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1. 发明授权

US06819433B2 Exposure apparatus including interferometer system 有权
标题翻译：曝光装置包括干涉仪系统
公开(公告)号：US06819433B2
公开(公告)日：2004-11-16
申请号：US10073593
申请日：2002-02-12
申请人： Ryo Takai , Kazunori Iwamoto
发明人： Ryo Takai , Kazunori Iwamoto
IPC分类号： G01B902
CPC分类号： G03F7/70691 , G01B11/028 , G01B11/245
摘要： To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage (27) are measured using as a reference a lens barrel support (35) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system (34) for projecting a pattern formed on a master onto a substrate, stages (27, 31, 40) capable of moving with respect to the projection optical system (34) while holding the substrate or master, and a lens barrel support (35) that supports the projection optical system (34), and which uses a Z measuring mirror (30) that is arranged on a Y stage (31) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer (25) arranged on the Y stage (31).
摘要翻译：为了精确地测量在曝光设备等中使用的舞台装置的位置和姿势，以独立于顶级的镜头筒支撑件（35）为基准来测量顶级（27）的Z位置和位移，在通过干涉仪系统的振动方面，包括用于将形成在母板上的图案投影到基板上的投影光学系统（34），能够相对于投影光学系统（34）移动的台（27,31,40）同时保持基板或主机，以及支撑投影光学系统（34）的镜筒支撑件（35），并且使用布置在Y台（31）上的Z测量镜（30）并具有反射表面几乎平行于XY平面，以及布置在Y平台（31）上的Z干涉仪（25）。

2. 发明授权

US06965428B2 Stage apparatus, exposure apparatus, and semiconductor device manufacturing method 失效
标题翻译：舞台装置，曝光装置和半导体装置的制造方法
公开(公告)号：US06965428B2
公开(公告)日：2005-11-15
申请号：US10704638
申请日：2003-11-12
申请人： Yasuyo Muto , Kazunori Iwamoto , Yukio Takabayashi , Takashi Meguro
发明人： Yasuyo Muto , Kazunori Iwamoto , Yukio Takabayashi , Takashi Meguro
IPC分类号： H01L21/683 , H01L21/027 , H01L21/68 , H01L21/687 , G03B27/58 , G03B27/62
CPC分类号： H01L21/68785 , G03F7/707 , G03F7/70716 , H01L21/68 , H01L21/68792 , Y10T279/23
摘要： A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.
摘要翻译：平台装置具有夹持和保持基板的基板保持单元，并且包括具有要安装基板保持单元的凹部的平坦表面。固定构件将设置在基板保持单元上的突起支撑件固定到平坦表面上。基板保持单元由固定构件支撑，而突起支撑件的远端与平坦表面的凹部接触，并且基板保持单元的剩余部分不与平坦表面接触。

3. 发明授权

US06856404B2 Scanning exposure method and apparatus, and device manufacturing method using the same 失效
标题翻译：扫描曝光方法和装置以及使用其的装置制造方法
公开(公告)号：US06856404B2
公开(公告)日：2005-02-15
申请号：US09323034
申请日：1999-06-01
申请人： Kazunori Iwamoto , Nobuyoshi Deguchi
发明人： Kazunori Iwamoto , Nobuyoshi Deguchi
IPC分类号： G03F7/20 , H01L21/027 , G01B9/02
CPC分类号： G03F7/70358 , G03F7/70725 , G03F7/70775
摘要： A scan type exposure for transferring a pattern onto a substrate by scan exposure. The apparatus includes a stage for moving the substrate in a Y direction corresponding to a scan direction, and in an X direction intersecting the scan direction, an alignment scope for performing measurement for alignment of the substrate, at a position spaced, in the Y direction, from a position where the exposure of the substrate is to be carried out, an X measuring device for performing yaw measurement of said stage by use of an X reflection surface provided on said stage along the Y direction, a Y measuring device for performing yaw measurement of the stage by use of a Y reflection surface provided on the stage along the X direction, and a controller being operable to select yaw measurement information of the X measuring device for an alignment operation including the alignment measurement using the alignment scope, and being operable to select yaw measurement information of the Y measuring device for the scan exposure.
摘要翻译：用于通过扫描曝光将图案转印到基板上的扫描型曝光。该装置包括：用于在与扫描方向对应的Y方向上移动基板的台，并且在与扫描方向相交的X方向上，用于在Y方向上间隔开的位置处进行用于对准基板的测量的对准范围从要进行基板的曝光的位置，用于通过使用沿着Y方向设置在所述台上的X反射面来进行所述平台的偏航测量的X测量装置，用于执行偏航的Y测量装置通过使用沿X方向设置在舞台上的Y反射面来测量舞台，以及控制器，用于选择X测量装置的偏航测量信息，以进行包括使用对准范围的对准测量的对准操作，并且可操作地选择用于扫描曝光的Y测量装置的偏航测量信息。

