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1. 发明授权

US08441747B2 Optical module with minimized overrun of the optical element 有权
标题翻译：具有光学元件最小化的光学模块
公开(公告)号：US08441747B2
公开(公告)日：2013-05-14
申请号：US11901130
申请日：2007-09-14
申请人： Willi Heintel , Hagen Federau , Joachim Hartjes , Harald Kirchner , Bernhard Geuppert , Ulrich Bingel , Tilman Schwertner
发明人： Willi Heintel , Hagen Federau , Joachim Hartjes , Harald Kirchner , Bernhard Geuppert , Ulrich Bingel , Tilman Schwertner
IPC分类号： G02B7/02 , G03B27/42
CPC分类号： G03B27/54 , G02B7/021 , G02B13/143 , G03F7/70783 , G03F7/70825
摘要： There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.
摘要翻译：提供了一种用于微光刻的光学模块。光学模块包括光学元件和用于保持光学元件的保持装置。光学元件具有（a）主延伸面，其中限定径向R和圆周方向U，以及（b）在其外周的区域中的自由光学直径和超限。保持装置在超越范围内与光学元件接触，并且以这样的方式形成和/或接触光学元件，使得从超载计算的超载比与生产光学元件所需的最小超限有关，最多为1.5。

2. 发明申请

US20080204689A1 Optical module with minimized overrun of the optical element 有权
标题翻译：具有光学元件最小化的光学模块
公开(公告)号：US20080204689A1
公开(公告)日：2008-08-28
申请号：US11901130
申请日：2007-09-14
申请人： Willi Heintel , Bernhard Geuppert , Ulrich Bingel , Joachim Hartjes , Hagen Federau , Harald Kirchner , Tilman Schwertner
发明人： Willi Heintel , Bernhard Geuppert , Ulrich Bingel , Joachim Hartjes , Hagen Federau , Harald Kirchner , Tilman Schwertner
IPC分类号： G03B27/54 , G02B7/02
CPC分类号： G03B27/54 , G02B7/021 , G02B13/143 , G03F7/70783 , G03F7/70825
摘要： There is provided an optical module for microlithography. The optical module includes an optical element and a retaining device for holding the optical element. The optical element has (a) a main extension plane, in which it defines a radial direction R and a circumferential direction U, and (b) a free optical diameter and an overrun in the region of its outer periphery. The retaining device contacts the optical element in the region of the overrun, and is formed and/or contacts the optical element in such a manner that the overrun ratio, calculated from the overrun related to a minimum overrun necessary for the production of the optical element, is at most 1.5.
摘要翻译：提供了一种用于微光刻的光学模块。光学模块包括光学元件和用于保持光学元件的保持装置。光学元件具有（a）主延伸面，其中限定径向R和圆周方向U，以及（b）在其外周的区域中的自由光学直径和超限。保持装置在超越范围内与光学元件接触，并且以这样的方式形成和/或接触光学元件，使得从超载计算的超载比与生产光学元件所需的最小超限有关，最多为1.5。

3. 发明申请

US20080225247A1 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 有权
标题翻译：光学元件曝光过程
公开(公告)号：US20080225247A1
公开(公告)日：2008-09-18
申请号：US12046186
申请日：2008-03-11
申请人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
发明人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
IPC分类号： G03B27/54 , G03B27/52 , G02B23/16
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：公开了一种包括第一光学元件模块和密封装置的光学元件单元。第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。第一部件类型是光学元件，第二部件类型与第一部件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和第二个空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

4. 发明授权

US09046795B2 Optical element unit for exposure processes having sealing element 有权
标题翻译：用于具有密封元件的曝光工艺的光学元件单元
公开(公告)号：US09046795B2
公开(公告)日：2015-06-02
申请号：US12046186
申请日：2008-03-11
申请人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
发明人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：光学元件单元包括第一光学元件模块和密封装置。第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。第一部件类型是光学元件，第二部件类型与第一部件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并且至少在第一方向上基本上预先将物质从第一空间和第二空间中的一个进入另一个第一空间空间和第二空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

