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1. 发明授权

US6025956A Incident-light fluorescence microscope 失效
标题翻译：入射光荧光显微镜
公开(公告)号：US6025956A
公开(公告)日：2000-02-15
申请号：US766132
申请日：1996-12-16
申请人： Takashi Nagano , Keiji Shimizu , Kenji Kawasaki , Kiyonobu Kurata , Masakazu Shimada
发明人： Takashi Nagano , Keiji Shimizu , Kenji Kawasaki , Kiyonobu Kurata , Masakazu Shimada
IPC分类号： G02B21/08 , G02B21/16 , G02B21/06
CPC分类号： G02B21/082 , G02B21/16
摘要： An incident-light fluorescence microscope including: (i) a transmission illuminating optical system which has a first optical member for receiving light emitted from a light source and extracting transmitted light and which irradiates the transmitted light onto a sample, and (ii) an observation optical system which has an objective lens and a second optical member and which is positioned closer to the objective lens than the sample. An incident-light fluorescence illuminating optical system is provided in the observation optical system, wherein the first optical member has a peak of transmittance at a wavelength longer than the fluorescent wavelength, and the second optical member selectively modulates only a wavelength transmitted through the first optical member.
摘要翻译：一种入射光荧光显微镜，包括：（i）透射照明光学系统，其具有用于接收从光源发射的光并提取透射光并将透射光照射到样品上的第一光学部件，以及（ii）观察光学系统，其具有物镜和第二光学构件，并且位于比样品更靠近物镜的位置。入射光荧光照明光学系统设置在观察光学系统中，其中第一光学构件具有比荧光波长更长的波长的透射峰，而第二光学构件仅选择性地仅调制透过第一光学会员。

2. 发明授权

US6043475A Focal point adjustment apparatus and method applied to microscopes 失效
标题翻译：焦点调节装置和方法应用于显微镜
公开(公告)号：US6043475A
公开(公告)日：2000-03-28
申请号：US839658
申请日：1997-04-15
申请人： Masakazu Shimada , Takashi Nagano , Takashi Yoneyama , Nobuyuki Nagasawa , Hideaki Endo , Jitsunari Kojima , Atsuhiro Tsuchiya , Yukiko Saeki
发明人： Masakazu Shimada , Takashi Nagano , Takashi Yoneyama , Nobuyuki Nagasawa , Hideaki Endo , Jitsunari Kojima , Atsuhiro Tsuchiya , Yukiko Saeki
IPC分类号： G02B21/24 , G02B7/04
CPC分类号： G02B21/241
摘要： A focal point adjustment apparatus applied to an optical apparatus with a projection optical system, comprises, an object lens, a stage on which a plate member on which a subject is put for measurement is placed, provision unit for providing the thickness of the plate member for measurement, determining unit for determining data on the distance between the object lens and the stage on the basis of the thickness of the plate member for measurement provided by the provision unit, and focusing unit for adjusting the distance between the object lens and the stage on the basis of the data on the distance between the object lens and the stage determined by the determining unit.
摘要翻译：一种应用于具有投影光学系统的光学装置的焦点调节装置，包括：物镜，放置有被测体放置用于测量的板构件的台，提供单元，用于提供板构件的厚度用于测量的确定单元，用于基于由提供单元提供的用于测量的板构件的厚度来确定物镜与台架之间的距离的数据;以及聚焦单元，用于调整物镜与舞台之间的距离基于由所述确定单元确定的所述物镜与所述台阶之间的距离的数据。

3. 发明申请

US20090016706A1 Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices 有权
标题翻译：加热装置，基板处理装置以及半导体装置的制造方法
公开(公告)号：US20090016706A1
公开(公告)日：2009-01-15
申请号：US12213823
申请日：2008-06-25
申请人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Masashi Sugishita , Toshimitsu Miyata , Kimio Kitamura , Kenji Tanaka , Jyunichi Nishihara
发明人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Masashi Sugishita , Toshimitsu Miyata , Kimio Kitamura , Kenji Tanaka , Jyunichi Nishihara
IPC分类号： F26B3/28
CPC分类号： H01L21/67109 , H01L21/67115
摘要： A heating apparatus comprises a wall for surrounding and defining a heating space, a heating element mounted on the inner side of the wall, reflecting members for reflecting the heat emitted from the heating element. Also, a moving unit joined to one end of each of the reflecting members for moving the reflecting members. Moreover, pivotal members joined to the reflecting members beside more their respective other side than one side of the reflecting members for controlling as pivots the movement of the reflecting member driven by the moving unit.
摘要翻译：加热装置包括用于围绕和限定加热空间的壁，安装在壁的内侧上的加热元件，用于反射从加热元件发出的热的反射构件。而且，移动单元连接到每个反射构件的一端以移动反射构件。此外，枢转构件在反射构件的相对另一侧更靠近反射构件的一侧接合，用于控制由移动单元驱动的反射构件的运动。

