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1. 发明授权

US07136220B2 Catadioptric reduction lens 失效
标题翻译：反射折射减少镜片
公开(公告)号：US07136220B2
公开(公告)日：2006-11-14
申请号：US10805393
申请日：2004-03-22
申请人： Wilhelm Ulrich , David R. Shafer , Alexander Epple , Helmut Beierl , Aurelian Dodoc
发明人： Wilhelm Ulrich , David R. Shafer , Alexander Epple , Helmut Beierl , Aurelian Dodoc
IPC分类号： G02B17/00 , G02B21/00 , G02B23/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection lens for imaging a pattern arranged in an object plane onto an image plane, preferably while creating a real intermediate image, including a catadioptric first lens section having a concave mirror and a physical beamsplitter having a beamsplitting surface, as well as a second lens section that is preferably refractive and follows the beamsplitter, between its object plane and image plane. Positive refractive power is arranged in an optical near-field of the object plane, which is arranged at a working distance from the first optical surface of the projection lens. The beamsplitter lies in the vicinity of low marginal-ray heights, which allows configuring projection lenses that are fully corrected for longitudinal chromatic aberration, while employing small quantities of materials, particularly those materials needed for fabricating their beamsplitters.
摘要翻译：一种反折射投射透镜，用于将布置在物平面中的图案成像到图像平面上，优选地在创建实际中间图像的同时，包括具有凹面镜的反折射第一透镜部分和具有分束表面的物理分束器，以及第二透镜部分优选地折射并且在分束器之间，在其物平面和图像平面之间。物体平面的光学近场被布置在距离投影透镜的第一光学表面的工作距离处。分束器位于低边缘射线高度附近，这允许配置对纵向色差完全校正的投影透镜，同时使用少量材料，特别是制造其分光器所需的材料。

2. 发明申请

US20080316456A1 CATADIOPTRIC PROJECTION OBJECTIVE WITH GEOMETRIC BEAM SPLITTING 审中-公开
标题翻译：几何投影目标与几何分束
公开(公告)号：US20080316456A1
公开(公告)日：2008-12-25
申请号：US12194005
申请日：2008-08-19
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G03F7/207 , G02B17/08
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

3. 发明授权

US07426082B2 Catadioptric projection objective with geometric beam splitting 失效
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US07426082B2
公开(公告)日：2008-09-16
申请号：US11282587
申请日：2005-11-21
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学元件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

4. 发明授权

US06995930B2 Catadioptric projection objective with geometric beam splitting 有权
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US06995930B2
公开(公告)日：2006-02-07
申请号：US10734623
申请日：2003-12-15
申请人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David R. Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.
摘要翻译：投影曝光透镜具有物平面，用于分离光束的光学元件，凹面镜，图像平面，布置在物平面和用于分离光束的光学元件之间的第一透镜系统，布置在光学器件之间的第二双透镜系统用于分离光束的元件和凹面镜，布置在用于分离光束的光学元件和图像平面之间的第三透镜系统。第二透镜系统最多有五个透镜。

5. 发明申请

US20060077366A1 Catadioptric projection objective with geometric beam splitting 失效
公开(公告)号：US20060077366A1
公开(公告)日：2006-04-13
申请号：US11282587
申请日：2005-11-21
申请人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G03B27/42 , G02B17/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A projection exposure lens has an object plane, optical elements for separating beams, a concave mirror, an image plane, a first lens system arranged between the object plane and the optical elements for separating beams, a second double pass lens system arranged between the optical elements for separating beams and the concave mirror, a third lens system arranged between the optical elements for separating beams and the image plane. The second lens system has a maximum of five lenses.

6. 发明申请

US20050117224A1 Catadioptric projection objective with geometric beam splitting 有权
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US20050117224A1
公开(公告)日：2005-06-02
申请号：US10734623
申请日：2003-12-15
申请人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
发明人： David Shafer , Alexander Epple , Aurelian Dodoc , Helmut Beierl , Wilhelm Ulrich
IPC分类号： G02B13/14 , G02B13/18 , G02B17/08 , G03F7/20 , G02B3/00 , G02B9/00
CPC分类号： G02B13/143 , G02B13/18 , G02B13/22 , G02B17/08 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective is used to project a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image and has an image-side numerical aperture NA>0.7. The projection objective comprises an optical axis and at least one catadioptric objective part that comprises a concave mirror and a first folding mirror. There are a first beam section running from the object plane to the concave mirror and a second beam section running from the concave mirror to the image plane. The first folding mirror is arranged with reference to the concave mirror in such a way that one of the beam sections is folded at the first folding mirror and the other beam section passes the first folding mirror without vignetting, the first beam section and the second beam section crossing one another in a cross-over region.
摘要翻译：反射折射投影物镜用于将形成投影物镜的物平面中的图案投影到投影物镜的像平面中，形成至少一个实际中间像，并具有图像侧数值孔径NA> 0.7。投影物镜包括光轴和包括凹面镜和第一折叠镜的至少一个反射折射物镜部分。存在从物平面延伸到凹面镜的第一光束部分和从凹面镜向像面延伸的第二光束部分。第一折叠镜相对于凹面镜布置成使得其中一个光束部分在第一折叠反射镜处被折叠，而另一个光束部分经过第一折叠镜而没有渐晕，第一光束部分和第二光束横跨地区相互交叉。

