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1. 发明授权

US4708484A Projection alignment method and apparatus 失效
标题翻译：投影对准方法及装置
公开(公告)号：US4708484A
公开(公告)日：1987-11-24
申请号：US789778
申请日：1985-10-21
申请人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
发明人： Yoshihiro Komeyama , Yukio Kembo , Asahiro Kuni , Ryuuichi Funatsu , Akira Inagaki , Minoru Ikeda , Keiichi Okamoto
IPC分类号： G01R31/26 , G03F9/00 , H01L21/30 , G01B11/26
CPC分类号： G03F9/7023 , G03F9/7049 , G03F9/7076
摘要： The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
摘要翻译：本发明涉及一种投影对准器，其中掩模和晶片彼此靠近地保持，并且其中将掩模上描绘的电路图案转印到晶片上，以检测掩模和晶片的相应位置的方法用于掩模和晶片之间的相对定位。以这样的方式分配显微镜物镜的取出的结束，使得防止用于检测掩模和晶片的显微镜和例如X射线的投射光的目的被干扰，从而实现增加吞吐量并且即使在投影期间也能够检测掩模和晶片的位置，本发明的目的在于，显微镜的目的是相对于掩模的平面垂直于或平面的倾斜晶片是要被检测的平面，以便不干涉诸如X射线的投影光，由此可以在检测掩模和晶片的相对位置的同时传输电路图案。

2. 发明授权

US4825453A X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US4825453A
公开(公告)日：1989-04-25
申请号：US788861
申请日：1985-10-17
申请人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
发明人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , G21K5/00
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70033 , G03F7/70841 , G03F7/70866
摘要： Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
摘要翻译：公开了一种具有低吸收少量X射线吸收气体的低衰减室的X射线曝光装置，该低衰减室插入在X射线源和掩模之间，使得透过低衰减室的X射线为照射在掩模上以将掩模图案转印到晶片上的抗蚀剂上，该装置包括用于检测混合在低衰减室中的气体中的气体或成分的检测装置，用于控制气体供应量的控制装置根据检测装置的输出信号进入低衰减室，和/或调节装置，用于根据检测装置的输出信号调节照射在掩模上的所述X射线的曝光量。

3. 发明授权

US4803712A X-ray exposure system 失效
标题翻译： X射线曝光系统
公开(公告)号：US4803712A
公开(公告)日：1989-02-07
申请号：US4880
申请日：1987-01-20
申请人： Yukio Kembo , Minoru Ikeda , Motoya Taniguchi
发明人： Yukio Kembo , Minoru Ikeda , Motoya Taniguchi
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70691 , G03F7/709
摘要： An X-ray exposure system includes a frame set on the floor; an X-ray source fixedly provided in the central portion of the upper part of the frame; a mask-wafer alignment means comprising a wafer at a fixed distance from a mask, an X-Y table mounted with the wafer holder, a mask holder for holding the mask, and an alignment detecting means for detecting the alignment of the alignment pattern of the mask and that of the wafer; vibration isolators for supporting the mask-wafer alignment means so that vibrations do not propagate to the mask-wafer alignment means; detecting means for detecting the position of the mask-wafer alignment means with respect to three-dimensional directions relative to the X-ray source; an arithmetic means for calculating an exposure error of a dislocation of a mask pattern exposure on the wafer, on the basis of position data obtained by the detecting means; and correcting means for correcting the exposure error calculated by the arithmetic means.
摘要翻译： X射线曝光系统包括设置在地板上的框架; 固定地设置在所述框架的上部的中心部分的X射线源; 掩模晶片对准装置，其包括距离掩模固定距离的晶片，安装有晶片保持器的XY工作台，用于保持掩模的掩模支架，以及用于检测掩模的对准图案的对准的对准检测装置和晶片的; 用于支撑掩模 - 晶片对准装置的振动隔离器，使得振动不传播到掩模 - 晶片对准装置; 检测装置，用于相对于X射线源相对于三维方向检测掩模晶片对准装置的位置; 用于根据由检测装置获得的位置数据计算晶片上的掩模图案曝光的位错的曝光误差的算术装置; 以及校正装置，用于校正由算术装置计算出的曝光误差。

