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1. 发明申请

US20100074295A1 Immersion lithography laser light source with pulse stretcher 审中-公开
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US20100074295A1
公开(公告)日：2010-03-25
申请号：US12592228
申请日：2009-11-20
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edmond Arriola , Mike Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edmond Arriola , Mike Wyatt , Walter Crosby
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method are disclosed which may comprise a pulsed gas discharge laser lithography light source which may comprise a seed laser portion providing a seed laser output light beam of seed pulses; an amplifier portion receiving the seed laser output light beam and amplifying the optical intensity of each seed pulse to provide a high power laser system output light beam of output pulses; the amplifier portion may comprise a ring power amplifier comprising amplifier portion injection optics comprising at least one beam expanding prism, a beam reverser and an input/output coupler; the beam expansion optics and the output coupler may be mounted on an optics assembly with the beam expansion optics rigidly mounted with respect to the optics assembly and the input/output coupler mounted for relative movement with respect to the optics assembly for optical alignment purposes.
摘要翻译：公开了一种可以包括脉冲气体放电激光光刻光源的装置和方法，脉冲气体放电激光光刻光源可以包括提供种子脉冲的种子激光输出光束的种子激光部分; 接收种子激光输出光束并放大每个种子脉冲的光强度的放大器部分，以提供输出脉冲的大功率激光系统输出光束; 放大器部分可以包括环形功率放大器，其包括放大器部分注入光学器件，其包括至少一个光束扩展棱镜，光束反向器和输入/输出耦合器; 光束扩展光学器件和输出耦合器可以安装在光学组件上，其中光束扩展光学器件相对于光学组件刚性地安装，并且输入/输出耦合器被安装成相对于用于光学对准目的的光学组件的相对运动。

2. 发明申请

US20090080476A1 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US20090080476A1
公开(公告)日：2009-03-26
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J.W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Mike Wyatt , Walter Crosby
IPC分类号： H01S3/139 , H01S3/083
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

3. 发明授权

US07643528B2 Immersion lithography laser light source with pulse stretcher 有权
标题翻译：浸没光刻激光光源带脉冲担架
公开(公告)号：US07643528B2
公开(公告)日：2010-01-05
申请号：US11973671
申请日：2007-10-10
申请人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
发明人： William N. Partlo , Alexander I. Ershov , German Rylov , Igor V. Fomenkov , Daniel J. W. Brown , Christian J. Wittak , Rajasekhar M. Rao , Robert A. Bergstedt , John Fitzgerald , Richard L. Sandstrom , Vladimir B. Fleurov , Robert N. Jacques , Ed Danielewicz , Robin Swain , Edward Arriola , Michael Wyatt , Walter Crosby
IPC分类号： H01S3/22
CPC分类号： H01S3/0057 , G03F7/70341 , G03F7/70583
摘要： An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.
摘要翻译：一种可包括可包括种子激光器部分的脉冲气体放电激光器的装置和方法; 接收种子激光输出并放大每个种子脉冲的光强度的放大器部分; 脉冲展开器，其可以包括：与第一延迟路径可操作地连接的第一分束器和与第二延迟路径可操作地连接的第二脉冲展开器; 包含第一分束器的第一光学延迟路径塔; 包含第二分束器的第二光学延迟路径塔; 第一和第二光学延迟路径中的一个可以包括：多个反射镜，其限定相应的光学延迟路径，包括位于第一塔架和第二塔架中的反射镜; 第一和第二光学延迟路径中的另一个可以包括：多个反射镜限定相应的光学延迟路径，其仅包括在第一塔架和第二塔架之一中的镜子。

4. 发明授权

US06535531B1 Gas discharge laser with pulse multiplier 有权
标题翻译：带脉冲倍增器的气体放电激光器
公开(公告)号：US06535531B1
公开(公告)日：2003-03-18
申请号：US10006913
申请日：2001-11-29
申请人： Scott T. Smith , Alexander I. Ershov , Rajasekhar M. Rao
发明人： Scott T. Smith , Alexander I. Ershov , Rajasekhar M. Rao
IPC分类号： H01S310
CPC分类号： G03F7/7055 , H01S3/0057 , H01S3/036 , H01S3/0385 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2258
摘要： A gas discharge laser with a pulse multiplier. In the pulse multiplier, short pulses from the laser are divided into portions and all or all but one of these portions are delayed in delay legs by different time periods and recombined to provide a stretched output pulse having substantially reduced intensity and longer duration as compared to the pulse from the laser. Focusing optics are included in each delay leg to assure that beam size and angular spread of each portion of the combined pulse is not substantially different from other portions of the pulse.
摘要翻译：具有脉冲倍增器的气体放电激光器。在脉冲乘法器中，来自激光器的短脉冲被分成多个部分，全部或全部，但是这些部分中的一个在延迟支路中延迟不同的时间段，并且重新组合以提供具有显着降低的强度和更长持续时间的拉伸输出脉冲，与来自激光的脉冲。每个延迟支路都包括聚焦光学元件，以确保组合脉冲的每个部分的光束尺寸和角度扩展与脉冲的其他部分基本不同。

