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1. 发明授权

US5191218A Vacuum chuck 失效
标题翻译：真空罐
公开(公告)号：US5191218A
公开(公告)日：1993-03-02
申请号：US723336
申请日：1991-06-28
申请人： Tetsuzo Mori , Mitsuji Marumo , Kazunori Iwamoto , Yuji Chiba , Kazuyuki Kasumi
发明人： Tetsuzo Mori , Mitsuji Marumo , Kazunori Iwamoto , Yuji Chiba , Kazuyuki Kasumi
IPC分类号： G03F7/20 , H01L21/683
CPC分类号： G03F7/707 , G03F7/70875 , H01L21/6838 , Y10S294/907 , Y10T279/11
摘要： A vacuum-attraction holding device includes a holding base having an attracting surface, for holding a substrate thereon; a suction passageway formed in the base, for supplying a vacuum to the holding base to attract the substrate to the attracting surface; and a pressure sensor provided in the base and being communicated with the suction passageway.

2. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

3. 发明授权

US5883932A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5883932A
公开(公告)日：1999-03-16
申请号：US464225
申请日：1995-06-05
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.
摘要翻译：一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

4. 发明授权

US5854819A Mask supporting device and correction method therefor, and exposure apparatus and device producing method utilizing the same 失效
标题翻译：掩模支撑装置及其校正方法，以及利用其的曝光装置和装置的制造方法
公开(公告)号：US5854819A
公开(公告)日：1998-12-29
申请号：US797467
申请日：1997-02-06
申请人： Shinichi Hara , Takeshi Miyachi , Nobutoshi Mizusawa , Yuji Chiba , Kazuyuki Kasumi
发明人： Shinichi Hara , Takeshi Miyachi , Nobutoshi Mizusawa , Yuji Chiba , Kazuyuki Kasumi
IPC分类号： G03F7/20 , H01L21/30
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70783 , G03F7/708
摘要： There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.
摘要翻译：公开了一种掩模支撑装置，其包括用于支撑设置有其中形成有掩模图案的矩形窗口的掩模基板的卡盘机构和用于加强掩模基板的框架，以及用于将所述掩模，来自相互正交的方向的载荷。用于施加载荷的机构包括固定的参考，其接触在荫罩框架的外周上的两个位置，以及两个按压机构，用于从两个接触位置相对的两个方向向荫罩框架施加负载。

5. 发明授权

US5930324A Exposure apparatus and device manufacturing method using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5930324A
公开(公告)日：1999-07-27
申请号：US831867
申请日：1997-04-02
申请人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
发明人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
IPC分类号： G03F7/20 , G03F9/00 , H01L21/30
CPC分类号： G03F7/702 , G03F7/70691 , G03F7/70841 , G03F9/7015
摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.
摘要翻译：一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件，由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态测量部分相对于辐射光的光轴。

6. 发明授权

US5825463A Mask and mask supporting mechanism 失效
标题翻译：面罩和面罩支撑机构
公开(公告)号：US5825463A
公开(公告)日：1998-10-20
申请号：US791545
申请日：1997-01-31
申请人： Shinichi Hara , Nobutoshi Mizusawa , Yuji Chiba
发明人： Shinichi Hara , Nobutoshi Mizusawa , Yuji Chiba
IPC分类号： G03F1/22 , G03F7/20 , G03B27/62
CPC分类号： G03F1/22 , G03F7/707
摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.
摘要翻译：一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模框架相对于X，Y和θ方向定位。两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。掩模在其底表面上的三个点处被支撑以在Z方向上定位。

7. 发明授权

US5356686A X-ray mask structure 失效
标题翻译： X光掩模结构
公开(公告)号：US5356686A
公开(公告)日：1994-10-18
申请号：US182513
申请日：1994-01-14
申请人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
发明人： Hidehiko Fujioka , Takeshi Miyachi , Yasuaki Fukuda , Yuji Chiba , Nobutoshi Mizusawa , Takao Kariya , Shunichi Uzawa
IPC分类号： G03F1/22 , G03F1/60 , G03F7/20 , H01L21/027 , H01L21/30 , G03F9/00 , G21K5/00
CPC分类号： G03F1/22 , G03F7/70866 , Y10T428/21 , Y10T428/24612 , Y10T428/24851
摘要： An X-ray mask structure includes a mask substrate having a pattern; a supporting frame for carrying and supporting the mask substrate; and an adhesive material for fixing the mask substrate to the supporting frame; wherein a stress releasing groove is formed in at least one of the mask substrate and the supporting frame.
摘要翻译： X射线掩模结构包括具有图案的掩模基板; 用于承载和支撑掩模基板的支撑框架; 以及用于将掩模基板固定到支撑框架的粘合材料; 其中在所述掩模基板和所述支撑框架中的至少一个中形成有应力释放槽。