5. 发明申请

US20120075602A1 OPTICAL ARRANGEMENT IN A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的投影目标中的光学布置
公开(公告)号：US20120075602A1
公开(公告)日：2012-03-29
申请号：US13235651
申请日：2011-09-19
申请人： Hans-Juergen Rostalski , Tilman Schwertner , Alexander Epple
发明人： Hans-Juergen Rostalski , Tilman Schwertner , Alexander Epple
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G02B17/0663 , G02B7/182 , G02B17/061 , G03F7/70233
摘要： The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
摘要翻译：本公开涉及一种设计用于在EUV中操作的微光刻投影曝光装置的投影物镜中的光学装置。光学装置包括沿着投影光束方向彼此直接相继的第一和第二反射镜。第二个镜子刚性连接到第一个镜子。

6. 发明申请

US20100201964A1 PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY 有权
标题翻译：投影目标的微观算法
公开(公告)号：US20100201964A1
公开(公告)日：2010-08-12
申请号：US12724496
申请日：2010-03-16
申请人： Jens Kugler , Tilman Schwertner
发明人： Jens Kugler , Tilman Schwertner
IPC分类号： G03B27/54 , G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B7/1822 , G03F7/70816
摘要： An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.
摘要翻译：光学系统包括具有调节元件的光学元件。光学元件通过直接或经由一个或多个中间元件布置在承载环上的至少一个连接构件连接到可转动的承载环到光学元件。可旋转承载环以相对于固定的外部安装件或光学元件经由旋转装置绕轴线自由旋转的方式承载。外部安装件，可旋转承载环和连接构件被构造为平行运动学形式的可旋转运动学。

7. 发明授权

US08553202B2 Projection objective for microlithography 有权
标题翻译：微光刻的投影目标
公开(公告)号：US08553202B2
公开(公告)日：2013-10-08
申请号：US12724496
申请日：2010-03-16
申请人： Jens Kugler , Tilman Schwertner
发明人： Jens Kugler , Tilman Schwertner
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70825 , G02B7/023 , G02B7/1822 , G03F7/70816
摘要： An optical system includes an optical element having adjusting elements. The optical element is connected to a rotatable carrying ring via at least one connecting member arranged on the carrying ring directly or via one or a plurality of intermediate elements to the optical element. The rotatable carrying ring is borne in a manner freely rotatable about an axis relative to a fixed outer mount or the optical element via a rotating device. The outer mount, the rotatable carrying ring and the connecting members are constructed as rotatable kinematics in the form of parallel kinematics.
摘要翻译：光学系统包括具有调节元件的光学元件。光学元件通过直接或经由一个或多个中间元件布置在承载环上的至少一个连接构件连接到可转动的承载环到光学元件。可旋转承载环以相对于固定的外部安装件或光学元件经由旋转装置绕轴线自由旋转的方式承载。外部安装件，可旋转承载环和连接构件被构造为平行运动学形式的可旋转运动学。

8. 发明授权

US09086561B2 Optical arrangement in a projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影物镜中的光学布置
公开(公告)号：US09086561B2
公开(公告)日：2015-07-21
申请号：US13235651
申请日：2011-09-19
申请人： Hans-Juergen Rostalski , Tilman Schwertner , Alexander Epple
发明人： Hans-Juergen Rostalski , Tilman Schwertner , Alexander Epple
IPC分类号： G03B27/68 , G03B27/52 , G03B27/60 , G03B27/70 , G02B17/06 , G02B7/182 , G03F7/20 , G03B27/54
CPC分类号： G02B17/0663 , G02B7/182 , G02B17/061 , G03F7/70233
摘要： The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
摘要翻译：本公开涉及一种设计用于在EUV中操作的微光刻投影曝光装置的投影物镜中的光学装置。光学装置包括沿着投影光束方向彼此直接相继的第一和第二反射镜。第二个镜子刚性连接到第一个镜子。