4. 发明授权

US4852133A X-ray lithography apparatus 失效
标题翻译： X射线光刻设备
公开(公告)号：US4852133A
公开(公告)日：1989-07-25
申请号：US117499
申请日：1987-11-06
申请人： Minoru Ikeda , Ryuichi Funatsu , Yukio Kembo , Motoya Taniguchi
发明人： Minoru Ikeda , Ryuichi Funatsu , Yukio Kembo , Motoya Taniguchi
IPC分类号： H01L21/027 , G03F7/20 , H01L21/30
CPC分类号： G03F7/70866 , G03F7/70875 , G03F7/70933
摘要： An X-ray lithography apparatus for transferring a pattern formed in a mask onto a wafer by using a soft X-ray. The apparatus comprises a soft X-ray generating unit, a gas chamber connected to an X-ray exit window of the soft X-ray generating unit and filled with a gaseous medium having a high transmittivity to the X-ray, the mask being mounted within the gas chamber, a stage for positioning the wafer in opposition to the mask with a small gap therebetween, detecting optics disposed within the gas chamber for optically picking up image of alignment patterns of the mask and wafer, an imager disposed within the gas chamber for converting the image of the alignment pattern picked up by the detecting optics into a video signal, a discharging port for withdrawing from the gas chamber the gaseous medium present in the vicinity of the imager, a combination of a blower and a heat exchanged for cooling and circulating the gaseous medium withdrawn through the gas discharging port, and a charging port for feeding back to the gas chamber the gaseous medium conditioned and circulated by the blower and the heat exchanger. The discharge port, blower and heat exchanger and the charging port cooperate to prevent the temperature of the gaseous medium within the gas chamber from being increased due to heat generated by the imager means to thereby suppress drift phenomenon in the detecting optics.
摘要翻译：一种X射线光刻设备，用于通过使用软X射线将形成在掩模中的图案转印到晶片上。该装置包括软X射线产生单元，连接到软X射线产生单元的X射线出射窗的气室，并且填充有对X射线具有高透射率的气体介质，所述掩模被安装在气室内设有用于将晶片定位成与掩模相对的掩模的台阶，其间检测设置在气室内的光学拾取掩模和晶片的对准图案的图像;设置在气室内的成像器用于将由检测光学元件拾取的对准图案的图像转换为视频信号;排出口，用于从气室中取出存在于成像器附近的气态介质，鼓风机和换热器的组合并且循环通过气体排出口排出的气体介质，以及用于将由鼓风机调节和循环的气体介质反馈给气室的充气口，在交换器。排气口，鼓风机和热交换器以及充气口配合，以防止气体室内气态介质的温度由于成像器装置产生的热量而增加，从而抑制检测光学元件中的漂移现象。

5. 发明授权

US4492356A Precision parallel translation system 失效
标题翻译：精密平行翻译系统
公开(公告)号：US4492356A
公开(公告)日：1985-01-08
申请号：US436721
申请日：1982-10-26
申请人： Motoya Taniguchi , Minoru Ikeda , Yoshihiro Komeyama
发明人： Motoya Taniguchi , Minoru Ikeda , Yoshihiro Komeyama
IPC分类号： B23Q1/34 , B23Q1/36 , B23Q1/62 , B23Q5/40 , B23Q5/50 , G03F7/20 , A47B91/00
CPC分类号： G03F7/70716 , B23Q1/34 , B23Q1/36 , B23Q1/621 , B23Q5/408 , B23Q5/50 , Y10T74/20207
摘要： A precision parallel translation system including a pair of tables or upper and lower tables movable parallel to and in directions perpendicular to each other, and a pair of drive means for rough movement each detachably connected to one of the tables to drive the respective table for movement a relatively long distance. Each table supports drive means for fine movement detachably connected to a base (which is the lower table in the case of the upper table) supporting the respective table. The table is moved a relatively long distance by the drive means for rough movement when rough movement is effected, to effect rough positioning of the table. Then the drive means for fine movement is secured to the base while detaching the drive means for rough movement from the table, to drive the table for fine movement to effect precision positioning of the table.
摘要翻译：一种精密并行平移平移系统，包括一对平行于和彼此垂直的方向移动的桌子或上表和下表，以及一对可移动地连接到一个桌子以驱动各个桌子移动的粗略运动的驱动装置相对较长的距离。每个桌子支撑用于可移动地连接到支撑相应桌子的基座（在上表的情况下的下表）的精细移动的驱动装置。通过驱动装置使桌子移动相对较长的距离，以便在进行粗略移动时进行粗略的移动，以实现桌子的粗略定位。然后将精细运动的驱动装置固定到基座上，同时分离驱动装置用于从工作台粗略移动，以驱动工作台进行精细移动，以实现工作台的精确定位。

