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1. 发明授权

US08951359B2 Liquid processing apparatus, liquid processing method and computer-readable storage medium storing liquid processing program 有权
标题翻译：液体处理装置，液体处理方法和存储液体处理程序的计算机可读存储介质
公开(公告)号：US08951359B2
公开(公告)日：2015-02-10
申请号：US13106972
申请日：2011-05-13
申请人： Takao Inada , Naoyuki Okamura , Hidetsugu Yano , Yosuke Hachiya
发明人： Takao Inada , Naoyuki Okamura , Hidetsugu Yano , Yosuke Hachiya
IPC分类号： B08B7/00 , B08B7/04 , B08B3/00 , H01L21/67
CPC分类号： H01L21/67028 , H01L21/67017 , H01L21/67051 , Y10S134/902
摘要： There is provided a liquid processing method for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The liquid processing method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution.
摘要翻译：提供了一种液体处理方法，其通过使用处理溶液在基板的前表面上进行液体处理，然后通过使用温度低于基板的温度的冲洗溶液在基板的前表面上进行冲洗处理处理方案。液体处理方法包括在液体处理和漂洗过程之间进行中间处理，用于将衬底的前表面的温度调节到高于冲洗溶液的温度并低于处理溶液的温度的温度。

2. 发明申请

US20110277793A1 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND COMPUTER-READABLE STORAGE MEDIUM STORING LIQUID PROCESSING PROGRAM 有权
标题翻译：液体加工设备，液体加工方法和计算机可读存储介质储存液体处理程序
公开(公告)号：US20110277793A1
公开(公告)日：2011-11-17
申请号：US13106972
申请日：2011-05-13
申请人： Takao Inada , Naoyuki Okamura , Hidetsugu Yano , Yosuke Hachiya
发明人： Takao Inada , Naoyuki Okamura , Hidetsugu Yano , Yosuke Hachiya
IPC分类号： B08B3/00 , B08B7/04
CPC分类号： H01L21/67028 , H01L21/67017 , H01L21/67051 , Y10S134/902
摘要： There is provided a liquid processing method for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The liquid processing method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution.
摘要翻译：提供了一种液体处理方法，其通过使用处理溶液在基板的前表面上进行液体处理，然后通过使用温度低于基板的温度的冲洗溶液在基板的前表面上进行冲洗处理处理方案。液体处理方法包括在液体处理和漂洗过程之间进行中间处理，用于将衬底的前表面的温度调节到高于冲洗溶液的温度并低于处理溶液的温度的温度。

3. 发明授权

US09231511B2 Control device of AC rotating machine 有权
标题翻译：交流旋转机控制装置
公开(公告)号：US09231511B2
公开(公告)日：2016-01-05
申请号：US14369822
申请日：2012-10-19
申请人： Yosuke Hachiya , Masato Ito , Satoru Terashima
发明人： Yosuke Hachiya , Masato Ito , Satoru Terashima
IPC分类号： H02P21/00 , H02P6/18 , H02P21/14
CPC分类号： H02P21/0039 , H02P6/18 , H02P21/18 , H02P21/24 , H02P2203/03 , H02P2203/11
摘要： A control device of an AC rotating machine includes a controller receiving a current vector instruction and a detection current vector as inputs and outputs a voltage vector instruction to the AC rotating machine, an alternating current amplitude computation mechanism computing an alternating current amplitude of at least one of a parallel component and an orthogonal component with respect to the voltage vector instruction, an alternating current amplitude instruction generator generating an alternating current amplitude instruction from the current vector instruction, and a magnetic-pole position computation mechanism computing an estimated magnetic-pole position of the AC rotating machine. The magnetic-pole position computation mechanism computes the estimated magnetic-pole position so that the alternating current amplitude coincides with the alternating current amplitude instruction.
摘要翻译：交流旋转机械的控制装置包括控制器，其接收电流矢量指令和检测电流矢量作为输入，并向AC旋转机器输出电压矢量指令;交流振幅计算机构，计算至少一个的交流振幅相对于电压矢量指令的并行分量和正交分量;交流电流振幅指令发生器，其从当前矢量指令生成交流振幅指令;以及磁极位置计算机构，其计算估计的磁极位置交流旋转机。磁极位置计算机构计算估计的磁极位置，使得交流振幅与交流振幅指令一致。

