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1. 发明申请

US20120210937A1 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：US20120210937A1
公开(公告)日：2012-08-23
申请号：US13458520
申请日：2012-04-27
申请人： RANDHIR THAKUR , STEVE G. GHANAYEM , JOSEPH YUDOVSKY , AARON WEBB , ADAM ALEXANDER BRAILOVE , NIR MERRY , VINAY K. SHAH , ANDREAS G. HEGEDUS
发明人： RANDHIR THAKUR , STEVE G. GHANAYEM , JOSEPH YUDOVSKY , AARON WEBB , ADAM ALEXANDER BRAILOVE , NIR MERRY , VINAY K. SHAH , ANDREAS G. HEGEDUS
IPC分类号： C23C16/46 , C23C16/50 , F28F3/12 , C23C16/44
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。

2. 发明授权

US07833351B2 Batch processing platform for ALD and CVD 失效
标题翻译： ALD和CVD的批处理平台
公开(公告)号：US07833351B2
公开(公告)日：2010-11-16
申请号：US11426563
申请日：2006-06-26
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

3. 发明申请

US20100173495A1 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：US20100173495A1
公开(公告)日：2010-07-08
申请号：US12724935
申请日：2010-03-16
申请人： Randhir Thakur , Steve G. Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Alexander Brailove , Nir Merry , Vinay K. Shah , Andreas G. Hegedus
发明人： Randhir Thakur , Steve G. Ghanayem , Joseph Yudovsky , Aaron Webb , Adam Alexander Brailove , Nir Merry , Vinay K. Shah , Andreas G. Hegedus
IPC分类号： H01L21/302 , H01L21/316 , H01L21/314 , C23C16/00
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput. In one embodiment, a system is configured to perform a substrate processing sequence that contains batch processing chambers only, or batch and single substrate processing chambers, to optimize throughput and minimize processing defects due to exposure to a contaminating environment. In one embodiment, a batch processing chamber is used to increase the system throughput by performing a process recipe step that is disproportionately long compared to other process recipe steps in the substrate processing sequence that are performed on the cluster tool. In another embodiment, two or more batch chambers are used to process multiple substrates using one or more of the disproportionately long processing steps in a processing sequence. Aspects of the invention also include an apparatus and method for delivering a precursor to a processing chamber so that a repeatable ALD or CVD deposition process can be performed.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。在一个实施例中，系统被配置为执行仅包含批处理室的衬底处理序列，或批处理和单个衬底处理室，以优化生产量并且由于暴露于污染环境而最小化处理缺陷。在一个实施例中，批处理室用于通过执行与在集群工具上执行的衬底处理序列中的其他工艺配方步骤相比不成比例地长的工艺配方步骤来增加系统吞吐量。在另一个实施方案中，使用两个或更多个间隔室来处理多个基板，使用处理顺序中的一个或多个不成比例的长处理步骤。本发明的方面还包括用于将前体输送到处理室的装置和方法，使得可以执行可重复的ALD或CVD沉积工艺。

4. 发明申请

US20090211742A1 COOLING PLATES AND SEMICONDUCTOR APPARATUS THEREOF 有权
标题翻译：冷却板及其半导体装置
公开(公告)号：US20090211742A1
公开(公告)日：2009-08-27
申请号：US12246020
申请日：2008-10-06
申请人： HELDER LEE , Miriam Schwartz , Michael Kuchar , Aaron Webb , Theodoss Costuros
发明人： HELDER LEE , Miriam Schwartz , Michael Kuchar , Aaron Webb , Theodoss Costuros
IPC分类号： F28F3/12
CPC分类号： F28F3/12 , H01L21/67109
摘要： A cooling plate includes a channel to transmit a fluid, wherein the channel is disposed within a base and the channel has a first portion and a second portion. The first portion is disposed substantially along a peripheral edge of the base, and the second portion is coupled to the first portion and is disposed further away from the peripheral edge of the base than the first portion. The second portion has a length that is at least about 35% as long as the length of the first portion. The cooling plate also includes a lid disposed over the base and the channel, wherein the lid provides support for a substrate.
摘要翻译：冷却板包括用于传输流体的通道，其中通道设置在基座内，并且通道具有第一部分和第二部分。第一部分基本上沿着基部的周边边缘设置，并且第二部分联接到第一部分并且被设置为比第一部分更远离基部的周边边缘。第二部分具有与第一部分的长度一样长的至少约35％的长度。冷却板还包括设置在基座和通道上的盖，其中盖为基底提供支撑。

