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1. 发明授权

US5157700A Exposure apparatus for controlling intensity of exposure radiation 失效
标题翻译：用于控制接触辐射强度的曝光装置
公开(公告)号：US5157700A
公开(公告)日：1992-10-20
申请号：US401615
申请日：1989-08-31
申请人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
发明人： Hiroshi Kurosawa , Mitsuaki Amemiya , Shigeru Terashima , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa , Makiko Mori , Ryuichi Ebinuma , Shinichi Hara , Nobutoshi Mizusawa , Eigo Kawakami
IPC分类号： G03F7/20
CPC分类号： G03F7/70691 , G03F7/70058 , G03F7/70091 , G03F7/702
摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

2. 发明授权

US5524131A Alignment apparatus and SOR x-ray exposure apparatus having same 失效
标题翻译：对准装置和具有该对准装置的SOR x射线曝光装置
公开(公告)号：US5524131A
公开(公告)日：1996-06-04
申请号：US441641
申请日：1995-05-15
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A semiconductor device manufacturing SOR X-ray exposure apparatus wherein, after a mask and a semiconductor wafer are aligned, and SOR X-ray is used to transfer a semiconductor device pattern on the mask onto a resist on the semiconductor wafer. The apparatus includes a mirror unit and an exposure unit for exposing the wafer through the mask to the X-ray from the mirror unit. The mirror unit includes an X-ray mirror for diverging the X-ray in a desired direction, a first chamber for providing a desired vacuum ambience around the X-ray mirror and a first supporting device for supplying the X-ray mirror. The exposure unit includes a shutter for controlling the exposure, a mask stage for holding the mask, a wafer stage for holding the wafer, a second chamber for providing a desired He ambience around the mask stage and the wafer stage, a frame structure for mounting the mask stage and the wafer stage and a second supporting device for supporting the frame structure. By this, a more highly integrated semiconductor device can be produced.
摘要翻译：一种制造SOR X射线曝光装置的半导体器件，其中在掩模和半导体晶片对准之后，使用SOR X射线将掩模上的半导体器件图案转印到半导体晶片上的抗蚀剂上。该装置包括反射镜单元和曝光单元，用于将晶片通过掩模曝光到来自反射镜单元的X射线。镜单元包括用于沿所需方向分散X射线的X射线镜，用于在X射线反射镜周围提供期望的真空环境的第一腔室和用于供给X射线镜的第一支撑装置。曝光单元包括用于控制曝光的快门，用于保持掩模的掩模台，用于保持晶片的晶片台，用于在掩模台和晶片台周围提供期望的He环境的第二室，用于安装的框架结构掩模台和晶片台以及用于支撑框架结构的第二支撑装置。由此，可以制造更高度集成的半导体器件。

3. 发明授权

US5822389A Alignment apparatus and SOR X-ray exposure apparatus having same 失效
标题翻译：对准装置和具有该对准装置的SOR X射线曝光装置
公开(公告)号：US5822389A
公开(公告)日：1998-10-13
申请号：US464038
申请日：1995-06-05
申请人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
发明人： Shunichi Uzawa , Takao Kariya , Makoto Higomura , Nobutoshi Mizusawa , Ryuichi Ebinuma , Kohji Uda , Kunitaka Ozawa , Mitsuaki Amemiya , Eiji Sakamoto , Naoto Abe , Kenji Saitoh
IPC分类号： G21K1/06 , G03F7/20 , G03F9/00 , G21K5/02 , G21K5/04 , G21K5/10 , H01L21/027 , H01L21/30 , H05H13/04 , G21K5/00
CPC分类号： G03F7/70008 , G03F7/702 , G03F7/70691 , G03F7/70741 , G03F7/70841 , G03F7/70866 , G03F7/70975 , G03F9/70 , G21K1/06
摘要： A synchrotron exposure includes a synchrotron radiation source for generating a synchrotron radiation beam, and exposure unit having a mask stage for holding a mask and a wafer stage for holding a waver, a beam port for directing the radiation beam to the exposure unit, a mirror unit having a mirror for reflecting the radiation beam, a pre-alignment system for aligning the wafer relative to the wafer stage, a fine-alignment system for aligning the wafer held by the wafer stage relative to the mask held by the mask stage, a mask storage apparatus for storing the mask, a wafer storage apparatus for storing the wafer, a mask conveying apparatus for conveying the mask between the mask storage apparatus and the mask stage and a wafer conveying apparatus for conveying a wafer between the wafer storage apparatus and the wafer stage.
摘要翻译：同步加速器曝光包括用于产生同步加速器辐射束的同步加速器辐射源，以及具有用于保持掩模的掩模台和用于保持摇摆的晶片台的曝光单元，用于将辐射束引导到曝光单元的光束端口具有用于反射辐射束的反射镜的单元，用于使晶片相对于晶片台对准的预对准系统，用于使由晶片台保持的晶片相对于由掩模台保持的掩模对准的精细对准系统，用于存储掩模的掩模存储装置，用于存储晶片的晶片存储装置，用于在掩模存储装置和掩模台之间传送掩模的掩模传送装置和用于在晶片存储装置和掩模载台之间传送晶片的晶片传送装置晶圆台。

