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    • 4. 发明授权
    • Method for manufacturing lepidocrocite
    • 菱镁矿生产方法
    • US4729846A
    • 1988-03-08
    • US4943
    • 1987-01-20
    • Yasushi MatsuiNorio KoikeKunio TakahashiHiroshi Matsue
    • Yasushi MatsuiNorio KoikeKunio TakahashiHiroshi Matsue
    • H01F1/11C01G49/02C01G49/06
    • C01G49/06C01P2004/52C01P2006/42
    • Lepidocrocite (.gamma.-FeOOH) with an large specific surface area and a uniform particle size is provided by a method comprising preparing a suspension of ferrous hydroxide at a pH of 6.5 to 7.5 by adding a ferrous salt solution with an alkali solution in an amount of 0.4 to 0.7 times the theoretical amount for converting all the ferrous salt to ferrous hydroxide, blowing an oxygen-containing gas into the suspension to form a seed crystal of .gamma.-FeOOH, completing the generation reaction of .gamma.-FeOOH by blowing an oxygen-containing gas into the suspension while adding an alkali solution to keep the pH of the suspension within a range of 3 to 5, in which an Si concentration of the suspensions for seed reaction and for generation reaction of .gamma.-FeOOH is controlled to be within 5 to 30 ppm.
    • 通过以下方法提供具有大的比表面积和均匀粒径的鳞状赤铁矿(γ-FeOOH),该方法包括通过将亚铁盐溶液与碱溶液一起加入至pH 6.5至7.5的方法制备氢氧化亚铁悬浮液 将所有亚铁盐转化为氢氧化亚铁的理论量的0.4〜0.7倍,向混悬液中吹入含氧气体,形成γ-FeOOH晶种,通过吹入含氧气体完成γ-FeOOH的发生反应 将气体加入到悬浮液中,同时加入碱溶液以将悬浮液的pH保持在3至5的范围内,其中用于种子反应的悬浮液和γ-FeOOH的发生反应的Si浓度被控制在5〜 30 ppm。
    • 10. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US4148048A
    • 1979-04-03
    • US871252
    • 1978-01-23
    • Iwao TakemotoNorio KoikeMasaharu Kubo
    • Iwao TakemotoNorio KoikeMasaharu Kubo
    • H01L27/146H01L27/14
    • H01L27/14645H01L27/14654
    • A solid-state imaging device contains a photoelectric part in which a plurality of picture elements each consisting of a photodiode and a switching transistor are arranged in two dimensions. The picture elements are disposed on the same semiconductor substrate, and scanning circuits which scan the switching transistors of the photoelectric part in succession are provided. The solid-state imaging device further comprises a semiconductor layer which has a conductivity type opposite to that of the semiconductor substrate and which is disposed in one major surface of the semiconductor substrate and means for applying a reverse bias between the semiconductor layer and the semiconductor substrate. At least the photoelectric part is disposed within the semiconductor layer, and a high impurity concentration region which has the same conductivity type as that of the semiconductor layer and is disposed at least under a part of the photodiode.
    • 固态成像装置包括其中由光电二极管和开关晶体管组成的多个像素二维布置的光电部件。 图像元素设置在相同的半导体衬底上,并且连续地扫描光电部件的开关晶体管的扫描电路被设置。 固态成像装置还包括半导体层,其具有与半导体衬底的导电类型相反的导电类型,并且设置在半导体衬底的一个主表面中;以及用于在半导体层和半导体衬底之间施加反向偏压的装置 。 至少光电部件设置在半导体层内,高浓度区域具有与半导体层相同的导电类型,并且至少设置在光电二极管的一部分下方。