4. 发明授权

US6034815A Laser scan microscope 有权
标题翻译：激光扫描显微镜
公开(公告)号：US6034815A
公开(公告)日：2000-03-07
申请号：US267044
申请日：1999-03-12
申请人： Masakazu Shimada
发明人： Masakazu Shimada
IPC分类号： G02B21/18 , G02B6/28 , G02B21/00 , G02B21/06 , G02B6/00 , G02B21/08
CPC分类号： G02B21/002 , G02B6/2804
摘要： A laser scan microscope comprises a laser scanning observation optical system for irradiating a sample with a laser beam while scanning the beam over the sample, and detecting the beam transmitted through the sample by means of a detector after the beam passes through a condenser lens, an ordinary observation optical system for irradiating the sample through the condenser lens by means of an illumination lamp, so that a transmitted image of the sample is allowed to be observed, and an optical transmission fiber array having a two-pronged structure having a first optical path extending from a condenser lens-side to the detector and a second optical path extending from the condenser lens-side to the illumination lump. The optical transmission fiber array receives a laser beam from the condenser lens-side and introduces the received beam to the detector by use of the first optical path, and the optical transmission fiber array receives light emitted from the illumination lump and introduces the light to the condenser lens by use of the second optical path.
摘要翻译：激光扫描显微镜包括激光扫描观察光学系统，用于在扫描样品上的光束的同时照射样品，并在光束通过聚光透镜后通过检测器检测透射通过样品的光束，普通观察光学系统，用于通过照明灯照射样品通过聚光透镜，使得允许观察样品的透射图像;以及具有双管结构的具有第一光路的光传输光纤阵列从聚光透镜侧延伸到检测器，以及从聚光透镜侧延伸到照明块的第二光路。光传输光纤阵列接收来自聚光透镜侧的激光束，并且通过使用第一光路将接收光束引入检测器，并且光传输光纤阵列接收从照明块发射的光并将光引入到聚光透镜。

5. 发明授权

US5277215A Method for supplying and discharging gas to and from semiconductor manufacturing equipment and system for executing the same 失效
标题翻译：用于向半导体制造设备供给和排出气体的方法及其执行系统
公开(公告)号：US5277215A
公开(公告)日：1994-01-11
申请号：US7163
申请日：1993-01-21
申请人： Hidehiro Yanagawa , Hiroyuki Nishiuchi , Masakazu Shimada , Mitsuhiro Hirano , Tomoshi Taniyama , Kazumi Nikaido , Yoshikazu Hisajima , Michio Sato
发明人： Hidehiro Yanagawa , Hiroyuki Nishiuchi , Masakazu Shimada , Mitsuhiro Hirano , Tomoshi Taniyama , Kazumi Nikaido , Yoshikazu Hisajima , Michio Sato
IPC分类号： C30B25/14 , H01L21/00 , H01L21/677 , F04B37/14
CPC分类号： H01L21/67757 , C23C16/45561 , C30B25/14 , H01L21/67017 , Y10T137/0396 , Y10T137/2705 , Y10T137/86187
摘要： A plurality of airtight chambers are connected through blocking means, which can communicate or shut off the chambers, and at least one of the airtight chambers is used as a processing chamber. One of the adjacent airtight chambers is replaced by a replacement gas, and the replacement gas is supplied to the other of the adjacent airtight chambers. When pressure difference or pressure in the two adjacent airtight chambers is below a predetermined value, the adjacent two airtight chambers are communicated, and pressure in the two airtight chambers is equalized.
摘要翻译：多个气密室通过阻挡装置连接，可以连通或关闭室，并且至少一个气密室用作处理室。相邻的气密室中的一个被替换气体代替，并且替换气体被供应到相邻气密室中的另一个。当两个相邻气密室中的压力差或压力低于预定值时，相邻的两个气密室连通，两个气密室中的压力相等。