4. 发明授权

US6069683A Scanning exposure method and apparatus 失效
标题翻译：扫描曝光方法和装置
公开(公告)号：US6069683A
公开(公告)日：2000-05-30
申请号：US927280
申请日：1997-09-11
申请人： Kazunori Iwamoto
发明人： Kazunori Iwamoto
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70358 , G03F7/70833 , G03F9/70
摘要： An exposure apparatus includes a projection optical system for projecting a pattern of an original onto a substrate, an original stage for moving the original relative to the projection optical system, a substrate stage for moving the substrate relative to the projection optical system, an alignment detecting system for detecting alignment information related to alignment of at least one of the original and the substrate, a correcting device for correcting the alignment information detected by the alignment detecting system, on the basis of the position of the original stage, and a controller for controlling alignment of at least one of the original and the substrate on the basis of the alignment information as corrected by the correcting device.
摘要翻译：曝光装置包括用于将原稿的图案投影到基板上的投影光学系统，用于相对于投影光学系统移动原稿的原稿台，用于相对于投影光学系统移动基板的基板台，对准检测用于检测与原稿和基板中的至少一个对准相关的对准信息的系统，用于基于原始台的位置校正由对准检测系统检测的对准信息的校正装置，以及用于控制基于校正装置校正的对准信息，对原稿和基板中的至少一个进行对准。

5. 发明授权

US5999589A Substrate holding device and exposing apparatus using the same 失效
标题翻译：基板保持装置和使用其的曝光装置
公开(公告)号：US5999589A
公开(公告)日：1999-12-07
申请号：US140679
申请日：1998-08-26
申请人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
发明人： Yuji Chiba , Nobutoshi Mizusawa , Kazunori Iwamoto , Yutaka Tanaka , Shinichi Hara , Mitsuji Marumo , Shin Matsui , Hiroshi Kurosawa
IPC分类号： B23Q3/08 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/683 , H01J37/20
CPC分类号： G03F7/707 , H01L21/6838 , H01J2237/20 , H01J2237/3175 , Y10T279/11
摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.
摘要翻译：基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

6. 发明申请

US20090317124A1 METHOD FOR PRODUCING CLEANING DEVICE AND CLEANING DEVICE 有权
标题翻译：用于生产清洁装置和清洁装置的方法
公开(公告)号：US20090317124A1
公开(公告)日：2009-12-24
申请号：US12337174
申请日：2008-12-17
申请人： Kazunori Iwamoto , Naoki Koike , Yusuke Inoue
发明人： Kazunori Iwamoto , Naoki Koike , Yusuke Inoue
IPC分类号： G03G21/00
CPC分类号： G03G15/0817 , G03G21/00 , G03G2221/0005 , G03G2221/163
摘要： A method for manufacturing a cleaning device of the image forming apparatus, the method includes: applying a liquid material to an area outer than an edge located at an end portion of a toner accommodating portion in the longitudinal direction of a toner removing member, wherein the liquid material is applied so as to satisfy one of the predetermined conditions.
摘要翻译：一种用于制造图像形成装置的清洁装置的方法，所述方法包括：将液体材料施加到位于调色剂容纳部分的位于调色剂除去构件的纵向方向上的端部的边缘的区域，其中，施加液体材料以满足预定条件之一。

