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1. 发明授权

US4692579A Electron beam lithography apparatus 失效
标题翻译：电子束光刻设备
公开(公告)号：US4692579A
公开(公告)日：1987-09-08
申请号：US735184
申请日：1985-05-17
申请人： Norio Saitou , Susumu Ozasa , Masahide Okumura , Mitsuo Ooyama , Tsutomu Komoda , Katsuhiro Harada , Minpei Fujinami , Kazumi Iwadate
发明人： Norio Saitou , Susumu Ozasa , Masahide Okumura , Mitsuo Ooyama , Tsutomu Komoda , Katsuhiro Harada , Minpei Fujinami , Kazumi Iwadate
IPC分类号： H01J37/317 , H01J37/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/30488 , H01J2237/31764
摘要： An electron beam lithography apparatus comprises: a spot electron beam generator; device for exposing a desired pattern onto a wafer using the spot beam; device for dividing the pattern into small regions; and device for designating an origin of the small region and also digitally scanning the portion inside the small region by a fixed correction amount by use of the spot beam, and thereby to reduce the settling time of the D/A converter in association with the digital scanning.
摘要翻译：电子束光刻设备包括：点电子束发生器; 使用点光束将期望图案曝光到晶片上的装置; 用于将图案分割成小区域的装置; 以及用于指定小区域的原点的装置，并且还通过使用点光束以固定的校正量对小区域内的部分进行数字扫描，从而减少D / A转换器与数字的相关的建立时间扫描。

2. 发明授权

US4829444A Charged particle beam lithography system 失效
标题翻译：带电粒子束光刻系统
公开(公告)号：US4829444A
公开(公告)日：1989-05-09
申请号：US922891
申请日：1986-10-24
申请人： Norio Saitou , Masahide Okumura , Tsutomu Komoda , Mitsuo Ooyama
发明人： Norio Saitou , Masahide Okumura , Tsutomu Komoda , Mitsuo Ooyama
IPC分类号： H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177
摘要： A charged particle beam lithography system has a high-throughput and inexpensive system configuration. The system configuration is constituted by a plurality of charged particle optical systems each adapted to focus and deflect a beam of charged particles and irradiate the beam onto a specimen so that the beam draws a desired pattern on the specimen, a plurality of deflection distortion correcting circuits each associated with each of the charged particle optical systems for correcting a deflection distortion of each charged particle optical system, and a common pattern data control circuit for supplying data of a pattern to be drawn to each of the plurality of deflection distortion correcting circuits.
摘要翻译：带电粒子束光刻系统具有高通量和廉价的系统配置。系统配置由多个带电粒子光学系统构成，每个充电粒子光学系统适于聚焦和偏转带电粒子束并将光束照射到样本上，使得光束在样本上画出期望的图案，多个偏转失真校正电路每个与用于校正每个带电粒子光学系统的偏转失真的带电粒子光学系统相关联的每个带电粒子光学系统以及用于向多个偏转失真校正电路中的每一个提供要绘制的图案的数据的公共图案数据控制电路。

