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1. 发明授权

US09104026B2 Optical imaging device and imaging method for microscopy 有权
标题翻译：光学成像装置及显微镜成像方法
公开(公告)号：US09104026B2
公开(公告)日：2015-08-11
申请号：US12568483
申请日：2009-09-28
申请人： Alexander Epple , Ella Mizkewicz , Heiko Feldmann
发明人： Alexander Epple , Ella Mizkewicz , Heiko Feldmann
IPC分类号： G02B17/00 , G02B21/00 , G02B23/00 , G02B21/04 , G02B17/06
CPC分类号： G02B21/04 , G02B17/0631
摘要： The present invention relates to an optical imaging device, in particular for microscopy, with a first optical element group and a second optical element group, wherein the first optical element group and the second optical element group, on an image plane, form an image of an object point of an object plane. The first optical element group includes a first optical element with a reflective first optical surface and a second optical element with a reflective second optical surface. The second optical element group includes a third optical element with a reflective third optical surface. The first optical element and the second optical element are formed and arranged such that on formation of the image of the object point, in each case a multiple reflection of at least one imaging beam takes place on the first optical surface and the second optical surface.
摘要翻译：本发明涉及具有第一光学元件组和第二光学元件组的特别是显微镜的光学成像装置，其中第一光学元件组和第二光学元件组在图像平面上形成图像物体平面的物体点。第一光学元件组包括具有反射的第一光学表面的第一光学元件和具有反射的第二光学表面的第二光学元件。第二光学元件组包括具有反射第三光学表面的第三光学元件。第一光学元件和第二光学元件被形成和布置成使得在形成物点的图像时，在每种情况下，在第一光学表面和第二光学表面上都会发生至少一个成像光束的多次反射。

2. 发明授权

US09019596B2 Catadioptric projection objective with intermediate images 有权
标题翻译：反射折射投影物镜与中间图像
公开(公告)号：US09019596B2
公开(公告)日：2015-04-28
申请号：US13361707
申请日：2012-01-30
申请人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Alexander Epple
IPC分类号： G02B17/08 , G03F7/20 , G02B17/06
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
摘要翻译：反射折射投射物镜具有第一物镜部分，限定光轴的第一部分并对物场进行成像以形成第一实际中间像。它还具有使用来自第一目标部分的辐射形成第二实际中间图像的第二反射折射物镜部分。第二目标部分具有凹面镜并且限定光轴的第二部分。第三目标部分将第二实际中间图像成像到图像平面中并且限定光轴的第三部分。折叠镜将物体平面上的辐射偏转到凹面镜; 并将来自凹面镜的辐射偏转到图像平面。由第一目标部分限定的光轴的第一部分与光轴的第三部分横向偏移并与其平行。

3. 发明授权

US08345350B2 Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same 有权
标题翻译：具有特定结构和布置的度数光学元件的色校正物镜和包括该光学元件的投影曝光设备
公开(公告)号：US08345350B2
公开(公告)日：2013-01-01
申请号：US12621239
申请日：2009-11-18
申请人： Alexander Epple , Heiko Feldmann , Hans-Juergen Rostalski
发明人： Alexander Epple , Heiko Feldmann , Hans-Juergen Rostalski
IPC分类号： G02B17/00
CPC分类号： G03F7/70216 , G02B13/143 , G02B13/146 , G02B17/08 , G02B17/0892 , G02B27/0012 , G02B27/0025 , G03B27/54 , G03F7/70225 , G03F7/70241 , G03F7/70375 , G03F7/706
摘要： An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion Δni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation  ∑ i = 1 N ⁢ Δ ⁢ ⁢ n i ⁡ ( s i - d i )  λ 0 ⁢ NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.
摘要翻译：具有多个光学元件的目标是将来自波长λ的波长带的电磁辐射从图像侧的数值孔径NA> 0.8到目标场的图像成像到多个光学元件，具有数量N的折射光学元件对于波长为λ0的波长变化为1μm的透明材料制成的每个折射光学元件i由具有归一化光学色散的Dgr ni = ni（λ0）-ni（λ0+1μm）制成。该目标满足关系式Σi= 1 N＆Dgr; 对于来自物场的光轴上的场点的轴射线束的任何射线，其中si是射线的几何路径长度，其中，si 具有轴向厚度di的第i个屈光光学元件，并且在物镜的所有光度光学元件上延伸。如果A = 0.2或更低，则反射色素得到充分校正。

