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1. 发明申请

US20100173495A1 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：US20100173495A1
公开(公告)日：2010-07-08
申请号：US12724935
申请日：2010-03-16
申请人： Randhir Thakur , Steve G. Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Alexander Brailove , Nir Merry , Vinay K. Shah , Andreas G. Hegedus
发明人： Randhir Thakur , Steve G. Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Alexander Brailove , Nir Merry , Vinay K. Shah , Andreas G. Hegedus
IPC分类号： H01L21/302 , H01L21/316 , H01L21/314 , C23C16/00
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

2. 发明申请

US20070295274A1 Batch Processing Platform For ALD and CVD 失效
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：US20070295274A1
公开(公告)日：2007-12-27
申请号：US11426563
申请日：2006-06-26
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

3. 发明授权

US07833351B2 Batch processing platform for ALD and CVD 失效
标题翻译： ALD和CVD的批处理平台
公开(公告)号：US07833351B2
公开(公告)日：2010-11-16
申请号：US11426563
申请日：2006-06-26
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

4. 发明申请

US20110041764A1 BATCH PROCESSING PLATFORM FOR ALD AND CVD 审中-公开
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：US20110041764A1
公开(公告)日：2011-02-24
申请号：US12939002
申请日：2010-11-03
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： H01L21/677 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气转移区域，至少一个具有缓冲室和分段平台的分批处理室，以及设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，其包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

5. 发明申请

US20060156979A1 Substrate processing apparatus using a batch processing chamber 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：US20060156979A1
公开(公告)日：2006-07-20
申请号：US11286063
申请日：2005-11-22
申请人： Randhir Thakur , Steve Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Brailove , Nir Merry , Vinay Shah , Andreas Hegedus
发明人： Randhir Thakur , Steve Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Brailove , Nir Merry , Vinay Shah , Andreas Hegedus
IPC分类号： H01L21/322 , C23C16/00
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

6. 发明授权

US08104951B2 Temperature uniformity measurements during rapid thermal processing 有权
标题翻译：快速热处理期间的温度均匀性测量
公开(公告)号：US08104951B2
公开(公告)日：2012-01-31
申请号：US11830845
申请日：2007-07-30
申请人： Wolfgang Aderhold , Andreas G. Hegedus , Nir Merry
发明人： Wolfgang Aderhold , Andreas G. Hegedus , Nir Merry
IPC分类号： G01K3/06 , G01N25/00 , G01J5/00 , H01L21/02
CPC分类号： G01J5/0022 , G01J2005/0081
摘要： Methods and apparatus for measuring substrate uniformity is provided. The invention includes placing a substrate in a thermal processing chamber, rotating the substrate while the substrate is heated, measuring a temperature of the substrate at a plurality of radial locations as the substrate rotates, correlating each temperature measurement with a location on the substrate, and generating a temperature contour map for the substrate based on the correlated temperature measurements. Numerous other aspects are provided.
摘要翻译：提供了测量基板均匀性的方法和装置。本发明包括将衬底放置在热处理室中，在衬底被加热的同时旋转衬底，在衬底旋转时在多个径向位置测量衬底的温度，使每个温度测量与衬底上的位置相关，以及基于相关的温度测量产生用于衬底的温度轮廓图。提供了许多其他方面。

7. 发明申请

US20090004405A1 Thermal Batch Reactor with Removable Susceptors 审中-公开
标题翻译：热分批反应器与可移动的受体
公开(公告)号：US20090004405A1
公开(公告)日：2009-01-01
申请号：US11771800
申请日：2007-06-29
申请人： Nir Merry , Joseph Yudovsky
发明人： Nir Merry , Joseph Yudovsky
IPC分类号： C23C16/455
CPC分类号： C23C16/4586 , C23C16/46 , H01L21/67306 , H01L21/67309 , Y10T428/13
摘要： An apparatus and method for uniform heating and gas flow in a batch processing chamber are provided. The apparatus includes a quartz chamber body, removable heater blocks which surround the quartz chamber body, an inject assembly coupled to one side of the quartz chamber body, and a substrate boat having removable susceptors. In one embodiment, the boat may be configured with a plurality of susceptors to control substrate heating during batch processing.
摘要翻译：提供了一种用于在批处理室中均匀加热和气流的装置和方法。该装置包括石英室主体，围绕石英室主体的可移除加热块，耦合到石英室主体的一侧的注入组件和具有可拆卸基座的基板舟。在一个实施例中，船可以配置有多个基座，以在批处理期间控制基板加热。

