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1. 发明授权

US5959304A Semiconductor exposure apparatus 失效
标题翻译：半导体曝光装置
公开(公告)号：US5959304A
公开(公告)日：1999-09-28
申请号：US80397
申请日：1998-05-18
申请人： Toshinobu Tokita , Yuji Chiba , Yutaka Tanaka
发明人： Toshinobu Tokita , Yuji Chiba , Yutaka Tanaka
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70691 , G03F7/7035 , G03F9/70
摘要： An exposure apparatus for transferring a pattern, formed on a membrane of a mask, to an exposure region of a wafer disposed opposed to the mask with a small spacing kept therebetween. The apparatus includes an exposure system for transferring, by exposure, the pattern of the mask to different exposure regions of the wafer sequentially, a measuring system for producing deformation information related to at least one portion of the mask membrane, and an attitude controlling system for controlling attitude of at least one of the mask and the wafer, on the basis of the deformation information produced by the measuring system.
摘要翻译：一种曝光装置，用于将形成在掩模的膜上的图案转印到与所述掩模相对设置的晶片的曝光区域，所述曝光区域间隔保持很小。该装置包括曝光系统，用于通过曝光将掩模的图案顺序地转印到晶片的不同曝光区域，用于产生与面膜的至少一部分相关的变形信息的测量系统和用于基于由测量系统产生的变形信息来控制掩模和晶片中的至少一个的控制姿态。

2. 发明授权

US06559927B1 Gap adjusting method in exposure apparatus 失效
标题翻译：曝光装置中的间隙调整方法
公开(公告)号：US06559927B1
公开(公告)日：2003-05-06
申请号：US09455248
申请日：1999-12-06
申请人： Toshinobu Tokita , Yutaka Tanaka
发明人： Toshinobu Tokita , Yutaka Tanaka
IPC分类号： G03B2758
CPC分类号： G03F9/703 , G03F7/70425 , G03F9/7046
摘要： An exposure apparatus includes a gap measuring device for measuring a gap between a mask, having a mask membrane, and a substrate, a gap adjuster for adjusting the gap between the mask and the substrate and a driver for relatively moving the mask and the substrate relative to each other. The gap adjusting device adjusts the gap when the mask and the substrate are placed at a position at which they are opposed to each other in an area smaller than a predetermined area.
摘要翻译：曝光装置包括用于测量具有掩模膜的掩模与基板之间的间隙的间隙测量装置，用于调节掩模和基板之间的间隙的间隙调节器和用于使掩模和基板相对移动的驱动器对彼此。间隙调整装置在将掩模和基板置于小于预定区域的区域彼此相对的位置时调整间隙。

3. 发明授权

US5930324A Exposure apparatus and device manufacturing method using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5930324A
公开(公告)日：1999-07-27
申请号：US831867
申请日：1997-04-02
申请人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
发明人： Shin Matsui , Ryuichi Ebinuma , Yuji Chiba , Yutaka Tanaka
IPC分类号： G03F7/20 , G03F9/00 , H01L21/30
CPC分类号： G03F7/702 , G03F7/70691 , G03F7/70841 , G03F9/7015
摘要： An exposure apparatus for exposing a wafer to a mask with radiation light to thereby transfer a pattern of the mask onto the wafer, includes a light emitting portion for emitting the radiation light, a stepper major assembly having a wafer stage portion for holding the wafer and being supported by a supporting system separate from the light emitting portion, an alignment measuring portion for alignment measurement for the wafer and the mask and being supported by a supporting system separate from the stepper major assembly, and a correcting system for correcting attitude of the alignment measuring portion with respect to an optical axis of the radiation light.
摘要翻译：一种曝光装置，用于将辐射光将晶片曝光于掩模，从而将掩模图案转印到晶片上，包括用于发射辐射光的发光部分，具有用于保持晶片的晶片台部分的步进主要组件，由与发光部分分开的支撑系统支撑，对准测量部分，用于晶片和掩模的对准测量，并由与步进主要组件分离的支撑系统支撑;以及校正系统，用于校正对准姿态测量部分相对于辐射光的光轴。

4. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

5. 发明授权

US5883932A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5883932A
公开(公告)日：1999-03-16
申请号：US464225
申请日：1995-06-05
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.
摘要翻译：一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