6. 发明授权

US4475223A Exposure process and system 失效
标题翻译：曝光过程和系统
公开(公告)号：US4475223A
公开(公告)日：1984-10-02
申请号：US387206
申请日：1982-06-10
申请人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
发明人： Motoya Taniguchi , Mitsuyoshi Koizumi , Nobuyuki Akiyama , Yukio Kembo , Minoru Ikeda
IPC分类号： H01L21/027 , G03B27/02 , G03F7/20 , G03F7/207 , G03F9/00 , G03F9/02 , G21K5/00
CPC分类号： G03F7/707 , G03F7/20 , G03F7/703 , G03F9/703 , G03F9/7034
摘要： An X ray exposure process and system for transferring a mask pattern onto a wafer with use of X rays, wherein heights on the mask at many points are measured on a light interference band basis by a mask-height measuring device of non-contact measurement type at an X ray exposure position, the mask being mounted on a chamber which is filled with a He gas and or the like to prevent attenuation of an X ray source, heights on the wafer at many points are measured at a wafer-height measuring position different from said exposure position, and according to the measured results, the wafer is finely moved upwardly or downwardly (that is, deformed) individually independently by means of a chuck which sucks and holds the wafer at many points thereon so that, a gap between the mask and wafer is adjusted to a desired level.
摘要翻译： X射线曝光处理和系统，用于使用X射线将掩模图案转印到晶片上，其中通过非接触测量型的掩模高度测量装置在光干涉条带下测量许多点上的掩模上的高度在X射线曝光位置，掩模被安装在填充有He气体等的室中以防止X射线源的衰减，在晶片高度测量位置处测量许多点上的晶片上的高度与所述曝光位置不同，并且根据测量结果，通过在其上的许多点吸附并保持晶片的卡盘，晶片被独立地独立地向上或向下（即变形）精细地移动，使得晶片之间的间隙掩模和晶片被调节到期望的水平。

7. 发明授权

US08234717B2 Accessing and checking the validity of control information stored in external storage 有权
标题翻译：访问和检查存储在外部存储器中的控制信息的有效性
公开(公告)号：US08234717B2
公开(公告)日：2012-07-31
申请号：US12516789
申请日：2007-03-05
申请人： Minoru Ikeda , Romuald Rousseau , Koichi Shirasuka
发明人： Minoru Ikeda , Romuald Rousseau , Koichi Shirasuka
IPC分类号： G06F9/34 , G06F9/06
CPC分类号： G06F21/88 , G06F21/62 , G06F21/78 , G06F2221/2107
摘要： [PROBLEMS] To more infallibly prevent leak of information because loss or theft. [MEANS FOR SOLVING PROBLEMS] It is judged whether or not read control information stored in a predetermined read control information storage area of an external storage is proper. If the judgment result shows that it is invalid, virtualized data stored in the external storage is decrypted, and genuine read control information virtualized in the virtualized data is extracted. It is judged whether or not the extracted genuine read control information is proper. If the extracted genuine read control information is proper, the virtualized genuine data in the virtualized data along with the genuine read control information is made usable by decrypting and creating the virtualized data, and improper read control information is stored in the read control information storage area. The proper genuine read control information and genuine data are encrypted to create virtualized data. The virtualized data is stored in a data storage area of the external storage corresponding to the read control information storage area.
摘要翻译： [问题]为了更可靠地防止信息泄漏，因为丢失或被盗。解决问题的手段判断存储在外部存储器的预定读取控制信息存储区域中的读取控制信息是否合适。如果判断结果为无效，则存储在外部存储器中的虚拟化数据被解密，并且提取虚拟化数据中虚拟化的原始读取控制信息。判断所提取的真实的读取控制信息是否合适。如果所提取的真实的读取控制信息正确，则虚拟化数据中的虚拟化的真实数据与真实的读取控制信息一起被解密并创建虚拟化数据可用，并且不正确的读取控制信息被存储在读取的控制信息存储区域。适当的正确读取控制信息和正版数据被加密以创建虚拟化数据。虚拟化数据被存储在与读取控制信息存储区域对应的外部存储器的数据存储区域中。

