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1. 发明授权

US4777641A Method and apparatus for alignment 失效
标题翻译：对准方法和装置
公开(公告)号：US4777641A
公开(公告)日：1988-10-11
申请号：US918004
申请日：1986-10-14
申请人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
发明人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
IPC分类号： G02B7/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G21K5/00
CPC分类号： G03F9/70
摘要： A method and apparatus for alignment for use in X-ray exposure or the like wherein a mask is provided having a formation of an alignment pattern made up of at least one linear segment formed in a peripheral section of the mask and a wafer is provided having a formation of an alignment pattern formed in a same direction as the alignment pattern of the mask and made up of linear segments. An illuminating arrangement illuminates a light to the mask alignment pattern along a direction inclined to the alignment direction and the mask alignment pattern and the wafer alignment pattern are imaged and transformed into a video signal. An A/D converts the video signal into a digital signal and stores the digital signal in a memory. The digital video signal is read out from the memory and averaged in a mask alignment pattern by removing a shadow portion caused by the mask alignment pattern and additionally averaged in a wafer alignment pattern area with an averaged wafer alignment pattern signal and an averaged wafer alignment pattern signal being provided. Relative displacement between the mask and the wafer is detected from the averaged mask alignment pattern signal and the averaged wafer alignment pattern signal and the mask and wafer are aligned by moving at least one of the mask and wafer so that displacement between the mask and the wafer does not exist.
摘要翻译：一种用于X射线曝光等的对准用的方法和装置，其中提供具有由形成在掩模的周边部分中的至少一个线性部分构成的取向图案的掩模和晶片，其具有：形成与由掩模的对准图形相同的方向形成并由直线段构成的对准图案。照明装置沿着对准方向倾斜的方向照射到掩模对准图案，并且将掩模对准图案和晶片对准图案成像并变换为视频信号。 A / D将视频信号转换为数字信号，并将数字信号存储在存储器中。从存储器中读出数字视频信号，并通过去除由掩模对准图形引起的阴影部分并以平均的晶片对准图案信号和平均的晶片对准图案在晶片对准图案区域中平均化，以掩模对准图案平均化提供信号。从平均的掩模对准图案信号中检测掩模和晶片之间的相对位移，并且通过移动掩模和晶片中的至少一个来对准平均的晶片对准图案信号并且掩模和晶片，使得掩模和晶片之间的位移不存在。

2. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

3. 发明授权

US4825453A X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US4825453A
公开(公告)日：1989-04-25
申请号：US788861
申请日：1985-10-17
申请人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
发明人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , G21K5/00
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70033 , G03F7/70841 , G03F7/70866
摘要： Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
摘要翻译：公开了一种具有低吸收少量X射线吸收气体的低衰减室的X射线曝光装置，该低衰减室插入在X射线源和掩模之间，使得透过低衰减室的X射线为照射在掩模上以将掩模图案转印到晶片上的抗蚀剂上，该装置包括用于检测混合在低衰减室中的气体中的气体或成分的检测装置，用于控制气体供应量的控制装置根据检测装置的输出信号进入低衰减室，和/或调节装置，用于根据检测装置的输出信号调节照射在掩模上的所述X射线的曝光量。

4. 发明授权

US4614431A Alignment apparatus with optical length-varying optical system 失效
标题翻译：具有光学长度变化光学系统的对准装置
公开(公告)号：US4614431A
公开(公告)日：1986-09-30
申请号：US580709
申请日：1984-02-16
申请人： Yoshihiro Komeyama
发明人： Yoshihiro Komeyama
IPC分类号： G03F9/00 , G01B11/00
CPC分类号： G03F9/7026
摘要： In an aligner system wherein a mask and a wafer are arranged so as to oppose each other with a predetermined gap therebetween, an alignment apparatus is provided including an objective for focusing an alignment marks formed on the mask and on the wafer, a photodetector for imaging both alignment marks, an optical length-varying optical system, a displacement detector, a magnification compensation arrangement, and a relative displacement magnitude detector. The optical length-varying optical system includes at least one prism arrangement for changing an optical length of the optical system to bring each of the alignment marks into focus. The optical system enables light rays from the alignment marks to enter the at least one prism arrangement an even number of times and to exit from the at least one prism arrangement an even number of times, so that the first entrance of the light rays to the at least one prism arrangement and the last exit of the light rays from the at least one prism arrangement may be shifted. The first entrance of the light rays includes optical images from the objective with the last exit of the light rays being directed toward the photodetector. The displacement detector detects the magnitude of movement of the at least one prism and the magnification compensation arrangement compensates for magnitudes of the displacements of the respective alignment marks from an optic axis whereby relative displacement magnitude between the mask and the wafer are detected by use of the images of equal magnifications and the mask and wafer can be aligned with high sensitivity and high accuracy.
摘要翻译：在其中掩模和晶片以其间具有预定间隙彼此相对布置的对准器系统中，提供了一种对准装置，其包括用于聚焦形成在掩模上和晶片上的对准标记的物镜，用于成像的光电检测器两个对准标记，光学长度变化光学系统，位移检测器，倍率补偿装置和相对位移幅度检测器。光学长度变化光学系统包括至少一个用于改变光学系统的光学长度以使每个对准标记聚焦的棱镜装置。光学系统使得来自对准标记的光线能够偶数次进入至少一个棱镜装置，并且从至少一个棱镜装置排出偶数次，使得光线的第一次入射到至少一个棱镜装置和来自至少一个棱镜装置的光线的最后出口可以移动。光线的第一入口包括来自物镜的光学图像，光线的最后出射指向光电检测器。位移检测器检测至少一个棱镜的运动幅度，并且倍率补偿装置补偿相应对准标记从光轴的位移的大小，从而通过使用掩模和晶片来检测掩模和晶片之间的相对位移幅度具有相同倍率的图像和掩模和晶片可以以高灵敏度和高精度对准。