5. 发明申请

US20070074663A1 Batch wafer handling system 审中-公开
标题翻译：批量晶圆处理系统
公开(公告)号：US20070074663A1
公开(公告)日：2007-04-05
申请号：US11242301
申请日：2005-09-30
申请人： Adam Brailove , Aaron Webb
发明人： Adam Brailove , Aaron Webb
IPC分类号： C23C16/00
CPC分类号： H01L21/67781 , H01L21/67757
摘要： The present invention generally provides a batch processing system having a processing chamber and a loading chamber. Substrates are transferred in and out the processing chamber in a batch by a substrate boat. A batch handling tool of the present invention is generally used in the loading chamber to load and unload the structured substrate support by group. The batch handling tool generally comprises a support member, which is configured to host at least two sets of support blades. The at least two sets of substrate supports are generally mounted on the support member and their positions are switchable when the support member rotates. Each set of the support blades is configured to load (unload) at least two substrates into(from) the substrate boat.
摘要翻译：本发明通常提供具有处理室和装载室的批处理系统。基板通过基板舟皿一批地进出处理室。本发明的批处理工具通常用于装载室中，以组合装载和卸载结构化基板支撑件。批处理工具通常包括支撑构件，其被构造成承载至少两组支撑叶片。至少两组基板支撑件通常安装在支撑构件上，并且当支撑构件旋转时它们的位置可切换。每组支撑叶片被配置为将至少两个基板装载（卸载）到（从）基板舟皿中。

6. 发明申请

US20110108742A1 SYSTEM AND METHOD FOR HANDLING MULTIPLE WORKPIECES FOR MATRIX CONFIGURATION PROCESSING 失效
标题翻译：用于处理矩阵配置处理的多个工件的系统和方法
公开(公告)号：US20110108742A1
公开(公告)日：2011-05-12
申请号：US12941656
申请日：2010-11-08
申请人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
发明人： William T. Weaver , Jaime A. Carrera , Robert B. Vopat , Aaron Webb , Charles T. Carlson
IPC分类号： H01L21/677 , B25J11/00 , B65G1/10 , B65G1/04 , B65G65/00 , G21K5/10
CPC分类号： H01L21/67739 , G21K5/10 , H01L21/67742 , H01L21/67766 , H01L21/68707
摘要： A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.
摘要翻译：用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。工件酒店被配置为从输送机接收多个工件。工件酒店包括排列在N列和M层的单元矩阵。拾取刀片被配置成插入酒店并从酒店退回，以便将多个基板从第一层卸载到单行拾取刀片中，并且重复卸载操作以形成矩阵，其包括多个设置在拾取刀片上的一排衬底。在一个例子中，工件酒店具有交错的配置，可以提供每个酒店单元的个人可访问性。

7. 发明申请

US20110041764A1 BATCH PROCESSING PLATFORM FOR ALD AND CVD 审中-公开
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：US20110041764A1
公开(公告)日：2011-02-24
申请号：US12939002
申请日：2010-11-03
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： H01L21/677 , C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气转移区域，至少一个具有缓冲室和分段平台的分批处理室，以及设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，其包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

8. 发明申请

US20080257260A9 Batch wafer handling system 审中-公开
标题翻译：批量晶圆处理系统
公开(公告)号：US20080257260A9
公开(公告)日：2008-10-23
申请号：US11242301
申请日：2005-09-30
申请人： Adam Brailove , Aaron Webb
发明人： Adam Brailove , Aaron Webb
IPC分类号： C23C16/00
CPC分类号： H01L21/67781 , H01L21/67757
摘要： The present invention generally provides a batch processing system having a processing chamber and a loading chamber. Substrates are transferred in and out the processing chamber in a batch by a substrate boat. A batch handling tool of the present invention is generally used in the loading chamber to load and unload the structured substrate support by group. The batch handling tool generally comprises a support member, which is configured to host at least two sets of support blades. The at least two sets of substrate supports are generally mounted on the support member and their positions are switchable when the support member rotates. Each set of the support blades is configured to load (unload) at least two substrates into(from) the substrate boat.
摘要翻译：本发明通常提供具有处理室和装载室的批处理系统。基板通过基板舟皿一批地进出处理室。本发明的批处理工具通常用于装载室中，以组合装载和卸载结构化基板支撑件。批处理工具通常包括支撑构件，其被构造成承载至少两组支撑叶片。至少两组基板支撑件通常安装在支撑构件上，并且当支撑构件旋转时它们的位置可切换。每组支撑叶片被配置为将至少两个基板装载（卸载）到（从）基板舟皿中。