4. 发明授权

US5159621A X-ray transmitting window and method of mounting the same 失效
标题翻译： X射线发射窗及其安装方法
公开(公告)号：US5159621A
公开(公告)日：1992-10-27
申请号：US739259
申请日：1991-08-01
申请人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
发明人： Yutaka Watanabe , Shunichi Uzawa , Yasuaki Fukuda , Nobutoshi Mizusawa , Ryuichi Ebinuma , Mitsuaki Amemiya
IPC分类号： G21K5/00 , G21K5/04 , H01J35/18
CPC分类号： G21K5/04 , H01J2235/18
摘要： An X-ray transmitting window for use in X-ray lithography, for allowing transmission therethrough of X-rays from a vacuum ambience to a different ambience, includes an X-ray transmitting film, and a gasket material gas-tightly provided on at least one of opposite surfaces in a peripheral portion of the X-ray transmitting film. The gasket material has a Brinell hardness smaller than that of the X-ray transmitting film. The formed X-ray transmitting window is able to be sandwiched and fastened between a pair of flanges in a gas-tight manner.

5. 发明授权

US5138643A Exposure apparatus 失效
公开(公告)号：US5138643A
公开(公告)日：1992-08-11
申请号：US591252
申请日：1990-10-01
申请人： Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
发明人： Eiji Sakamoto , Ryuichi Ebinuma , Mitsuaki Amemiya , Shunichi Uzawa , Koji Uda
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70008 , G03F7/70691 , G03F7/70858 , G03F7/70866
摘要： An exposure apparatus includes a chamber for placing an article in a predetermined ambience; a holding device for holding the article in the chamber; a fluid supplying device for supplying a temperature adjusting fluid into the holding device through a flow passageway; a detecting device for detecting leakage of the fluid from the flow passageway; and a flow rate controlling device for controlling the flow rate of the fluid to be supplied to the holding device on the basis of the detection by the detecting device.

6. 发明授权

US5231291A Wafer table and exposure apparatus with the same 失效
标题翻译：晶圆台和曝光装置相同
公开(公告)号：US5231291A
公开(公告)日：1993-07-27
申请号：US821888
申请日：1992-01-17
申请人： Mitsuaki Amemiya , Eiji Sakamoto , Koji Uda , Kunitaka Ozawa , Kazunori Iwamoto , Shunichi Uzawa , Mitsuji Marumo
发明人： Mitsuaki Amemiya , Eiji Sakamoto , Koji Uda , Kunitaka Ozawa , Kazunori Iwamoto , Shunichi Uzawa , Mitsuji Marumo
IPC分类号： G03F7/20 , H01L21/00 , H01L21/687
CPC分类号： H01L21/67109 , G03F7/2041 , G03F7/707 , G03F7/70866 , G03F7/70875
摘要： A wafer table includes a wafer holding surface for holding a wafer by attraction; a flow passageway through which a temperature adjusting medium flows to remove any heat in the wafer table; a temperature measuring system for measuring the temperature of the wafer held by the wafer holding surface; a temperature adjusting system disposed between the wafer holding surface and the flow passageway; a temperature setting system for setting a temperature related to the wafer held by the wafer holding surface; a flow rate controlling system for controlling the flow rate of the temperature adjusting medium to be circulated through the flow passageway; and a temperature controlling system for controlling the operation of the temperature adjusting system related to heat, on the basis of a value set by the temperature setting system and a value measured by the temperature measuring system.
摘要翻译：晶片台包括用于通过吸引保持晶片的晶片保持表面; 流动通道，温度调节介质通过该通道流动以去除晶片台中的任何热量; 用于测量由晶片保持表面保持的晶片的温度的温度测量系统; 设置在晶片保持表面和流动通道之间的温度调节系统; 用于设定与晶片保持面保持的晶片有关的温度的温度设定系统; 流量控制系统，用于控制温度调节介质流过所述流动通道的流量; 以及温度控制系统，用于基于由温度设定系统设定的值和由温度测量系统测量的值来控制与热量相关的温度调节系统的操作。

7. 发明授权

US5131022A Exposure method and apparatus 失效
标题翻译：曝光方法和装置
公开(公告)号：US5131022A
公开(公告)日：1992-07-14
申请号：US769493
申请日：1991-10-01
申请人： Shigeru Terashima , Mitsuaki Amemiya , Isamu Shimoda , Shunichi Uzawa , Takao Kariya
发明人： Shigeru Terashima , Mitsuaki Amemiya , Isamu Shimoda , Shunichi Uzawa , Takao Kariya
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/2008 , G03F7/70875
摘要： An exposure apparatus for lithographically transferring a pattern of a mask onto a workpiece coated with a radiation sensitive material includes a first filter made the same material as of the substrate of the mask, a second filter formed by a base member made of the same material as the mask substrate and being coated with a radiation sensitive material, an illuminometer for measuring illuminance of light passed through the first and second filters, respectively, and a control device for determining an exposure time for lithographic transfer of the pattern of the mask onto the wafer, on the basis of a difference between a measured value as measured through the first filter and a measured value as measured through the second filter.