5. 发明授权

US07852889B2 Active spectral control of DUV light source 有权
标题翻译： DUV光源的主动光谱控制
公开(公告)号：US07852889B2
公开(公告)日：2010-12-14
申请号：US11510037
申请日：2006-08-25
申请人： Wayne J. Dunstan , Robert N. Jacques , Rajasekhar M. Rao , Fedor B. Trintchouk
发明人： Wayne J. Dunstan , Robert N. Jacques , Rajasekhar M. Rao , Fedor B. Trintchouk
IPC分类号： H01S3/086 , H01S3/097 , H01S3/1055 , H01S3/22
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译：根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。

6. 发明申请

US20070195836A1 Active spectral control of DUV light source 有权
标题翻译： DUV光源的主动光谱控制
公开(公告)号：US20070195836A1
公开(公告)日：2007-08-23
申请号：US11510037
申请日：2006-08-25
申请人： Wayne J. Dunstan , Robert N. Jacques , Rajasekhar M. Rao , Fedor B. Trintchouk
发明人： Wayne J. Dunstan , Robert N. Jacques , Rajasekhar M. Rao , Fedor B. Trintchouk
IPC分类号： H01S3/13
CPC分类号： H01S3/13 , G03F7/70575 , H01S3/134 , H01S3/136
摘要： According to aspects of an embodiment of the disclosed subject matter, a line narrowed high average power high pulse repetition laser micro-photolithography light source bandwidth control method and apparatus are disclosed which may comprise a bandwidth metrology module measuring the bandwidth of a laser output flight pulse beam pulse produced by the light source and providing a bandwidth measurement; a bandwidth error signal generator receiving the bandwidth measurement and a bandwidth setpoint and providing a bandwidth error signal; an active bandwidth controller providing a fine bandwidth correction actuator signal and a coarse bandwidth correction actuator signal responsive to the bandwidth error. The fine bandwidth correction actuator and the coarse bandwidth correction actuator each may induce a respective modification of the light source behavior that reduces bandwidth error. The coarse and fine bandwidth correction actuators each may comprise a plurality of bandwidth correction actuators.
摘要翻译：根据所公开的主题的实施例的方面，公开了一种窄的高平均功率高脉冲重复激光微光刻光源带宽控制方法和装置，其可以包括测量激光输出飞行脉冲带宽的带宽测量模块由光源产生的光束脉冲并提供带宽测量; 接收带宽测量和带宽设定点并提供带宽误差信号的带宽误差信号发生器; 有源带宽控制器提供精细的带宽校正致动器信号和响应于带宽误差的粗略带宽校正致动器信号。精细带宽校正致动器和粗带宽校正致动器各自可以引起减少带宽误差的光源特性的相应修改。粗略和精细带宽校正致动器各自可以包括多个带宽校正致动器。

