专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09443692B2 Focused ion beam low kV enhancement 有权
公开(公告)号：US09443692B2
公开(公告)日：2016-09-13
申请号：US14803964
申请日：2015-07-20
申请人： FEI Company
发明人： Mostafa Maazouz
IPC分类号： H01J3/14 , H01J37/07 , H01J37/21 , H01J37/10 , H01J37/04 , H01J37/305 , H01J3/02 , H01J37/06 , H01J37/147 , H01J37/248
CPC分类号： H01J37/07 , H01J3/026 , H01J37/04 , H01J37/06 , H01J37/10 , H01J37/1477 , H01J37/21 , H01J37/248 , H01J37/3056 , H01J37/3178 , H01J2237/0473 , H01J2237/04735 , H01J2237/04756 , H01J2237/1518 , H01J2237/1534 , H01J2237/28 , H01J2237/31749
摘要： The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

2. 发明授权

US08710465B2 Pattern data conversion for lithography system 有权
标题翻译：光刻系统的图案数据转换
公开(公告)号：US08710465B2
公开(公告)日：2014-04-29
申请号：US13293426
申请日：2011-11-10
申请人： Teunis Van De Peut , Marco Jan-Jaco Weiland
发明人： Teunis Van De Peut , Marco Jan-Jaco Weiland
IPC分类号： H01J37/06 , H01J37/07 , G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70291 , G03F7/70508
摘要： A method and system for exposing a target according to pattern data in a maskless lithography machine generating a plurality of exposure beamlets for exposing the target. The method comprises providing input pattern data in a vector format, rendering and quantizing the input pattern data to generate intermediate pattern data, and re-sampling and re-quantizing the intermediate pattern data to generate output pattern data. The output pattern data is supplied to the lithography machine, and the beamlets generated by the lithography machine are modulated on the basis of the output pattern data.
摘要翻译：一种用于在无掩模光刻机中根据图案数据曝光目标的方法和系统，其生成用于曝光目标的多个曝光子束。该方法包括以矢量格式提供输入图形数据，渲染和量化输入图案数据以产生中间图案数据，并重新采样和重新量化中间图案数据以产生输出图案数据。将输出图案数据提供给光刻机，并且基于输出图案数据调制由光刻机产生的子束。

3. 发明授权

US07189979B2 Electron gun 有权
标题翻译：电子枪
公开(公告)号：US07189979B2
公开(公告)日：2007-03-13
申请号：US10822720
申请日：2004-04-13
申请人： Masahiko Okunuki , Hiroya Ohta
发明人： Masahiko Okunuki , Hiroya Ohta
IPC分类号： H01J37/07
CPC分类号： H01J37/065
摘要： An electron gun includes a cathode portion which emits electrons, an anode portion which accelerates the emission electrons, a bias portion which is arranged between the cathode portion and the anode portion and controls trajectories of the emission electrons, a shielding portion which is arranged below the anode portion and shields some of the emission electrons, and a cooling portion which cools the shielding portion. The bias portion controls the trajectories of the electrons so as to form a crossover between the bias portion and the anode portion, and prevents the electrons from emitting on the anode portion.
摘要翻译：电子枪包括发射电子的阴极部分，加速发射电子的阳极部分，设置在阴极部分和阳极部分之间的偏置部分，并控制发射电子的轨迹;屏蔽部分布置在阳极部分并屏蔽一些发射电子;以及冷却部分，其冷却屏蔽部分。偏置部分控制电子的轨迹，以在偏压部分和阳极部分之间形成交叉，并防止电子在阳极部分上发射。