9. 发明授权

US07869147B2 Holding device for optical element 有权
标题翻译：光学元件保持装置
公开(公告)号：US07869147B2
公开(公告)日：2011-01-11
申请号：US11784511
申请日：2007-04-06
申请人： Tilman Schwertner , Stefan Hembacher
发明人： Tilman Schwertner , Stefan Hembacher
IPC分类号： G02B7/02
CPC分类号： G02B27/0006 , G02B7/028 , G02B21/33 , G03F7/70341 , G03F7/70825
摘要： A device or the operation of a device for the holding, especially sealing support of an optical element, especially an optical lens with at least one holding element for mounting the optical element and preferably at least one sealing element for sealing contact at at least a part of the optical element and/or the holding element, wherein the sealing element or at least a part thereof is displaceable between a first position, in which the sealing element rests against the optical element and a second position, in which the sealing element is spaced apart from the optical element, or wherein the sealing element is switchable such that it rests against the optical element under different contact pressure or adjustable contact force. The holding element can either take on the holding function alone and independently of the sealing element or work together with the sealing element in this regard. The sealing element can also be provided separately and independently of the holding element, such that the holding element is optimizable to the holding function. Especially, the present invention concerns an immersion objective for microlithography in which at least one actuatable sealing element is provided.
摘要翻译：尤其是具有用于安装光学元件的至少一个保持元件的光学元件的光学元件的保持，特别是密封支撑的装置或操作装置，并且优选地至少一个用于在至少一部分处密封接触的密封元件其中所述密封元件或其至少一部分可在第一位置和第二位置之间移动，所述第一位置在所述第一位置和所述第二位置之间移动，所述密封元件和/ 除了光学元件之外，或者其中密封元件是可切换的，使得其在不同的接触压力或可调接触力下靠在光学元件上。在这方面，保持元件可以独立地承担保持功能，独立于密封元件或与密封元件一起工作。密封元件也可以分开设置并且独立于保持元件，使得保持元件可以优化到保持功能。特别地，本发明涉及一种用于微光刻的浸没物镜，其中提供至少一个致动密封元件。

10. 发明申请

US20070285645A1 Holding device for optical element 有权
标题翻译：光学元件保持装置
公开(公告)号：US20070285645A1
公开(公告)日：2007-12-13
申请号：US11784511
申请日：2007-04-06
申请人： Tilman Schwertner , Stefan Hembacher
发明人： Tilman Schwertner , Stefan Hembacher
IPC分类号： G03B27/54 , G02B7/02 , G02B7/182
CPC分类号： G02B27/0006 , G02B7/028 , G02B21/33 , G03F7/70341 , G03F7/70825
摘要： A device or the operation of a device for the holding, especially sealing support of an optical element, especially an optical lens with at least one holding element for mounting the optical element and preferably at least one sealing element for sealing contact at at least a part of the optical element and/or the holding element, wherein the sealing element or at least a part thereof is displaceable between a first position, in which the sealing element rests against the optical element and a second position, in which the sealing element is spaced apart from the optical element, or wherein the sealing element is switchable such that it rests against the optical element under different contact pressure or adjustable contact force. The holding element can either take on the holding function alone and independently of the sealing element or work together with the sealing element in this regard. The sealing element can also be provided separately and independently of the holding element, such that the holding element is optimizable to the holding function. Especially, the present invention concerns an immersion objective for microlithography in which at least one actuatable sealing element is provided.
摘要翻译：尤其是具有用于安装光学元件的至少一个保持元件的光学元件的光学元件的保持，特别是密封支撑的装置或操作装置，并且优选地至少一个用于在至少一部分处密封接触的密封元件其中所述密封元件或其至少一部分可在第一位置和第二位置之间移动，所述第一位置在所述第一位置和所述第二位置之间移动，所述密封元件和/ 除了光学元件之外，或者其中密封元件是可切换的，使得其在不同的接触压力或可调接触力下靠在光学元件上。在这方面，保持元件可以独立地承担保持功能，独立于密封元件或与密封元件一起工作。密封元件也可以分开设置并且独立于保持元件，使得保持元件可以优化到保持功能。特别地，本发明涉及一种用于微光刻的浸没物镜，其中提供至少一个致动密封元件。

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