3. 发明授权

US6159644A Method of fabricating semiconductor circuit devices utilizing multiple exposures 失效
公开(公告)号：US6159644A
公开(公告)日：2000-12-12
申请号：US142077
申请日：1998-09-01
申请人： Hidetoshi Satoh , Yoshinori Nakayama , Masahide Okumura , Hiroya Ohta , Norio Saitou
发明人： Hidetoshi Satoh , Yoshinori Nakayama , Masahide Okumura , Hiroya Ohta , Norio Saitou
IPC分类号： G03F7/20 , H01J37/304 , G03F9/00
CPC分类号： G03F7/70616 , G03F7/70433 , G03F7/70458 , G03F7/70633 , H01J37/3045 , H01J2237/3175 , Y10S430/143
摘要： In a semiconductor circuit device fabricating process in which a reduction image projection exposure apparatus and an electron beam exposure apparatus are in a mixed use in its exposure process, pattern position shift errors for each exposure apparatus are measured and corrected at the time of drawing by means of an electron beam drawing apparatus, thereby enhancing the alignment accuracy.First, a pattern for measuring position shifts is exposed using a stepper and the electron beam drawing apparatus. Then, the position shift errors are measured using an identical coordinate position measuring device. Accidental errors have been mixed in the measurement result at this time. On account of this, measurement data at a certain point are smoothed by taking a summation average with data on the periphery thereof, thus decreasing influences of the accidental errors. Moreover, by inverting positive or negative signs of the data on the position shift errors, the data are made into correction data. Then, the correction data are stored. When an exposure is performed by the electron beam drawing apparatus with the pattern exposed by the stepper as a reference, the correction data for the two apparatuses are transferred to the electron beam drawing apparatus, the two data are added to detected mark positions, and at positions after the addition, pattern position shifts within a wafer surface are determined. At the time of exposure, the exposure is performed at positions obtained by subtracting the correction data from the determined pattern position shifts. This method makes it possible to correct both position shift errors within the wafer surface due to the stepper and position shift errors due to the electron beam drawing apparatus, thus allowing the alignment accuracy to be enhanced. Also, this result makes it possible to enhance yield for products in the fabricating process.

4. 发明授权

US5650631A Electron beam writing system 失效
标题翻译：电子束写入系统
公开(公告)号：US5650631A
公开(公告)日：1997-07-22
申请号：US470592
申请日：1995-06-07
申请人： Yasunari Sohda , Masahide Okumura , Yasuhiro Someda , Hidetoshi Satoh , Yoshinori Nakayama , Norio Saitou
发明人： Yasunari Sohda , Masahide Okumura , Yasuhiro Someda , Hidetoshi Satoh , Yoshinori Nakayama , Norio Saitou
IPC分类号： G21K5/04 , G03F7/20 , H01J37/04 , H01J37/09 , H01J37/147 , H01J37/305 , H01L21/027 , H01J37/30
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J2237/0435 , H01J2237/31774 , H01J2237/31776
摘要： A blanking array is used for controlling an electron beam in an electron beam writing system. Electrodes in the array are formed in parallel and two sets of the parallel electrodes, orthogonal to one another, are used for dividing the electron beam into a plurality of individual exposure areas. The sets of parallel electrodes can be formed in one array by a wire mesh or in two separate arrays spaced closely together or farther apart at different focal point positions. The electrodes are provided to extend across an aperture, such as a square or triangular aperture. For a triangular aperture, the electrodes are made parallel to the hypotenuse of the triangle. The writing patterns are formed by combining the exposure areas. Control of each exposure area is realized by applying opposite polarity voltage to adjacent electrodes in order to deflect the portion of the beam passing between the adjacent electrodes. The deflected beam portions are blocked by a downstream aperture that permits the non-deflected electron beam portions to pass through for forming the patterns to be written.
摘要翻译：消隐阵列用于控制电子束写入系统中的电子束。阵列中的电极平行地形成，并且彼此正交的两组平行电极被用于将电子束分成多个单独的曝光区域。这些平行电极组可以通过丝网形成一个阵列，或者可以在不同的焦点位置处彼此间隔开或更远的两个分离的阵列中形成。电极被设置成延伸穿过诸如正方形或三角形孔的孔。对于三角形孔，电极与三角形的斜边平行。通过组合曝光区域形成书写图案。通过对相邻的电极施加相反极性的电压来实现对每个曝光区域的控制，以便偏转通过相邻电极的光束的部分。偏转的光束部分被允许非偏转的电子束部分通过以形成待写入的图案的下游孔阻挡。

