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1. 发明授权

US08329557B2 Techniques for forming thin films by implantation with reduced channeling 有权
标题翻译：通过植入减少沟道形成薄膜的技术
公开(公告)号：US08329557B2
公开(公告)日：2012-12-11
申请号：US12778989
申请日：2010-05-12
申请人： Adam Brailove , Zuqin Liu , Francois J. Henley , Albert J. Lamm
发明人： Adam Brailove , Zuqin Liu , Francois J. Henley , Albert J. Lamm
IPC分类号： H01L21/30
CPC分类号： H01L31/0392 , H01L21/67213 , H01L21/76254 , H01L31/18 , Y02E10/50
摘要： Embodiments of the present invention relate to the use of a particle accelerator beam to form thin films of material from a bulk substrate. In particular embodiments, a bulk substrate having a top surface is exposed to a beam of accelerated particles. Then, a thin film of material is separated from the bulk substrate by performing a controlled cleaving process along a cleave region formed by particles implanted from the beam. To improve uniformity of depth of implantation, channeling effects are reduced by one or more techniques. In one technique, a miscut bulk substrate is subjected to the implantation, such that the lattice of the substrate is offset at an angle relative to the impinging particle beam. According to another technique, the substrate is tilted at an angle relative to the impinging particle beam. In still another technique, the substrate is subjected to a dithering motion during the implantation. These techniques may be employed alone or in combination.
摘要翻译：本发明的实施例涉及使用粒子加速器束从大量衬底形成材料薄膜。在具体的实施方案中，具有顶表面的本体衬底暴露于加速颗粒束。然后，通过沿着从光束注入的颗粒形成的切割区域进行受控的切割过程，将薄膜材料与本体基板分离。为了改善植入深度的均匀性，可以通过一种或多种技术降低沟道效应。在一种技术中，对杂散块体基板进行注入，使得基板的晶格相对于撞击的粒子束以一定角度偏移。根据另一种技术，衬底相对于撞击粒子束以一定角度倾斜。在另一种技术中，衬底在植入期间经历抖动运动。这些技术可以单独使用或组合使用。

2. 发明申请

US20100224130A1 ROTATING SUBSTRATE SUPPORT AND METHODS OF USE 审中-公开
标题翻译：旋转基板支持和使用方法
公开(公告)号：US20100224130A1
公开(公告)日：2010-09-09
申请号：US12779904
申请日：2010-05-13
申请人： Jacob Smith , Alexander Tam , R. Suryanarayanan Iyer , Sean Seutter , Binh Tran , Nir Merry , Adam Brailove , Robert Shydo, JR. , Robert Andrews , Frank Roberts , Theodore Smick , Geoffrey Ryding
发明人： Jacob Smith , Alexander Tam , R. Suryanarayanan Iyer , Sean Seutter , Binh Tran , Nir Merry , Adam Brailove , Robert Shydo, JR. , Robert Andrews , Frank Roberts , Theodore Smick , Geoffrey Ryding
IPC分类号： H01L21/46
CPC分类号： H01L21/68792 , C23C16/4584 , H01L21/67126 , H01L21/68742
摘要： A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
摘要翻译：本文公开了一种利用旋转衬底支撑件来处理衬底的方法和装置。在一个实施例中，用于处理衬底的装置包括具有设置在腔室内的衬底支撑组件的室。衬底支撑组件包括具有支撑表面的衬底支撑件和设置在支撑表面下方的加热器。轴联接到基板支撑件，并且电机通过转子联接到轴，以向基板支撑件提供旋转运动。密封块设置在转子周围并与其形成密封。密封块具有至少一个密封件和沿密封块和轴之间的界面设置的至少一个通道。端口连接到每个通道以连接到泵。升降机构联接到轴上以升高和降低基板支撑。

3. 发明申请

US20100044595A1 Race track configuration and method for wafering silicon solar substrates 失效
标题翻译：用于晶圆硅太阳能基板的赛道配置和方法
公开(公告)号：US20100044595A1
公开(公告)日：2010-02-25
申请号：US12462210
申请日：2009-07-29
申请人： Francois J. Henley , Adam Brailove
发明人： Francois J. Henley , Adam Brailove
IPC分类号： H01J37/08 , B26D7/18 , B65H1/00
CPC分类号： B28D5/0011 , B28D5/0082 , H01L21/67213 , H01L21/67736 , Y10T83/0467 , Y10T83/2074
摘要： A system for manufacturing free-standing films from work pieces. The system includes a racetrack structure being configured to transfer at least one work piece and one or more accelerator-based ion implanters coupled to the racetrack structure via an end station. Each of the accelerator-based ion implanters is configured to introduce particles having an energy of greater than 1 MeV to implant into a surface of the work piece loaded in the end station to form a cleave region in the work piece. The system includes one or more cleave modules coupled to the racetrack structure configured to perform a cleave process to release a free-standing film from the work piece along the cleave region. Additionally, the system includes an output port coupled to each cleave module to output the free standing film detached from the work piece and one or more service modules each connected to the racetrack structure.
摘要翻译：用于从工件制造独立薄膜的系统。该系统包括赛道结构，其配置成经由终端站传送至少一个工件和一个或多个基于加速器的离子注入器，该离子注入器耦合到跑道结构。基于加速器的离子注入器被配置为引入具有大于1MeV的能量的颗粒，以将其注入到装载在终端站中的工件的表面中，以在工件中形成切割区域。该系统包括耦合到跑道结构的一个或多个切割模块，其被配置为执行切割过程，以沿着切割区域从工件释放独立的薄膜。此外，该系统包括一个输出端口，该输出端口连接到每个切割模块，以输出与工件分离的自立式薄膜和一个或多个服务模块，每个服务模块连接到跑道结构。