4. 发明申请

US20130014786A1 LIQUID PROCESS APPARATUS AND LIQUID PROCESS METHOD 有权
标题翻译：液体过程设备和液体过程方法
公开(公告)号：US20130014786A1
公开(公告)日：2013-01-17
申请号：US13546372
申请日：2012-07-11
申请人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
发明人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
IPC分类号： B08B3/04 , F17D1/00
CPC分类号： H01L21/02041 , H01L21/67051 , H01L21/6719 , Y02E60/34 , Y10T137/0318 , Y10T137/598
摘要： A top plate 32 is provided with a top plate rotation mechanism configured to rotate the top plate 32 in a horizontal plane. An outside cup peripheral case 50 disposed around a cup 40 is configured to move between an upper position, in which a top end of the cylinder 50 is positioned above the cup 40, and a lower position located below the upper position. A nozzle support arm 82 configured to support a nozzle 82a is moved, in a horizontal direction, between an advanced position, in which the arm 82 is advanced into the outside cup peripheral case 50 via a side opening 50m formed in a side surface of the outside cup peripheral case 50 when the cylinder 50 is located in the upper position, and a retracted position, in which the arm 82 is retracted outward from the outside cup peripheral case 50.
摘要翻译：顶板32设置有顶板旋转机构，其被配置为使顶板32在水平面中旋转。设置在杯40周围的外杯周边壳体50被构造成在缸体50的上端位于杯40的上方的位置和位于上部位置下方的下部位置之间移动。构造成支撑喷嘴82a的喷嘴支撑臂82在水平方向上在前进位置之间移动，在前进位置，臂82经由形成在外侧杯外周壳50的侧面中的侧开口50m前进到外杯外壳50 当圆筒50位于上部位置时，外侧杯形外壳50以及从外侧杯状外壳50向外侧缩回的缩回位置。

5. 发明授权

US09177838B2 Liquid process apparatus and liquid process method 有权
标题翻译：液体加工设备和液体加工方法
公开(公告)号：US09177838B2
公开(公告)日：2015-11-03
申请号：US13546394
申请日：2012-07-11
申请人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
发明人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
IPC分类号： B08B3/00 , H01L21/67 , G03F7/42
CPC分类号： H01L21/67051 , G03F7/423
摘要： A top plate 32 is provided to be moved in a horizontal direction between an advanced position, in which the top plate 32 covers from above a substrate W held by a substrate holding unit 21, and a retracted position that is retracted from the advanced position. An air hood 70 configured to supply a purified gas downward is provided to be lifted between a lower position, in which the air hood covers from above the substrate W held by the substrate holding unit 21, and an upper position located above the lower position.
摘要翻译：顶板32设置成在顶板32从由基板保持单元21保持的基板W上方覆盖的前进位置和从前进位置缩回的缩回位置之间沿水平方向移动。被配置为向下供给净化气体的空气罩70被设置为在从由基板保持单元21保持的基板W的上方覆盖着空气罩的下部位置和位于下部位置上方的上部位置之间提升。

6. 发明授权

US09691602B2 Liquid process apparatus and liquid process method 有权
公开(公告)号：US09691602B2
公开(公告)日：2017-06-27
申请号：US13546372
申请日：2012-07-11
申请人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
发明人： Norihiro Ito , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya , Takashi Nagai
IPC分类号： H01L21/02 , H01L21/67
CPC分类号： H01L21/02041 , H01L21/67051 , H01L21/6719 , Y02E60/34 , Y10T137/0318 , Y10T137/598
摘要： A top plate is provided with a top plate rotation mechanism configured to rotate the top plate in a horizontal plane. An outside cup peripheral case disposed around a cup is configured to move between an upper position, in which a top end of the cylinder is positioned above the cup, and a lower position located below the upper position. A nozzle support arm configured to support a nozzle is moved, in a horizontal direction, between an advanced position, in which the arm is advanced into the outside cup peripheral case via a side opening formed in a side surface of the outside cup peripheral case when the cylinder is located in the upper position, and a retracted position, in which the arm is retracted outward from the outside cup peripheral case.

