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1. 发明授权

US07198447B2 Semiconductor device producing apparatus and producing method of semiconductor device 有权
标题翻译：半导体装置的制造装置及半导体装置的制造方法
公开(公告)号：US07198447B2
公开(公告)日：2007-04-03
申请号：US10360597
申请日：2003-02-06
申请人： Kazuhiro Morimitsu , Tatsuhisa Matsunaga , Masanori Kaneko , Kouichi Noto , Hidehiro Yanagawa , Masaki Matsushima
发明人： Kazuhiro Morimitsu , Tatsuhisa Matsunaga , Masanori Kaneko , Kouichi Noto , Hidehiro Yanagawa , Masaki Matsushima
IPC分类号： H01L21/677 , B65B21/02 , B65B69/00 , B65G65/34
CPC分类号： H01L21/67757 , Y10S414/137 , Y10S414/139
摘要： A semiconductor device producing apparatus is disclosed. The apparatus includes a carrier-holding stage for placing a carrier; first, second and third stages each for holding first and second boats one at a time, each boat holding one or more substrates; a boat transfer mechanism for transferring the boats among the first, second and third stages; and a substrate transfer mechanism for transferring the substrate(s) from the carrier to the boat held by the first stage. A controller controls the first stage, the boat transfer mechanism and the substrate transfer mechanism so that the boat transfer mechanism transfers one of the boats from the second stage to the first stage, the substrate transfer mechanism then transfers the substrate(s) from the carrier to the boat held by the first stage, and the first stage then moves the boat into the processing chamber for processing.
摘要翻译：公开了一种半导体器件制造装置。该装置包括用于放置载体的载体保持台; 第一，第二和第三阶段各自用于一次一个地保持第一和第二船，每个船保持一个或多个基底; 在第一，第二和第三阶段转运船只的船只转运机构; 以及用于将基板从载体转移到由第一级保持的船的基板传送机构。控制器控制第一阶段，船只传送机构和基板传送机构，使得船只传送机构将其中一个船从第二阶段转移到第一阶段，然后基板传送机构将载体从载体到第一阶段所持有的船，然后第一阶段将船移动到处理室中进行处理。

2. 发明授权

US06641350B2 Dual loading port semiconductor processing equipment 有权
标题翻译：双加载端口半导体加工设备
公开(公告)号：US06641350B2
公开(公告)日：2003-11-04
申请号：US09834913
申请日：2001-04-16
申请人： Takanobu Nakashima , Tatsuhisa Matsunaga , Hidehiro Yanagawa
发明人： Takanobu Nakashima , Tatsuhisa Matsunaga , Hidehiro Yanagawa
IPC分类号： F26B2106
CPC分类号： H01L21/67772 , H01L21/67775 , Y10S414/14
摘要： A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.
摘要翻译：基板处理设备包括两个荚支撑台和两个可独立操作的荚门开启器。每个荚支撑台能够在其上放置用于在其中容纳基底的荚。每个荚门开启器具有允许访问放置在相应的荚支撑台上的荚内的基底的装置。

3. 发明授权

US5902103A Vertical furnace of a semiconductor manufacturing apparatus and a boat cover thereof 失效
标题翻译：半导体制造装置的立式炉及其船盖
公开(公告)号：US5902103A
公开(公告)日：1999-05-11
申请号：US771976
申请日：1996-12-23
申请人： Kiyohiko Maeda , Satoshi Kakizaki , Tomoshi Taniyama , Hidehiro Yanagawa , Ken-ichi Suzaki
发明人： Kiyohiko Maeda , Satoshi Kakizaki , Tomoshi Taniyama , Hidehiro Yanagawa , Ken-ichi Suzaki
IPC分类号： H01L21/22 , C23C16/44 , C23C16/455 , C30B25/14 , C30B31/16 , H01L21/00 , F27D5/00
CPC分类号： H01L21/67098 , C23C16/455 , C23C16/45591 , C30B25/14 , C30B31/16
摘要： A vertical furnace for use in a semiconductor manufacturing apparatus, which comprises a heater, an outer tube, an inner tube, all being disposed concentrically in a multi-layered fashion, a boat adapted to be introduced into the inner tube with a wafer loaded thereon, and a boat cover disposed internally of the inner tube concentrically therewith. The boat cover is comprised of a boat cover body and an auxiliary cover plate connected to said boat cover body with a given gap therebetween, the boat cover body having a predetermined number of slit apertures extending in a generator direction thereof, the auxiliary cover plate being disposed to cover the slit apertures. The introduced reactive gas flows in branched streams, one flowing through the inside of the boat cover and the other flowing in past the boat cover, whereby the film deposited on the wafer is improved in uniformity and homogeneity. Further, since the boat cover is provided on the inner tube in the form of a unitary body, adjustments relative thereto can be made easily, thus improving the efficiency of the maintenance works thereof.
摘要翻译：一种用于半导体制造装置的垂直炉，其包括加热器，外管，内管，全部以多层方式同心设置，适于在其上装载有晶片的情况下引入内管中的船以及与其同心地配置在内管的内部的船盖。船盖由船盖体和辅助盖板组成，辅助盖板在其间具有给定的间隙连接到船盖体，船盖主体具有沿其发电机方向延伸的预定数量的狭缝孔，辅助盖板为设置成覆盖狭缝孔。引入的反应气体以分支流流动，一个流经船盖的内部，另一个流过船盖，由此沉积在晶片上的膜的均匀性和均匀性得到改善。此外，由于舟形盖以单体形式设置在内管上，因此可以容易地进行相对于其的调节，从而提高其维护工作的效率。