4. 发明申请

US20100317140A1 TECHNIQUES FOR FORMING THIN FILMS BY IMPLANTATION WITH REDUCED CHANNELING 有权
标题翻译：通过减少通道进行植入形成薄膜的技术
公开(公告)号：US20100317140A1
公开(公告)日：2010-12-16
申请号：US12778989
申请日：2010-05-12
申请人： ADAM BRAILOVE , Zuqin Liu , Francois J. Henley , Albert J. Lamm
发明人： ADAM BRAILOVE , Zuqin Liu , Francois J. Henley , Albert J. Lamm
IPC分类号： H01L21/263 , H01J37/08
CPC分类号： H01L31/0392 , H01L21/67213 , H01L21/76254 , H01L31/18 , Y02E10/50
摘要： Embodiments of the present invention relate to the use of a particle accelerator beam to form thin films of material from a bulk substrate. In particular embodiments, a bulk substrate having a top surface is exposed to a beam of accelerated particles. Then, a thin film of material is separated from the bulk substrate by performing a controlled cleaving process along a cleave region formed by particles implanted from the beam. To improve uniformity of depth of implantation, channeling effects are reduced by one or more techniques. In one technique, a miscut bulk substrate is subjected to the implantation, such that the lattice of the substrate is offset at an angle relative to the impinging particle beam. According to another technique, the substrate is tilted at an angle relative to the impinging particle beam. In still another technique, the substrate is subjected to a dithering motion during the implantation. These techniques may be employed alone or in combination.
摘要翻译：本发明的实施例涉及使用粒子加速器束从大量衬底形成材料薄膜。在具体的实施方案中，具有顶表面的本体衬底暴露于加速颗粒束。然后，通过沿着从光束注入的颗粒形成的切割区域进行受控的切割过程，将薄膜材料与本体基板分离。为了改善植入深度的均匀性，可以通过一种或多种技术降低沟道效应。在一种技术中，对杂散块体基板进行注入，使得基板的晶格相对于撞击的粒子束以一定角度偏移。根据另一种技术，衬底相对于撞击粒子束以一定角度倾斜。在另一种技术中，衬底在植入期间经历抖动运动。这些技术可以单独使用或组合使用。

5. 发明申请

US20070295274A1 Batch Processing Platform For ALD and CVD 失效
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：US20070295274A1
公开(公告)日：2007-12-27
申请号：US11426563
申请日：2006-06-26
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

6. 发明授权

US06803590B2 Ion beam mass separation filter, mass separation method thereof and ion source using the same 失效
标题翻译：离子束质量分离过滤器，其质量分离方法和使用其的离子源
公开(公告)号：US06803590B2
公开(公告)日：2004-10-12
申请号：US10379065
申请日：2003-03-04
申请人： Adam Brailove , Hirohiko Murata
发明人： Adam Brailove , Hirohiko Murata
IPC分类号： H11J4900
CPC分类号： H01J49/284
摘要： A mass separation filter has a first magnet forming a first magnetic field in an orthogonal direction to a beam axis of an ion beam, a second magnet sequentially arranged with the first magnet along the beam axis, parallel with and facing the opposite direction of the first magnet, and forming a second magnetic field orthogonal to the beam axis; and a collimator wall formed within the first and second magnetic fields that forms a transfer channel from a first curved channel deflected from the first magnetic field to a second curved channel deflected by the second magnetic field in a direction the reverse of the first magnetic field. Incident ions pass through a channel inversely curved by the magnetic fields of the first and second magnets according to the mass separation filter, and it is possible to lead ions of a desired mass in the same direction as the beam axis.
摘要翻译：质量分离过滤器具有形成与离子束的束轴正交的第一磁场的第一磁体，沿着光束轴线与第一磁体顺序排列的第二磁体，与第一磁体平行并面向第一磁体的相反方向并形成与光束轴正交的第二磁场; 以及形成在第一和第二磁场内的准直器壁，其形成从第一磁场偏转的第一弯曲通道到由第二磁场偏转的第二弯曲通道在与第一磁场相反的方向上的转移通道。事件离子通过根据质量分离过滤器由第一和第二磁体的磁场反向弯曲的通道，并且可以将所需质量的离子导引在与光束轴线相同的方向上。

