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1. 发明申请

US20180330911A1 METHOD AND APPARATUS FOR AN IMAGING SYSTEM 审中-公开
公开(公告)号：US20180330911A1
公开(公告)日：2018-11-15
申请号：US16036663
申请日：2018-07-16
申请人： Frederick A. Flitsch
发明人： Frederick A. Flitsch
IPC分类号： H01J37/06 , H01J37/317 , H01J37/20 , H01J37/08 , H01J37/244 , H01J9/02
CPC分类号： H01J37/06 , G03F7/0002 , G03F9/00 , H01J9/022 , H01J37/08 , H01J37/20 , H01J37/244 , H01J37/248 , H01J37/317 , H01J37/3177 , H01J2237/1205 , H01J2237/20 , H01J2237/303 , H01J2237/304 , H01J2237/3174 , H01J2237/31759 , H01J2237/31798 , Y10T29/49004
摘要： The present invention provides apparatus for an imaging system comprising a multitude of chemical emitting elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system of chemical emitters are disclosed.

2. 发明授权

US09952128B2 Preparation of specimen arrays on an EM grid 有权
公开(公告)号：US09952128B2
公开(公告)日：2018-04-24
申请号：US15285070
申请日：2016-10-04
申请人： The Scripps Research Institute
发明人： Bridget Carragher , Clinton S. Potter , Tilak Jain
IPC分类号： G01N1/28 , G01N1/30 , G01N1/31 , H01J37/20 , H01J37/26
CPC分类号： G01N1/28 , G01N1/30 , G01N1/31 , G01N1/312 , H01J37/20 , H01J37/261 , H01J2237/20 , H01J2237/2007 , H01J2237/202 , H01J2237/204 , H01J2237/208 , H01J2237/2602
摘要： The invention provides systems or apparatuses for dispensing aqueous materials for electron microscopy (EM). The systems allow dispensing of aqueous materials onto an EM sample grid at individual specimen locations in an ordered array of specimen locations, with each individual specimen location in the array of locations. The systems contain a holder for reversibly receiving an EM sample grid, and a dispenser containing one or more dispensing elements that are configured to discretely dispense one or more aqueous solutions from the dispensing elements onto a plurality of individual specimen locations. The dispenser is able to provide an ordered array of discrete specimen locations discontinuous with one another. In the systems, at least one dispensing element is configured to dispense picoliter volumes of one or more of the aqueous solutions. Additionally, the systems contain a drive mechanism to position the EM sample grid relative to the one or more dispensing elements, as well as one or more reservoirs operably linked to the dispenser for holding the one or more aqueous solutions to be discretely dispensed onto each individual specimen location in the array of locations.

3. 发明申请

US20170200627A1 SYSTEM AND METHOD FOR SELECTIVE ZAPPING 有权
公开(公告)号：US20170200627A1
公开(公告)日：2017-07-13
申请号：US14995088
申请日：2016-01-13
申请人： Applied Materials Israel, Ltd.
发明人： Tuvia Biber , Efim Kerner , Efraim Siman Tov
IPC分类号： H01L21/683 , H01L21/66 , H01L21/326
CPC分类号： H01L21/6833 , H01J2237/0044 , H01J2237/20 , H01L21/326 , H01L21/67288 , H01L21/6831 , H01L22/14 , H01L22/26 , H05F3/00
摘要： A system for zapping a wafer, the system includes a pulse generator; a sensor; a first conductive interface; a second conductive interface; a controller; wherein the pulse generator is configured to generate zapping pulses; wherein the first conductive interface is configured to provide the zapping pulses to a first location of a backside insulating layer of a wafer; wherein the sensor is configured to monitor a coupling between the first conductive interface and the second conductive interface to provide a monitoring result; wherein the monitoring occurs while the second conductive interface contacts a second location of the backside insulating layer; and wherein the controller is configured to control a generation of the zapping pulses in response to the monitoring result.

4. 发明授权

US09318332B2 Grid for plasma ion implant 有权
标题翻译：等离子体离子注入网格
公开(公告)号：US09318332B2
公开(公告)日：2016-04-19
申请号：US14135519
申请日：2013-12-19
申请人： Intevac, Inc.
发明人： Vinay Prabhakar , Babak Adibi
IPC分类号： H01L21/425 , C23C16/00 , H01L21/266 , H01L31/068 , H01L31/18 , H01L21/426 , H01J37/32
CPC分类号： H01L31/0516 , H01J37/32412 , H01J37/32422 , H01J37/32623 , H01J2237/20 , H01J2237/3365 , H01L21/266 , H01L21/426 , H01L31/0682 , H01L31/1804 , H01L31/188 , Y02E10/50 , Y02E10/547 , Y02P70/521
摘要： A grid for minimizing effects of ion divergence in plasma ion implant. The plasma grid is made of a flat plate having a plurality of holes, wherein the holes are arranged in a plurality of rows and a plurality of columns thereby forming beamlets of ions that diverge in one direction. A mask is used to form the implanted shapes on the wafer, wherein the holes in the mask are oriented orthogonally to the direction of beamlet divergence.
摘要翻译：用于最小化离子发散在等离子体离子注入中的网格。等离子体格栅由具有多个孔的平板制成，其中孔布置成多行和多个列，从而形成沿一个方向发散的离子束。掩模用于在晶片上形成植入的形状，其中掩模中的孔与子束发散的方向垂直。

