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1. 发明授权

US4788577A Substrate surface deflecting device 失效
标题翻译：基板表面偏转装置
公开(公告)号：US4788577A
公开(公告)日：1988-11-29
申请号：US142698
申请日：1988-01-11
申请人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
发明人： Nobuyuki Akiyama , Asahiro Kuni , Yukio Kembo , Toshihiko Nakata
IPC分类号： G02F1/13 , G03B27/32 , G03F7/20 , H01L21/027 , H01L21/68 , H05K3/00 , G03B27/42
CPC分类号： G03F7/70691
摘要： An exposure apparatus comprises a stage; a base plate provided on the stage; a flexible chuck plate which is capable of sucking under vacuum a substantially entire surface of a substrate to a surface thereof; a plurality of vertical displacement generating mechanism including a plurality of feedscrews provided at the base plate with predetermined intervals therebetween, a plurality of rotational actuators for rotatively driving each of the feedscrews, and a plurality of spring members interposed between the chuck plate and the base plate so as to allow a tip of each of the feedscrews to be engaged with a rear surface of the chuck plate; restricting mechanism for restricting the chuck plate in such a manner as not to be displaced horizontally relative to the base plate; a mask holder for holding a mask; a mechanism for measuring a level of the mask held by the mask holder; and a mechanism for measuring a level of the substrate sucked onto the chuck plate, whereby each of the rotational actuators of the vertical displacement generating mechanism is driven on the basis of gaps between the mask and the substrated measured by the mechanism for measuring the level of the mask and the mechanism for measuring the level of the substrate so as to subject the substrate to deflection via the flexible chuck plate, thereby producing a uniform gap between the mask and the substrate.
摘要翻译：曝光装置包括：设置在舞台上的底板; 柔性卡盘板，其能够在真空下将基板的大致整个表面吸附到其表面; 多个垂直位移产生机构，包括设置在基板处的预定间隔的多个进给螺杆，用于旋转地驱动每个进给螺杆的多个旋转致动器，以及插入在卡盘板和基板之间的多个弹簧构件以允许每个所述进给螺杆的末端与所述卡盘板的后表面接合; 限制机构，用于以不相对于基板水平位移的方式限制卡盘板; 用于保持面罩的面罩座; 用于测量由所述面罩支架保持的面罩的高度的机构; 以及用于测量吸附到卡盘板上的基板的高度的机构，由此垂直位移产生机构的旋转致动器中的每个旋转致动器基于掩模和由用于测量液面的机构测量的底板之间的间隙而被驱动掩模和用于测量基板的水平的机构，以便使基板经由柔性卡盘板偏转，从而在掩模和基板之间产生均匀的间隙。

2. 发明授权

US4447731A Exterior view examination apparatus 失效
标题翻译：外观检查装置
公开(公告)号：US4447731A
公开(公告)日：1984-05-08
申请号：US327191
申请日：1981-12-03
申请人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
发明人： Asahiro Kuni , Yukio Kembo , Nobuyuki Akiyama , Nobuhiko Aoki
IPC分类号： G01B11/02 , G01B21/00 , G01Q20/02 , G01Q20/04 , G01Q30/02 , G01Q30/04 , H01J37/20 , H01J37/22 , H01J37/28
CPC分类号： H01J37/226 , H01J37/20
摘要： An exterior view examination apparatus comprising a movable sample stage provided in a sample chamber of a scanning type electron microscope; a sample mounted on the stage; and an optical microscope which can observe the sample from an exterior of the chamber, mounted on the chamber in parallel with the scanning type electron microscope, the position of a surface part of the sample (mounted on the sample stage) to be observed, measured or analyzed being preliminary defined by the optical microscope, and the sample stage being moved by a certain amount thereby to bring the sample at the center of the visual field of the electron microscope.
摘要翻译：一种外观检查装置，包括设置在扫描型电子显微镜的样品室中的可移动样品台; 样品安装在舞台上; 和可以与扫描型电子显微镜平行地安装在室上的室外观察样品的光学显微镜，测量样品表面部分（安装在样品台上）的位置，测量或者通过光学显微镜进行初步定义，并且将样品台移动一定量，从而将样品置于电子显微镜的视野的中心。

3. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

4. 发明授权

US4666291A Light-exposure apparatus 失效
标题翻译：曝光装置
公开(公告)号：US4666291A
公开(公告)日：1987-05-19
申请号：US852729
申请日：1986-04-16
申请人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
发明人： Motoya Taniguchi , Asahiro Kuni , Ryuichi Funatsu , Yukio Kembo , Akira Inagaki
IPC分类号： H01L51/00 , G03F7/20 , G03F9/00 , G03B27/68
CPC分类号： G03F9/7053 , G03F7/703 , G03F7/707
摘要： A light-exposure apparatus which can keep uniform the gap between a mask and a wafer and reduce the density of arrangement of vertical movers adapted to deform the wafer to thereby reduce cost and weight of the apparatus. The apparatus has a thin plate deforming mechanism comprising a chuck platen for holding on its top surface the wafer, the bottom surface of the chuck platen being formed with imperforate slits patterned in the form of a grid composed of a plurality of triangular meshes so that the chuck platen may be deformed along bending lines near the triangular meshes, and a plurality of vertical movers for vertically deforming the individual triangular meshes so as to flatten or deform into a desired shape the wafer.
摘要翻译：能够使掩模和晶片之间的间隙保持均匀并且减小适于使晶片变形的垂直移动器的布置密度，从而降低装置的成本和重量的曝光装置。该装置具有薄板变形机构，其包括用于在其顶表面上保持晶片的卡盘台板，卡盘台板的底表面形成为由多个三角形网格构成的网格形式的无孔狭缝，使得卡盘台板可以沿着三角形网格附近的弯曲线变形，并且多个垂直移动器用于使各个三角形网格垂直变形，以使其平坦化或变形成所需形状的晶片。

5. 发明授权

US4777641A Method and apparatus for alignment 失效
标题翻译：对准方法和装置
公开(公告)号：US4777641A
公开(公告)日：1988-10-11
申请号：US918004
申请日：1986-10-14
申请人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
发明人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
IPC分类号： G02B7/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G21K5/00
CPC分类号： G03F9/70
摘要： A method and apparatus for alignment for use in X-ray exposure or the like wherein a mask is provided having a formation of an alignment pattern made up of at least one linear segment formed in a peripheral section of the mask and a wafer is provided having a formation of an alignment pattern formed in a same direction as the alignment pattern of the mask and made up of linear segments. An illuminating arrangement illuminates a light to the mask alignment pattern along a direction inclined to the alignment direction and the mask alignment pattern and the wafer alignment pattern are imaged and transformed into a video signal. An A/D converts the video signal into a digital signal and stores the digital signal in a memory. The digital video signal is read out from the memory and averaged in a mask alignment pattern by removing a shadow portion caused by the mask alignment pattern and additionally averaged in a wafer alignment pattern area with an averaged wafer alignment pattern signal and an averaged wafer alignment pattern signal being provided. Relative displacement between the mask and the wafer is detected from the averaged mask alignment pattern signal and the averaged wafer alignment pattern signal and the mask and wafer are aligned by moving at least one of the mask and wafer so that displacement between the mask and the wafer does not exist.
摘要翻译：一种用于X射线曝光等的对准用的方法和装置，其中提供具有由形成在掩模的周边部分中的至少一个线性部分构成的取向图案的掩模和晶片，其具有：形成与由掩模的对准图形相同的方向形成并由直线段构成的对准图案。照明装置沿着对准方向倾斜的方向照射到掩模对准图案，并且将掩模对准图案和晶片对准图案成像并变换为视频信号。 A / D将视频信号转换为数字信号，并将数字信号存储在存储器中。从存储器中读出数字视频信号，并通过去除由掩模对准图形引起的阴影部分并以平均的晶片对准图案信号和平均的晶片对准图案在晶片对准图案区域中平均化，以掩模对准图案平均化提供信号。从平均的掩模对准图案信号中检测掩模和晶片之间的相对位移，并且通过移动掩模和晶片中的至少一个来对准平均的晶片对准图案信号并且掩模和晶片，使得掩模和晶片之间的位移不存在。