8. 发明授权

US07748542B2 Batch deposition tool and compressed boat 失效
标题翻译：批量沉积工具和压缩船
公开(公告)号：US07748542B2
公开(公告)日：2010-07-06
申请号：US11216969
申请日：2005-08-31
申请人： Joseph Yudovsky , Robert C. Cook , Nir Merry
发明人： Joseph Yudovsky , Robert C. Cook , Nir Merry
IPC分类号： A47G19/08
CPC分类号： H01L21/67309 , H01L21/67757
摘要： Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.
摘要翻译：本发明的方面包括用于处理一批基底的方法和装置。在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。

9. 发明申请

US20070059128A1 Batch deposition tool and compressed boat 失效
标题翻译：批量沉积工具和压缩船
公开(公告)号：US20070059128A1
公开(公告)日：2007-03-15
申请号：US11216969
申请日：2005-08-31
申请人： Joseph Yudovsky , Robert Cook , Nir Merry
发明人： Joseph Yudovsky , Robert Cook , Nir Merry
IPC分类号： H01L21/677
CPC分类号： H01L21/67309 , H01L21/67757
摘要： Aspects of the invention include methods and apparatus for processing a batch of substrates. In one embodiment, a compressed substrate boat is configured to reduce pumping volume in a batch processing chamber. The compressed substrate boat comprises a stationary substrate boat and a movable substrate boat, each may be loaded/unloaded independently. The movable substrate boat and the stationary substrate boat may be interleaving with one another such that the distance between the substrates is reduced. In another embodiment, a substrate boat having removable substrate holder is configured to provide susceptors without dramatically increasing pumping volume. The removable substrate holder may be loaded/unloaded away from the substrate boat with susceptors. The removable substrate holder is engaged with the substrate boat such that substrates thereon are interleaving with the susceptors. Embodiments of the present invention reduces pumping volume and increases throughput, hence reduces cost of ownership during batch processing.
摘要翻译：本发明的方面包括用于处理一批基底的方法和装置。在一个实施例中，压缩衬底舟被配置成减少间歇处理室中的泵送体积。压缩的基板舟皿包括固定的基板船和可移动的基板船，每个可以独立地加载/卸载。可移动衬底舟皿和固定衬底舟皿可以彼此交错，使得衬底之间的距离减小。在另一个实施例中，具有可移除衬底保持器的衬底舟皿构造成提供感受器而不会显着增加泵送容积。可移除的基板保持器可以与基座一起装载/卸载离开基板舟皿。可拆卸衬底保持器与衬底舟皿接合，使得其上的衬底与感受器交错。本发明的实施例减少了泵送量并增加了生产量，因此在批量处理期间降低了所有权成本。

10. 发明授权

US08880210B2 Methods and apparatus for processing substrates using model-based control 有权
标题翻译：使用基于模型的控制处理基板的方法和装置
公开(公告)号：US08880210B2
公开(公告)日：2014-11-04
申请号：US13183520
申请日：2011-07-15
申请人： Keith Brian Porthouse , John W. Lane , Mariusch Gregor , Nir Merry , Michael R. Rice , Alex Minkovich , Hongbin Li , Dmitry A. Dzilno
发明人： Keith Brian Porthouse , John W. Lane , Mariusch Gregor , Nir Merry , Michael R. Rice , Alex Minkovich , Hongbin Li , Dmitry A. Dzilno
IPC分类号： G06F19/00 , G05B17/02 , H01L21/67 , G05D16/20
CPC分类号： G05D16/2046 , G05B17/02 , H01L21/67017 , H01L21/67253
摘要： Methods and apparatus are disclosed herein. In some embodiments, methods of controlling process chambers may include predetermining a relationship between pressure in a processing volume and a position of an exhaust valve as a function of a process parameter; setting the process chamber to a first state having a first pressure in the processing volume and a first value of the process parameter, wherein the exhaust valve is set to a first position based on the predetermined relationship to produce the first pressure at the first value; determining a pressure control profile to control the pressure as the process chamber is changed to a second state having a second pressure and a second process parameter value from the first state; and applying the pressure control profile to control the pressure by varying the position of the exhaust valve while changing the process chamber to the second state.
摘要翻译：本文公开了方法和装置。在一些实施例中，控制处理室的方法可以包括根据处理参数预先确定处理容积中的压力与排气门的位置之间的关系; 将所述处理室设定为处理容积中具有第一压力的第一状态和所述处理参数的第一值，其中所述排气阀基于所述预定关系设定在第一位置以产生所述第一值的所述第一压力; 当所述处理室改变为具有来自所述第一状态的第二压力和第二过程参数值的第二状态时，确定压力控制曲线以控制所述压力; 以及通过在将处理室改变到第二状态的同时改变排气门的位置来施加压力控制曲线来控制压力。

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