8. 发明授权

US07575103B2 Elevator supervisory system for managing operating condition data 失效
标题翻译：电梯监控系统，用于管理运行状态数据
公开(公告)号：US07575103B2
公开(公告)日：2009-08-18
申请号：US10574606
申请日：2004-08-11
申请人： Yuji Chiba
发明人： Yuji Chiba
IPC分类号： B66B1/34
CPC分类号： B66B5/0012
摘要： An elevator supervisory system capable of managing abnormality data, operating condition data and car interior video data in association with one another, so that this data can be displayed in association with one another upon the occurrence of an abnormality.
摘要翻译：一种能够彼此相关联地管理异常数据，操作条件数据和汽车内部视频数据的电梯监控系统，使得可以在发生异常时相关联地显示该数据。

9. 发明授权

US6014421A Radiation reduction exposure apparatus and method of manufacturing semiconductor device 失效
标题翻译：减光曝光装置及半导体装置的制造方法
公开(公告)号：US6014421A
公开(公告)日：2000-01-11
申请号：US847404
申请日：1997-04-24
申请人： Yuji Chiba , Masami Tsukamoto
发明人： Yuji Chiba , Masami Tsukamoto
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70233 , G03F7/70283 , G03F7/703 , G03F7/70358 , G03F7/70708 , G03F7/70725
摘要： An X-ray reduction exposure apparatus which provides a preferable image forming system in an entire mask surface area of a reflection type mask, can reduce curvature of the field and astigmatism of the transfer image even in scan exposure and, therefore, can obtain high transfer precision, and the apparatus contributes to the manufacture of a semiconductor element having high reliability. The X-ray reduction exposure apparatus has, as a characteristic feature, a drive mechanism for driving a mask scan stage substantially along the curvature surface of the mask. This drive mechanism is constituted by a main drive section (linear motor or the like) linearly driven in a direction corresponding to the moving direction of a mask scan stage and a sub-drive section (actuator or the like) driven perpendicularly to the drive direction, otherwise, constituted by a main drive section and a guide having a shape which is the same as the curvature surface shape of the mask.
摘要翻译：在反射型掩模的整个掩模表面区域中提供优选的图像形成系统的X射线减少曝光装置即使在扫描曝光中也可以减小转印图像的曲率和像散，因此可以获得高转印并且该装置有助于制造具有高可靠性的半导体元件。作为特征，X射线减少曝光装置具有用于基本上沿着掩模的曲率表面驱动掩模扫描台的驱动机构。该驱动机构由与驱动方向垂直驱动的荫罩扫描台和副驱动部（致动器等）的移动方向对应的方向直线驱动的主驱动部（直线电机等）构成，否则由主驱动部分和具有与掩模的曲率表面形状相同的形状的引导件构成。

10. 发明授权

US5959304A Semiconductor exposure apparatus 失效
标题翻译：半导体曝光装置
公开(公告)号：US5959304A
公开(公告)日：1999-09-28
申请号：US80397
申请日：1998-05-18
申请人： Toshinobu Tokita , Yuji Chiba , Yutaka Tanaka
发明人： Toshinobu Tokita , Yuji Chiba , Yutaka Tanaka
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70691 , G03F7/7035 , G03F9/70
摘要： An exposure apparatus for transferring a pattern, formed on a membrane of a mask, to an exposure region of a wafer disposed opposed to the mask with a small spacing kept therebetween. The apparatus includes an exposure system for transferring, by exposure, the pattern of the mask to different exposure regions of the wafer sequentially, a measuring system for producing deformation information related to at least one portion of the mask membrane, and an attitude controlling system for controlling attitude of at least one of the mask and the wafer, on the basis of the deformation information produced by the measuring system.
摘要翻译：一种曝光装置，用于将形成在掩模的膜上的图案转印到与所述掩模相对设置的晶片的曝光区域，所述曝光区域间隔保持很小。该装置包括曝光系统，用于通过曝光将掩模的图案顺序地转印到晶片的不同曝光区域，用于产生与面膜的至少一部分相关的变形信息的测量系统和用于基于由测量系统产生的变形信息来控制掩模和晶片中的至少一个的控制姿态。

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