4. 发明授权

US07075093B2 Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation 失效
标题翻译：用于具有精确X-Y平移的IC制造的并行多电子束光刻技术
公开(公告)号：US07075093B2
公开(公告)日：2006-07-11
申请号：US10844201
申请日：2004-05-12
申请人： Richard M. Gorski , Boris Rozansky , Hsing-Yao Chen
发明人： Richard M. Gorski , Boris Rozansky , Hsing-Yao Chen
IPC分类号： H01J37/07
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J2237/0435 , H01J2237/31766 , H01J2237/31774
摘要： A maskless, direct write electron lithography apparatus for accurately and simultaneously writing plural sub-micron patterns on a silicon substrate employs plural parallel electron beams with precise X-Y mechanical translation of the substrate to provide low cost, high throughput integrated circuit (IC) fabrication. Plural compact micro electron gun assemblies arranged in an I×J rectangular grid each simultaneously expose one IC pattern on the substrate, with each electron gun assembly including a K×L array of individually controlled electron guns emitting K×L electron beams. The regular, small spacing between electron beams in each array, i.e., approximately 1 mm or less, requires a correspondingly small X-Y translation of the substrate to write the entire wafer. Each electron gun array includes plural AC blanked cathodes and DC biased plates having plural aligned beam passing apertures. A computer controlled pattern generator synchronized with wafer X-Y translation controls the duration and timing of the cathode blanking signals.
摘要翻译：用于在硅衬底上准确并同时地写入多个亚微米图案的无掩模式直写式电子光刻设备采用具有精确的X-Y机械平移的平行电子束，以提供低成本，高吞吐量的集成电路（IC）制造。以1x×矩形栅格排列的多个紧凑型微电子枪组件同时暴露基板上的一个IC图案，每个电子枪组件包括发射KxL电子束的独立控制的电子枪的KxL阵列。每个阵列中的电子束之间规则的小的间隔，即大约1mm或更小，需要基片的相应较小的X-Y平移来写入整个晶片。每个电子枪阵列包括多个交流阴极阴极和具有多个对准的光束通过孔的直流偏压板。与晶片X-Y平移同步的计算机控制模式发生器控制阴极消隐信号的持续时间和时序。

5. 发明申请

US20050052103A1 Small electron gun 有权
标题翻译：小电子枪
公开(公告)号：US20050052103A1
公开(公告)日：2005-03-10
申请号：US10873358
申请日：2004-06-23
申请人： Soichi Katagiri , Takashi Ohshima
发明人： Soichi Katagiri , Takashi Ohshima
IPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J37/073 , H01J41/20
CPC分类号： H01J37/18 , H01J7/16 , H01J7/18 , H01J37/07 , H01J2237/022 , H01J2237/062 , H01J2237/06316 , H01J2237/1825 , H01J2237/188
摘要： To provide a small electron gun capable of keeping a high vacuum pressure used for an electron microscope and an electron-beam drawing apparatus. An electron gun constituted by a nonevaporative getter pump, a heater, a filament, and an electron-source positioning mechanism is provided with an opening for rough exhausting and its automatically opening/closing valve, and means for ionizing and decomposing an inert gas or a compound gas for the nonevaporative getter pump. It is possible to keep a high vacuum pressure of 10−10 Torr without requiring an ion pump by using a small electron gun having a height and a width of approximately 15 cm while emitting electrons from the electron gun.
摘要翻译：提供能够保持用于电子显微镜和电子束拉伸装置的高真空压力的小型电子枪。由非蒸发式吸气泵，加热器，灯丝和电子源定位机构构成的电子枪设置有用于粗排气的开口及其自动打开/关闭阀，以及用于电离和分解惰性气体或用于非蒸发吸气泵的复合气体。通过使用电子枪发射电子的高度和宽度约为15cm的小型电子枪，可以保持10 -10乇的高真空压力，而不需要离子泵。

6. 发明授权

US5872366A Charged-particle-beam exposure device and charged-particle-beam exposure method 失效
标题翻译：带电粒子束曝光装置和带电粒子束曝光方法
公开(公告)号：US5872366A
公开(公告)日：1999-02-16
申请号：US908699
申请日：1997-08-08
申请人： Yoshihisa Ooaeh , Tomohiko Abe , Akio Yamada , Hiroshi Yasuda , Kenj Kudoh , Kouzi Takahata
发明人： Yoshihisa Ooaeh , Tomohiko Abe , Akio Yamada , Hiroshi Yasuda , Kenj Kudoh , Kouzi Takahata
IPC分类号： H01J37/07 , H01J37/065 , H01J37/24 , H01J37/30 , H01J37/09
CPC分类号： H01J37/241 , H01J37/065 , H01J2237/3175
摘要： An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower than the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode and the anode, and being applied with a voltage lower than the first voltage to form a cross-over image of the electron beam, the fourth aperture being larger than the third aperture.
摘要翻译：用于发射沿着光束轴线行进的电子束的电子枪包括具有尖端的阴极，该尖端具有基本上圆形的圆锥形形状和基本上在光束轴线处的尖端表面，阴极被施加第一电压，阳极具有基本上在所述光束轴上的第一孔，并施加高于所述第一电压的第二电压;控制电极，其具有基本上在所述光束轴上的第二孔，并施加低于所述第一电压的电压以控制所述第一电压的电流阴极，第二孔径大于尖端表面，具有基本上在梁轴上的第三孔的引导电极设置在阴极和阳极之间，并施加有比第一电压高的电压并且低于第二电压电压，所述第三孔小于所述尖端表面，以及透镜电极，所述透镜电极具有基本上在所述光束轴上的第四孔引导电极和阳极，并施加低于第一电压的电压以形成电子束的交叉图像，第四孔径大于第三孔径。