6. 发明授权

US08501599B2 Substrate processing apparatus and substrate processing method 有权
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US08501599B2
公开(公告)日：2013-08-06
申请号：US12087479
申请日：2007-02-21
申请人： Masaaki Ueno , Masakazu Shimada , Takeo Hanashima , Haruo Morikawa , Akira Hayashida
发明人： Masaaki Ueno , Masakazu Shimada , Takeo Hanashima , Haruo Morikawa , Akira Hayashida
IPC分类号： H01L21/20 , H01L21/36 , H05B1/02 , C23C16/00
CPC分类号： H01L21/67109 , C23C16/46 , H01L21/67248
摘要： A substrate processing apparatus has: a process chamber in which a substrate is processed; a heating device that optically heats the substrate accommodated in the process chamber from an outer periphery side of the substrate; a cooling device that cools the outer periphery side of the substrate by flowing a fluid in a vicinity of an outer periphery of the substrate optically heated by the heating device; a temperature detection portion that detects a temperature inside the process chamber; and a heating control portion that controls the heating device and the cooling device in such a manner so as to provide a temperature difference between a center portion of the substrate and an end portion of the substrate while maintaining a temperature at the center portion at a pre-determined temperature according to the temperature detected by the temperature detection portion.
摘要翻译：基板处理装置具有：处理基板的处理室; 加热装置，其从基板的外周侧光学加热容纳在处理室中的基板; 冷却装置，其通过使由加热装置光学加热的基板的外周附近的流体流动来冷却基板的外周侧; 温度检测部，其检测处理室内的温度; 以及加热控制部，其以这样的方式控制加热装置和冷却装置，以在基板的中心部分和基板的端部之间提供温度差，同时将中心部分处的温度保持在预先根据由温度检测部分检测的温度确定温度。

7. 发明授权

US08116618B2 Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices 有权
标题翻译：加热装置，基板处理装置以及半导体装置的制造方法
公开(公告)号：US08116618B2
公开(公告)日：2012-02-14
申请号：US12213823
申请日：2008-06-25
申请人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Masashi Sugishita , Toshimitsu Miyata , Kimio Kitamura , Kenji Tanaka , Jyunichi Nishihara
发明人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Masashi Sugishita , Toshimitsu Miyata , Kimio Kitamura , Kenji Tanaka , Jyunichi Nishihara
IPC分类号： A45D20/40 , A21B2/00
CPC分类号： H01L21/67109 , H01L21/67115
摘要： A heating apparatus comprises a wall for surrounding and defining a heating space, a heating element mounted on the inner side of the wall, reflecting members for reflecting the heat emitted from the heating element. Also, a moving unit joined to one end of each of the reflecting members for moving the reflecting members. Moreover, pivotal members joined to the reflecting members beside more their respective other side than one side of the reflecting members for controlling as pivots the movement of the reflecting member driven by the moving unit.
摘要翻译：加热装置包括用于围绕和限定加热空间的壁，安装在壁的内侧上的加热元件，用于反射从加热元件发出的热的反射构件。而且，移动单元连接到每个反射构件的一端以移动反射构件。此外，枢转构件在反射构件的相对另一侧更靠近反射构件的一侧接合，用于控制由移动单元驱动的反射构件的运动。

8. 发明授权

US07700054B2 Substrate processing apparatus having gas side flow via gas inlet 有权
标题翻译：具有通过气体入口的气体侧流动的基板处理装置
公开(公告)号：US07700054B2
公开(公告)日：2010-04-20
申请号：US11987493
申请日：2007-11-30
申请人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Yukinori Aburatani , Tomoyuki Yamada , Seiyo Nakashima , Masashi Sugishita
发明人： Akira Hayashida , Masaaki Ueno , Masakazu Shimada , Yukinori Aburatani , Tomoyuki Yamada , Seiyo Nakashima , Masashi Sugishita
IPC分类号： H01L21/00 , B01J19/00 , F27B5/14
CPC分类号： H01L21/67109 , F27B17/0025
摘要： An object of the present invention is to improve substrate processing efficiency. A substrate processing apparatus has a reaction tube that processes a substrate inside, and a heating apparatus disposed so as to surround an external periphery of the reaction tube, so that at least a gas inlet tube is disposed on a side surface in an area in which the substrate is processed inside the reaction tube, and the heating apparatus has a heat insulator that surrounds the reaction tube, an inlet opening formed in the shape of a groove in the heat insulator from the lower end of the heating apparatus so as to avoid the gas inlet tube, and a heating element disposed between the heat insulator and the reaction tube.
摘要翻译：本发明的目的是提高基板处理效率。基板处理装置具有处理内部的基板的反应管和设置成围绕反应管的外周的加热装置，使得至少一个气体入口管设置在其中的在反应管内加工基板，加热装置具有围绕反应管的绝热体，从加热装置的下端形成为绝热体的槽状的入口开口，以避免气体入口管和设置在隔热件和反应管之间的加热元件。

