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    • 5. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US4148048A
    • 1979-04-03
    • US871252
    • 1978-01-23
    • Iwao TakemotoNorio KoikeMasaharu Kubo
    • Iwao TakemotoNorio KoikeMasaharu Kubo
    • H01L27/146H01L27/14
    • H01L27/14645H01L27/14654
    • A solid-state imaging device contains a photoelectric part in which a plurality of picture elements each consisting of a photodiode and a switching transistor are arranged in two dimensions. The picture elements are disposed on the same semiconductor substrate, and scanning circuits which scan the switching transistors of the photoelectric part in succession are provided. The solid-state imaging device further comprises a semiconductor layer which has a conductivity type opposite to that of the semiconductor substrate and which is disposed in one major surface of the semiconductor substrate and means for applying a reverse bias between the semiconductor layer and the semiconductor substrate. At least the photoelectric part is disposed within the semiconductor layer, and a high impurity concentration region which has the same conductivity type as that of the semiconductor layer and is disposed at least under a part of the photodiode.
    • 固态成像装置包括其中由光电二极管和开关晶体管组成的多个像素二维布置的光电部件。 图像元素设置在相同的半导体衬底上,并且连续地扫描光电部件的开关晶体管的扫描电路被设置。 固态成像装置还包括半导体层,其具有与半导体衬底的导电类型相反的导电类型,并且设置在半导体衬底的一个主表面中;以及用于在半导体层和半导体衬底之间施加反向偏压的装置 。 至少光电部件设置在半导体层内,高浓度区域具有与半导体层相同的导电类型,并且至少设置在光电二极管的一部分下方。
    • 7. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US4223330A
    • 1980-09-16
    • US5567
    • 1979-01-22
    • Norio KoikeIwao TakemotoShinya OhbaMasaharu KuboShuhei Tanaka
    • Norio KoikeIwao TakemotoShinya OhbaMasaharu KuboShuhei Tanaka
    • H01L27/146H04N5/335H04N5/359H04N5/374H01L27/14H01L29/78
    • H01L27/14654
    • In a solid-state imaging device having, in one major surface region of a semiconductor substrate, photoelectric conversion elements which are disposed in a two-dimensional array, vertical switching metal-insulator-semiconductor field effect transistors and horizontal switching metal-insulator-semiconductor field effect transistors which select the photoelectric conversion elements, and vertical and horizontal scanning circuits which turn the switching transistors "on" and "off," a solid-state imaging device characterized in that the vertical switching metal-insulator-semiconductor field effect transistors which are not selected are placed into a deeper cutoff state, i.e., the major surface regions of the semiconductor substrate corresponding to gate electrodes of these vertical switching metal-insulator-semiconductor field effect transistors are placed at an accumulation level.
    • 在具有在半导体衬底的一个主表面区域中设置为二维阵列的光电转换元件的立体成像器件中,垂直开关金属 - 绝缘体 - 半导体场效应晶体管和水平开关金属 - 绝缘体半导体 选择光电转换元件的场效应晶体管以及使开关晶体管“导通”和“截止”的垂直和水平扫描电路,其特征在于垂直开关金属 - 绝缘体半导体场效应晶体管 未选择的位置被置于更深的截止状态,即,对应于这些垂直开关金属 - 绝缘体 - 半导体场效应晶体管的栅极的半导体衬底的主表面区域被放置在累积水平。
    • 9. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US4316205A
    • 1982-02-16
    • US119383
    • 1980-02-07
    • Masakazu AokiIwao TakemotoMasaharu KuboRyuichi Izawa
    • Masakazu AokiIwao TakemotoMasaharu KuboRyuichi Izawa
    • H01L27/146H01L31/113H04N5/335H04N5/374H01L27/14
    • H01L31/1136H01L27/14643
    • In a solid-state imaging device having in one major surface region of a monolithic semiconductor body, photodiodes which are arrayed in two dimensions, vertical switching MOS transistors and horizontal switching MOS transistors which address the photodiodes, MOS transistors which constitute vertical and horizontal scanning circuits for turning "on" and "off" the switching MOS transistors, and MOS transistors which constitute other peripheral circuitry, the photodiodes being constructed of source regions of the vertical switching MOS transistors and the semiconductor body; a solid-state imaging device characterized in that among source and drain regions of the various MOS transistors, the source regions of the vertical switching MOS transistors are lower in the surface impurity concentration and deeper in the junction depth than the other source and drain regions.
    • 在具有单片半导体主体的一个主表面区域的固态成像装置中,以二维排列的光电二极管,构成光电二极管的垂直开关MOS晶体管和水平开关MOS晶体管,构成垂直和水平扫描电路的MOS晶体管 为了使开关MOS晶体管“开”和“关”,构成其它外围电路的MOS晶体管,该光电二极管由垂直开关MOS晶体管和半导体本体的源极区构成; 一种固态成像装置,其特征在于,在各种MOS晶体管的源极和漏极区域中,垂直开关MOS晶体管的源极区域的表面杂质浓度较低,并且结深度比其他源极和漏极区域更深。