7. 发明授权

US07346414B2 Moving mechanism and stage system in exposure apparatus 失效
标题翻译：曝光设备中的移动机构和舞台系统
公开(公告)号：US07346414B2
公开(公告)日：2008-03-18
申请号：US11210786
申请日：2005-08-25
申请人： Hideo Tanaka , Kazunori Iwamoto , Yukio Takabayashi
发明人： Hideo Tanaka , Kazunori Iwamoto , Yukio Takabayashi
IPC分类号： G06F19/00
CPC分类号： G03F7/70716 , G03F7/709 , H01L21/682
摘要： A moving mechanism includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator which is movable along the second guide surface. The first structural member is supported by the second structural member at three positions.
摘要翻译：移动机构包括具有第一引导表面的第一结构构件，可沿着第一引导表面移动的移动构件，具有第二引导表面的第二结构构件和具有设置在移动构件上的可移动元件的致动器和定子其可沿着第二引导表面移动。第一结构构件由第三结构构件在三个位置处支撑。

8. 发明申请

US20060017909A1 Stage apparatus, exposure apparatus, and semiconductor device manufacturing mehtod 审中-公开
标题翻译：舞台装置，曝光装置和半导体器件制造mehtod
公开(公告)号：US20060017909A1
公开(公告)日：2006-01-26
申请号：US11210883
申请日：2005-08-25
申请人： Yasuyo Muto , Kazunori Iwamoto , Yukio Takabayashi , Takashi Meguro
发明人： Yasuyo Muto , Kazunori Iwamoto , Yukio Takabayashi , Takashi Meguro
IPC分类号： G03B27/58
CPC分类号： H01L21/68785 , G03F7/707 , G03F7/70716 , H01L21/68 , H01L21/68792 , Y10T279/23
摘要： A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.
摘要翻译：平台装置具有夹持和保持基板的基板保持单元，并且包括具有要安装基板保持单元的凹部的平坦表面。固定构件将设置在基板保持单元上的突起支撑件固定到平坦表面上。基板保持单元由固定构件支撑，而突起支撑件的远端与平坦表面的凹部接触，并且基板保持单元的剩余部分不与平坦表面接触。

9. 发明授权

US5640440A Substrate conveying system 失效
标题翻译：基板输送系统
公开(公告)号：US5640440A
公开(公告)日：1997-06-17
申请号：US504235
申请日：1995-07-19
申请人： Mitsutoshi Kuno , Kazunori Iwamoto , Mitsuji Marumo
发明人： Mitsutoshi Kuno , Kazunori Iwamoto , Mitsuji Marumo
IPC分类号： B25J9/10 , B25J13/08 , B25J15/06 , B65G49/07 , G03F7/20 , H01L21/00 , H01L21/027 , H01L21/677 , H01L21/68
CPC分类号： H01L21/67259 , G03F7/7075
摘要： A substrate conveying system includes an attracting device for attracting a substrate with reduced pressure, a moving device for relatively moving the substrate relative to the attracting device, and a detecting device for detecting the pressure of the attracting device during the relative movement of the substrate to thereby obtain positional information related to the substrate.
摘要翻译：基板输送系统包括用于以减压的方式吸引基板的吸引装置，用于使基板相对于吸引装置相对移动的移动装置，以及检测装置，用于在基板相对移动期间检测吸引装置的压力从而获得与基板相关的位置信息。

10. 发明授权

US5467720A Support device 失效
标题翻译：支持设备
公开(公告)号：US5467720A
公开(公告)日：1995-11-21
申请号：US328390
申请日：1994-10-24
申请人： Nobushige Korenaga , Kazunori Iwamoto
发明人： Nobushige Korenaga , Kazunori Iwamoto
IPC分类号： G03F7/20 , G05D19/00 , H01L21/027 , H01L21/30 , H01L21/677 , H01L21/687 , A47B85/00
CPC分类号： H01L21/67796 , G03F7/2039 , G03F7/70716 , G03F7/70766 , G03F7/709 , H01J2237/0216
摘要： A supporting device for supporting a member having an inside movable portion includes a main frame, a supporting reference plate on which the member is to be placed and a plurality of driving mechanisms each being disposed between the main frame and the supporting reference plate and each having a high-rigidity displacement providing element and a low-rigidity supporting element of low damping factor, disposed in series.
摘要翻译：用于支撑具有内部可移动部分的构件的支撑装置包括：主框架，其上将放置构件的支撑基准板和分别设置在主框架和支撑基准板之间的多个驱动机构，每个具有串联设置的高刚性位移提供元件和低阻尼系数的低刚性支撑元件。

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