7. 发明授权

US06873418B1 Optical mountings for gas discharge MOPA laser spectral analysis module 有权
标题翻译：用于气体放电MOPA激光光谱分析模块的光学安装
公开(公告)号：US06873418B1
公开(公告)日：2005-03-29
申请号：US10676224
申请日：2003-09-30
申请人： James K. Howey , Rajasekhar M. Rao
发明人： James K. Howey , Rajasekhar M. Rao
IPC分类号： G01B9/02 , G01J11/00 , G02B7/02 , G02B7/182 , H01S3/13
CPC分类号： G02B7/1825 , G01J11/00 , G02B7/021
摘要： A wavemeter for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise an adjustable optic mounting containing an optic element having an assigned vertical optical plane in the wavemeter optical layout and comprising: a mounting dowel pin positioned on a platform holding the components of the wavemeter; a dowel receiving opening on the adjustable mirror mounting a tangent to which is in the assigned vertical optical plane. The adjustable optic mounting may contain a tilt mechanism incorporated into the adjustable optic mounting enabling tilting the optic element about an axis in a plane parallel to a platform holding components of the wavemeter. The mounting may also have an optic receiving recess indexed to the size of the optic element. The optic element may be retained by at least one spring clip and may be a flat rectangular mirror or a circular optic, e.g., a mirror or a lens. The mounting may also have an optic mounting frame containing an optical element; a slit assembly containing a microslit adapted to selectively pass a slit of the optical output of the optical diffusion element to a succeeding optical element, moveably mounted to the optic mounting frame; a microslit position adjustment mechanism moving the slit assembly from a retracted position exposing the optic diffusion element for purposes of alignment to a down position with the slit aligned and moving the microslit into alignment.
摘要翻译：一种用于具有输出激光束的高重复率气体放电激光器的波长计，其包括脉冲输出大于或等于15mJ /脉冲，亚纳米带宽调谐范围脉冲具有飞行器带宽精度和数十个飞行器带宽精度范围，用于以4000Hz及以上的脉冲重复频率在脉冲到脉冲基础上测量带宽，其可以包括可调光学安装件，其包含在波长计光学布局中具有指定的垂直光学平面的光学元件，并且包括：安装销钉位于保持波长计的组件的平台上; 可调节镜上的定位销接收开口安装在指定的垂直光学平面中的切线。可调节光学安装件可以包含结合到可调节光学安装件中的倾斜机构，使得可以在与保持波长计的部件的平台平行的平面中的轴线处倾斜光学元件。安装件还可以具有与光学元件的尺寸分度的光学接收凹部。光学元件可以由至少一个弹簧夹保持，并且可以是平面矩形镜或圆形光学器件，例如镜子或透镜。安装件还可以具有包含光学元件的光学安装框架; 狭缝组件，其包含适于选择性地将光扩散元件的光输出的狭缝传递到可移动地安装到光学安装框架的后续光学元件的微型灯; 微型位置调节机构使狭缝组件从缩回位置移动，该缩回位置暴露光学扩散元件，以便对准到下部位置，同时狭缝对准并将微光线移动到对准位置。

8. 发明授权

US07292343B2 Gas discharge MOPA laser spectral analysis module 有权
公开(公告)号：US07292343B2
公开(公告)日：2007-11-06
申请号：US11075973
申请日：2005-03-08
申请人： Rajasekhar M. Rao , John T. Melchior , Holger K. Glatzel
发明人： Rajasekhar M. Rao , John T. Melchior , Holger K. Glatzel
IPC分类号： G01B9/02 , G01J3/45 , H01S3/13
CPC分类号： G01J1/4257 , G01J1/429 , G01J3/02 , G01J3/0205 , G01J3/0208 , G01J3/024 , G01J3/027 , G01J3/26 , G01J9/02 , G01J9/0246 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A wavemeter and method for measuring bandwidth for a high repetition rate gas discharge laser having an output laser bean comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a focusing lens having a focal length; an optical interferometer creating an interference fringe pattern; an optical detection means positioned at the focal length from the focusing lens; and a bandwidth calculator calculating bandwidth from the position of interference fringes in the interference fringe pattern incident on the optical detection means, defining a DID and a DOD, the respective distances between a pair of first fringe borders and between a pair of second fringe borders in the interference pattern on an axis of the interference pattern, and according to the formula Δλ=λ0[DOD2−DID2]/[8f2−D02], where λ0 is an assumed constant wavelength and D0=(DOD−DID)/2, and f is the focal length. The optical detector may be a photodiode array. The wavemeter may have an optical interferometer having a slit function; the slit function and the focal length being selected to deliver to the optical detector the two innermost fringes of the optical interference ring pattern. The optical detector may comprise an array of pixels each having a height and width and the array having a total width; and an aperture at the optical input to the optical interferometer may selectively input to the optical interferometer a portion of a beam of light sufficient for the output of the etalon to illuminate the optical detector over the height of each respective pixel height and the total width. The optical interferometer may comprise an etalon having a slit function of 3 pm or less and a finesses of 25 or greater; and the focal length may be 1.5 meters. A second stage diffuser may be placed between the first stage diffuser and the etalon delivering a narrow cone of light to the etalon, and an aperture between the second stage diffuser and the etalon may deliver to the etalon a thin strip of the narrow cone of light.