5. 发明授权

US4701620A Electron beam exposure apparatus 失效
标题翻译：电子束曝光装置
公开(公告)号：US4701620A
公开(公告)日：1987-10-20
申请号：US893180
申请日：1986-08-05
申请人： Masahide Okumura , Takashi Matsuzaka , Genya Matsuoka , Norio Saitou
发明人： Masahide Okumura , Takashi Matsuzaka , Genya Matsuoka , Norio Saitou
IPC分类号： H01L21/30 , H01J37/141 , H01J37/153 , H01J37/21 , H01J37/304 , H01L21/027 , G21K1/093 , H01J37/07
CPC分类号： H01J37/153 , H01J37/304
摘要： Disclosed is an electron beam exposure apparatus which includes an objective lens focusing an electron beam, and a dynamic focus correction lens dynamically correcting the focusing by the objective lens. The apparatus comprises a control circuit which, in order to prevent a current variation induced in the objective lens by the dynamic focus correction lens, controls current supplied to the objective lens so as to cancel the current variation induced in the objective lens due to the coil current of the dynamic focus correction lens.
摘要翻译：公开了一种电子束曝光装置，其包括聚焦电子束的物镜和动态校正透镜，动态校正物镜的聚焦。该装置包括一个控制电路，为了防止物镜由动态聚焦校正透镜引起的电流变化，控制提供给物镜的电流，以消除由于线圈而引起的物镜中的电流变化电流的动态聚焦校正镜头。

6. 发明授权

US6121625A Charged particle beam lithography apparatus for forming pattern on semi-conductor 失效
公开(公告)号：US6121625A
公开(公告)日：2000-09-19
申请号：US87296
申请日：1998-05-29
申请人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
发明人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
IPC分类号： G03F7/20 , C08F10/02 , G03F1/20 , H01J37/147 , H01J37/317 , H01L21/027 , H01J37/304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.

7. 发明授权

US5402863A Apparatus to automatically adjust spring tension of an elevator brake to maintain brake torque 失效
标题翻译：自动调节电梯制动器的弹簧张力以保持制动转矩的装置
公开(公告)号：US5402863A
公开(公告)日：1995-04-04
申请号：US147472
申请日：1993-11-05
申请人： Masahide Okumura , Shigemi Iwata , Hiroyuki Ikejima
发明人： Masahide Okumura , Shigemi Iwata , Hiroyuki Ikejima
IPC分类号： B66B1/32
CPC分类号： B66B1/32
摘要： An elevator adjusting apparatus for adjusting a brake torque produced by a brake for braking travel of an elevator cage includes a brake torque adjustment mode setting unit for setting an adjustment mode for the brake torque, a cage position recognizing unit for recognizing a cage position, a cage speed detecting unit for detecting a cage speed, a brake actuation command generating unit for reissuing a brake actuation command generating unit for issuing a brake actuation command when the brake torque adjustment mode is set by the brake torque adjustment mode setting unit and the cage position recognizing unit recognizes that the cage position has reached a predetermined position of a lift passage, a brake control unit for actuating the brake in response to the brake actuation command issued from the brake actuation command generating unit, and a brake torque calculating unit for calculating the brake torque based on the cage speed detected by the cage speed detecting unit during the brake actuation. With the apparatus, the brake torque can be adjusted simply accurately and efficiently without using any weights.
摘要翻译：一种用于调节由用于制动行驶的制动器产生的制动力矩的电梯调节装置，包括用于设定制动扭矩的调整模式的制动转矩调节模式设定单元，用于识别轿厢位置的轿厢位置识别单元，用于检测轿厢速度的轿厢速度检测单元，制动促动指令发生单元，用于在制动转矩调节模式设定单元设定制动转矩调整模式时，重新发出用于发出制动动作指令的制动器动作指令生成部，识别单元识别出轿厢位置已经到达提升通道的预定位置，用于响应于从制动致动指令产生单元发出的制动器致动指令而致动制动器的制动控制单元，以及用于计算基于笼内速度检测单元在车架速度检测时的制动转矩 ake致动。利用该装置，可以简单地准确和有效地调节制动转矩，而不使用任何重量。