9. 发明申请

US20100032425A1 SUBSTRATE PROCESSING APPARATUS, HEATING DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 有权
标题翻译：基板加工装置，加热装置和半导体装置制造方法
公开(公告)号：US20100032425A1
公开(公告)日：2010-02-11
申请号：US12429462
申请日：2009-04-24
申请人： Masakazu Shimada
发明人： Masakazu Shimada
IPC分类号： F27D11/00
CPC分类号： H01L21/67109
摘要： Provided are a substrate processing apparatus, a heating device, and a semiconductor device manufacturing method. The substrate processing apparatus comprises a process chamber configured to process a substrate. A heating element is installed at a peripheral side of the process chamber. An annular inner wall is installed at a peripheral side of the heating element. An annular outer wall is installed at a peripheral side of the inner wall with a space being formed therebetween. An annular cooling member is installed at the space for cooling. An actuating mechanism moves the cooling member between a contact position where the cooling member makes contact with at least one of the inner wall and the outer wall and a non-contact position where the cooling member does not make contact with any one of the inner wall and the outer wall. A control unit controls at least the actuating mechanism.
摘要翻译：提供了一种基板处理装置，加热装置和半导体装置的制造方法。基板处理装置包括被配置为处理基板的处理室。加热元件安装在处理室的周边。环形内壁安装在加热元件的周边。环形外壁安装在内壁的周边，其间形成有空间。环形冷却件安装在冷却空间。致动机构使冷却部件在冷却部件与内壁和外壁之中的至少一个接触的接触位置和非接触位置之间移动，其中冷却部件不与内壁和外墙。控制单元至少控制致动机构。

10. 发明申请

US20090291566A1 Substrate Processing Apparatus, Coolant Gas Supply Nozzle and Semiconductor Device Manufacturing Method 有权
标题翻译：基板处理装置，冷却剂气体供给喷嘴和半导体装置制造方法
公开(公告)号：US20090291566A1
公开(公告)日：2009-11-26
申请号：US11989698
申请日：2006-07-19
申请人： Masaaki Ueno , Akira Hayashida , Masakazu Shimada , Takenori Oka
发明人： Masaaki Ueno , Akira Hayashida , Masakazu Shimada , Takenori Oka
IPC分类号： H01L21/477 , C23C16/00
CPC分类号： H01L21/67769 , C23C16/463 , C23C16/54 , H01L21/67109
摘要： A substrate processing apparatus comprises a processing chamber for storing a boat supporting multiple substrates and for processing the multiple substrates, a heater unit installed around the processing chamber for heating the substrates, and a coolant gas supply nozzle including a pipe section extending perpendicular to a main surface of the substrate supported in the boat stored in the processing chamber, and a spray hole formed on the pipe section for spraying coolant gas to at least two of the multiple substrates, wherein the coolant gas supply nozzle is formed so that the cross sectional area of the pipe section in the area where the spray hole is formed is larger than the total opening area of the spray hole.
摘要翻译：基板处理装置包括：处理室，用于存储支撑多个基板并用于处理多个基板的船;加热器单元，安装在处理室周围用于加热基板;以及冷却剂气体供给喷嘴，其包括垂直于主体的管段支撑在存储在处理室中的舟皿中的基板的表面，以及形成在管段上用于将冷却剂气体喷射到多个基板中的至少两个的喷射孔，其中冷却剂气体供给喷嘴形成为横截面积在喷孔形成区域中的管段大于喷孔的总开口面积。

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