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1. 发明授权

US07136220B2 Catadioptric reduction lens 失效
标题翻译：反射折射减少镜片
公开(公告)号：US07136220B2
公开(公告)日：2006-11-14
申请号：US10805393
申请日：2004-03-22
申请人： Wilhelm Ulrich , David R. Shafer , Alexander Epple , Helmut Beierl , Aurelian Dodoc
发明人： Wilhelm Ulrich , David R. Shafer , Alexander Epple , Helmut Beierl , Aurelian Dodoc
IPC分类号： G02B17/00 , G02B21/00 , G02B23/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.
摘要翻译：一种反折射投射透镜，用于将布置在物平面中的图案成像到图像平面上，优选地在创建实际中间图像的同时，包括具有凹面镜的反折射第一透镜部分和具有分束表面的物理分束器，以及第二透镜部分优选地折射并且在分束器之间，在其物平面和图像平面之间。物体平面的光学近场被布置在距离投影透镜的第一光学表面的工作距离处。分束器位于低边缘射线高度附近，这允许配置对纵向色差完全校正的投影透镜，同时使用少量材料，特别是制造其分光器所需的材料。

2. 发明授权

US07426082B2 Catadioptric projection objective with geometric beam splitting 失效
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US07426082B2
公开(公告)日：2008-09-16
申请号：US11282587
申请日：2005-11-21
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学元件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

3. 发明申请

US20080316456A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH GEOMETRIC BEAM SPLITTING 审中-公开
标题翻译：几何投影目标与几何分束
公开(公告)号：US20080316456A1
公开(公告)日：2008-12-25
申请号：US12194005
申请日：2008-08-19
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G03F7/207 , G02B17/08
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

4. 发明授权

US06995930B2 Catadioptric projection objective with geometric beam splitting 有权
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US06995930B2
公开(公告)日：2006-02-07
申请号：US10734623
申请日：2003-12-15
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

5. 发明申请

US20060077366A1 Catadioptric projection objective with geometric beam splitting 失效
公开(公告)号：US20060077366A1
公开(公告)日：2006-04-13
申请号：US11282587
申请日：2005-11-21
申请人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G03B27/42 , G02B17/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

6. 发明申请

US20050117224A1 Catadioptric projection objective with geometric beam splitting 有权
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US20050117224A1
公开(公告)日：2005-06-02
申请号：US10734623
申请日：2003-12-15
申请人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B13/14 , G02B13/18 , G02B17/08 , G03F7/20 , G02B3/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective is used to project a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image and has an image-side numerical aperture NA>0.7. The projection objective comprises an optical axis and at least one catadioptric objective part that comprises a concave mirror and a first folding mirror. There are a first beam section running from the object plane to the concave mirror and a second beam section running from the concave mirror to the image plane. The first folding mirror is arranged with reference to the concave mirror in such a way that one of the beam sections is folded at the first folding mirror and the other beam section passes the first folding mirror without vignetting, the first beam section and the second beam section crossing one another in a cross-over region.
摘要翻译：反射折射投影物镜用于将形成投影物镜的物平面中的图案投影到投影物镜的像平面中，形成至少一个实际中间像，并具有图像侧数值孔径NA> 0.7。投影物镜包括光轴和包括凹面镜和第一折叠镜的至少一个反射折射物镜部分。存在从物平面延伸到凹面镜的第一光束部分和从凹面镜向像面延伸的第二光束部分。第一折叠镜相对于凹面镜布置成使得其中一个光束部分在第一折叠反射镜处被折叠，而另一个光束部分经过第一折叠镜而没有渐晕，第一光束部分和第二光束横跨地区相互交叉。