4. 发明授权

US5277215A Method for supplying and discharging gas to and from semiconductor manufacturing equipment and system for executing the same 失效
标题翻译：用于向半导体制造设备供给和排出气体的方法及其执行系统
公开(公告)号：US5277215A
公开(公告)日：1994-01-11
申请号：US7163
申请日：1993-01-21
申请人： Hidehiro Yanagawa , Hiroyuki Nishiuchi , Masakazu Shimada , Mitsuhiro Hirano , Tomoshi Taniyama , Kazumi Nikaido , Yoshikazu Hisajima , Michio Sato
发明人： Hidehiro Yanagawa , Hiroyuki Nishiuchi , Masakazu Shimada , Mitsuhiro Hirano , Tomoshi Taniyama , Kazumi Nikaido , Yoshikazu Hisajima , Michio Sato
IPC分类号： C30B25/14 , H01L21/00 , H01L21/677 , F04B37/14
CPC分类号： H01L21/67757 , C23C16/45561 , C30B25/14 , H01L21/67017 , Y10T137/0396 , Y10T137/2705 , Y10T137/86187
摘要： A plurality of airtight chambers are connected through blocking means, which can communicate or shut off the chambers, and at least one of the airtight chambers is used as a processing chamber. One of the adjacent airtight chambers is replaced by a replacement gas, and the replacement gas is supplied to the other of the adjacent airtight chambers. When pressure difference or pressure in the two adjacent airtight chambers is below a predetermined value, the adjacent two airtight chambers are communicated, and pressure in the two airtight chambers is equalized.
摘要翻译：多个气密室通过阻挡装置连接，可以连通或关闭室，并且至少一个气密室用作处理室。相邻的气密室中的一个被替换气体代替，并且替换气体被供应到相邻气密室中的另一个。当两个相邻气密室中的压力差或压力低于预定值时，相邻的两个气密室连通，两个气密室中的压力相等。

5. 发明申请

US20100154711A1 SUBSTRATE PROCESSING APPARATUS 审中-公开
标题翻译：基板加工设备
公开(公告)号：US20100154711A1
公开(公告)日：2010-06-24
申请号：US12644318
申请日：2009-12-22
申请人： Kiyohisa ISHIBASHI , Fumihide IKEDA , Masaaki UENO , Takahiro MAEDA , Yasuhiro INOKUCHI , Yasuo KUNII , Hidehiro YANAGAWA
发明人： Kiyohisa ISHIBASHI , Fumihide IKEDA , Masaaki UENO , Takahiro MAEDA , Yasuhiro INOKUCHI , Yasuo KUNII , Hidehiro YANAGAWA
IPC分类号： C23C16/00
CPC分类号： C23C16/4586 , C23C16/45502 , C23C16/45578 , H01L21/67011 , H01L21/67109 , H01L21/67309
摘要： Films are formed on a plurality of substrates through a batch process while preventing formation of films on the rear surfaces of the substrates. For this, a substrate processing apparatus comprises a reaction vessel, supports, a support holder, and an induction heating device. The reaction vessel is configured to process substrates therein. The supports are made of a conductive material and having a disk shape, and each of the supports is configured to accommodate a substrate in its concave part in a state where the substrate is horizontally positioned with a top surface of the substrate being exposed. The concave part is formed concentrically with a circumference of the support, and a difference between radii of the support and the concave part is greater than a distance between neighboring two of the supports held by the support holder. The support holder is configured to hold at least the supports horizontally in multiple stages. The induction heating device is configured to heat at least the supports held by the support holder inside the reaction vessel by using an induction heating method.
摘要翻译：通过间歇工艺在多个基板上形成膜，同时防止在基板的后表面上形成膜。为此，基板处理装置包括反应容器，支撑件，支撑架和感应加热装置。反应容器被配置为在其中处理基板。支撑体由导电材料制成并且具有圆盘形状，并且每个支撑件构造成在基板被暴露的顶表面的水平位置的状态下容纳其凹部中的基板。凹部与支撑体的圆周同心地形成，并且支撑件的半径与凹部之间的差大于由支撑保持器保持的相邻的两个支撑件之间的距离。支撑架被配置成在多个阶段中至少水平地保持支撑件。感应加热装置通过使用感应加热方法，至少将由支撑架保持的支撑体加热到反应容器内部。

6. 再颁专利

USRE43023E1 Dual loading port semiconductor processing equipment 有权
标题翻译：双加载端口半导体加工设备
公开(公告)号：USRE43023E1
公开(公告)日：2011-12-13
申请号：US12724026
申请日：2010-03-15
申请人： Takanobu Nakashima , Tatsuhisa Matsunaga , Hidehiro Yanagawa
发明人： Takanobu Nakashima , Tatsuhisa Matsunaga , Hidehiro Yanagawa
IPC分类号： F26B21/06
CPC分类号： H01L21/67772 , H01L21/67775 , Y10S414/14
摘要： A substrate processing equipment comprises two pod supporting stages and two independently operable pod door openers. Each pod supporting stage is capable of placing thereon a pod for containing substrates therein. Each pod door openers having means for permitting access to the substrates inside the pod placed on a corresponding pod supporting stage.
摘要翻译：基板处理设备包括两个荚支撑台和两个可独立操作的荚门开启器。每个荚支撑台能够在其上放置用于在其中容纳基底的荚。每个荚门开启器具有允许访问放置在相应的荚支撑台上的荚内的基底的装置。

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