8. 发明授权

US08149197B2 Electro-optical device, drive method for electro-optical device, and electronic apparatus 有权
标题翻译：电光装置，电光装置的驱动方法以及电子装置
公开(公告)号：US08149197B2
公开(公告)日：2012-04-03
申请号：US11537729
申请日：2006-10-02
申请人： Chiyoaki Iijima , Minoru Ikeda
发明人： Chiyoaki Iijima , Minoru Ikeda
IPC分类号： G09G3/36
CPC分类号： G09G3/3622 , G09G3/2014 , G09G2310/0205 , G09G2320/0209
摘要： An electro-optical display device includes an electro-optical panel, a scanning line drive circuit for scanning the scanning lines of the panel during a selection period, and a signal line drive circuit for outputting a data signal to a predetermined pixel through the corresponding data line of the panel in synchronization with the scanning of the scanning line drive circuit. During the selection period during which the data signal is output to the predetermined pixel, the duration of the ON voltage interval corresponding to a grayscale level having the longest OFF voltage interval is longer than the duration of the OFF voltage interval corresponding to a grayscale level having the longest ON voltage interval.
摘要翻译：电光显示装置包括电光面板，用于在选择周期期间扫描面板的扫描线的扫描线驱动电路和用于通过相应数据将数据信号输出到预定像素的信号线驱动电路与扫描线驱动电路的扫描同步的面板线。在将数据信号输出到预定像素的选择期间期间，对应于具有最长OFF电压间隔的灰度级的ON电压间隔的持续时间比对应于具有最长的接通电压间隔。

9. 发明申请

US20090286796A1 Compounds exhibiting type X sPLA2 inhibiting effect 审中-公开
标题翻译：表现出X型sPLA2抑制作用的化合物
公开(公告)号：US20090286796A1
公开(公告)日：2009-11-19
申请号：US12458846
申请日：2009-07-24
申请人： Tomoyuki Ogawa , Kaoru Seno , Kohji Hanasaki , Minoru Ikeda , Takashi Ono
发明人： Tomoyuki Ogawa , Kaoru Seno , Kohji Hanasaki , Minoru Ikeda , Takashi Ono
IPC分类号： A61K31/5025 , C07D487/02 , A61P43/00
CPC分类号： C07D403/12 , C07D209/12 , C07D209/22 , C07D209/24 , C07D209/42 , C07D487/04
摘要： A compound represented by the general formula: wherein R20 is —CH2COOH and the like; R21 is —COCONH2 and the like; R22 is C4-C6 alkyl; and the like; R23 is —CH2—R18 wherein R18 is aryl and the like; R24 is hydrogen or C1-C6 alkyl and the like; an optical active compound, a prodrug thereof, or a pharmaceutically acceptable salt, or a solvate having type X sPLA2 inhibitory effect was found.
摘要翻译：由通式表示的化合物：其中R 20是-CH 2 COOH等; R 21是-COCONH 2等; R 22是C 4 -C 6烷基; 等等; R 23是-CH 2 -R 18，其中R 18是芳基等; R 24是氢或C 1 -C 6烷基等; 发现光学活性化合物，其前药，或其药学上可接受的盐，或具有X sPLA2型抑制作用的溶剂化物。

10. 外观设计

USD561803S1 Video camera with recorder and player 有权
公开(公告)号：USD561803S1
公开(公告)日：2008-02-12
申请号：US29277583
申请日：2007-03-02
申请人： Shinichi Morita , Atsushi Ishibashi , Minoru Ikeda , Akihiro Gotou
设计人： Shinichi Morita , Atsushi Ishibashi , Minoru Ikeda , Akihiro Gotou

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