专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US12080511B2 Sample holder, method for using sample holder, projection amount adjustment jig, projection amount adjustment method and charged particle beam device 有权
公开(公告)号：US12080511B2
公开(公告)日：2024-09-03
申请号：US17754069
申请日：2019-09-25
申请人： Hitachi High-Tech Corporation
发明人： Megumi Nakamura , Hisayuki Takasu , Kento Horinouchi
IPC分类号： H01J37/20 , H01J37/09
CPC分类号： H01J37/20 , H01J37/09 , H01J2237/026 , H01J2237/20
摘要： A performance of a sample holder 1 used in a charged particle beam device is improved. A shield plate 2 is connected to a sample stand 7. A sample stand 7 is provided with a pressing member 5 that can move in a direction perpendicular to the shield plate 2 in a state in which the pressing member is attached to the sample stand 7, and has a bar shape. A sample supporting member 4 connected to the pressing member 5 is provided at a position facing the shield plate 2. A spring 6 is provided along an outer circumference of the pressing member 5 and is connected to the sample supporting member 4 and the sample stand 7.

2. 发明授权

US11674226B2 Separation of plasma suppression and wafer edge to improve edge film thickness uniformity 有权
公开(公告)号：US11674226B2
公开(公告)日：2023-06-13
申请号：US16803313
申请日：2020-02-27
申请人： Lam Research Corporation
发明人： Fayaz Shaikh , Taide Tan
IPC分类号： C23C16/455 , H01J37/32 , C23C16/458 , C23C16/509
CPC分类号： C23C16/45565 , C23C16/4585 , C23C16/5096 , H01J37/32082 , H01J37/32623 , H01J37/32642 , H01J37/32715 , H01J2237/20 , H01J2237/332
摘要： A chamber for use in implementing a deposition process includes a pedestal for supporting a semiconductor wafer. A silicon ring is disposed over the pedestal and surrounds the semiconductor wafer. The silicon ring has a ring thickness that approximates a semiconductor wafer thickness. The silicon ring has an annular width that extends a process zone defined over the semiconductor wafer to an extended process zone that is defined over the semiconductor wafer and the silicon ring. A confinement ring defined from a dielectric material is disposed over the pedestal and surrounds the silicon ring. A showerhead having a central showerhead area and an extended showerhead area is also included. The central showerhead area is substantially disposed over the semiconductor wafer and the silicon ring. The extended showerhead area is substantially disposed over the confinement ring. The annular width of the silicon ring enlarges a surface area of the semiconductor wafer that is exposed and shifts non-uniformity effects of deposition materials over the semiconductor wafer from an edge of the semiconductor wafer to an outer edge of the silicon ring.

3. 发明授权

US10872743B2 Sample holding mechanism, manufacturing method for same, and charged particle beam device 有权
公开(公告)号：US10872743B2
公开(公告)日：2020-12-22
申请号：US16029751
申请日：2018-07-09
申请人： HITACHI, LTD.
发明人： Akira Sugawara , Yoshio Takahashi , Tetsuya Akashi , Toshiaki Tanigaki
IPC分类号： H01J37/20 , H01J37/244 , H01J37/22 , G03H5/00 , H01J37/04
CPC分类号： H01J37/20 , G03H5/00 , H01J37/045 , H01J37/22 , H01J37/244 , G03H2224/04 , H01J2237/043 , H01J2237/20
摘要： Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film.

4. 发明授权

US10614993B2 Method and apparatus for an imaging system 有权
公开(公告)号：US10614993B2
公开(公告)日：2020-04-07
申请号：US16036663
申请日：2018-07-16
申请人： Frederick A. Flitsch
发明人： Frederick A. Flitsch
IPC分类号： B33Y10/00 , H01J37/06 , H01J37/317 , H01J37/08 , H01J9/02 , H01J37/244 , H01J37/20 , H01J37/248 , G03F7/00 , G03F9/00
CPC分类号： H01J37/06 , B33Y10/00 , G03F7/0002 , G03F9/00 , H01J9/022 , H01J37/08 , H01J37/20 , H01J37/244 , H01J37/248 , H01J37/317 , H01J37/3177 , H01J2237/1205 , H01J2237/20 , H01J2237/303 , H01J2237/304 , H01J2237/3174 , H01J2237/31759 , H01J2237/31798 , Y10T29/49004
摘要： The present invention provides apparatus for an imaging system comprising a multitude of chemical emitting elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system of chemical emitters are disclosed.