7. 发明申请

US20050185269A1 Catadioptric projection objective with geometric beam splitting 审中-公开
标题翻译：反射折射投影物镜，具有几何光束分裂
公开(公告)号：US20050185269A1
公开(公告)日：2005-08-25
申请号：US11014857
申请日：2004-12-20
申请人： Alexander Epple , Helmut Beierl , Aurelian Dodoc , Wilhelm Ulrich
发明人： Alexander Epple , Helmut Beierl , Aurelian Dodoc , Wilhelm Ulrich
IPC分类号： G02B1/00 , G02B17/00 , G02B17/08 , G02B21/00 , G02B23/00 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G02B17/0804 , G03F7/70225
摘要： A catadioptric projection objective for imaging a pattern arranged on the object plane of the projection objective, on the image plane of the projection objective, comprising: a first objective part for imaging an object field in a first real intermediate image; a second objective part for producing a second real intermediate image with the radiation coming from the first objective part; and a third objective part for imaging the second real intermediate image on the image plane; wherein at least one of the objective parts is a catadioptric objective part with a concave mirror, and at least one of the objective parts is a refractive objective part and a folding mirror is arranged within this refractive objective part in such a way that a field lens is arranged between the folding mirror and an intermediate image which is closest to the folding mirror.
摘要翻译：一种反射折射投射物镜，用于对布置在投影物镜的物平面上的图案进行成像，在投影物镜的像平面上，包括：用于对第一实际中间图像中的物场进行成像的第一物镜部分; 用于产生具有来自第一目标部分的辐射的第二实际中间图像的第二目标部分; 以及第三目标部分，用于对所述图像平面上的所述第二实际中间图像进行成像; 其中所述目标部分中的至少一个是具有凹面镜的反射折射物镜部分，并且所述目标部分中的至少一个是折射目标部分，并且折射镜布置在所述折射目标部分内，使得场透镜布置在折叠镜和最靠近折叠镜的中间图像之间。

8. 发明申请

US20070109659A1 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
公开(公告)号：US20070109659A1
公开(公告)日：2007-05-17
申请号：US11649274
申请日：2007-01-04
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B3/00
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.

9. 发明授权

US07187503B2 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US07187503B2
公开(公告)日：2007-03-06
申请号：US11011610
申请日：2004-12-15
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B9/00 , G02B9/60 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

10. 发明授权

US07408716B2 Refractive projection objective for immersion lithography 有权
$Refractive projection objective for immersion lithography$
标题翻译：用于浸没光刻的折射投影物镜
公开(公告)号：US07408716B2
公开(公告)日：2008-08-05
申请号：US11649274
申请日：2007-01-04
申请人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
发明人： Hans-Juergen Rostalski , Aurelian Dodoc , Alexander Epple , Helmut Beierl
IPC分类号： G02B3/00 , G02B9/60 , G03B27/54
CPC分类号： G03F7/70341 , G02B13/143 , G02B13/18 , G02B15/177 , G02B21/33 , G02B27/0025 , G03F7/70241
摘要： A purely refractive projection objective suitable for immersion microlithography is designed as a single-waist system with five lens groups, in the case of which a first lens group with negative refractive power, a second lens group with positive refractive power, a third lens group with negative refractive power, a fourth lens group with positive refractive power and a fifth lens group with positive refractive power are provided. A constriction site of narrowest constriction of the beam bundle lies in the region of the waist. A waist distance AT exists between the object plane and the constriction site X. The condition AT/L≦0.4 holds for a distance ratio AT/L between the waist distance AT and an object-image distance L of the projection objective. Embodiments of inventive projection objectives reach very high numerical apertures NA>1.1 in conjunction with a large image field and are distinguished by a compact overall size and good correction of the lateral chromatic aberration.
摘要翻译：适用于浸没微光刻的纯折射投射物镜被设计为具有五个透镜组的单腰系统，在其中具有负屈光力的第一透镜组，具有正屈光力的第二透镜组，具有正屈光力的第二透镜组，具有提供负屈光力，具有正屈光力的第四透镜组和具有正屈光力的第五透镜组。束束狭窄收缩的收缩位置位于腰部区域。在物平面和收缩位置X之间存在腰距离AT。对于距离距离AT和投影物镜的物体距离L之间的距离比AT / L，条件AT / L <= 0.4成立。本发明的投影物镜的实施例结合大图像场达到非常高的数值孔径NA> 1.1，并且通过紧凑的总体尺寸和横向色差的良好校正来区分。

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