5. 发明申请

US20150340193A1 INSPECTION APPARATUS 有权
标题翻译：检查装置
公开(公告)号：US20150340193A1
公开(公告)日：2015-11-26
申请号：US14813768
申请日：2015-07-30
申请人： EBARA CORPORATION
发明人： Shoji YOSHIKAWA , Kiwamu TSUKAMOTO , Takeshi MURAKAMI , Masahiro HATAKEYAMA , Tsutomu KARIMATA
IPC分类号： H01J37/02 , H01J37/20 , H01J37/285
CPC分类号： H01J37/023 , G01N21/9501 , G01N23/2204 , H01J37/09 , H01J37/16 , H01J37/20 , H01J37/285 , H01J2237/022 , H01J2237/0264 , H01J2237/1501 , H01J2237/166 , H01J2237/20 , H01J2237/2007 , H01J2237/20221 , H01J2237/20278 , H01J2237/26
摘要： An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.
摘要翻译：提供了能够有助于降低设备成本的检查装置。检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

6. 发明申请

US20150243470A1 PLATEN SUPPORT STRUCTURE 审中-公开
标题翻译：钢板支撑结构
公开(公告)号：US20150243470A1
公开(公告)日：2015-08-27
申请号：US14186678
申请日：2014-02-21
申请人： Varian Semiconductor Equipment Associates, Inc.
发明人： Roger B. Fish , Steven Anella , Todd Lewis MacEachern
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/20 , H01J37/3171 , H01J2237/20 , H01J2237/2001 , H01J2237/31701 , H01L21/6833
摘要： A platen support structure adapted to thermally insulate a heated platen portion from a cold base plate while providing substantially leak-free gas transport therebetween and while allowing thermal expansion and contraction of the platen portion. Various examples provide of the support structure provide a tubular flexure having an internal gas conduit, a platen portion mounting tab connected to the flexure and having an internal gas input slot that is in fluid communication with the internal gas conduit of the flexure, the platen portion mounting tab being adapted for connection to a platen portion of a platen, and a base plate mounting tab connected to the flexure and having an internal gas output slot that is in fluid communication with the internal gas conduit of the flexure, the base plate mounting tab being adapted for connection to a base plate of the platen.
摘要翻译：压板支撑结构，其适于将加热的压板部分与冷底板热绝缘，同时在其间提供基本上无泄漏的气体输送，同时允许压板部分的热膨胀和收缩。支撑结构的各种示例提供了具有内部气体导管的管状挠曲件，连接到挠曲件的压板部分安装凸片，并且具有与挠曲件的内部气体导管流体连通的内部气体输入槽，压板部分安装翼片适于连接到台板的压板部分，以及底板安装翼片，其连接到弯曲部并具有与挠曲件的内部气体导管流体连通的内部气体输出槽，底板安装翼片适于连接到压板的基板。

7. 发明申请

US20150136977A1 Differential Imaging with Pattern Recognition for Process Automation of Cross Sectioning Applications 审中-公开
标题翻译：差分成像与截面应用的过程自动化模式识别
公开(公告)号：US20150136977A1
公开(公告)日：2015-05-21
申请号：US14526971
申请日：2014-10-29
申请人： FEI Company
发明人： Alexander Buxbaum
IPC分类号： H01J37/304 , H01J37/305 , G01N1/44 , H01J37/26 , G01N1/32
CPC分类号： H01J37/222 , G01N1/286 , G01N1/32 , G01N1/44 , H01J37/261 , H01J37/304 , H01J37/3056 , H01J2237/08 , H01J2237/20 , H01J2237/221 , H01J2237/226 , H01J2237/262 , H01J2237/30466 , H01J2237/31745
摘要： A method for using differential imaging for applications involving TEM samples by allowing operators to take multiple images during a procedure involving a focused ion beam procedure and overlaying the multiple images to create a differential image that clearly shows the differences between milling steps. The methods also involve generating real-time images of the area being milled and using the overlays of the differential images to show small changes in each image, and thus highlight the ion beam milling location. The methods also involve automating the process of creating differential images and using them to automatically mill subsequent slices.
摘要翻译：一种在涉及TEM样品的应用中使用差分成像的方法，允许操作者在涉及聚焦离子束过程的过程中拍摄多个图像，并覆盖多个图像以产生清晰地显示铣削步骤之间的差异的差分图像。该方法还涉及生成正在研磨的区域的实时图像并使用差分图像的叠加来显示每个图像中的小变化，并且因此突出显示离子束研磨位置。这些方法还涉及自动化创建差分图像的过程，并使用它们来自动研磨随后的切片。