5. 发明申请

US20180330911A1 METHOD AND APPARATUS FOR AN IMAGING SYSTEM 审中-公开
公开(公告)号：US20180330911A1
公开(公告)日：2018-11-15
申请号：US16036663
申请日：2018-07-16
申请人： Frederick A. Flitsch
发明人： Frederick A. Flitsch
IPC分类号： H01J37/06 , H01J37/317 , H01J37/20 , H01J37/08 , H01J37/244 , H01J9/02
CPC分类号： H01J37/06 , G03F7/0002 , G03F9/00 , H01J9/022 , H01J37/08 , H01J37/20 , H01J37/244 , H01J37/248 , H01J37/317 , H01J37/3177 , H01J2237/1205 , H01J2237/20 , H01J2237/303 , H01J2237/304 , H01J2237/3174 , H01J2237/31759 , H01J2237/31798 , Y10T29/49004
摘要： The present invention provides apparatus for an imaging system comprising a multitude of chemical emitting elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system of chemical emitters are disclosed.

6. 发明授权

US09952128B2 Preparation of specimen arrays on an EM grid 有权
公开(公告)号：US09952128B2
公开(公告)日：2018-04-24
申请号：US15285070
申请日：2016-10-04
申请人： The Scripps Research Institute
发明人： Bridget Carragher , Clinton S. Potter , Tilak Jain
IPC分类号： G01N1/28 , G01N1/30 , G01N1/31 , H01J37/20 , H01J37/26
CPC分类号： G01N1/28 , G01N1/30 , G01N1/31 , G01N1/312 , H01J37/20 , H01J37/261 , H01J2237/20 , H01J2237/2007 , H01J2237/202 , H01J2237/204 , H01J2237/208 , H01J2237/2602
摘要： The invention provides systems or apparatuses for dispensing aqueous materials for electron microscopy (EM). The systems allow dispensing of aqueous materials onto an EM sample grid at individual specimen locations in an ordered array of specimen locations, with each individual specimen location in the array of locations. The systems contain a holder for reversibly receiving an EM sample grid, and a dispenser containing one or more dispensing elements that are configured to discretely dispense one or more aqueous solutions from the dispensing elements onto a plurality of individual specimen locations. The dispenser is able to provide an ordered array of discrete specimen locations discontinuous with one another. In the systems, at least one dispensing element is configured to dispense picoliter volumes of one or more of the aqueous solutions. Additionally, the systems contain a drive mechanism to position the EM sample grid relative to the one or more dispensing elements, as well as one or more reservoirs operably linked to the dispenser for holding the one or more aqueous solutions to be discretely dispensed onto each individual specimen location in the array of locations.

7. 发明申请

US20170200627A1 SYSTEM AND METHOD FOR SELECTIVE ZAPPING 有权
公开(公告)号：US20170200627A1
公开(公告)日：2017-07-13
申请号：US14995088
申请日：2016-01-13
申请人： Applied Materials Israel, Ltd.
发明人： Tuvia Biber , Efim Kerner , Efraim Siman Tov
IPC分类号： H01L21/683 , H01L21/66 , H01L21/326
CPC分类号： H01L21/6833 , H01J2237/0044 , H01J2237/20 , H01L21/326 , H01L21/67288 , H01L21/6831 , H01L22/14 , H01L22/26 , H05F3/00
摘要： A system for zapping a wafer, the system includes a pulse generator; a sensor; a first conductive interface; a second conductive interface; a controller; wherein the pulse generator is configured to generate zapping pulses; wherein the first conductive interface is configured to provide the zapping pulses to a first location of a backside insulating layer of a wafer; wherein the sensor is configured to monitor a coupling between the first conductive interface and the second conductive interface to provide a monitoring result; wherein the monitoring occurs while the second conductive interface contacts a second location of the backside insulating layer; and wherein the controller is configured to control a generation of the zapping pulses in response to the monitoring result.