6. 发明授权

US4213117A Method and apparatus for detecting positions of chips on a semiconductor wafer 失效
标题翻译：用于检测半导体晶片上的芯片位置的方法和装置
公开(公告)号：US4213117A
公开(公告)日：1980-07-15
申请号：US964353
申请日：1978-11-28
申请人： Yukio Kembo , Asahiro Kuni , Hiroshi Makihira
发明人： Yukio Kembo , Asahiro Kuni , Hiroshi Makihira
IPC分类号： H01L23/544 , G06K9/04
CPC分类号： H01L23/544 , H01L2223/54453 , H01L2924/0002
摘要： A method and apparatus for detecting positions of chips on a semiconductor wafer. The method comprises an illuminating step for illuminating obliquely the semiconductor wafer from above including at least a position detecting direction; a totalizing step for optically totalizing, when the irregular reflecting rays reflecting at the semiconductor wafer illuminated at the illuminating step are photographed by an image pickup element or device, the irregular reflecting rays in the direction normal to the position detecting direction or for electrically totalizing the levels of a video signal produced by the image pickup element or device in the same direction; a video signal detecting step for producing a video signal with coordinates lying in the position detecting direction by photographing an image resulting from optical totalization at the totalizing step by the image pickup element or device or electrically totalizing the image; and a street position detecting step for detecting a street position between chips by extracting a specific coordinate with a wide width and a low level corresponding to dark from the video signal produced at the video signal detecting step. The apparatus executes the above-mentioned method.
摘要翻译：一种用于检测半导体晶片上的芯片位置的方法和装置。该方法包括用于从至少位置检测方向从上方倾斜地照射半导体晶片的照明步骤; 当在照明步骤照射的半导体晶片处反射的不规则反射光线被图像拾取元件或器件拍摄时，在垂直于位置检测方向的方向上的不规则反射光线或用于电气地将由图像拾取元件或装置在相同方向上产生的视频信号的电平; 视频信号检测步骤，用于通过拍摄由图像拾取元件或装置的累积步骤产生的由光学累积得到的图像，或者电子地对图像进行电积分，产生具有处于位置检测方向的坐标的视频信号; 以及街道位置检测步骤，用于通过从视频信号检测步骤中产生的视频信号提取具有与深度对应的宽宽度和低电平的特定坐标来检测码片之间的街道位置。该装置执行上述方法。

7. 发明授权

US07631548B2 Scanning probe microscope 失效
标题翻译：扫描探针显微镜
公开(公告)号：US07631548B2
公开(公告)日：2009-12-15
申请号：US11737779
申请日：2007-04-20
申请人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： Shuichi Baba , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01B5/28
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

8. 发明申请

US20070266780A1 Scanning Probe Microscope 失效
标题翻译：扫描探头显微镜
公开(公告)号：US20070266780A1
公开(公告)日：2007-11-22
申请号：US11737779
申请日：2007-04-20
申请人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
发明人： SHUICHI BABA , Masahiro Watanabe , Toshihiko Nakata , Toru Kurenuma , Hiroshi Kuroda , Takafumi Morimoto , Yukio Kembo , Manabu Edamura
IPC分类号： G01N13/10
CPC分类号： G01Q60/28 , G01Q10/06 , G01Q30/04
摘要： With a scanning probe microscope, if a plurality of sample properties are measured using a scanning scheme of allowing a probe to approach and withdraw from a sample, the sample properties need to be accurately and reliably detected in the minimum required measurement time. Further, the acting force between the probe and the sample varies depending on the type of the probe and the wear condition of a probe tip. Thus, disadvantageously, property values acquired using different probes cannot be compared with one another unless the artifactual effect of the measuring probes are eliminated. In accordance with the present invention, with a scanning probe microscope, the probe is brought into intermittent contact with the sample, while driving means repeatedly allows the probe to approach and withdraw from the sample with a variable amplitude. The sample property is thus acquired at a high speed. Further, a calibration sample is used in a given environment (given temperature and humidity) to acquire a force curve for at least one point. Information obtained from the force curve is used to correct measurements to display the distribution of the sample property.
摘要翻译：使用扫描探针显微镜，如果使用允许探针进入和退出样本的扫描方案测量多个样品特性，则需要在最小所需测量时间内精确可靠地检测样品性质。此外，探针和样品之间的作用力根据探针的类型和探针尖端的磨损情况而变化。因此，不利的是，使用不同探针获得的特性值不能相互比较，除非消除了测量探针的人为影响。根据本发明，利用扫描探针显微镜，使探针与样品间歇接触，同时驱动装置反复允许探针以可变的幅度从样品接近和退出。因此，以高速度获取样品特性。此外，在给定的环境（给定的温度和湿度）中使用校准样品以获得至少一个点的力曲线。从力曲线获得的信息用于校正测量值以显示样品属性的分布。