4. 发明申请

US20120162625A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 有权
标题翻译：具有中间图像的目标投影
公开(公告)号：US20120162625A1
公开(公告)日：2012-06-28
申请号：US13361707
申请日：2012-01-30
申请人： Aurelian DODOC , Wilhelm ULRICH , Alexander EPPLE
发明人： Aurelian DODOC , Wilhelm ULRICH , Alexander EPPLE
IPC分类号： G03F7/20 , G03B27/70 , G02B17/08
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective has a first objective part, defining a first part of the optical axis and imaging an object field to form a first real intermediate image. It also has a second, catadioptric objective part forming a second real intermediate image using the radiation from the first objective part. The second objective part has a concave mirror and defines a second part of the optical axis. A third objective part images the second real intermediate image into the image plane and defines a third part of the optical axis. Folding mirrors deflect the radiation from the object plane towards the concave mirror; and deflect the radiation from the concave mirror towards the image plane. The first part of the optical axis defined by the first objective part is laterally offset from and aligned parallel with the third part of the optical axis.
摘要翻译：反射折射投射物镜具有第一物镜部分，限定光轴的第一部分并对物场进行成像以形成第一实际中间图像。它还具有使用来自第一目标部分的辐射形成第二实际中间图像的第二反射折射物镜部分。第二目标部分具有凹面镜并且限定光轴的第二部分。第三目标部分将第二实际中间图像成像到图像平面中并且限定光轴的第三部分。折叠镜将物体平面上的辐射偏转到凹面镜; 并将来自凹面镜的辐射偏转到图像平面。由第一目标部分限定的光轴的第一部分与光轴的第三部分横向偏移并与其平行。

5. 发明授权

US08004756B2 Chromatically corrected catadioptric objective and projection exposure apparatus including the same 有权
标题翻译：色度校正反射折射物镜和投影曝光设备包括它们
公开(公告)号：US08004756B2
公开(公告)日：2011-08-23
申请号：US12834485
申请日：2010-07-12
申请人： Alexander Epple
发明人： Alexander Epple
IPC分类号： G02B17/08
CPC分类号： G03F7/70225 , G02B17/0892 , G02B27/0025
摘要： A catadioptric objective includes a plurality of optical elements arranged along an optical axis to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA with electromagnetic radiation from a wavelength band around a central wavelength λ
摘要翻译：反射折射物镜包括沿着光轴布置的多个光学元件，用于将物镜的物体表面中的物场的图案成像到在像侧数值孔径NA处的物镜的图像表面区域中的图像场，来自中心波长λ<300nm附近的波长带的电磁辐射。光学元件包括凹面镜和多个透镜。对于波长带的每个波长λ，投影物镜在相应的Petzval表面中形成图案的图像，Petzval表面对于不同的波长彼此偏离。多个透镜包括由具有基本不同的阿贝数的不同材料制成的透镜。在与图像表面区域中的光轴平行测量的图像场（最大图像高度y'）的边缘场点处的平面参考表面处的给定波长处的Petzval表面的纵向离开p随波长 λ根据：dp /dλ<（15λ/ NA2）/ nm。

6. 发明申请

US20110075121A1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：目标投影目标
公开(公告)号：US20110075121A1
公开(公告)日：2011-03-31
申请号：US12748862
申请日：2010-03-29
申请人： Alexander Epple , Toralf Gruner , Ralf Mueller
发明人： Alexander Epple , Toralf Gruner , Ralf Mueller
IPC分类号： G03B27/72 , G02B17/06
CPC分类号： G02B13/143 , G02B17/0892 , G03F7/70225
摘要： Catadioptric projection objective (1) for microlithography for imaging an object field (3) in an object plane (5) onto an image field (7) in an image plane (9), including a first partial objective (11) imaging the object field onto a first real intermediate image (13), a second partial objective (15) imaging the first intermediate image onto a second real intermediate image (17) and a third partial objective (19) imaging the second intermediate image onto the image field (7). The second partial objective (15) has exactly one concave mirror (21) and at least one lens (23). The minimum distance between an optically utilized region of the concave mirror (21) and an optically utilized region of a surface (25)—facing the concave mirror—of a lens (23) adjacent to the concave mirror is greater than 10 mm.
摘要翻译：用于微光刻的反折射投影物镜（1），用于将物平面（5）中的物场（3）成像到图像平面（9）中的图像场（7），包括对物场进行成像的第一部分物镜（11）到第一实际中间图像（13），将第一中间图像成像到第二实际中间图像（17）上的第二部分目标（15）和将第二中间图像成像到图像场（7）上的第三部分目标（19））。第二部分物镜（15）具有正好一个凹面镜（21）和至少一个透镜（23）。凹面镜（21）的光学利用区域与与凹面镜相邻的透镜（23）的凹面镜的表面（25）的光学利用区域之间的最小距离大于10mm。