6. 发明申请

US20140096733A1 GLOW PLUG, NEW GLOW PLUG DETERMINATION METHOD, AND GLOW PLUG DRIVING CONTROL DEVICE 有权
标题翻译： GLOW PLUG，新GLOW PLUG确定方法和GLOW PLUG驱动控制装置
公开(公告)号：US20140096733A1
公开(公告)日：2014-04-10
申请号：US14118918
申请日：2012-05-14
申请人： Tomohiro Nakamura , Yutaka Tanaka , Yoshihito Fujishiro , Yasuo Toyoshima
发明人： Tomohiro Nakamura , Yutaka Tanaka , Yoshihito Fujishiro , Yasuo Toyoshima
IPC分类号： F02P19/02
CPC分类号： F02P19/02 , F02D41/266 , F02D2041/2058 , F02P19/027 , F23Q7/001
摘要： There is provided a new glow plug that can be easily determined as to whether or not it is a new article.An additional circuit 12 formed by connecting a diode 13, a fuse 14, and an adjusting resistor 15 in series in this order is connected in parallel to a heating element 11 of a glow plug 1. The diode 13 is provided so as to have an anode located on the positive electrode side of the heating element 11 and a cathode located on the fuse 14 side. In the case of a unit inspection, by applying a positive voltage for test to a heating element negative electrode connecting portion 3a, it is possible to determine whether or not the glow plug 1 is normal without blowing the fuse 14 before the glow plug 1 is used in a vehicle.
摘要翻译：提供了一个新的电热塞，可以很容易地确定它是否是一个新的文章。依次连接二极管13，熔断器14和调节电阻器15而构成的附加电路12与电热塞1的加热元件11并联连接。二极管13设置成具有位于加热元件11的正极侧的阳极和位于保险丝14侧的阴极。在单元检查的情况下，通过向加热元件负极连接部3a施加正电压进行测试，可以在电热塞1为止之前先吹出保险丝14来判断电热塞1是否正常用于车辆。

7. 发明申请

US20130255615A1 GLOW PLUG CONTROL DRIVE METHOD AND GLOW PLUG DRIVE CONTROL SYSTEM 有权
标题翻译： GLOW插头控制驱动方法和GLOW PLUG驱动控制系统
公开(公告)号：US20130255615A1
公开(公告)日：2013-10-03
申请号：US13993165
申请日：2011-12-06
申请人： Yoshito Hujishiro , Yutaka Tanaka , Tomohiro Nakamura
发明人： Yoshito Hujishiro , Yutaka Tanaka , Tomohiro Nakamura
IPC分类号： F02P23/00
CPC分类号： F02P23/00 , F02D2041/2027 , F02P19/02 , F02P19/022 , F02P19/023 , F02P19/026 , F23Q7/001
摘要： To suppress current fluctuations upon commencement of driving and prolong lifespan by reducing electric stress caused by current fluctuations.A glow plug 1, a glow switch 2, and a stabilizing coil 3 are series-connected, and upon commencement of the driving of the glow plug 1, a repetition frequency of PWM signals that control the opening and closing of the glow switch 2 is made into a higher frequency than a repetition frequency in a normal drive state and the opening and closing of the glow switch 2 is controlled (S104), and when a predetermined drive shift condition has been met (S106), the repetition frequency of the PWM signals is returned to the frequency during normal driving and the opening and closing of the glow switch 2 is controlled (S108), whereby the current upon commencement of driving is smoothed and the occurrence of an instantaneous large current is suppressed.
摘要翻译：为了抑制驱动开始时的电流波动，通过减少由电流波动引起的电应力来延长寿命。电热塞1，辉光开关2和稳定线圈3是串联的，并且在电热塞1的驱动开始时，控制辉光开关2的打开和关闭的PWM信号的重复频率是在正常驱动状态下被制成比重复频率高的频率，并且控制辉光开关2的打开和关闭（S104），并且当满足预定的驱动移位条件（S106）时，PWM的重复频率信号在正常驱动期间返回到频率，并且控制辉光开关2的打开和关闭（S108），从而驱动开始时的电流平滑，并且抑制了瞬时大电流的发生。