9. 发明授权

US5062715A Method and apparatus for detecting photoacoustic signal and method for detecting internal defect of semiconductor device 失效
标题翻译：用于检测光声信号的方法和装置以及用于检测半导体器件的内部缺陷的方法
公开(公告)号：US5062715A
公开(公告)日：1991-11-05
申请号：US479712
申请日：1990-02-14
申请人： Toshihiko Nakata , Yukio Kembo
发明人： Toshihiko Nakata , Yukio Kembo
IPC分类号： G01N29/00 , G01N29/04 , G01N29/24 , G02B21/00
CPC分类号： G02B21/0072 , G01N29/2418 , G01N2291/0423 , G01N2291/2697
摘要： A photoacoustic signal detecting method and apparatus for intensity-modulating light having a wavelength penetrating a sample such as a semiconductor device at a desired frequency, the light being emitted from a first light source, focusing the intensity-modulated light on the sample as a light spot, by changing the position of the sample and the optical constant of the means for focusing, scanning the light spot inside the sample in a depth direction thereof to detect the photoacoustic effect generated in the sample, and extracting information relative to the surface and inside of the sample and defect information therein. The photoacoustic effect is detected using an interferometer. Light incident on the sample surface for a second light source in order to obtain interference light and the interference light reflected from the sample surface are adjusted in response to a signal indicative of the depth of the light spot to detect optimum interference light. Light reflected from the sample surface when light emitted from a third light source is incident on the surface is detected through the focusing optical system to generate the signal indicative of the depth of the light spot.
摘要翻译：一种光声信号检测方法和装置，用于强度调制具有以期望频率穿透诸如半导体器件的样品的波长的光，所述光从第一光源发射，将强度调制光聚焦在样品上作为光通过改变样品的位置和聚焦装置的光学常数，扫描样品内的光斑在其深度方向上，以检测样品中产生的光声效应，并提取相对于表面和内部的信息的样品和缺陷信息。使用干涉仪检测光声效应。为了获得干涉光和从样品表面反射的干涉光，入射到用于第二光源的样品表面上的光被响应于指示光斑的深度的信号来调节以检测最佳干涉光。通过聚焦光学系统检测从第三光源发射的光入射在表面上的从样品表面反射的光，以产生指示光斑深度的信号。

10. 发明申请

US20080223122A1 SCANNING PROBE MICROSCOPE 有权
标题翻译：扫描探针显微镜
公开(公告)号：US20080223122A1
公开(公告)日：2008-09-18
申请号：US12023158
申请日：2008-01-31
申请人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
发明人： Masahiro Watanabe , Toru KURENUMA , Hiroshi Kuroda , Takafumi Morimoto , Shuichi Baba , Toshihiko Nakata , Manabu Edamura , Yukio Kembo
IPC分类号： G01B5/28
CPC分类号： G01Q70/04 , G01Q10/06
摘要： A scanning probe microscope, capable of performing shape measurement not affected by electrostatic charge distribution of a sample, which: monitors an electrostatic charge state by detecting a change in a flexure or vibrating state of a cantilever due to electrostatic charges in synchronization with scanning during measurement with relative scanning between the probe and the sample, and makes potential adjustment so as to cancel an influence of electrostatic charge distribution, thus preventing damage of the probe or the sample due to discharge and achieving reduction in measurement errors due to electrostatic charge distribution.
摘要翻译：扫描探针显微镜，其能够执行不受样品静电荷分布影响的形状测量，其通过检测与测量同步的静电荷引起的静电荷的悬臂的挠曲或振动状态的变化来监测静电荷状态通过探针和样品之间的相对扫描，进行电位调整，以消除静电电荷分布的影响，从而防止由于放电而引起的探针或样品的损伤，并实现由静电电荷分布引起的测量误差的降低。

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