8. 发明申请

US20150021495A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND DRAWING CHAMBER 有权
标题翻译：充电颗粒光束绘图设备和绘图室
公开(公告)号：US20150021495A1
公开(公告)日：2015-01-22
申请号：US14326997
申请日：2014-07-09
申请人： NuFlare Technology, Inc
发明人： Hiroyasu SAITO , Yoshinori NAKAGAWA , Seiichi NAKAZAWA
IPC分类号： H01J37/20 , H01J37/317
CPC分类号： H01J37/3174 , H01J37/16 , H01J2237/20
摘要： A charged particle beam drawing apparatus includes: a stage configured to support a specimen as a drawing target; and an airtight drawing chamber formed into a box shape provided with a side wall and a bottom plate, and configured to house the stage. The bottom plate includes: multiple support portions connected to the side wall and configured to support the stage; and a curved portion connected to the support portions and having a convex shape curved outward.
摘要翻译：带电粒子束描绘装置包括：被配置为支撑作为绘图目标的样本的平台; 以及形成为具有侧壁和底板的箱形的气密拉拔室，并且构造成容纳所述台。底板包括：多个支撑部分，其连接到侧壁并且被配置为支撑台架; 以及与支撑部连接并具有向外弯曲的凸形的弯曲部。

9. 发明授权

US08891728B2 Specimen supporting member for X-ray microscope image observation, specimen containing cell for X-ray microscope image observation, and X-ray microscope 有权
标题翻译：用于X射线显微镜图像观察的样品支撑构件，用于X射线显微镜图像观察的含有细胞的样品和X射线显微镜
公开(公告)号：US08891728B2
公开(公告)日：2014-11-18
申请号：US13581141
申请日：2011-02-23
申请人： Toshihiko Ogura
发明人： Toshihiko Ogura
IPC分类号： G21K7/00 , G01N23/225
CPC分类号： G21K7/00 , G01N23/2251 , H01J2237/20 , H01J2237/2445 , H01J2237/28
摘要： A specimen supporting member (10) includes: a specimen supporting film (11) such as a silicon nitride film, a carbon film, and a polyimide film; an X-ray radiation film (13) provided on one principal surface of the specimen supporting film, and for radiating a characteristic X-ray in a soft X-ray region upon irradiation with charged particles; and a specimen adsorption film (12) which is a metal film provided on another principal surface of the specimen supporting film (11), and which fixes by adsorption a specimen (1) to be observed. Since a protein which is a constitutive substance of a biological specimen has a characteristic to easily adsorb to a metallic ion, a specimen adsorption film (12) is formed on one principal surface of the specimen supporting film (11) so that an observation specimen adsorbs thereto.
摘要翻译：样品支撑构件（10）包括：诸如氮化硅膜，碳膜和聚酰亚胺膜的样品支撑膜（11）; 设置在试样支撑膜的一个主面上的X射线辐射膜（13），用于在带电粒子照射时在软X射线区域照射特征X射线; 以及作为在试样支撑膜（11）的另一主面上设置的金属膜的试样吸附膜（12），通过吸附待观察的试样（1）固定。由于作为生物样品的组成物质的蛋白质具有容易吸附到金属离子的特性，因此在试样支撑膜（11）的一个主面上形成试样吸附膜（12），使得观察试样吸附到此。

10. 发明授权

US08888950B2 Apparatus for plasma processing and method for plasma processing 有权
标题翻译：等离子体处理装置及等离子体处理方法
公开(公告)号：US08888950B2
公开(公告)日：2014-11-18
申请号：US12528326
申请日：2008-03-13
申请人： Kyung Ho Lee , Jae Ho Guahk , Jae Chul Choi , Young Ki Han , Hee Se Lee , Yong Hwan Lim , Kwan Goo Rha , Seng Hyun Chung , Sun Q Jeon , Jung Hee Lee
发明人： Kyung Ho Lee , Jae Ho Guahk , Jae Chul Choi , Young Ki Han , Hee Se Lee , Yong Hwan Lim , Kwan Goo Rha , Seng Hyun Chung , Sun Q Jeon , Jung Hee Lee
IPC分类号： C23F1/00 , H01L21/306 , H01L21/687 , H01J37/32 , H01L21/67 , H01L21/02
CPC分类号： H01L21/67069 , H01J37/32431 , H01J2237/20 , H01L21/0209 , H01L21/68735 , H01L21/68742
摘要： There is provided a substrate supporter capable of securely supporting a substrate such as a wafer on which a device having a predetermined thin film pattern is formed to remove various impurities formed on the rear surface of the substrate, and a plasma processing apparatus having the same. The plasma processing apparatus includes: at least one arm; and a supporting portion extending from the arm toward a substrate seating position of the substrate, so that the plasma processing apparatus can reduce the likelihood of arc discharges compared with conventional dry etching to increase process yield and product reliability, and ensure stable mounting of a substrate.
摘要翻译：提供了一种能够可靠地支撑诸如其上形成有预定薄膜图案的装置的基板的基板的基板支撑件，以去除形成在基板的后表面上的各种杂质，以及具有该基板的等离子体处理装置。等离子体处理装置包括：至少一个臂; 以及从臂朝向基板的基板安置位置延伸的支撑部，使得与常规干蚀刻相比，等离子体处理装置可以减少电弧放电的可能性，以提高工艺成品率和产品可靠性，并且确保基板的稳定安装。

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