7. 发明申请

US20120291709A1 ROTATING SUBSTRATE SUPPORT AND METHODS OF USE 审中-公开
标题翻译：旋转基板支持和使用方法
公开(公告)号：US20120291709A1
公开(公告)日：2012-11-22
申请号：US13559511
申请日：2012-07-26
申请人： Jacob Smith , ALEXANDER TAM , R. SURYANARAYANAN IYER , SEAN SEUTTER , BINH TRAN , NIR MERRY , ADAM BRAILOVE , ROBERT SHYDO, JR. , ROBERT ANDREWS , FRANK ROBERTS , THEODORE SMICK , GEOFFREY RYDING
发明人： Jacob Smith , ALEXANDER TAM , R. SURYANARAYANAN IYER , SEAN SEUTTER , BINH TRAN , NIR MERRY , ADAM BRAILOVE , ROBERT SHYDO, JR. , ROBERT ANDREWS , FRANK ROBERTS , THEODORE SMICK , GEOFFREY RYDING
IPC分类号： C23C14/50
CPC分类号： H01L21/68792 , C23C16/4584 , H01L21/67126 , H01L21/68742
摘要： A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.
摘要翻译：本文公开了一种利用旋转衬底支撑件来处理衬底的方法和装置。在一个实施例中，用于处理衬底的装置包括具有设置在腔室内的衬底支撑组件的室。衬底支撑组件包括具有支撑表面的衬底支撑件和设置在支撑表面下方的加热器。轴联接到基板支撑件，并且电机通过转子联接到轴，以向基板支撑件提供旋转运动。密封块设置在转子周围并与其形成密封。密封块具有至少一个密封件和沿密封块和轴之间的界面设置的至少一个通道。端口连接到每个通道以连接到泵。升降机构联接到轴上以升高和降低基板支撑。

8. 发明申请

US20060156979A1 Substrate processing apparatus using a batch processing chamber 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：US20060156979A1
公开(公告)日：2006-07-20
申请号：US11286063
申请日：2005-11-22
申请人： Randhir Thakur , Steve Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Brailove , Nir Merry , Vinay Shah , Andreas Hegedus
发明人： Randhir Thakur , Steve Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Brailove , Nir Merry , Vinay Shah , Andreas Hegedus
IPC分类号： H01L21/322 , C23C16/00
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

9. 发明授权

US07833351B2 Batch processing platform for ALD and CVD 失效
标题翻译： ALD和CVD的批处理平台
公开(公告)号：US07833351B2
公开(公告)日：2010-11-16
申请号：US11426563
申请日：2006-06-26
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

10. 发明授权

US07601652B2 Method for treating substrates and films with photoexcitation 有权
标题翻译：用光激发处理底物和膜的方法
公开(公告)号：US07601652B2
公开(公告)日：2009-10-13
申请号：US11157567
申请日：2005-06-21
申请人： Kaushal K. Singh , Sean M. Seutter , Jacob Smith , R. Suryanarayanan Iyer , Steve G. Ghanayem , Adam Brailove , Robert Shydo , Jeannot Morin
发明人： Kaushal K. Singh , Sean M. Seutter , Jacob Smith , R. Suryanarayanan Iyer , Steve G. Ghanayem , Adam Brailove , Robert Shydo , Jeannot Morin
IPC分类号： H01L21/31
CPC分类号： H01L21/0217 , C23C16/0227 , C23C16/345 , C23C16/45519 , C23C16/45591 , C23C16/482 , C23C16/488 , C23C16/52 , H01L21/0228 , H01L21/3185
摘要： Embodiments of the invention generally provide a method for depositing films using photoexcitation. The photoexcitation may be utilized for at least one of treating the substrate prior to deposition, treating substrate and/or gases during deposition, treating a deposited film, or for enhancing chamber cleaning. In one embodiment, a method for depositing silicon and nitrogen-containing film on a substrate includes heating a substrate disposed in a processing chamber, generating a beam of energy of between about 1 to about 10 eV, transferring the energy to a surface of the substrate; flowing a nitrogen-containing chemical into the processing chamber, flowing a silicon-containing chemical with silicon-nitrogen bonds into the processing chamber, and depositing a silicon and nitrogen-containing film on the substrate.
摘要翻译：本发明的实施方案通常提供使用光激发沉积膜的方法。光致激发可以用于在沉积之前处理衬底，在沉积期间处理衬底和/或气体，处理沉积膜或用于增强腔室清洁中的至少一种。在一个实施例中，用于在衬底上沉积硅和含氮膜的方法包括加热设置在处理室中的衬底，产生约1至约10eV的能量束，将能量转移到衬底的表面 ; 使含氮化学物质流入处理室，使含有硅 - 氮的键的含硅化学物质流入处理室，并在衬底上沉积含硅和氮的膜。

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