9. 发明授权

US07006547B2 Very high repetition rate narrow band gas discharge laser system 失效
公开(公告)号：US07006547B2
公开(公告)日：2006-02-28
申请号：US10815386
申请日：2004-03-31
申请人： Thomas D. Steiger , Edward P. Holtaway , Bryan Moosman , Rajasekhar M. Rao
发明人： Thomas D. Steiger , Edward P. Holtaway , Bryan Moosman , Rajasekhar M. Rao
IPC分类号： H01S3/22
CPC分类号： H01S3/038 , H01S3/0057 , H01S3/07 , H01S3/097 , H01S3/09702 , H01S3/104 , H01S3/1305 , H01S3/2333
摘要： A method and apparatus for producing a very high repetition rate gas discharge laser system in a MOPA configuration is disclosed which may comprise a master oscillator gas discharge layer system producing a beam of oscillator laser output light pulses at a very high pulse repetition rate; at least two power amplification gas discharge laser systems receiving laser output light pulses from the master oscillator gas discharge laser system and each of the at least two power amplification gas discharge laser systems amplifying some of the received laser output light pulses at a pulse repetition that is a fraction of the very high pulse repetition rate equal to one over the number of the at least two power amplification gas discharge laser systems to form an amplified output laser light pulse beam at the very high pulse repetition rate, which may be positioned in series with respect to the oscillator laser output light pulse beam. The apparatus and method may further comprise a beam delivery unit connected to the laser light output of the power amplification laser system. The apparatus and method may be a very high repetition rate gas discharge laser system in a MOPO configuration. The apparatus and method may comprise a compression head comprising a compression head charge storage device being charged at x times per second; a gas discharge chamber comprising at least two sets of paired gas discharge electrodes; at least two magnetically saturable switches, respectively connected between the compression head charge storage device and one of the at least two sets of paired electrodes and comprising first and second opposite biasing windings having a first biasing current for the first biasing winding and a second biasing current for the second biasing winding and comprising a switching circuit to switch the biasing current from the first biasing current to the second biasing current such that only one of the at least two switches receives the first biasing current at a repetition rate equal to x divided by the number of the at least two sets of paired electrodes while the remainder of the at least two magnetically saturable switches receives the second biasing current. The apparatus and method may be utilized as a lithography tool or for producing laser produced plasma EUV light.

10. 发明授权

US06894785B2 Gas discharge MOPA laser spectral analysis module 有权
公开(公告)号：US06894785B2
公开(公告)日：2005-05-17
申请号：US10676907
申请日：2003-09-30
申请人： Rajasekhar M. Rao , John T. Melchior , Holger K. Glatzel
发明人： Rajasekhar M. Rao , John T. Melchior , Holger K. Glatzel
IPC分类号： H01S3/23 , G01B9/02
CPC分类号： H01S3/2366 , H01S3/03 , H01S3/2333
摘要： A spectral analysis module, including a wavemeter, for a high repetition rate gas discharge laser having a laser output beam comprising a pulsed output of greater than or equal to 15 mJ per pulse, sub-nanometer bandwidth tuning range pulses having a femptometer bandwidth precision and tens of femptometers bandwidth accuracy range, for measuring bandwidth on a pulse to pulse basis at pulse repetition rates of 4000 Hz and above, is disclosed which may comprise a primary beam-splitter in the path of the laser output laser of the gas discharge laser operative to pass the vast majority of the output beam and to reflect a first small portion of the output beam, the primary beam splitter oriented at an angle to sufficiently reduce the fluence on the primary beam-splitter, and creating overlapping fresnel reflections in the first small portion of the laser output beam; a secondary beam splitter made from a material having a damage threshold sufficiently high to tolerate the fluence created by the overlapping portion of the fresnel reflections in the first small portion of the output laser beam, the secondary beam splitter reflecting the vast majority of the first small portion of the output laser beam and passing a second small portion of the output laser beam; a telescoping optic in the path of the second small portion of the output beam operative to demagnify the second small portion of the output beam onto a first stage diffuser receiving the demagnified second small portion of the output laser beam, the demagnification selected to keep the fluence in the overlapping fresnel reflections in the second small portion of the output laser beam below the damage threshold of the first stage diffuser. The telescoping optic may demagnify a long axis of the second small portion of the output laser beam more than a short axis of the second small portion of the output laser beam, redistributing the fluence of the second small portion of the laser output beam across the first stage diffuser to keep any portion of the first stage diffuser from exceeding the damage threshold for the material from which the first stage diffuser is made. The vast majority of the first small portion of the laser output beam may be reflected into a power detection module. A second stage diffuser may creating a narrow cone of a focused second small portion of the laser output beam before the beam enters an interferometer.

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