-29
申请号：US501883
申请日：1990-03-30
申请人： Kunio Okumori , Kazuo Terada
发明人： Kunio Okumori , Kazuo Terada
IPC分类号： C04B35/26
CPC分类号： C04B35/2683 , Y10S264/58
摘要： An iron ore or mill scale is crushed to form a powder having an average particle diameter not exceeding 12 microns. The powder is heated at a temperature of 600.degree. C. to 900.degree. C. in the presence of oxygen to form an iron oxide containing at least 98.0% of Fe.sub.2 O.sub.3. The iron oxide is mixed with strontium oxide or carbonate. The mixture is calcined to form strontium ferrite. The calcined product is pulverized, the crushed material is molded in a magnetic field, and the molded product is sintered to yield a magnet of strontium ferrite having a high level of performance.
摘要翻译：将铁矿石或粉碎物粉碎以形成平均粒径不超过12微米的粉末。在氧气存在下，将该粉末在600〜900℃的温度下加热，形成含有至少98.0％的Fe 2 O 3的氧化铁。氧化铁与氧化锶或碳酸盐混合。将混合物煅烧形成锶铁氧体。将煅烧产物粉碎，将破碎的材料在磁场中模制，并将模制产品烧结以产生具有高性能水平的锶铁氧体磁体。

7. 发明授权

US5053156A Process for producing ferrite powder for ferrite magnets 失效
标题翻译：铁氧体磁铁用铁氧体粉末的制造方法
公开(公告)号：US5053156A
公开(公告)日：1991-10-01
申请号：US618937
申请日：1990-11-28
申请人： Kunio Okumori , Kazuo Terada
发明人： Kunio Okumori , Kazuo Terada
IPC分类号： C01G49/00 , C04B35/26 , H01F1/34
CPC分类号： C04B35/2683
摘要： A process for producing ferrite powder for high performance ferrite magnets is claimed, which comprises: milling magnetite or mill scale into a powder comprising particles of specified particle size; oxidizing the milled product to obtain a powder containing 98.0% or higher Fe.sub.2 O.sub.3 ; further adding thereto iron oxide originated from iron chloride or iron sulfide together with an oxide or a carbonate of Sr or Ba; and calcining the resulting powder mixture.The present invention provides a low-cost process for producing ferrite powder for ferrite magnets having high pellet strength as well as high magnetic properties, from which a high performance Sr-ferrite magnet as well as Ba-ferrite magnet suitable for use in automobile motors can be readily produced by simply molding the powder under a magnetic field and sintering.
摘要翻译：一种用于生产用于高性能铁氧体磁体的铁氧体粉末的方法，其特征在于，它包括：将磁铁矿或磨料粉碎成包含特定粒度的颗粒的粉末; 氧化研磨产物得到含有98.0％或更高的Fe 2 O 3的粉末; 进一步添加源自氯化铁或硫化铁的氧化铁与Sr或Ba的氧化物或碳酸盐; 并煅烧所得的粉末混合物。本发明提供了一种用于制造铁氧体磁铁铁氧体粉末的低成本方法，其具有高的颗粒强度以及高的磁性能，其中适用于汽车电动机的高性能Sr-铁氧体磁体以及Ba-铁氧体磁体可由该方法通过在磁场下简单地成型粉末并烧结容易地制造。