5. 发明授权

US4516254A X-Ray lithographic apparatus 失效
标题翻译： X射线光刻设备
公开(公告)号：US4516254A
公开(公告)日：1985-05-07
申请号：US557460
申请日：1983-12-02
申请人： Yoshihiro Komeyama , Motoya Taniguchi
发明人： Yoshihiro Komeyama , Motoya Taniguchi
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , G03B41/00
CPC分类号： G03F7/709 , G03F7/7035 , G03F7/70808 , G03F7/70866 , H01L21/30
摘要： The present invention consists in an X-ray lithographic apparatus having an X-ray generator which generates X-rays, and a gastight chamber which is gastightly coupled to the X-ray generator and which holds a mask to be exposed to the X-rays, on its surface remote from the X-ray generator, characterized in that the gastight chamber is provided with a window on which a soft member softer than the mask is mounted.
摘要翻译：本发明包括具有产生X射线的X射线发生器的X射线光刻设备，以及与气体密封地连接到X射线发生器并且保持掩模以暴露于X射线的气密室在其远离X射线发生器的表面上，其特征在于，所述气密室设置有窗口，柔性构件比所述掩模安装在所述窗口上。

6. 发明授权

US4492356A Precision parallel translation system 失效
标题翻译：精密平行翻译系统
公开(公告)号：US4492356A
公开(公告)日：1985-01-08
申请号：US436721
申请日：1982-10-26
申请人： Motoya Taniguchi , Minoru Ikeda , Yoshihiro Komeyama
发明人： Motoya Taniguchi , Minoru Ikeda , Yoshihiro Komeyama
IPC分类号： B23Q1/34 , B23Q1/36 , B23Q1/62 , B23Q5/40 , B23Q5/50 , G03F7/20 , A47B91/00
CPC分类号： G03F7/70716 , B23Q1/34 , B23Q1/36 , B23Q1/621 , B23Q5/408 , B23Q5/50 , Y10T74/20207
摘要： A precision parallel translation system including a pair of tables or upper and lower tables movable parallel to and in directions perpendicular to each other, and a pair of drive means for rough movement each detachably connected to one of the tables to drive the respective table for movement a relatively long distance. Each table supports drive means for fine movement detachably connected to a base (which is the lower table in the case of the upper table) supporting the respective table. The table is moved a relatively long distance by the drive means for rough movement when rough movement is effected, to effect rough positioning of the table. Then the drive means for fine movement is secured to the base while detaching the drive means for rough movement from the table, to drive the table for fine movement to effect precision positioning of the table.
摘要翻译：一种精密并行平移平移系统，包括一对平行于和彼此垂直的方向移动的桌子或上表和下表，以及一对可移动地连接到一个桌子以驱动各个桌子移动的粗略运动的驱动装置相对较长的距离。每个桌子支撑用于可移动地连接到支撑相应桌子的基座（在上表的情况下的下表）的精细移动的驱动装置。通过驱动装置使桌子移动相对较长的距离，以便在进行粗略移动时进行粗略的移动，以实现桌子的粗略定位。然后将精细运动的驱动装置固定到基座上，同时分离驱动装置用于从工作台粗略移动，以驱动工作台进行精细移动，以实现工作台的精确定位。

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