8. 发明授权

US5172403A X-ray exposure apparatus 失效
公开(公告)号：US5172403A
公开(公告)日：1992-12-15
申请号：US601924
申请日：1990-10-22
申请人： Yutaka Tanaka , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa , Mitsuaki Amemiya
发明人： Yutaka Tanaka , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa , Mitsuaki Amemiya
IPC分类号： G21K5/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70866 , G03F7/70691 , G03F7/70808 , G03F7/70858
摘要： An X-ray exposure apparatus for transferring a pattern of a mask to a wafer includes an X-ray source accommodating chamber; a mask chuck for supporting the mask; a wafer chuck for supporting the wafer; a stage for moving the wafer chuck; a stage accommodating chamber for accommodating therein the mask chuck, the wafer chuck and the stage; a barrel for coupling the X-ray source accommodating chamber with the stage accommodating chamber, to define an X-ray projection passageway; a blocking window provided in the X-ray projection passageway, for isolating the ambience in the X-ray accommodating chamber and the ambience in the stage accommodating chamber from each other; and a gas supply port contributable to fill the stage accommodating chamber with a gas ambience of low X-ray absorption, the gas supply port opening to the X-ray projection passageway, at a position between the blocking window and the mask supported by the mask chuck.

9. 发明授权

US5267292A X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US5267292A
公开(公告)日：1993-11-30
申请号：US026105
申请日：1993-03-01
申请人： Yutaka Tanaka , Nobutoshi Mizusawa , Mitsuaki Amemiya , Takao Kariya , Isamu Shimoda
发明人： Yutaka Tanaka , Nobutoshi Mizusawa , Mitsuaki Amemiya , Takao Kariya , Isamu Shimoda
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70816 , G03F7/70858 , G03F7/70866 , G03F7/70875
摘要： An X-ray exposure apparatus for exposing a semiconductor wafer to a mask with X-rays, to print a pattern of the mask onto the wafer, is disclosed. The ambience within a stage accommodating chamber, accommodating a mask, a semiconductor wafer, and the like, is replaced by helium. Thereafter, a predetermined quantity of helium is supplied into the stage accommodating chamber. This effectively prevents degradation of the purity of helium due to air leakage into the chamber. Therefore, any undesirable decrease in the quantity of X-ray transmission can be avoided. Thus, high-precision and high-throughput exposure is ensured.
摘要翻译：公开了一种用于将半导体晶片暴露于具有X射线的掩模的X射线曝光装置，以将掩模的图案印刷在晶片上。由氦气代替在平台容纳室内容纳掩模，半导体晶片等的氛围。此后，将预定量的氦供应到载物台容纳室中。这有效地防止由于空气泄漏到室中氦的纯度的降低。因此，可以避免X射线透射量的任何不期望的减少。因此，确保了高精度和高通量的曝光。

10. 发明授权

US5581590A SOR exposure system and method of manufacturing semiconductor devices using same 失效
标题翻译： SOR曝光系统及使用其的半导体器件的制造方法
公开(公告)号：US5581590A
公开(公告)日：1996-12-03
申请号：US272374
申请日：1994-07-06
申请人： Makiko Mori , Kunitaka Ozawa , Mitsuaki Amemiya
发明人： Makiko Mori , Kunitaka Ozawa , Mitsuaki Amemiya
IPC分类号： G03F7/20 , H01L21/027 , G21K5/00
CPC分类号： G03F7/708
摘要： In an SOR exposure system for transferring patterns on masks to semiconductor wafers by using SOR radiation reflected by an X-ray reflecting mirror, a first shutter device for shielding at least .gamma. rays and a second shutter device for shielding X-rays are provided between the SOR ring and the mirror inside a beam port, and an exposure adjustment device for adjusting the amount of exposure when a circuit pattern on a mask is transferred to a wafer is provided between the mirror and the wafer. As a result, the human body can be protected against radiation rays, such as gamma rays, generated from the SOR ring when electrons are implanted thereto or when the SOR ring is stopped. Damage to the X-ray reflecting mirror caused by radiation rays is reduced, and stable reflectance of the mirror can be obtained. Maintenance of the SOR exposure system is also made easier.
摘要翻译：在通过使用由X射线反射镜反射的SOR辐射将掩模上的图案转印到半导体晶片的SOR曝光系统中，至少屏蔽至少伽马射线的第一快门装置和用于屏蔽X射线的第二快门装置 SOR环和光束端口内的反射镜，以及用于当将掩模上的电路图案转印到晶片时调节曝光量的曝光调节装置设置在反射镜和晶片之间。结果，当电子被植入其中时或当SOR环停止时，可以保护人体免受从SOR环产生的辐射线，例如γ射线。由放射线引起的对X射线反射镜的伤害降低，反射镜的反射率稳定。 SOR曝光系统的维护也变得更加容易。

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