7. 发明申请

US20050185269A1 Catadioptric projection objective with geometric beam splitting 审中-公开
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US20050185269A1
公开(公告)日：2005-08-25
申请号：US11014857
申请日：2004-12-20
申请人： Alexander Epple , Helmut Beierl , Aurelian Dodoc , Wilhelm Ulrich
发明人： Alexander Epple , Helmut Beierl , Aurelian Dodoc , Wilhelm Ulrich
IPC分类号： G02B1/00 , G02B17/00 , G02B17/08 , G02B21/00 , G02B23/00 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G02B17/0804 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern arranged on the object plane of the projection objective, on the image plane of the projection objective, comprising: a first objective part for imaging an object field in a first real intermediate image; a second objective part for producing a second real intermediate image with the radiation coming from the first objective part; and a third objective part for imaging the second real intermediate image on the image plane; wherein at least one of the objective parts is a catadioptric objective part with a concave mirror, and at least one of the objective parts is a refractive objective part and a folding mirror is arranged within this refractive objective part in such a way that a field lens is arranged between the folding mirror and an intermediate image which is closest to the folding mirror.
摘要翻译：一种反射折射投射物镜，用于对布置在投影物镜的物平面上的图案进行成像，在投影物镜的像平面上，包括：用于对第一实际中间图像中的物场进行成像的第一物镜部分; 用于产生具有来自第一目标部分的辐射的第二实际中间图像的第二目标部分; 以及第三目标部分，用于对所述图像平面上的所述第二实际中间图像进行成像; 其中所述目标部分中的至少一个是具有凹面镜的反射折射物镜部分，并且所述目标部分中的至少一个是折射目标部分，并且折射镜布置在所述折射目标部分内，使得场透镜布置在折叠镜和最靠近折叠镜的中间图像之间。

8. 发明授权

US07697211B2 Symmetrical objective having four lens groups for microlithography 有权
标题翻译：具有用于微光刻的四个透镜组的对称物镜
公开(公告)号：US07697211B2
公开(公告)日：2010-04-13
申请号：US12257156
申请日：2008-10-23
申请人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
发明人： David R. Shafer , Aurelian Dodoc , Johannes Zellner , Heiko Feldmann , Wilhelm Ulrich , Holger Walter , Ulrich Loering , Daniel Kraehmer , Gerhard Fuerter
IPC分类号： G02B27/30
CPC分类号： G02B13/143 , G02B13/26 , G03F7/70241
摘要： The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.
摘要翻译：本发明的特征在于一种用于微光刻的系统，其包括配置成在多个汞发射线处发射辐射的水银光源，设置成接收由水银光源发射的辐射的投影物镜，以及被配置为相对于投影物镜定位晶片的台。在操作期间，投影物镜将来自光源的辐射引导到晶片，其中晶片处的辐射包括来自多于一个发射线的能量。用于所述投影物镜的光学透镜系统包括四个透镜组，每个透镜组具有包括二氧化硅的两个透镜，另一方面，第一和第二透镜组以及第三透镜组和第四透镜组相对于垂直的平面对称地定位到所述透镜系统的光轴。

9. 发明授权

US08730572B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08730572B2
公开(公告)日：2014-05-20
申请号：US13470956
申请日：2012-05-14
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf M. Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B17/08
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

10. 发明授权

US08416490B2 Catadioptric projection objective 有权
标题翻译：反射折射投影物镜
公开(公告)号：US08416490B2
公开(公告)日：2013-04-09
申请号：US12816863
申请日：2010-06-16
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1
摘要翻译：用于将设置在投影物镜的物平面中的图案成像到投影物镜的像平面上的折反射投射物镜具有用于将设置在物平面中的图案成像为第一中间图像的第一折射目标部分; 第二目标部分，其包括用于将第一中间成像成像成第二中间图像的至少一个凹面镜; 以及第三折射物镜部分，用于将所述第二中间成像成像到所述图像平面上; 其中所述投影物镜具有最大透镜直径Dmax，最大像场高度Y'和像侧数值孔径NA; 其中COMP1 = Dmax /（Y'·NA2），并且其中条件COMP1 <10成立。

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