8. 发明授权

US5281827A Charged particle beam exposure apparatus 失效
标题翻译：带电粒子束曝光装置
公开(公告)号：US5281827A
公开(公告)日：1994-01-25
申请号：US763145
申请日：1991-09-20
申请人： Masamichi Kawano , Masahide Okumura , Haruo Yoda , Yukinobu Shibata , Tadao Konishi
发明人： Masamichi Kawano , Masahide Okumura , Haruo Yoda , Yukinobu Shibata , Tadao Konishi
IPC分类号： H01L21/30 , H01J37/302 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/302 , H01J37/3174
摘要： A column section is disposed within a thermostatic chamber within a clean room, a section for analog controlling each portion of the column section is disposed within the clean room and outside of the thermostatic chamber, and a section for digital controlling the analog control section is disposed outside of the clean room.
摘要翻译：柱部分设置在洁净室内的恒温室中，用于模拟控制柱部分的每个部分的部分设置在洁净室内和恒温室外部，并且设置用于数字控制模拟控制部分的部分在洁净室外。

9. 发明授权

US06329665B1 Charged particle beam lithography apparatus for forming pattern on semi-conductor 失效
标题翻译：用于在半导体上形成图案的带电粒子束光刻设备
公开(公告)号：US06329665B1
公开(公告)日：2001-12-11
申请号：US09621708
申请日：2000-07-21
申请人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
发明人： Hiroyuki Ito , Yasunari Sohda , Yasuhiro Someda , Yoshinori Nakayama , Masahide Okumura , Hidetoshi Satoh
IPC分类号： H01J37304
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.
摘要翻译：为了提供极大地增加图案投影数的高速和高精度的单元投影曝光装置，提供了安装传送孔和传输孔的多个模板掩模，并且通过驱动级定位，电子束通过通过其他模板掩模的透射孔，同时用光束偏转装置在模板掩模上选择孔，将传播孔连续地提供给掩模传送方向，模板掩模在与梁一起传播的同时被移动，而其它模版当指定的模板掩模孔组被曝光时，执行掩模转印。重复这些操作，以便执行所有曝光处理。

10. 发明授权

US4670652A Charged particle beam microprobe apparatus 失效
标题翻译：带电粒子束微探针装置
公开(公告)号：US4670652A
公开(公告)日：1987-06-02
申请号：US737478
申请日：1985-05-24
申请人： Mikio Ichihashi , Masahide Okumura , Satoru Fukuhara
发明人： Mikio Ichihashi , Masahide Okumura , Satoru Fukuhara
IPC分类号： H01J37/22 , G01B15/00 , G01B15/04 , G01B15/08 , G01N23/225 , H01J37/28
CPC分类号： H01J37/28
摘要： A charged particle beam microprobe apparatus capable of accurately determining the three-dimensional structure of a surface is disclosed in which a detection system including at least a pair of detectors disposed symmetrically with respect to the optical axis of an charged particle beam generating instrument is used for obtaining an image signal from a surface scanned with a charged particle beam, the image signal obtained by difference detection in the detection system is compared with a pair of variable reference levels opposite in polarity to each other, to be converted into positive and negative rectangular wave signals, and information on whether the scanned surface slopes upward or downward when viewed from the detection system and information on the gradient of the scanned surface are obtained from the polarity and pulse width of each of the positive and negative rectangular wave signals, respectively, to determine the three-dimensional structure of the scanned surface. That is, the charged particle beam apparatus does not utilize a phenomenon that the coefficient of backscattered electrons is proportional to the angle of slope of a primary beam impinging surface, and hence can use secondary electron suitable for forming a high resolution scanned image.
摘要翻译：公开了一种能够精确地确定表面的三维结构的带电粒子束微探针装置，其中使用包括至少一对相对于带电粒子束产生装置的光轴对称设置的检测器的检测系统从用带电粒子束扫描的表面获得图像信号，将通过检测系统中的差分检测获得的图像信号与彼此极性相反的一对可变参考电平进行比较，以被转换为正和负矩形波信号，以及关于从检测系统观察扫描表面是向上还是向下倾斜的信息以及关于扫描表面的梯度的信息的信息分别从正和负矩形波信号的极性和脉冲宽度获得到确定扫描表面的三维结构。也就是说，带电粒子束装置没有利用背散射电子的系数与主光束入射表面的倾斜角成比例的现象，因此可以使用适于形成高分辨率扫描图像的二次电子。

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