8. 发明授权

US08159852B2 Semiconductor memory device 有权
标题翻译：半导体存储器件
公开(公告)号：US08159852B2
公开(公告)日：2012-04-17
申请号：US12398839
申请日：2009-03-05
申请人： Toshiyuki Kouchi , Yutaka Tanaka
发明人： Toshiyuki Kouchi , Yutaka Tanaka
IPC分类号： G11C5/02
CPC分类号： G11C8/16 , G11C11/412
摘要： A semiconductor memory device includes first and second driving transistors; first and second load transistors; and first and second transmission transistors. Their respective drain diffusion layers of the transistors are isolated from one another. The semiconductor memory device also includes a bit cell in which the first and second driving transistors, the first and second load transistors, and the first and second transmission transistors are arranged; a first wiring for connecting their respective drains of the first driving transistor, the first load transistor, and the first transmission transistor; and a second wiring for connecting their respective drains of the second driving transistor, the second load transistor, and the second transmission transistor.
摘要翻译：半导体存储器件包括第一和第二驱动晶体管; 第一和第二负载晶体管; 以及第一和第二传输晶体管。它们各自的漏极扩散层彼此隔离。半导体存储器件还包括其中布置第一和第二驱动晶体管，第一和第二负载晶体管以及第一和第二传输晶体管的位单元; 用于连接第一驱动晶体管，第一负载晶体管和第一透射晶体管的各自的漏极的第一布线; 以及用于连接其第二驱动晶体管，第二负载晶体管和第二传输晶体管的各自的漏极的第二布线。

9. 发明申请

US20090268499A1 SEMICONDUCTOR MEMORY DEVICE 有权
标题翻译：半导体存储器件
公开(公告)号：US20090268499A1
公开(公告)日：2009-10-29
申请号：US12398839
申请日：2009-03-05
申请人： Toshiyuki Kouchi , Yutaka Tanaka
发明人： Toshiyuki Kouchi , Yutaka Tanaka
IPC分类号： G11C5/02 , G11C5/06 , G11C8/16
CPC分类号： G11C8/16 , G11C11/412
摘要： A semiconductor memory device includes first and second driving transistors; first and second load transistors; and first and second transmission transistors. Their respective drain diffusion layers of the transistors are isolated from one another. The semiconductor memory device also includes a bit cell in which the first and second driving transistors, the first and second load transistors, and the first and second transmission transistors are arranged; a first wiring for connecting their respective drains of the first driving transistor, the first load transistor, and the first transmission transistor; and a second wiring for connecting their respective drains of the second driving transistor, the second load transistor, and the second transmission transistor.
摘要翻译：半导体存储器件包括第一和第二驱动晶体管; 第一和第二负载晶体管; 以及第一和第二传输晶体管。它们各自的漏极扩散层彼此隔离。半导体存储器件还包括其中布置第一和第二驱动晶体管，第一和第二负载晶体管以及第一和第二传输晶体管的位单元; 用于连接第一驱动晶体管，第一负载晶体管和第一透射晶体管的各自的漏极的第一布线; 以及用于连接其第二驱动晶体管，第二负载晶体管和第二传输晶体管的各自的漏极的第二布线。

10. 发明授权

US07566422B2 Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus 失效
标题翻译：带有储存氦气的储罐的曝光装置和使用曝光装置的制造装置的方法
公开(公告)号：US07566422B2
公开(公告)日：2009-07-28
申请号：US11201142
申请日：2005-08-11
申请人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
发明人： Shinichi Hara , Yutaka Tanaka , Shigeru Terashima , Takayuki Hasegawa , Shin Matsui
IPC分类号： G05D16/00 , C23C14/00
CPC分类号： G05D16/2013
摘要： A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.
摘要翻译：一种处理装置，包括：密封真空室，其包含处理部分; 压力控制系统，通过排出密封真空室中的环境气体来保持密封真空室的内部压力恒定在预定水平; 以及环境气体循环系统，其将从密封的真空室排出的环境气体再循环回密封的真空室中; 其中由环境气体再循环系统再循环的环境被吹入密封的真空室中，使得沿着处理部分沿预定方向产生气流。

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