8. 发明授权

US08006636B2 Substrate treatment apparatus 有权
标题翻译：基板处理装置
公开(公告)号：US08006636B2
公开(公告)日：2011-08-30
申请号：US12177243
申请日：2008-07-22
申请人： Kazuo Terada , Kazuo Sakamoto , Takeshi Uehara
发明人： Kazuo Terada , Kazuo Sakamoto , Takeshi Uehara
IPC分类号： B05C11/02 , B05B15/04
CPC分类号： H01L21/6715 , H01L21/67178 , H01L21/68785
摘要： A substrate treatment apparatus of the present invention includes: a holding means for rotatably holding a substrate to be treated; a coating solution supply nozzle for supplying a coating solution onto the front surface of the substrate to be treated held on the holding means; a treatment container with an upper surface open for housing them; an exhaust means for exhausting an atmosphere in the treatment container from the bottom; a multiblade centrifugal fan provided on the inner periphery of the treatment container for flowing airflow on a front surface side of the substrate to the exhaust means; and a controller for controlling the number of rotations of the multiblade centrifugal fan corresponding to the number of rotations of the substrate, wherein the number of rotations of the multiblade centrifugal fan is controlled so that turbulent airflow flowing in a circumferential direction on the front surface of the substrate generated due to the rotation of the substrate is corrected to laminar airflow flowing in a radial direction.
摘要翻译：本发明的基板处理装置包括：用于可旋转地保持待处理基板的保持装置; 涂布溶液供给喷嘴，用于将涂布溶液供给到保持在保持装置上的被处理基板的前表面上; 处理容器，其上表面打开以容纳它们; 用于从底部排出处理容器中的气氛的排气装置; 设置在处理容器的内周上的多叶离心风扇，用于将衬底的前表面侧的气流流向排气装置; 以及控制器，用于控制与所述基板的旋转数相对应的所述多叶离心风扇的转数，其中所述多叶离心风扇的转数受到控制，使得在圆周方向上流动的湍流气流在由于基板的旋转而产生的基板被校正成沿径向流动的层流。

9. 发明申请

US20110000512A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20110000512A1
公开(公告)日：2011-01-06
申请号：US12824565
申请日：2010-06-28
申请人： Takayuki TOSHIMA , Kazuo TERADA , Kazuyuki HONDA
发明人： Takayuki TOSHIMA , Kazuo TERADA , Kazuyuki HONDA
IPC分类号： B08B3/00
CPC分类号： B08B3/10 , H01L21/67057 , H01L21/67751 , Y10S134/902
摘要： Provided are a substrate processing apparatus and a substrate processing method capable of processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The substrate processing apparatus includes a cleaning bath configured to accommodate a substrate and clean the substrate by flowing a cleaning solution, and a processing vessel configured to accommodate the cleaning bath and process the substrate with a supercritical fluid.
摘要翻译：提供了一种基板处理装置和基板处理方法，其能够使用超临界流体处理基板，而不将形成在基板上的图案暴露于大气环境。基板处理装置包括：清洗槽，其配置为容纳基板并通过流动清洁溶液清洁基板;以及处理容器，其构造成容纳清洗槽并用超临界流体处理基板。

10. 发明申请

US20100192992A1 SUBSTRATE CARRYING APPARATUS AND SUBSTRATE PROCESSING SYSTEM 失效
标题翻译：基板承载装置和基板处理系统
公开(公告)号：US20100192992A1
公开(公告)日：2010-08-05
申请号：US12698455
申请日：2010-02-02
申请人： Takayuki TOSHIMA , Kazuo TERADA
发明人： Takayuki TOSHIMA , Kazuo TERADA
IPC分类号： B08B3/00 , H01L21/673 , H01L21/677
CPC分类号： H01L21/67057 , H01L21/67034 , H01L21/67346 , H01L21/67748 , H01L21/68742
摘要： Disclosed is a substrate carrying apparatus having a simple configuration capable of inhibiting the occurrence of pattern collapse. A carrying tray of the disclosed substrate carrying apparatus includes a bottom plate for supporting the substrate and a circumferential side wall being provided around the bottom plate. An opening is formed in the bottom plate. An elevating member, to and from which the substrate is to be transferred, passes through the opening. A space is temporarily formed in a carrying tray. The elevating member within the opening passes to the outside of the carrying tray through the space. When the substrate is carried, the liquid is reservoired within the carrying tray, and the substrate is carried while the liquid remained on the upper surface of the substrate.
摘要翻译：公开了具有能够抑制图案塌陷的发生的简单结构的基板输送装置。所公开的基板承载装置的承载托盘包括用于支撑基板的底板和围绕底板设置的周向侧壁。在底板上形成开口。升降构件，要从基板转移到其上并通过该开口。暂时在搬运托盘中形成空间。开口内的升降构件通过该空间传递到搬运托盘的外部。当承载基板时，液体被储存在承载托盘内，并且在液体保留在基板的上表面上的同时承载基板。

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