7. 发明申请

US20100265478A1 PROJECTION LENS SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE INSTALLATION 有权
标题翻译：微波投影曝光安装投影镜头系统
公开(公告)号：US20100265478A1
公开(公告)日：2010-10-21
申请号：US12825001
申请日：2010-06-28
申请人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
发明人： Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Bärbel Schwaer , Olaf Rogalsky , Arif Kazi
IPC分类号： G03B27/68
CPC分类号： G03F7/70341 , G03F7/70891
摘要： A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
摘要翻译：微光刻投影曝光装置包括将物体成像到平面上并具有弯曲表面的透镜的投影物镜。在投影物镜中，存在液体或固体介质，其直接邻接可用于成像物体的区域上的曲面。投影曝光装置还具有可调节的操纵器，用于降低在投影操作期间由介质的加热引起的图像场曲率。

8. 发明授权

US07697198B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US07697198B2
公开(公告)日：2010-04-13
申请号：US10576265
申请日：2004-10-15
申请人： David Shafer , Alexander Epple , Aurelian Dodoc , Wilhelm Ulrich , Karl-Heinz Schuster
发明人： David Shafer , Alexander Epple , Aurelian Dodoc , Wilhelm Ulrich , Karl-Heinz Schuster
IPC分类号： G02B17/08
CPC分类号： G02B13/143 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for projecting a pattern arranged in the object plane of the projection objective into the image plane of the projection objective, having: a first objective part for projecting an object field lying in the object plane into a first real intermediate image; a second objective part for generating a second real intermediate image with the radiation coming from the first objective part; a third objective part for generating a third real intermediate image with the radiation coming from the second objective part; and a fourth objective part for projecting the third real intermediate image into the image plane.
摘要翻译：一种反折射投射物镜，用于将布置在投影物镜的物平面中的图案投影到投影物镜的像平面中，具有：第一物镜部分，用于将物平面中的物场投影到第一实际中间像中; 第二目标部分，用于利用来自第一目标部分的辐射产生第二实际中间图像; 第三目标部分，用于利用来自第二目标部分的辐射产生第三实际中间图像; 以及用于将第三实际中间图像投影到图像平面中的第四目标部分。

9. 发明申请

US20090316256A1 CHROMATICALLY CORRECTED OBJECTIVE AND PROJECTION EXPOSURE APPARATUS INCLUDING THE SAME 审中-公开
标题翻译：经修正的目标和投影曝光装置包括其中
公开(公告)号：US20090316256A1
公开(公告)日：2009-12-24
申请号：US12143598
申请日：2008-06-20
申请人： Alexander EPPLE , Heiko FELDMANN
发明人： Alexander EPPLE , Heiko FELDMANN
IPC分类号： G03B27/54 , G02B3/00 , G02B17/08
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/0012 , G02B27/0025 , G03F7/70225
摘要： An objective having a plurality of optical elements arranged to image a pattern from an object field in an object surface of the objective to an image field in an image surface region of the objective at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ, includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion Δni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation  ∑ i = 1 N  Δ   n i  ( s i - d i )  λ 0  NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected
摘要翻译：具有多个光学元件的目标，该多个光学元件布置成将物体的物体表面中的物体的图案成像到图像侧数值孔径NA> 0.8的物镜的图像表面区域中的图像场，其中电磁辐射来自围绕波长λ的波长带包括N个度数光学元件，每个度数光学元件i由具有用于波长变化的归一化光学色散Deltani = ni（λ0）-ni（λ0+1μm）的透明材料制成从波长λ0下午1点。目标满足源自物场中光轴上的场点的轴射线束的任何射线的关系ΣΣifield field field field field field field field field field field field field field field field field field field field field field 其中，si是具有轴向厚度di的第i个屈光光学元件中的光线的几何路径长度，并且在该物镜的所有光度光学元件上延伸。如果A = 0.2或更低，则反射色素得到充分校正

10. 发明申请

US20090115986A1 Microlithography projection objective 审中-公开
标题翻译：微光刻投影物镜
公开(公告)号：US20090115986A1
公开(公告)日：2009-05-07
申请号：US11916162
申请日：2006-05-23
申请人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
发明人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
摘要翻译：关于在这样的投影物镜中抑制假光，描述用于成像到平面中的布置在物体平面中的图案的微光刻投影物镜。

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