7. 发明授权

US5854490A Charged-particle-beam exposure device and charged-particle-beam exposure method 失效
公开(公告)号：US5854490A
公开(公告)日：1998-12-29
申请号：US680960
申请日：1996-07-16
申请人： Yoshihisa Ooaeh , Akio Yamada , Hiroshi Yasuda
发明人： Yoshihisa Ooaeh , Akio Yamada , Hiroshi Yasuda
IPC分类号： H01J37/07 , H01J37/065 , H01J37/24 , H01J37/30 , H01J37/63
CPC分类号： H01J37/241 , H01J37/065 , H01J2237/3175
摘要： An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower than the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode and the anode, and being applied with a voltage lower than the first voltage to form a cross-over image of the electron beam, the fourth aperture being larger than the third aperture.

8. 发明授权

US4983806A Method and device for cooling electron beam gun 失效
标题翻译：冷却电子束枪的方法和装置
公开(公告)号：US4983806A
公开(公告)日：1991-01-08
申请号：US487595
申请日：1990-03-01
申请人： James L. Harper , Charles H. Hill
发明人： James L. Harper , Charles H. Hill
IPC分类号： C23C14/30 , H01J37/07 , H01J37/305
CPC分类号： H01J37/07 , C23C14/30 , H01J37/305
摘要： A device and method for cooling the edge of a top plate which partially surrounds an evaporant pocket in an electron beam gun. The invention involves the passage of coolant through a channel in the top plate. The channel is substantially parallel to and close enough to the edge of the top plate so that re-evaporation of evaporant condensed on the edge of the top plate is substantially prevented.
摘要翻译：一种用于冷却部分地围绕电子束枪的蒸发袋的顶板的边缘的装置和方法。本发明涉及冷却剂通过顶板中的通道。通道与顶板的边缘基本平行并足够接近，从而基本上防止了冷凝在顶板边缘上的蒸发剂的再蒸发。

9. 发明授权

US4126811A Electron gun with linear thermionic cathode for electron-beam heating 失效
标题翻译：具有线性热阴极的电子枪用于电子束加热
公开(公告)号：US4126811A
公开(公告)日：1978-11-21
申请号：US806706
申请日：1977-06-30
申请人： Boris A. Movchan , Viktor A. Timashov , Nikolai V. Chaika
发明人： Boris A. Movchan , Viktor A. Timashov , Nikolai V. Chaika
IPC分类号： H01J37/065 , H01J37/07 , H01J29/46 , H01J29/48
CPC分类号： H01J37/07 , H01J37/065
摘要： An electron gun comprises a linear thermionic cathode having part of its emitting surface facing an accelerating anode, and the rest of the emitting surface separated by a gap from a cathode-adjacent focusing electrode. The cathode-adjacent focusing electrode is made of two portions spaced apart. On the opposite end surfaces of these portions, there is attached a pair of flat current-conducting springs whose other ends are connected to leads. The other end surfaces of these portions accommodate cathode holders and have a pair of flat springs attached thereto, the other ends of the pair of flat springs being connected to the insulator of the electron gun housing. The pairs of flat springs attached to different portions of the focusing electrode deflect towards each other. The proposed electron gun increases the stability of its electron-optical parameters.
摘要翻译：电子枪包括线性热离子阴极，其一部分发射表面面向加速阳极，其余发射表面与阴极相邻的聚焦电极间隔开。阴极相邻的聚焦电极由间隔开的两个部分制成。在这些部分的相对端面上，安装有一对扁平的导电弹簧，其另一端连接到引线。这些部分的另一端面容纳阴极保持器，并具有一对连接到其上的平板弹簧，该对弹簧的另一端连接到电子枪壳体的绝缘体。连接到聚焦电极的不同部分的一对平板弹簧彼此偏向。所提出的电子枪增加了其电子 - 光学参数的稳定性。

10. 发明申请

US20210050175A1 ELECTRON SOURCE AND ELECTRON GUN 有权
公开(公告)号：US20210050175A1
公开(公告)日：2021-02-18
申请号：US16966907
申请日：2018-12-26
申请人： 38th Research Institute, China Electronics Technology Group Corporation
发明人： Huarong LIU , Junting WANG , Xuehui WANG , Yuxuan QI , Xianbin HU , Xueming JIN , Zhao HUANG , Dizhi CHEN , Yijing LI , Youyin DENG
IPC分类号： H01J37/073 , H01J37/065 , H01J3/02 , H01J37/07
摘要： The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式