8. 发明授权

US09318332B2 Grid for plasma ion implant 有权
标题翻译：等离子体离子注入网格
公开(公告)号：US09318332B2
公开(公告)日：2016-04-19
申请号：US14135519
申请日：2013-12-19
申请人： Intevac, Inc.
发明人： Vinay Prabhakar , Babak Adibi
IPC分类号： H01L21/425 , C23C16/00 , H01L21/266 , H01L31/068 , H01L31/18 , H01L21/426 , H01J37/32
CPC分类号： H01L31/0516 , H01J37/32412 , H01J37/32422 , H01J37/32623 , H01J2237/20 , H01J2237/3365 , H01L21/266 , H01L21/426 , H01L31/0682 , H01L31/1804 , H01L31/188 , Y02E10/50 , Y02E10/547 , Y02P70/521
摘要： A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.
摘要翻译：用于最小化离子发散在等离子体离子注入中的网格。等离子体格栅由具有多个孔的平板制成，其中孔布置成多行和多个列，从而形成沿一个方向发散的离子束。掩模用于在晶片上形成植入的形状，其中掩模中的孔与子束发散的方向垂直。

9. 发明申请

US20150340193A1 INSPECTION APPARATUS 有权
标题翻译：检查装置
公开(公告)号：US20150340193A1
公开(公告)日：2015-11-26
申请号：US14813768
申请日：2015-07-30
申请人： EBARA CORPORATION
发明人： Shoji YOSHIKAWA , Kiwamu TSUKAMOTO , Takeshi MURAKAMI , Masahiro HATAKEYAMA , Tsutomu KARIMATA
IPC分类号： H01J37/02 , H01J37/20 , H01J37/285
CPC分类号： H01J37/023 , G01N21/9501 , G01N23/2204 , H01J37/09 , H01J37/16 , H01J37/20 , H01J37/285 , H01J2237/022 , H01J2237/0264 , H01J2237/1501 , H01J2237/166 , H01J2237/20 , H01J2237/2007 , H01J2237/20221 , H01J2237/20278 , H01J2237/26
摘要： An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.
摘要翻译：提供了能够有助于降低设备成本的检查装置。检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

10. 发明申请

US20150243470A1 PLATEN SUPPORT STRUCTURE 审中-公开
标题翻译：钢板支撑结构
公开(公告)号：US20150243470A1
公开(公告)日：2015-08-27
申请号：US14186678
申请日：2014-02-21
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Roger B. Fish , Steven Anella , Todd Lewis MacEachern
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/20 , H01J2237/2001 , H01J2237/31701 , H01L21/6833
摘要： A platen support structure adapted to thermally insulate a heated platen portion from a cold base plate while providing substantially leak-free gas transport therebetween and while allowing thermal expansion and contraction of the platen portion. Various examples provide of the support structure provide a tubular flexure having an internal gas conduit, a platen portion mounting tab connected to the flexure and having an internal gas input slot that is in fluid communication with the internal gas conduit of the flexure, the platen portion mounting tab being adapted for connection to a platen portion of a platen, and a base plate mounting tab connected to the flexure and having an internal gas output slot that is in fluid communication with the internal gas conduit of the flexure, the base plate mounting tab being adapted for connection to a base plate of the platen.
摘要翻译：压板支撑结构，其适于将加热的压板部分与冷底板热绝缘，同时在其间提供基本上无泄漏的气体输送，同时允许压板部分的热膨胀和收缩。支撑结构的各种示例提供了具有内部气体导管的管状挠曲件，连接到挠曲件的压板部分安装凸片，并且具有与挠曲件的内部气体导管流体连通的内部气体输入槽，压板部分安装翼片适于连接到台板的压板部分，以及底板安装翼片，其连接到弯曲部并具有与挠曲件的内部气体导管流体连通的内部气体输出槽，底板安装翼片适于连接到压板的基板。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式