7. 发明授权

US09190311B2 Liquid arm cleaning unit for substrate processing apparatus 有权
标题翻译：用于基板处理设备的液体臂清洁单元
公开(公告)号：US09190311B2
公开(公告)日：2015-11-17
申请号：US13351653
申请日：2012-01-17
申请人： Jiro Higashijima , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
发明人： Jiro Higashijima , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
IPC分类号： H01L21/687 , B08B3/04 , H01L21/67
CPC分类号： H01L21/68728 , B08B3/04 , B08B3/041 , H01L21/67017 , H01L21/67051 , H01L21/6719 , H01L21/68742
摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.
摘要翻译：公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

8. 发明申请

US20140232314A1 CONTROL DEVICE FOR ROTARY MACHINE AND INDUCTANCE MEASUREMENT METHOD FOR ROTARY MACHINE 有权
标题翻译：旋转机控制装置及旋转机电感测量方法
公开(公告)号：US20140232314A1
公开(公告)日：2014-08-21
申请号：US14346030
申请日：2011-11-29
申请人： Yosuke Hachiya , Tetsuya Kojima , Shoji Adachi
发明人： Yosuke Hachiya , Tetsuya Kojima , Shoji Adachi
IPC分类号： H02P21/00
CPC分类号： H02P21/0035 , H02P21/16
摘要： A control device for rotary machine includes: a voltage instruction generation section for generating a voltage instruction; a voltage application section for applying voltage to a rotary machine based on the voltage instruction; a current detection section for detecting rotary machine current of the rotary machine; and an inductance calculation section for calculating an inductance of the rotary machine from the voltage instruction and the rotary machine current. The voltage instruction generation section generates voltage instructions of constant DC voltages. The voltage application section applies voltages to the rotary machine based on the voltage instructions. The inductance calculation section calculates the inductance from a voltage instruction for measurement arbitrarily selected from the voltage instructions, and the rotary machine currents detected by the current detection section before and after application of the voltage instruction for measurement.
摘要翻译：旋转机械的控制装置包括：电压指令生成部，生成电压指令; 电压施加部，其基于所述电压指令向旋转机器施加电压; 用于检测旋转机械的旋转机器电流的电流检测部分; 以及电感计算部，用于根据电压指令和旋转电机电流计算旋转机的电感。电压指令生成部生成恒定直流电压的电压指令。电压施加部分基于电压指令向旋转机器施加电压。电感计算部根据从电压指令任意选择的测量用电压指令和由施加电压指令进行测量之前和之后由电流检测部分检测的旋转电机，计算电感。

9. 发明申请

US20130180659A1 LIQUID TREATMENT APPARATUS 有权
标题翻译：液体处理装置
公开(公告)号：US20130180659A1
公开(公告)日：2013-07-18
申请号：US13823205
申请日：2012-08-01
申请人： Norihiro Itoh , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
发明人： Norihiro Itoh , Kazuhiro Aiura , Naoki Shindo , Yosuke Hachiya
IPC分类号： H01L21/02 , H01L21/465
CPC分类号： H01L21/02041 , H01L21/465 , H01L21/67051 , H01L21/6719 , H01L21/68785 , H01L21/68792
摘要： A liquid treatment apparatus includes a substrate holder (21) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle (82) that supplies a treatment liquid to the substrate held by the substrate holder, a cup (40) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate (32) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member (130) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space (132).
摘要翻译：液体处理装置包括：水平地保持基板并旋转基板的基板保持件（21），将处理液体供给到由基板保持件保持的基板的处理液喷嘴（82），布置在由基板保持器保持的基板的周缘的外侧，接收由处理液喷嘴供给到基板的处理液，从上方覆盖基板保持体的基板的顶板（32），旋转顶板的顶板旋转驱动机构和围绕顶板的周缘的液体接收构件（130），并具有圆形的液体容纳空间（132）。

10. 发明申请

US20120180828A1 Liquid Processing Apparatus and Liquid Processing Method 有权
标题翻译：液体处理设备和液体处理方法
公开(公告)号：US20120180828A1
公开(公告)日：2012-07-19
申请号：US13351653
申请日：2012-01-17
申请人： Jiro HIGASHIJIMA , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
发明人： Jiro HIGASHIJIMA , Yosuke Hachiya , Kazuhiro Aiura , Norihiro Itoh , Naoki Shindo , Yuki Ito
IPC分类号： B08B3/00
CPC分类号： H01L21/68728 , B08B3/04 , B08B3/041 , H01L21/67017 , H01L21/67051 , H01L21/6719 , H01L21/68742
摘要： Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.
摘要翻译：公开了一种液体处理装置和液体处理方法，其可以防止处理室中的基板由于附着到支撑喷嘴的喷嘴支撑臂上的污染而被污染。本公开的液体处理装置包括：处理室，具有被配置为保持基板的基板保持单元和设置在基板保持单元周围的杯子; 喷嘴，被配置为将流体供给到由所述基板保持单元保持的所述基板; 以及配置成支撑喷嘴的喷嘴支撑臂。构造成清洁喷嘴支撑臂的手臂清洁单元安装在液体处理装置中。

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