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1. 发明授权

US07566422B2 Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus 失效
标题翻译：带有储存氦气的储罐的曝光装置和使用曝光装置的制造装置的方法
公开(公告)号：US07566422B2
公开(公告)日：2009-07-28
申请号：US11201142
申请日：2005-08-11
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D16/00 , C23C14/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

2. 发明授权

US06750946B2 Processing apparatus for processing sample in predetermined atmosphere 失效
标题翻译：用于在预定气氛中处理样品的处理装置
公开(公告)号：US06750946B2
公开(公告)日：2004-06-15
申请号：US09897930
申请日：2001-07-05
申请人： Yutaka Tanaka , Shigeru Terashima , Shinichi Hara
发明人： Yutaka Tanaka , Shigeru Terashima , Shinichi Hara
IPC分类号： G03B2752
CPC分类号： H01L21/67196 , G03F7/7075 , G03F7/70808 , G03F7/70841 , G03F7/70866 , H01L21/67017 , H01L21/67201 , Y10T29/41
摘要： A substrate processing system has a first processing device which processes a substrate with a first process in a first gas atmosphere within a process chamber and a transfer device that transfers a substrate in a second gas atmosphere within a clean booth, the transfer device transferring a substrate which has been processed with a second process by a second processing device or a substrate which is to be processed by that second processing device. A load-lock chamber has a substrate transfer path between the first processing device and the transfer device and there is a gas supply device which supplies the first gas from the process chamber to the load-lock chamber when the substrate is transferred between the load-lock chamber and a first processing device, and supplies the second gas from the clean booth to the load-lock chamber when the substrate is transferred between the load-lock chamber and the transfer device.
摘要翻译：基板处理系统具有第一处理装置，其处理处理室内的第一气体气氛中的第一处理的基板和在清洁室内将第二气体气氛中的基板转印的转印装置，所述转印装置将基板其通过第二处理装置或将被该第二处理装置处理的基板的第二处理进行处理。负载锁定室具有在第一处理装置和转印装置之间的基板传送路径，并且存在一个气体供应装置，当基板在载荷传递装置之间传送时，将第一气体从处理室供应到装载锁定室，锁定室和第一处理装置，并且当衬底在负载锁定室和转移装置之间传送时，将来自清洁室的第二气体供应到负载锁定室。

3. 发明授权

US06984362B2 Processing apparatus, measuring apparatus, and device manufacturing method 失效
标题翻译：处理装置，测量装置和装置制造方法
公开(公告)号：US06984362B2
公开(公告)日：2006-01-10
申请号：US10619506
申请日：2003-07-16
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05B1/00 , G05B23/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

4. 发明申请

US20050271558A1 Processing apparatus, measuring apparatus, and device manufacturing method 失效
标题翻译：处理装置，测量装置和装置制造方法
公开(公告)号：US20050271558A1
公开(公告)日：2005-12-08
申请号：US11201142
申请日：2005-08-11
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： H01L21/027 , G03F7/20 , G05D16/00 , G05D16/20
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

5. 发明授权

US06616898B2 Processing apparatus with pressure control and gas recirculation system 失效
标题翻译：具有压力控制和气体再循环系统的加工设备
公开(公告)号：US06616898B2
公开(公告)日：2003-09-09
申请号：US09257258
申请日：1999-02-25
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D1600
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient gas recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境气体被吹送到密封真空室中，使得沿着处理部分沿预定方向产生气流。

6. 发明授权

US5157700A Exposure apparatus for controlling intensity of exposure radiation 失效
标题翻译：用于控制接触辐射强度的曝光装置
公开(公告)号：US5157700A
公开(公告)日：1992-10-20
申请号：US401615
申请日：1989-08-31
申请人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号： G03F7/20
CPC分类号： G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

7. 发明授权

US06714277B2 Exposure apparatus, gas replacement method, semiconductor device manufacturing method, semiconductor manufacturing factory and exposure apparatus maintenance method 失效
标题翻译：曝光装置，气体置换方法，半导体装置制造方法，半导体制造厂和曝光装置的维修方法
公开(公告)号：US06714277B2
公开(公告)日：2004-03-30
申请号：US09818625
申请日：2001-03-28
申请人： Shinichi Hara , Yutaka Tanaka , Kazuyuki Kasumi , Toru Hirabayashi
发明人： Shinichi Hara , Yutaka Tanaka , Kazuyuki Kasumi , Toru Hirabayashi
IPC分类号： G03B2752
CPC分类号： G03F7/70058 , G03F7/70775 , G03F7/70841 , G03F7/70883 , G03F7/70933
摘要： An exposure apparatus includes a chamber which incorporates an optical element and surrounds a predetermined region, a mechanism for setting an inert gas atmosphere in the chamber, and a closed vessel which surrounds the chamber. The purity of inert gas in the chamber is higher than a purity of inert gas in the closed vessel.
摘要翻译：曝光装置包括包含光学元件并围绕预定区域的腔室，用于设置腔室中的惰性气体气氛的机构和围绕腔室的封闭容器。室内惰性气体的纯度高于密闭容器中惰性气体的纯度。

8. 发明授权

US5883932A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5883932A
公开(公告)日：1999-03-16
申请号：US464225
申请日：1995-06-05
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.
摘要翻译：一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

9. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

10. 发明申请

US20070024861A1 LASER TRACKING INTERFEROMETER 有权
标题翻译：激光跟踪干涉仪
公开(公告)号：US20070024861A1
公开(公告)日：2007-02-01
申请号：US11458533
申请日：2006-07-19
申请人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
发明人： Shinichirou Yanaka , Makoto Abe , Shinichi Hara , Naoyuki Taketomi
IPC分类号： G01B11/02
CPC分类号： G01S17/36 , G01B11/03 , G01S7/4812 , G01S7/497 , G01S17/42 , G01S17/66
摘要： A laser tracking interferometer; a carriage rotatable about a center of the reference sphere; a laser interferometer that provides a retroreflector displacement signal, and a displacement gage that provides a displacement signal. A data processing apparatus computes displacement of the retroreflector with respect to the reference sphere. A position sensitive detector provides a position signal corresponding to the amount of deviation of a laser beam when the laser beam is reflected off the retroreflector back into the laser interferometer and deviated in a direction orthogonal to its optical axis. A controller controls rotation of the carriage based on the position signal from the position detector so that the amount of deviation becomes zero.
摘要翻译：激光跟踪干涉仪; 可围绕参考球的中心旋转的托架; 提供后向反射器位移信号的激光干涉仪和提供位移信号的位移计。数据处理装置计算回射器相对于参考球的位移。当激光束从后向反射器反射回激光干涉仪并偏离与其光轴正交的方向时，位置敏感检测器提供对应于激光束偏离量的位置信号。控制器基于来自位置检测器的位置信号控制滑架的旋转，使得偏差量变为零。

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