9. 发明申请

US20130108406A1 HIGH-THROUGHPUT WORKPIECE HANDLING 审中-公开
标题翻译：高效率工作处理
公开(公告)号：US20130108406A1
公开(公告)日：2013-05-02
申请号：US13470809
申请日：2012-05-14
申请人： Jason Schaller , Robert Vopat , Charles T. Carlson , Malcolm N. Daniel, JR. , Aaron Webb , William T. Weaver
发明人： Jason Schaller , Robert Vopat , Charles T. Carlson , Malcolm N. Daniel, JR. , Aaron Webb , William T. Weaver
IPC分类号： B66C17/00 , B66C1/42 , B66C1/02
CPC分类号： B65G49/00 , B65G47/918 , B65G49/061 , B65G2203/041 , H01L21/67213 , H01L21/67733 , H01L21/67736 , H01L21/67754
摘要： A system and method for receiving unprocessed workpieces, moving them, orienting them and placing them in a load lock, or other end point is disclosed. The system includes a gantry module for moving workpieces from a conveyor system to a swap module. The swap module is used to remove a carrier or matrix of processed workpieces from a load lock and place a carrier of matrix of unprocessed workpieces in its place. The processed workpieces are then moved by the gantry module back to the conveyor. The gantry module may have X, Y, Z and rotational actuators and include an end effector having multiple grippers. A method of aligning a plurality of workpieces on the end effector so that the plurality can be transported at the same time is also disclosed.
摘要翻译：公开了一种用于接收未加工的工件，移动它们，将它们定向并将它们放置在装载锁中或其它端点的系统和方法。该系统包括用于将工件从传送系统移动到交换模块的台架模块。交换模块用于从加载锁移除已处理工件的载体或矩阵，并将未加工工件的矩阵载体放置在其位置。然后将经处理的工件通过台架模块移回到输送机。台架模块可以具有X，Y，Z和旋转致动器，并且包括具有多个夹具的末端执行器。还公开了一种使末端执行器上的多个工件对齐的方法，以便可以同时传送多个工件。

10. 发明申请

US20070295274A1 Batch Processing Platform For ALD and CVD 失效
标题翻译：用于ALD和CVD的批处理平台
公开(公告)号：US20070295274A1
公开(公告)日：2007-12-27
申请号：US11426563
申请日：2006-06-26
申请人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
发明人： Aaron Webb , Adam Brailove , Joseph Yudovsky , Nir Merry , Andrew Constant , Efrain Quiles , Michael R. Rice , Gary J. Rosen , Vinay K. Shah
IPC分类号： C23C16/00
CPC分类号： C23C16/54 , C23C16/4583 , H01L21/67173 , H01L21/67742 , H01L21/67757 , H01L21/67769 , Y10S414/14
摘要： A batch processing platform used for ALD or CVD processing is configured for high throughput and minimal footprint. In one embodiment, the processing platform comprises an atmospheric transfer region, at least one batch processing chamber with a buffer chamber and staging platform, and a transfer robot disposed in the transfer region wherein the transfer robot has at least one substrate transfer arm that comprises multiple substrate handling blades. The platform may include two batch processing chambers configured with a service aisle disposed therebetween to provide necessary service access to the transfer robot and the deposition stations. In another embodiment, the processing platform comprises at least one batch processing chamber, a substrate transfer robot that is adapted to transfer substrates between a FOUP and a processing cassette, and a cassette transfer region containing a cassette handler robot. The cassette handler robot may be a linear actuator or a rotary table.
摘要翻译：用于ALD或CVD处理的批处理平台配置为高吞吐量和最小占地面积。在一个实施例中，处理平台包括大气传送区域，具有缓冲室和分段平台的至少一个批处理室和设置在传送区域中的传送机器人，其中传送机器人具有至少一个基板传送臂，该基板传送臂包括多个基板处理刀片。平台可以包括两个批处理室，其配置有设置在其间的服务通道，以提供对传送机器人和沉积站的必要的服务访问。在另一个实施例中，处理平台包括至少一个批处理室，适于在FOUP和处理盒之间传送基板的基板传送机器人以及包含盒式处理机器人的盒传送区域。盒式处理机器人可以是线性致动器或旋转台。

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